An Overview of Laser Crystallisation Processes and Techniques for Low Temperature Polysilicon Technology

In this paper, we describe and review the main techniques which are currently being used or studied, in order to synthesise thin films of device-worthy polycrystalline silicon material (poly-Si) on glass or other non-refractory large area substrates. The problems and limitations of the excimer laser processing are first emphasised and some novel or revisited crystallisation processes with good potential for industrialisation are subsequently presented and discussed.