• 제목/요약/키워드: large-area display

검색결과 292건 처리시간 0.032초

Transducer 최적화 설계에 의한 Laser Projection Display용 음향광학변조기 제작 및 특성평가에 대한 연구 (Fabrication of transducer optimized acousto optic modulator for laser projection display)

  • 차승남;이항우;김용훈;황영모
    • 한국광학회지
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    • 제8권5호
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    • pp.410-414
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    • 1997
  • Laser projection display(LPD)는 레이저를 이용한 full color의 대형화면을 구현하는 system이다. $TeO_2$$LiNbO_3$ 단결정을 음향광학 매질과 transducer로 사용하여 이 system에 쓰이는 영상 신호 처리용 음향광학변조기(Acousto Optic Modulator : AOM)를 제작하고 그 특성을 평가하였다. AOM은 transducer에서 발생된 초음파가 가장 효과적으로 음향광학 매질에 전달되도록 simulation한 후 제작하였으며 제작된 AOM은 특성평가와 더불어 설계값에 맞게 제작되었는가를 회절효율 측정을 통해 검증하였다. LPD System에 실장된 AOM의 회절효율은 85%이며 rise time은 41.5 ns이다.

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High-Density Hollow Cathode Plasma Etching for Field Emission Display Applications

  • Lee, Joon-Hoi;Lee, Wook-Jae;Choi, Man-Sub;Yi, Joon-Sin
    • Journal of Information Display
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    • 제2권4호
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    • pp.1-7
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    • 2001
  • This paper investigates the characteristics of a newly developed high density hollow cathode plasma(HCP) system and its application for the etching of silicon wafers. We used $SF_6$ and $O_2$ gases in the HCP dry etch process. This paper demonstrates very high plasma density of $2{\times}10^{12}cm^{-3}$ at a discharge current of 20 rna, Silicon etch rate of 1.3 ${\mu}m$/min was achieved with $SF_6/O_2$ plasma conditions of total gas pressure of 50 mTorr, gas flow rate of 40 seem, and RF power of200W. This paper presents surface etching characteristics on a crystalline silicon wafer and large area cast type multicrystlline silicon wafer. We obtained field emitter tips size of less than 0.1 ${\mu}m$ without any photomask step as well as with a conventional photolithography. Our experimental results can be applied to various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications. In this research, we studied silicon etching properties by using the hollow cathode plasma system.

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평판형 디스플레이 적용을 위한 내장형 Multiple U-Type 안테나를 이용한 유도결합형 플라즈마에 관한 연구 (Characteristics of Inductively Coupled Plasma with a Multiple U-Type Internal Antenna for Flat Panel Display Applications)

  • 임종혁;김경남;염근영
    • 한국진공학회지
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    • 제15권3호
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    • pp.241-245
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    • 2006
  • 본 연구에서는 대면적 플라즈마 공정에 적용 가능한 고밀도 플라즈마를 발생시키기 위하여 기존의 내장형 serpentine-type 안테나와 새롭게 고안된 내장형 유도결합형 multiple U-Type 안테나를 1020mm X 920mm(기판 880 X 660mm)의 챔버에서 연구하였다. 내장형 유도결합형 multiple U-type을 적용한 플라즈마는 serpentine-type과 비교하여 더 높은 플라즈마 밀도, 높은 radical 밀도, 좋은 균일도를 관찰할 수 있었다. 이는 serpentine-type의 경우와 비교하여 보다 적은 정상파 효과와 높은 유도결합에 기인한다. 내장형 유도결합형 multiple U-type 안테나의 적용으로 $2\times10^{11}/cm^3$의 높은 플라즈마 밀도를 얻을 수 있었고 5000W의 입력전압과 Ar 가스 15mTorr 공정압력조건에서 4%의 균일도를 관찰할 수 있었다.

광 검출기가 장착된 OLED 조명 시스템 (OLED Lighting System Integrated with Optical Monitoring Circuit)

  • 신동균;박종운;서화일
    • 반도체디스플레이기술학회지
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    • 제12권2호
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    • pp.13-17
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    • 2013
  • In lighting system where several large-area organic light-emitting diode (OLED) lighting panels are involved, panel aging may appear differently from each other, resulting in a falling-off in lighting quality. To achieve uniform light output across large-area OLED lighting panels, we have employed an optical feedback circuit. Light output from each OLED panel is monitored by the optical feedback circuit that consists of a photodiode, I-V converter, 10-bit analogdigital converter (ADC), and comparator. A photodiode generates current by detecting OLED light from one side of the glass substrate (i.e., edge emission). Namely, the target luminance from the emission area (bottom emission) of OLED panels is monitored by current generated from the photodiode mounted on a glass edge. To this end, we need to establish a mapping table between the ADC value and the luminance of bottom emission. The reference ADC value corresponds to the target luminance of OLED panels. If the ADC value is lower or higher than the reference one (i.e., when the luminance of OLED panel is lower or higher than its target luminance), a micro controller unit (MCU) adjusts the pulse width modulation (PWM) used for the control of the power supplied to OLED panels in such a way that the ADC value obtained from optical feedback is the same as the reference one. As such, the target luminance of each individual OLED panel is unchanged. With the optical feedback circuit included in the lighting system, we have observed only 2% difference in relative intensity of neighboring OLED panels.

Roll-to-Roll Printing Techniques and Materials for Large-Area Electronics

  • 조규진
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.2.2-2.2
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    • 2011
  • In this talk, the general concept of roll-to-roll printing technologies will be introduced with basic fundamentals of ink formulations for printing electronic devices as the first part of the talk. As the second part, based on the R2R printing process, key factors for printing TFTs, IC, PV and display would be presented using the information from the case study of R2R gravure and offset.

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Integrated driver with optical compensation for improved uniformity of emissive displays

  • Maeyaert, Stefaan;Bakeroot, Benoit;Doutreloigne, Jan;Monte, Ann;Bauwens, Pieter;Calster, Andre Van
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.692-695
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    • 2008
  • Large area emissive displays have problems with nonuniform pixel characteristics and their individual ageing. A pixel integrated driver with pixel based optical feedback is presented to solve these problems. Photodetectors, optical feedback circuit and data handling capabilities are integrated in a high voltage CMOS technology.

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Controlled interfacial energy for UV-imprinting using resin adhesion to substrates

  • Kim, Jin-Ook;Nam, Yeon-Heui;Chae, G.S.;Chung, In-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1622-1624
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    • 2006
  • We introduce a modified UV-imprint lithography, a resin transfer from the template to the substrate. We analyzed this method by considering the surface and interfacial free energies of the template-resinsubstrate system. This technique is purely fast and applicable to large area patterning.

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An Overview of Laser Crystallisation Processes and Techniques for Low Temperature Polysilicon Technology

  • Pribat, Didier
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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    • pp.50-55
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    • 2003
  • In this paper, we describe and review the main techniques which are currently being used or studied, in order to synthesise thin films of device-worthy polycrystalline silicon material (poly-Si) on glass or other non-refractory large area substrates. The problems and limitations of the excimer laser processing are first emphasised and some novel or revisited crystallisation processes with good potential for industrialisation are subsequently presented and discussed.

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Roll-to-Roll Manufacturing of Displays;Can it Become a Reality?

  • Wickboldt, Paul
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.805-807
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    • 2005
  • A basic assessment is presented of the technical, economic and strategic challenges expected for manufacturing displays in a roll-to-roll format. Two general pathways are considered; one that results in dramatic cost reductions but results in sacrificing product performance, and another which is an extension of the conventional FPD cost-reduction from increased substrate size. While Roll-to-Roll fabrication is fundamentally possible, feasibility experiments will be required to address the most significant technical challenge: achieving and managing acceptable yield. In all respects, the efforts to achieve RTR manufacturing will be assisted by overlapping interests in other application areas such as flex circuit, photovoltaics and large area lighting.

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Field Emission Characteristics of Carbon Nanotube-Copper Composite Structures

  • Sung, Woo-Yong;Kim, Wal-Jun;Lee, Seung-Min;Lee, Ho-Young;Kim, Yong-Hyup
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1459-1461
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    • 2005
  • Carbon nanotube -copper composite structures were fabricated using composite plating method and their field emission characteristics were investigated. Multi-walled carbon nanotubes synthesized by chemical vapor deposition were used in the present study. It was revealed that turn-on field of the structures was about 3.0 $V/{\mu}m$ at the current density of 0.1 ${\mu}A/cm^2$. We observed relatively uniform emission characteristics as well as stable emission currents. CNT-Cu composite plating method is efficient and it has no intrinsic limit on the plating area. Moreover, it gives strong adhesion between emitters and an electrode. The refore, we expect that CNT-Cu composite plating method can be applied to fabricate electron field emitters for large area FEDs and large area vacuum lighting sources.

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