• 제목/요약/키워드: ion spectroscopy

검색결과 1,049건 처리시간 0.032초

비행시간형 직충돌 이온산란 분광법을 이용한 Si(100) 면의 구조해석 (Si(100) Surface Structure Studied by Time-Of-Flight Impact-Collision ton Scattering Spectroscopy)

  • 황연;이태근
    • 한국세라믹학회지
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    • 제40권8호
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    • pp.765-769
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    • 2003
  • 2 keV의 저에너지 He$^{+}$ 이온을 사용한 비행시간형 직충돌 이온산란 분광법을 이용하여 Si(100) 표면의 원자구조를 해석하였다. [011] 방위를 따라 이온빔을 입사시키고, 입사 각도에 따른 산란된 이온의 강도를 측정하였다. 20$^{\circ}$, 28$^{\circ}$, 46$^{\circ}$, 63$^{\circ}$, 80$^{\circ}$등의 5가지 입사각도에서 집속 효과가 일어났다. 이 각도를 설명하기 위해 그림자 원뿔을 계산하여 원자의 위치를 모사하였으며, 이 결과는 실험과 잘 일치하였다. 28$^{\circ}$, 46$^{\circ}$, 63$^{\circ}$ 및 80$^{\circ}$에서 일어나는 4개의 집속 효과는 표면 최외층에서 이 합체가 자리하지 않는 {011}면을 따라서 발생한 것이며 벌크 구조가 반영된 결과이다. 그 반면에 이합체를 이루는 원자사이에서 발생한 산란은 20$^{\circ}$에서 집속 효과를 나타내었다.

이온빔 스퍼터링 방법으로 증착한 NiFe/Ag 박막의 확산 거동 (A Study on Diffusion Behavior in NiFe/Ag Bilayer Films deposited by ion Beam Sputtering Methods)

  • 지재범;이성래;문대원
    • 한국표면공학회지
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    • 제35권2호
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    • pp.107-112
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    • 2002
  • We have studied diffusion behavior of NiFe/Ag bilayer deposited by on silicon Ion Beam Sputtering methods. The diffusion behavior of NiFe and Ag in NiFe/Ag thin film is analyzed by Medium Energy Ion Scattering Spectroscopy. For samples without Ta underlayer, silicides such as Ni-Si or Fe-Si were formed at Si substrate and NiFe interface. In contrast, Ag predominantly diffused into the NiFe layer probably through their grain boundaries for Ta underlayered samples.

산소-17 핵자기공명분광법을 이용한 디옥소우라늄(VI) 이온의 질산 이온과의 착물형성에 관한 연구 (Study of Complex Formation of Dioxouranium(VI) Ion with Nitrate Ion by 17O NMR Spectroscopy)

  • 정우식
    • 공업화학
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    • 제3권2호
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    • pp.312-317
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    • 1992
  • 디옥소우라늄(VI) (우라닐) 이온과 질산 이온과의 상호작용을 산소-17 핵자기공명분광법으로 연구하였다. $UO_2NO_3{^+}$의 우라닐 산소 원자(이후 우라닐 산소)의 산소-17 공명신호는 우라닐 이온의 그것보다 낮은 자기장에서 나타났다. $UO_2NO_3{^+}$의 안정도상수를 5, 15, 25, $35^{\circ}C$에서 질산 이온 농도에 따른 산소-17 화학적 이동의 변화로부터 구했으며, 그 값은 이온강도에 따라 달랐다. 안정도상수의 온도 의존성으로부터 계산한 열역학적 파라미터는 다음과 같다: ${\Delta}H=-(27.2{\pm}1.7)kJ\;mol^{-1}$${\Delta}S=-(110{\pm}7)JK^{-1}mol^{-1}$. 우라닐 이온과 여러가지 음이온의 배위자와의 1:1 착물형성 반응에 대한 엔탈퍼와 엔트로피 사이에는 직선관계가 있었다.

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A Study on the Magnetic Properties of Ion Irradiated Cu/Co Multilayer System

  • Kim, T.Y.;Chang, G.S.;Son, J.H.;Kim, S.H.;Shin, S.W.;Chae, K.H.;Sung, M.C.;Lee, J.;Jeong, K.;Lee, Y.P.;;Whang, C.N
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.163-163
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    • 2000
  • In this research, we used the ion irradiation technique which has an advantae in improving intentionally the properties of surface and interface in a non-equilibrium, instead of the conventional annealing method which has been known to improve the material properties in the equilibrium stat. Cu/Co multilayered films were prepared on SiN4/SiO2/Si substrates by the electron-beam evaporation for the Co layers and the thermal evaporation for the Cu layers in a high vacuum. The ion irradiation with a 80keV Ar+ was carried out at various ion doses in a high vacuum. Hysteresis loops of the films were investigated by magneto-optical polar Kerr spectroscopy at various experimental conditions. The change of atomic structure of the films before and after the ion irradiation was studied by glancing angle x-ray diffraction, and the intermixing between Co and Cu sublayers was confirmed by Rutherford backscattering spectroscopy. The surface roughness and magneto-resistance were measured by atomic force microscopy and with a four-point probe system, respectively. During the magneto-resistance measurement, we changed temperature and the direction of magnetization. From the results of experiments, we found that the change at the interfaces of the Cu/Co multilayered film induced by ion irradiation cause the change of magnetic properties. According to the change in hysteresis loop, the surface inplane component of magnetic easy axis was isotropic before the ion irradiation, but became anisotropic upon irradiation. It was confirmed that this change influences the axial behavior of magneto-resistance. Especially, the magneto-resistance varied in accordance with an external magnetic field and the direction of current, which means that magneto-resistance also shows the uniaxial behavior.

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질소이온주입에 의한 알루미늄의 표면개질특성 (Surface Modification of Aluminum by Nitrogen ion Implantation)

  • 강혁진;안성훈;이재상;이재형;김경균
    • 한국정밀공학회지
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    • 제22권12호
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    • pp.124-130
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    • 2005
  • The research on surface modification technology has been advanced to improve the properties of engineering materials. ion implantation is a novel surface modification technology to enhance the mechanical, chemical and electrical properties of substrate's surface using accelerated ions. In this research, nitrogen ions were implanted into aluminum substrates which would be used for mold of rubber materials. The composition of nitrogen ion implanted aluminum alloy and nitrogen ion distribution profile were analyzed by Auger Electron Spectroscopy (AES). To analyze the modified surface, properties such as hardness, friction coefficient, wear resistance, contact angle, and surface roughness were measured. Hardness of ion implanted specimens was higher than that of untreated specimens. Friction coefficient was reduced, and wear resistance was improved. From the experimental results, it can be expected that ion implantation of nitrogen enhances the surface properties of aluminum mold.

OPTICAL PROPERTIES OF AMORPHOUS CN FILMS

  • Park, Sung-Jin;Lee, Soon-Il;Oh, Soo-Ghee;Bae, J.H.;Kim, W.M.;Cheong, B.;Kim, S.G.
    • 한국표면공학회지
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    • 제29권5호
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    • pp.556-562
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    • 1996
  • Carbon nitride (CN) films were synthesized on silicon substrates by a combined ion-beam and laser-ablation method under various conditions; ion-beam energy and ion-beam current were varied. Raman spectroscopy and spectroscopic ellipsometry (SE) were employed to characterize respectively the structural and the optical properties of the CN films. Raman spectra show that all the CN films are amorphous independent of the ion-beam current and the ion-beam energy. Refractive indices, extinction coefficients and optical band gaps which were determined from the measured SE spectra exhibit a significant dependence on the synthesis conditions. Especially, the decrease of the refractive indices and the shrinkage of the optical band gap is noticeable as the ion-beam current and/or the ion-beam energy increase.

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산화물유리에서의 $Na^+$이온과 $Ag^+$이온 교환에 따른 전기전도도 변화 (Electrical conductivity in oxide glasses subjected to $sodium \leftrightarrow silver$ ion exchange treatment)

  • 한준수;강원호;이효경
    • E2M - 전기 전자와 첨단 소재
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    • 제9권3호
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    • pp.284-290
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    • 1996
  • The electrical properties of bulk galsses in the system Na$_{2}$O-CaO-Al$_{2}$O$_{3}$-B$_{2}$O$_{3}$-SiO$_{2}$ containing 20 to 30mol% sodium which have been subjected to a sodium .tautm. silver ion exchange reaction for 24, 36 and 48 hrs. were analysed by impedance spectroscopy method. Ion exchanged glasses exhibit activation energy values lower than those of the untreated ones. The electrical conductivity increase with sodium content and ion exchanging time. In this experiment the electrical conductivity exhibits a manximum value of 1.78*10$^{-4}$ S/cm at 200.deg. C which contains 30mol% sodium and subjects ion exchange reaction for 48hrs.

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Simulation of Neutron irradiation Corrosion of Zr-4 Alloy Inside Water Pressure reactors by Ion Bombardment

  • Bai, X.D.;Wang, S.G.;Xu, J.;Chen, H.M.;Fan, Y.D.
    • 한국진공학회지
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    • 제6권S1호
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    • pp.96-109
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    • 1997
  • In order to simulate the corrosion behavior of Zr-4 alloy in pressurized water reactors it was implanted (or bombarded) with 190ke V $Zr^+\; and \;Ar^+$ ions at liquid nitrogen temperature and room temperature respectively up to a dose of $5times10^{15} \sim 8\times10^{16} \textrm{ions/cm}^2$ The oxidation behavior and electrochemical vehavior were studied on implanted and unimplanted samples. The oxidation kinetics of the experimental samples were measured in pure oxygen at 923K and 133.3Pa. The corrosion parameters were measured by anodic polarization methods using a princeton Applied Research Model 350 corrosion measurement system. Auger Electron Spectroscopy (AES) and X-ray Photoelectric Spectroscopy (XPS) were employed to investigate the distribution and the ion valence of oxygen and zirconium ions inside the oxide films before and after implantation. it was found tat: 1) the $Zr^+$ ion implantation (or bombardment) enhanced the oxidation of Zircaloy-4 and resulted in that the oxidation weight gain of the samples at a dose of $8times10^{16}\textrm{ions/cm}^2$ was 4 times greater than that of the unimplantation ones;2) the valence of zirconium ion in the oxide films was classified as $Zr^0,Zr^+,Zr^{2+},Zr^{3+}\; and \;Zr^{4+}$ and the higher vlence of zirconium ion increased after the bombardment ; 3) the anodic passivation current density is about 2 ~ 3 times that of the unimplanted samples; 4) the implantation damage function of the effect of ion implantation on corrosion resistance of Zr-4 alloy was established.

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Photoelectron Imaging Spectroscopy for (2+1) Resonance-Enhanced Multiphoton Ionization of Atomic Bromine

  • Kim, Yong-Shin;Jung, Young-Jae;Kang, Wee-Kyung;Jung, Kyung-Hoon
    • Bulletin of the Korean Chemical Society
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    • 제23권2호
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    • pp.189-194
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    • 2002
  • Two-photon resonant third photon ionization of atomic bromine $(4p^5\;^2P_{3/2}\;and\;^2P_{1/2})$ has been studied using a photoelectron imaging spectroscopy in the wavelength region 250 - 278 nm. The technique has yielded simultaneously both relative branching ratios to the three levels of $Br^+(^3P_2,\;^3P_{0.1}\;and^1D_2)$ with $4p^4$ configuration and the angular distributions of outgoing photoelectrons. The product branching ratios reveal a strong propensity to populate particular levels in many cases. Several pathways have been documented for selective formation of $Br^+(^3P_2)$ and $Br^+(^3P_{0.1})$ ions. In general, the final ion level distributions are dominated by the preservation of the ion core configuration of a resonant excited state. Some deviations from this simple picture are discussed in terms of the configuration interaction of resonant states and the autoionization in the continuum. The photoelectron angular distributions are qualitatively similar for all transitions, with a positive $A_2$ anisotropy coefficient of 1.0-2.0 and negligible $A_4$ in most cases, which suggests that the angular distribution is mainly determined by the single-photon ionization process of a resonant excited state induced from the third photon absorption.

Modeling and Applications of Electrochemical Impedance Spectroscopy (EIS) for Lithium-ion Batteries

  • Choi, Woosung;Shin, Heon-Cheol;Kim, Ji Man;Choi, Jae-Young;Yoon, Won-Sub
    • Journal of Electrochemical Science and Technology
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    • 제11권1호
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    • pp.1-13
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    • 2020
  • As research on secondary batteries becomes important, interest in analytical methods to examine the condition of secondary batteries is also increasing. Among these methods, the electrochemical impedance spectroscopy (EIS) method is one of the most attractive diagnostic techniques due to its convenience, quickness, accuracy, and low cost. However, since the obtained spectra are complicated signals representing several impedance elements, it is necessary to understand the whole electrochemical environment for a meaningful analysis. Based on the understanding of the whole system, the circuit elements constituting the cell can be obtained through construction of a physically sound circuit model. Therefore, this mini-review will explain how to construct a physically sound circuit model according to the characteristics of the battery cell system and then introduce the relationship between the obtained resistances of the bulk (Rb), charge transfer reaction (Rct), interface layer (RSEI), diffusion process (W) and battery characteristics, such as the state of charge (SOC), temperature, and state of health (SOH).