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Characteristics of Inductively Coupled Plasma with a Multiple U-Type Internal Antenna for Flat Panel Display Applications  

Lim, J.H. (Department of Materials Science and Engineering, Sungkyunkwan University)
Kim, K.N. (Department of Materials Science and Engineering, Sungkyunkwan University)
Yeom, G.Y. (Department of Materials Science and Engineering, Sungkyunkwan University)
Publication Information
Journal of the Korean Vacuum Society / v.15, no.3, 2006 , pp. 241-245 More about this Journal
Abstract
In this study, the characteristics of large area internal linear ICP sources of 1020mm X 920mm(substrate area is 880 X 660mm) were investigated using two different types of antenna, that is, a conventional serpentine-type antenna and a newly developed multiple U-type antenna. The multiple antenna showed a higher plasma density, a higher radical density, and more plasma stability compared to the serpentine-type antenna, and it appeared from the higher inductively coupling and less standing wave effect compared to the serpentine-type antenna. Using the multiple U-type antenna, the plasma density of $2\times10^{11}/cm^3$ with the plasma uniformity of 4% could be obtained using 15mTorr Ar and 5000W of RF power.
Keywords
Plasma; Flat penal display; Large area; Antenna;
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