• Title/Summary/Keyword: large-area display

Search Result 292, Processing Time 0.032 seconds

A Novel Approach for Controlling Process Uniformity with a Large Area VHF Source for Solar Applications

  • Tanaka, T.
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.08a
    • /
    • pp.146-147
    • /
    • 2011
  • Processing a large area substrate for liquid crystal display (LCD) or solar panel applications in a capacitively coupled plasma (CCP) reactor is becoming increasingly challenging because of the size of the substrate size is no longer negligible compared to the wavelength of the applied radio frequency (RF) power. The situation is even worse when the driving frequency is increased to the Very High Frequency (VHF) range. When the substrate size is still smaller than 1/8 of the wavelength, one can obtain reasonably uniform process results by utilizing with methods such as tailoring the precursor gas distribution by adjustingthrough shower head hole distribution or hole size modification, locally adjusting the distance between the substrate and the electrode, and shaping shower head holes to modulate the hollow cathode effect modifying theand plasma density distribution by shaping shower head holes to adjust the follow cathode effect. At higher frequencies, such as 40 MHz for Gen 8.5 (2.2 m${\times}$2.6 m substrate), these methods are not effective, because the substrate is large enough that first node of the standing wave appears within the substrate. In such a case, the plasma discharge cannot be sustained at the node and results in an extremely non-uniform process. At Applied Materials, we have studied several methods of modifying the standing wave pattern to adjusting improve process non-uniformity for a Gen 8.5 size CCP reactor operating in the VHF range. First, we used magnetic materials (ferrite) to modify wave propagation. We placed ferrite blocks along two opposing edges of the powered electrode. This changes the boundary condition for electro-magnetic waves, and as a result, the standing wave pattern is significantly stretched towards the ferrite lined edges. In conjunction with a phase modulation technique, we have seen improvement in process uniformity. Another method involves feeding 40 MHz from four feed points near the four corners of the electrode. The phase between each feed points are dynamically adjusted to modify the resulting interference pattern, which in turn modulate the plasma distribution in time and affect the process uniformity. We achieved process uniformity of <20% with this method. A third method involves using two frequencies. In this case 40 MHz is used in a supplementary manner to improve the performance of 13 MHz process. Even at 13 MHz, the RF electric field falls off around the corners and edges on a Gen 8.5 substrate. Although, the conventional methods mentioned above improve the uniformity, they have limitations, and they cannot compensate especially as the applied power is increased, which causes the wavelength becomes shorter. 40 MHz is used to overcome such limitations. 13 MHz is applied at the center, and 40 MHz at the four corners. By modulating the interference between the signals from the four feed points, we found that 40 MHz power is preferentially channeled towards the edges and corners. We will discuss an innovative method of controlling 40 MHz to achieve this effect.

  • PDF

Micro-gap DBD Plasma and Its Applications

  • Zhang, Zhitao;Liu, Cheng;Bai, Mindi;Yang, Bo;Mao, Chengqi
    • Journal of the Speleological Society of Korea
    • /
    • no.76
    • /
    • pp.37-42
    • /
    • 2006
  • The Dielectric Barrier Discharge (DBD) is a nonequilibrium gas discharge that is generated in the space between two electrodes, which are separated by an insulating dielectric layer. The dielectric layer can be put on either of the two electrodes or be inserted in the space between two electrodes. If an AC or pulse high voltage is applied to the electrodes that is operated at applied frequency from 50Hz to several MHz and applied voltages from a few to a few tens of kilovolts rms, the breakdown can occur in working gas, resulting in large numbers of micro-discharges across the gap, the gas discharge is the so called DBD. Compared with most other means for nonequilibrium discharges, the main advantage of the DBD is that active species for chemical reaction can be produced at low temperature and atmospheric pressure without the vacuum set up, it also presents many unique physical and chemical process including light, heat, sound and electricity. This has led to a number of important applications such as ozone synthesizing, UV lamp house, CO2 lasers, et al. In recent years, due to its potential applications in plasma chemistry, semiconductor etching, pollution control, nanometer material and large area flat plasma display panels, DBD has received intensive attention from many researchers and is becoming a hot topic in the field of non-thermal plasma.

Comparison of limited- and large-volume cone-beam computed tomography using a small voxel size for detecting isthmuses in mandibular molars

  • de Souza Tolentino, Elen;Andres Amoroso-Silva, Pablo;Alcalde, Murilo Priori;Yamashita, Fernanda Chiguti;Iwaki, Lilian Cristina Vessoni;Rubira-Bullen, Izabel Regina Fischer;Duarte, Marco Antonio Hungaro
    • Imaging Science in Dentistry
    • /
    • v.51 no.1
    • /
    • pp.27-34
    • /
    • 2021
  • Purpose: This study was performed to compare the ability of limited- and large-volume cone-beam computed tomography (CBCT) to display isthmuses in the apical root canals of mandibular molars. Materials and Methods: Forty human mandibular first molars with isthmuses in the apical 3 mm of mesial roots were scanned by micro-computed tomography (micro-CT), and their thickness, area, and length were recorded. The samples were examined using 2 CBCT systems, using the smallest voxels and field of view available for each device. The Mann-Whitney, Friedman, and Dunn multiple comparison tests were performed (α=0.05). Results: The 3D Accuitomo 170 and i-Cat devices detected 77.5% and 75.0% of isthmuses, respectively (P>0.05). For length measurements, there were significant differences between micro-CT and both 3D Accuitomo 170 and i-Cat(P<0.05). Conclusion: Both CBCT systems performed similarly and did not detect isthmuses in the apical third in some cases. CBCT still does not equal the performance of micro-CT in isthmus detection, but it is nonetheless a valuable tool in endodontic practice.

Exploring Optimal Threshold of RGB Pixel Values to Extract Road Features from Google Earth (Google Earth에서 도로 추출을 위한 RGB 화소값 최적구간 추적)

  • Park, Jae-Young;Um, Jung-Sup
    • Journal of Korea Spatial Information System Society
    • /
    • v.12 no.1
    • /
    • pp.66-75
    • /
    • 2010
  • The authors argues that the current road updating system based on traditional aerial photograph or multi-spectral satellite image appears to be non-user friendly due to lack of the frequent cartographic representation for the new construction sites. Google Earth are currently being emerged as one of important places to extract road features since the RGB satellite image with high multi-temporal resolution can be accessed freely over large areas. This paper is primarily intended to evaluate optimal threshold of RGB pixel values to extract road features from Google Earth. An empirical study for five experimental sites was conducted to confirm how a RGB picture provided Google Earth can be used to extact the road feature. The results indicate that optimal threshold of RGB pixel values to extract road features was identified as 126, 125, 127 for manual operation which corresponds to 25%, 30%, 19%. Also, it was found that display scale difference of Google Earth was not very influential in tracking required RGB pixel value. As a result the 61cm resolution of Quickbird RGB data has shown the potential to realistically identified the major type of road feature by large scale spatial precision while the typical algorithm revealed successfully the area-wide optimal threshold of RGB pixel for road appeared in the study area.

High rate deposition of poly-si thin films using new magnetron sputtering source

  • Boo, Jin-Hyo;Park, Heon-Kyu;Nam, Kyung-Hoon;Han, Jeon-Geon
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2000.02a
    • /
    • pp.186-186
    • /
    • 2000
  • After LeComber et al. reported the first amorphous hydrogenated silicon (a-Si: H) TFT, many laboratories started the development of an active matrix LCDs using a-Si:H TFTs formed on glass substrate. With increasing the display area and pixel density of TFT-LCD, however, high mobility TFTs are required for pixel driver of TF-LCD in order to shorten the charging time of the pixel electrodes. The most important of these drawbacks is a-Si's electron mobiliy, which is the speed at which electrons can move through each transistor. The problem of low carier mobility for the a-Si:H TFTs can be overcome by introducing polycrystalline silicon (poly-Si) thin film instead of a-Si:H as a semiconductor layer of TFTs. Therefore, poly-Si has gained increasing interest and has been investigated by many researchers. Recnetly, fabrication of such poly-Si TFT-LCD panels with VGA pixel size and monolithic drivers has been reported, . Especially, fabricating poly-Si TFTs at a temperature mach lower than the strain point of glass is needed in order to have high mobility TFTs on large-size glass substrate, and the monolithic drivers will reduce the cost of TFT-LCDs. The conventional methods to fabricate poly-Si films are low pressure chemical vapor deposition (LPCVD0 as well as solid phase crystallization (SPC), pulsed rapid thermal annealing(PRTA), and eximer laser annealing (ELA). However, these methods have some disadvantages such as high deposition temperature over $600^{\circ}C$, small grain size (<50nm), poor crystallinity, and high grain boundary states. Therefore the low temperature and large area processes using a cheap glass substrate are impossible because of high temperature process. In this study, therefore, we have deposited poly-Si thin films on si(100) and glass substrates at growth temperature of below 40$0^{\circ}C$ using newly developed high rate magnetron sputtering method. To improve the sputtering yield and the growth rate, a high power (10~30 W/cm2) sputtering source with unbalanced magnetron and Si ion extraction grid was designed and constructed based on the results of computer simulation. The maximum deposition rate could be reached to be 0.35$\mu$m/min due to a high ion bombardment. This is 5 times higher than that of conventional sputtering method, and the sputtering yield was also increased up to 80%. The best film was obtained on Si(100) using Si ion extraction grid under 9.0$\times$10-3Torr of working pressure and 11 W/cm2 of the target power density. The electron mobility of the poly-si film grown on Si(100) at 40$0^{\circ}C$ with ion extraction grid shows 96 cm2/V sec. During sputtering, moreover, the characteristics of si source were also analyzed with in situ Langmuir probe method and optical emission spectroscopy.

  • PDF

A Review : Improvement of Operation Current for Realization of High Mobility Oxide Semiconductor Thin-film Transistors (고이동도 산화물 반도체 박막 트랜지스터 구현을 위한 구동전류 향상)

  • Jang, Kyungsoo;Raja, Jayapal;Kim, Taeyong;Kang, Seungmin;Lee, Sojin;Nguyen, Thi Cam Phu;Than, Thuy Trinh;Lee, Youn-Jung;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.28 no.6
    • /
    • pp.351-359
    • /
    • 2015
  • Next-generation displays should be transparent and flexible as well as having high resolution and frame number. The main factor for active matrix organic light emitting diode and next-generation displays is the development of TFTs (thin-film transistors) with high mobility and large area uniformity. The TFTs used for transparent displays are mainly oxide TFT that has oxide semiconductor as channel layer. Zinc-oxide based substances such as indium-gallium-zinc-oxide has attracted attention in the display industry. In this paper, the mobility improvement of low cost oxide TFT is studied for fast operating next-generation displays by overcoming disadvantages of amorphous silicon TFT that has low mobility and poly silicon TFT that requires expensive equipment for complex process and doping process.

Two-dimensionally Integrated Fluorescent Lamp for 40 inch LCD-TV Application

  • Kim, Joong-Hyun;Hwang, In-Sun;Byun, Jin-Seob;Park, Hae-Il;Kim, Hyoung-Joo;Jang, Hyeon-Yong;Kang, Seock-Hwan;Kim, Min-Gyu;Kwon, Nam-Ok;Lee, Sang-Yu;Souk, Jun-Hyung;Ko, Jae-Hyeon;Lee, Ki-Yeon;Jung, Kyeong-Taek;Kim, Dong-Woo;Ha, Hae-Soo;Heon, Min;Kim, Nam-Hun;Kim, Hyun-Sook;Kim, Geun-Young;Cho, Seog-Hyun
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2004.08a
    • /
    • pp.795-798
    • /
    • 2004
  • After showing 32 inch two-dimensionally integrated fluorescent lamp (TIFL) and its module at SID '04, 40 inch TIFL and its module of prototype have been developed at the first time. It is the biggest size in the world as well as has a backlight unit without BEF optical film. The luminance of TIFL is 14000 nit at 190 watt power consumption and its luminous efficacy is 51 lumen/watt. The use of TIFL simplifies backlight assembly process and removes high price optical sheets. As a result, LCD TV, used by TIFL, is rapidly going to expand its market share in the large size TV area.

  • PDF

A Study on Clothes Purchase and Size Fit for Kindergarten Children (유치원 아동의 의복구매와 치수 맞음새에 관한 연구)

  • Zhang, Mei-Na;Lee, Young-Suk;Kim, Soon-Boon
    • Fashion & Textile Research Journal
    • /
    • v.15 no.1
    • /
    • pp.116-129
    • /
    • 2013
  • This research analyzes the status of clothes purchase and the size fit of the clothes for kindergarten children in the Daegu city area. The total of 344 questionnaires were analyzed. The summary and the conclusion are as follows: First, the frequency of accompanying children when purchasing appeared mostly 'sometimes accompany'. Second, the parents appeared 'sometimes reflect children's opinions'. Third, the main information source was 'store display'. The main place of purchase was large discount stores, internet home-shopping, and department stores (respectively) with significant differences in the age of the parent(p<.05) and monthly incomes(p<.001). In the clothes size selection, 72.1% of the parents selected 'one size larger' at time purchase and showed asignificant difference by monthly income. Repair-experience after purchase appeared in 31.4% of the samples because of the inadequate length and width of the clothes. The unfit clothes parts were in the order of pant length, sleeve length, waist part, jacket length, pant width, hip part, and crotch, which showed a significant difference in children based on gender. The salient purchasing point for child clothing was in the order of 'size fit', 'color and pattern', 'design' and 'convenience in action'. It is important to consider that kindergarten children need adequate size for growing and convenient pattern designs (that include materials at stretching parts) for positive acting because they are in a period of frequent activity and growth.

Transfer of Heat-treated ZnO Thin-film Plastic Substrates for Transparent and Flexible Thin-film Transistors (투명 유연 박막 트랜지스터의 구현을 위한 열처리된 산화아연 박막의 전사방법 개발)

  • Kwon, Soon Yeol;Jung, Dong Geon;Choi, Young Chan;Lee, Jae Yong;Kong, Seong Ho
    • Journal of Sensor Science and Technology
    • /
    • v.27 no.3
    • /
    • pp.182-185
    • /
    • 2018
  • Zinc oxide (ZnO) thin films have the advantages of growing at a low temperature and obtaining high charge mobility (carrier mobility) [1]. Furthermore, the zinc oxide thin film can be used to control application resistance depending on its oxygen content. ZnO has the desired physical properties, a transparent nature, with a flexible display that makes it ideal for use as a thin-film transistor. Though these transparent flexible thin-film transistors can be manufactured in various manners, manufacturing large-area transistors using a solution process is easier owing to the low cost and flexible substrate. The advantage of being able to process at low temperatures has been attracting attention as a preferred method. However, in the case of a thin-film transistor fabricated through a solution process, it is reported that charge mobility is lower. To improve upon this, a method of improving the crystallinity through heat treatment and increasing electron mobility has been reported. However, as the heat treatment temperature is relatively high at $500^{\circ}C$, an application where a flexible substrate is absent would be more suitable.

Improvement of Electrical Properties by Controlling Nickel Plating Temperatures for All Solid Alumina Capacitors

  • Jeong, Myung-Sun;Ju, Byeong-Kwon;Oh, Young-Jei;Lee, Jeon-Kook
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2011.10a
    • /
    • pp.25.2-25.2
    • /
    • 2011
  • Recently, thin film capacitors used for vehicle inverters are small size, high capacitance, fast response, and large capacitance. But its applications were made up of liquid as electrolyte, so its capacitors are limited to low operating temperature range and the polarity. This research proposes using Ni-P alloys by electroless plating as the electrode instead of liquid electrode. Our substrate has a high aspect ratio and complicated shape because of anodic aluminum oxide (AAO). We used AAO because film thickness and effective surface area are depended on for high capacitance. As the metal electrode instead of electrolyte is injected into AAO, the film capacitor has advantages high voltage, wide operating temperature, and excellent frequency property. However, thin film capacitor made by electroless-plated Ni on AAO for full-filling into etched tunnel was limited from optimizing the deposition process so as to prevent open-through pore structures at the electroless plating owing to complicated morphological structure. In this paper, the electroless plating parameters are controlled by temperature in electroless Ni plating for reducing reaction rate. The Electrical properties with I-V and capacitance density were measured. By using nickel electrode, the capacitance density for the etched and Ni electroless plated films was 100 nFcm-2 while that for a film without any etch tunnel was 12.5 nFcm-2. Breakdown voltage and leakage current are improved, as the properties of metal deposition by electroless plating. The synthesized final nanostructures were characterized by scanning electron microscopy (SEM).

  • PDF