• Title/Summary/Keyword: interface charge

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Interfacial Microstructure and Electrical Properties of $Al_2O_3/Si$ Interface of Mono-crystalline Silicon Solar Cells (단결정 실리콘 태양전지에서 후열처리에 따른 $Al_2O_3/Si$ 계면조직의 특성 변화)

  • Paek, Sin Hye;Kim, In Seob;Cheon, Joo Yong;Chun, Hui Gon
    • Journal of the Semiconductor & Display Technology
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    • v.12 no.3
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    • pp.41-46
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    • 2013
  • Efficient and inexpensive solar cells are necessary for photo-voltaic to be widely adopted for mainstream electricity generation. For this to occur, the recombination losses of charge carriers (i.e. electrons or holes) must be minimized using a surface passivation technique suitable for manufacturing. Recently it has been shown that aluminum oxide thin films are negatively charged dielectrics that provide excellent surface passivation of silicon solar cells to attract positive-charged holes. Especially aluminum oxide thin film is a quite suitable passivation on the rear side of p-type silicon solar cells. This paper, it demonstrate the interfacial microstructure and electrical properties of mono-crystalline silicon surface passivated by $Al_2O_3$ films during firing process as applied for screen-printed solar cells. The first task is a comparison of the interfacial microstructure and chemical bonds of PECVD $Al_2O_3$ and of PEALD $Al_2O_3$ films for the surface passivation of silicon. The second is to study electrical properties of double-stacked layers of PEALD $Al_2O_3$/PECVD SiN films after firing process in the temperature range of $650{\sim}950^{\circ}C$.

Preparation of Spherical Li4Ti5O12 and the Effect of Y and Nb Doping on the Electrochemical Properties as Anode Material for Lithium Secondary Batteries (리튬이온이차전지용 구형 Li4Ti5O12 음극 합성 및 Y와 Nb 도핑에 따른 전기화학적 특성)

  • Ji, Mi-Jung;Kwon, Yong-Jin;Kim, Eun-Kyung;Park, Tae-Jin;Jung, Sung-Hun;Choi, Byung-Hyun
    • Journal of the Korean Ceramic Society
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    • v.49 no.6
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    • pp.659-662
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    • 2012
  • Yttrium (Y) and niobium (Nb) doped spherical $Li_4Ti_5O_{12}$ were synthesized to improve the energy density and electrochemical properties of anode material. The synthesized crystal was $Li_4Ti_5O_{12}$, the particle size was less than $1{\mu}m$ and the morphology was spherical and well dispersed. The Y and Nb optimal doping amounts were 1 mol% and 0.5 mol%, respectively. The initial capacity of the dopant discharge and charge capacity were respectively 149mAh/g and 143 mAh/g and were significantly improved compared to the undoped condition at 129 mAh/g. Also, the capacity retention of 0.2 C/5 C was 74% for each was improved to 94% and 89%. It was consequently found that Y and Nb doping into the $Li_4Ti_5O_{12}$ matrix reduces the polarization and resistance of the solid electrolyte interface (SEI) layer during the electrochemical reaction.

A Study on the Characteristics and Programming Conditions of the Scaled SONOSFET NVSM for Flash Memory (플래시메모리를 위한 Scaled SONOSFET NVSM의 프로그래밍 조건과 특성에 관한 연구)

  • 박희정;박승진;남동우;김병철;서광열
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.11
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    • pp.914-920
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    • 2000
  • When the charge-trap type SONOS(polysilicon-oxide-nitride-oxide-semiconductor) cells are used to flash memory, the tunneling program/erase condition to minimize the generation of interface traps was investigated. SONOSFET NVSM(Nonvolatile Semiconductor Memory) cells were fabricated using 0.35 ㎛ standard memory cell embedded logic process including the ONO cell process, based on retrograde twin-well, single-poly, single metal CMOS(Complementary Metal Oxide Semiconductor) process. The thickness of ONO triple-dielectric for the memory cell is tunnel oxide of 24 $\AA$, nitride of 74 $\AA$, blocking oxide of 25 $\AA$, respectively. The program mode(V$\_$g/=7, 8, 9 V, V$\_$s/=V$\_$d/=-3 V, V$\_$b/=floating) and the erase mode(V$\_$g/=-4, -5, -6 V, V$\_$s/=V$\_$d/=floating, V$\_$b/=3 V) by MFN(Modified Fowler-Nordheim) tunneling were used. The proposed programming condition for the flash memory of SONOSFET NVSM cells showed less degradation(ΔV$\_$th/, S, G$\_$m/) characteristics than channel MFN tunneling operation. Also, the program inhibit conditins of unselected cell for separated source lines NOR-type flash memory application were investigated. we demonstrated that the phenomenon of the program disturb did not occur at source/drain voltage of 1 V∼12 V and gate voltage of -8 V∼4 V.

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Post Annealing Effect on the Characteristics of Al2O3 Thin Films Deposited by Aerosol Deposition on 4H-SiC (4H-SiC기판 위에 Aerosol Deposition으로 증착된 Al2O3박막의 후열처리 효과)

  • Yu, Susanna;Kang, Min-Seok;Kim, Hong-Ki;Lee, Young-Hie;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.8
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    • pp.486-490
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    • 2014
  • $Al_2O_3$ films on silicon carbide were fabricated by Aerosol deposition with annealing temperature at $800^{\circ}C$ and $1,000^{\circ}C$. The effect of thermal treatment on physical properties of $Al_2O_3$ thin films has been investigated by XRD (X-ray diffraction), AFM (atomic force microscope), SEM (scanning electron microscope), and AES (auger electron spectroscopy). Also electrical properties have been investigated by Keithley 4,200 semiconductor parameter analyzer to explain the interface trapped charge density ($D_{it}$), flatband voltage ($V_{FB}$) and leakage current ($I_o$). $Al_2O_3$ films become crystallized with increasing temperature by calculating full width at half maximum (FWHM) of diffraction peaks, also surface morphology is observed by topography measurement in non-contact mode AFM. $D_{it}$ was $2.26{\times}10^{-12}eV^{-1}.cm^{-2}$ at $800^{\circ}C$ annealed sample, which is the lowest value in all samples. Also the sample annealed at $800^{\circ}C$ has the lowest leakage current of $4.89{\times}10^{-13}A$.

Solar Power Emotional LED Lightening Street Lamps with Multiple Control Sun Tracker (다중 추적식 태양광 발전 감성형 LED 가로등)

  • Lee, Jae-Min;Kim, Yong;Bae, Cheol-Soo;Kwon, Dae-Sig
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.2
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    • pp.920-926
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    • 2011
  • In this paper, a solar power emotional LED lightening street lamps with multi control sun tracker is presented. The proposed system has a multiple control sun tracking function and high quality emotional LED lamps. The system is designed to absorb maximum sun lights by temperature sensor and humidity sensor of control circuits. A battery charge-discharge controller is developed for high efficient usage of battery charger for utilization of new and renewal energy. An interface circuit for remote monitoring and controlling is included in the developed system. The proposed multi tracking solar power emotional LED street lamps is better than conventional systems in aspect of tracking operation and energy efficiency, and expected to be a leading model for next generation solar power street lamp system, because it is a new technology combining sun tracking solar power system and emotional lightening system.

Effect of Cetyltrimethyl Ammonium Bromide on Foam Stability and SiO2Separation for Decontamination Foam Application (거품제염을 위한 실리카 나노입자와 CTAB (Cetyltrimethyl Ammonium Bromide)의 거품안정성 및 분리특성 평가)

  • Choi, Mansoo;Kim, Seung-Eun;Yoon, In-Ho;Jung, Chong-Hun;Choi, Wang-Kyu;Moon, Jei-Kwon;Kim, Seon-Byeong
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.16 no.2
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    • pp.173-182
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    • 2018
  • As part of planning for waste minimization, decontamination foam has been considered as a potential application for the cleaning of radioactive contaminant. In this study, we synthesized silica particles to improve foam stability by varying synthesis parameters. Cetyltrimethylammonium bromide (CTAB) was found to influence the stability of the decontamination foam. The reason was that higher interaction between $SiO_2$ nanoparticles and surfactant at the air-water interface in aqueous solution is beneficial for foam stability. CTAB can also be used as an additive for the aggregation of silica nanoparticles. In the separation of $SiO_2$ nanoparticles, CTAB plays a critical role in the nanoparticles flocculation because of the charge neutralization and hydrophobic effects of its hydrocarbon tails.

Non-volatile Molecular Memory using Nano-interfaced Organic Molecules in the Organic Field Effect Transistor

  • Lee, Hyo-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.31-32
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    • 2010
  • In our previous reports [1-3], electron transport for the switching and memory devices using alkyl thiol-tethered Ru-terpyridine complex compounds with metal-insulator-metal crossbar structure has been presented. On the other hand, among organic memory devices, a memory based on the OFET is attractive because of its nondestructive readout and single transistor applications. Several attempts at nonvolatile organic memories involve electrets, which are chargeable dielectrics. However, these devices still do not sufficiently satisfy the criteria demanded in order to compete with other types of memory devices, and the electrets are generally limited to polymer materials. Until now, there is no report on nonvolatile organic electrets using nano-interfaced organic monomer layer as a dielectric material even though the use of organic monomer materials become important for the development of molecularly interfaced memory and logic elements. Furthermore, to increase a retention time for the nonvolatile organic memory device as well as to understand an intrinsic memory property, a molecular design of the organic materials is also getting important issue. In this presentation, we report on the OFET memory device built on a silicon wafer and based on films of pentacene and a SiO2 gate insulator that are separated by organic molecules which act as a gate dielectric. We proposed push-pull organic molecules (PPOM) containing triarylamine asan electron donating group (EDG), thiophene as a spacer, and malononitrile as an electron withdrawing group (EWG). The PPOM were designed to control charge transport by differences of the dihedral angles induced by a steric hindrance effect of side chainswithin the molecules. Therefore, we expect that these PPOM with potential energy barrier can save the charges which are transported to the nano-interface between the semiconductor and organic molecules used as the dielectrics. Finally, we also expect that the charges can be contributed to the memory capacity of the memory OFET device.[4]

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X-Ray Photoelectron Spectroscopy Studies of Pd Supported MgO/Mg (X-선 광전자분광법을 이용한 MgO/Mg 표면에 증착된 Pd의 분석)

  • Tai, Wei-Sheng;Seo, Hyun-Ook;Kim, Kwang-Dae;Kim, Young-Dok
    • Journal of the Korean Vacuum Society
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    • v.18 no.4
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    • pp.281-287
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    • 2009
  • Pd was deposited on magnesium-oxide-covered magnesium ribon substrate by metal thermal evaporation method in high vacuum. The electronic and chemical properties of Pd samples with different coverages were studied using in-situ X-ray Photoelctron Spectroscopy (XPS) and Field Emission Scanning Electron Microscopy (SEM). For relatively lower amounts of Pd deposited(< 1nm), separate Pd particles could be observed, whereas at higher Pd coverages, Pd thin films caused by agglomeration of Pd nanoparticles was found. The metal support interaction with Pd-support was observed. The Pd atoms on the metal oxide/metal interface were partially negative charged by charge transfer.

Ru employed as Counter Electrode for TCO-less Dye Sensitized Solar Cells (투명전도층이 없는 염료감응형 태양전지의 Ru 상대전극 연구)

  • Noh, Yunyoung;Yoo, Kicheon;Yu, Byungkwan;Han, Jeungjo;Ko, Minjae;Song, Ohsung
    • Korean Journal of Metals and Materials
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    • v.50 no.2
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    • pp.159-163
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    • 2012
  • A TCO-less ruthenium (Ru) catalytic layer on glass substrate instead of conventional Ru/TCO/ glass substrate was assessed as counter electrode (CE) material in dye sensitized solar cells (DSSCs) by examining the effect of the Ru thickness on the DSSC performance. Ru films with different thicknesses (34, 46, 69, and 90 nm) were deposited by atomic layer deposition (ALD) on glass substrates to replace both existing catalyst and electrode layer. In order to make our comparison, we also prepared an Ru catalytic layer by a similar method on FTO/glass substrate. Finally, we prepared the $0.45cm^2$ DSSC device the properties of the DSSCs were examined by cyclic voltammetry (CV), impedance spectroscopy (EIS), and current-voltage (I-V) method. CV measurements revealed an increase in catalytic activity with increasing film thickness. The charge transfer resistance at the interface between the electrolyte and Rudecreased with increasing Ru thickness. I-V results showed that the energy conversion efficiency increased up to 1.96%. Our results imply that TCO-less Ru/glass might perform as both catalyst and electrode layer when it is used in counter electrodes in DSSCs.

Property of Counter Electrode with Pt and Ru Catalyst Films for Dye-Sensitized Solar Cell (염료감응형 태양전지용 나노두께 Pt와 Ru 상대전극의 물성)

  • Noh, Yunyoung;Yu, Byungkwan;Yoo, Kicheon;Ko, Min Jae;Song, Ohsung
    • Korean Journal of Metals and Materials
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    • v.50 no.3
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    • pp.243-247
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    • 2012
  • A ruthenium (Ru) catalytic layer and a conventional Pt layer were assessed as counter electrodes (CE) for dye sensitized solar cells (DSSCs). Ru films with different thicknesses of 34, 46, and 90 nm were deposited by atomic layer deposition (ALD). Pt layers with the same thicknesses were prepared by sputtering. $0.45cm^2$ DSSCs were prepared and their properties were characterized by FE-SEM, cyclic voltammetry (CV), impedance spectroscopy (EIS), and current-voltage (I-V). FE-SEM revealed that the crystallized Ru films and Pt films had been deposited quite conformally. CV showed that the catalytic activity of Pt was much greater than that of Ru. In addition, although the catalytic activity of Pt did not depend on the thickness, that of Ru showed an increase with increasing thickness. Impedance analysis revealed high charge transfer resistance at the Ru interface and a decrease with increasing Ru thickness, whereas Pt showed low resistance with no thickness dependence. Despite the relatively small catalytic activity of Ru, the I-V result revealed the average energy conversion efficiency of Ru and Pt to be 2.98% and 6.57%, respectively. These results suggest that Ru can be used as counter electrodes in DSSCs due to its extremely low temperature process compatibility.