• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.363-363
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• 2008

The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.988-991
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• 2004

In the present investigation, we tried AR coating simulation by using the "Essential Macleod optical coating design and analysis" program. After various run of the program we selected appropriate materials which have specific refractive indices and for that thickness was optimized to get the low reflectance. By comparing the simulated results for the different materials,we found that $SiO_2$ and TiN are the appropriate materials for this Flat panel device (FPD) application. Thin films of these materials were deposited using RF magnetron sputtering and Inductively Coupled Plasma Chemical Vapour Deposition (ICPCVD) methods on Polyethyleneterephthalate (PET) substrates. Spectroscopic ellipsometer (SE MF-1000) and UV-Vis spectrophotometer (SCINCO) were used for the optical characterization. The obtained experimental results are in good agreement with the simulation results.

• Journal of the Korean Magnetics Society
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• v.14 no.5
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• pp.163-168
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• 2004

We prepared ultra thin film structure of Si(100)/ $SiO_2$(200 nm)/Ta(5 nm)/Ni$_{80}$Fe$_{20/(l～15 nm)}$Ta(5 nm) using an inductively coupled plasma(ICP) helicon sputter. Magnetic properties and cross-sectional microstructures were investigated with a superconduction quantum interference device(SQUID) and a transmission electron microscope(TEM), respectively. We report that NiFe films of sub-3 nm thickness show the B$_{bulk}$ = 0 and B$_{surf}$=-3 ${\times}$ 10$^{-7}$(J/$m^2$). Moreover, Curie temperature may be lowered by decreasing thickness. Coercivity become larger as temperature decreased with 0.5 nm - thick Ta/NiFe interface intermixing. Our result implies that effective magnetic properties of magnetoelastic anisotropy, saturation magnetization, and coercivity may change abruptly in nano-thick films. Thus we should consider those abrupt changes in designing nano-devices such as MRAM applications.

• Clean Technology
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• v.16 no.1
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• pp.19-25
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• 2010

In this work, the conversion of crystalline cellulose into polyols in the presence of hydrogen was examined over noble metal (Pt, Ru, Ir, Rh, and Pd) catalysts supported on activated carbon. For comparison, Pt/${\gamma}-Al_2O_3$ and Pt/H-mordenite were also investigated. Several techniques: $N_2$ physisorption, X-ray diffraction(XRD), inductively-coupled plasma-atomic emission spectroscopy (ICP-AES), temperature-programmed reduction with $H_2$ ($H_2$-TPR) and CO chemisorption were employed to characterize the catalysts. The cellulose conversion was not strongly dependent on the types of the catalyst used. Pt/AC showed the highest yields to polyols among activated carbon-supported noble metal catalysts, viz. Pt/AC, Ru/AC, Ir/AC, Rh/AC and Pd/AC.

• Journal of Environmental Health Sciences
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• v.43 no.3
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• pp.194-201
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• 2017

Objectives: Zinc oxide nanoparticles (ZnO NPs) are widely used in various commercial products, but they are exposed to the environment and can induce toxicity. In this study, we investigated the environmental fate and bioaccumulation of ZnO NPs in a microcosm. Methods: The microcosm was composed of water, soil (Lufa Soil 2.2) and organisms (Oryzias latipes, Neocaridina denticulata, Semisulcospira libertina). Point five and 5 mg/L of ZnO NPs were exposed in the microcosm for 14 days. Total Zn concentrations were measured using an Inductively Coupled Plasma Mass Spectrometer (ICP-MS) and intracellular NPs were observed using Transmission Electron Microscopy (TEM). Results: In the initial stages of exposure, the Zn concentrations in water increased in all exposure groups and then decreased, while the Zn concentration in soil increased after three hours for the 5 mg/L solution. Zn concentrations also showed increasing trends in N. denticulata and S. libertina at 0.5 and 5 mg/L, and in O. latipes at 5 mg/L. Accumulation of NPs was found in the livers of O. latipes and hepatopancreas of N. denticulata and S. libertina. Conclusions: In the early stages of exposure, ZnO NPs remained in the water, and then were transported to the soil and test species. Unlike other species, total Zn concentrations in N. denticulata and S. libertina increased for both 0.5 mg/L and 5 mg/L. Therefore, ZnO NPs were more easily accumulated in zoobenthos than in fish.

• Korean Chemical Engineering Research
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• v.50 no.3
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• pp.435-441
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• 2012

The direct conversion of cellulose into polyols in $H_2$ was examined over Pt catalysts supported on various zeolites, viz., mordenite, Y, ferrierite, and ${\beta}$. For comparison, Pt catalysts supported on ${\gamma}-Al_2O_3$, $SiO_2-Al_2O_3$, and $SiO_2$ were also tested. The physical properties of the catalysts were probed with $N_2$ physisorption. The surface acidity was measured with temperature programmed desorption of ammonia ($NH_3$-TPD). The Pt content was quantified with inductively coupled plasma-atomic emission spectroscopy (ICP-AES). The Pt dispersion was determined with CO chemisorptions and transmission electron microscopy (TEM). The conversion of cellulose appeared to be mainly dependent on the reaction temperature and reaction time because it depends on the concentration of $H^+$ ions reversibly formed in hot water. Pt/H-mordenite (20) showed the highest yield to polyols among the tested catalysts. Pt/H-zeolite was superior to Pt/Na-zeolite for this reaction. The polyol yield was dependent on the surface acid density and the external surface area.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.79-79
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• 1999

The varous techniques for fabrication of si or metal tip as a field emission electron source have been reported due to great potential capabilities of flat panel display application. In this report, 240nm thermal oxide was initially grown at the p-type (100) (5-25 ohm-cm) 4 inch Si wafer and 310nm Si3N4 thin layer was deposited using low pressure chemical vapor deposition technique(LPCVD). The 2 micron size dot array was photolithographically patterned. The KOH anisotropic etching of the silicon substrate was utilized to provide V-groove formation. After formation of the V-groove shape, dry oxidation at 100$0^{\circ}C$ for 600 minutes was followed. In this procedure, the orientation dependent oxide growth was performed to have a etch-mask for dry etching. The thicknesses of the grown oxides on the (111) surface and on the (100) etch stop surface were found to be ~330nm and ~90nm, respectively. The reactive ion etching by 100 watt, 9 mtorr, 40 sccm Cl2 feed gas using inductively coupled plasma (ICP) system was performed in order to etch ~90nm SiO layer on the bottom of the etch stop and to etch the Si layer on the bottom. The 300 watt RF power was connected to the substrate in order to supply ~(-500)eV. The negative ion energy would enhance the directional anisotropic etching of the Cl2 RIE. After etching, remaining thickness of the oxide on the (111) was measured to be ~130nm by scanning electron microscopy.

• Korean Chemical Engineering Research
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• v.53 no.3
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• pp.372-381
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• 2015

The effect of preparation method on the catalytic activities of the $Ni/Al_2O_3$ catalysts on steam reforming of ethylene glycol was investigated. The catalysts were prepared with various preparation methods such as an incipient wetness impregnation, wet impregnation, and coprecipitation method. In the case of coprecipitation method, various precipitants such as KOH, $K_2CO_3$, and $NH_4OH$ were compared. The prepared catalysts were characterized by using $N_2$ physisorption, inductively coupled plasma-atomic emission spectroscopy, X-ray diffraction, temperatureprogrammed reduction, pulsed $H_2$ chemisorption, temperature-programmed oxidation, scanning electron microscopy, and thermogravimetric analysis. Among the catalysts reduced at 773 K, the $Ni/Al_2O_3$ catalyst prepared by a coprecipitation with KOH or $K_2CO_3$ as precipitants showed the best catalytic performance. The preparation method affected the particle size of Ni, reducibility of nickel oxides, catalytic performance (activity and stability), and types of coke formed during the reaction. The $Ni/Al_2O_3$ catalyst prepared by a coprecipitation with KOH showed the increasing catalytic activity with an increase in the reduction temperature from 773 to 1173 K because of an increase in the reduction degree of Ni oxide species even though the particle size of Ni increased with increasing reduction temperature.

• Journal of Korean Society of Water and Wastewater
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• v.21 no.5
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• pp.559-569
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• 2007

The purposes of this study were to find the main foulant of membrane and the optimal chemical cleaning method for MF(microfiltration) drinking water treatment system using D dam water as water source. The MF pilot plant which can treat maximum $500m^3/d$ consisted of 3 racks and was operated for 10 months under various operation conditions. After 10 months operation, $1^{st}$ and $2^{nd}$ rack of membrane pilot plant system were cleaned chemically and the degree of the restoration of the fouled membrane in terms of the pure water flux was detemnined. Inorganic compounds which contained in chemical cleaning waste was analyzed by Inductively Coupled Plasma (ICP). One membrane module for 3rd rack was disjointed and membrane fouling materials, especially inorganic compounds were investigated by Electron Probe Microanlysis (EPMA) to elucidate the reason of TMP increase. And also, the various chemical reagents (1N HCl or $H_2SO_4$, oxalic acid as acid and 0.3% NaOCl as alkali) were tested by combination of acid and alkali to determine the optimal chemical cleaning method for the MF system using micro-modules manufactured using the disjointed module. It was verified that the inside and outside of membrane module was colorized with black. As a result of the quantitative and semi-qualitative analysis of membrane foulant by ICP, most of inorganic foulant was manganese which is hard to remove by inorganic acid such as HCI. Especially, it was observed by EPMA that Mn was attached more seriously in inside surface of membrane than in outside surface of that. It was supposed that Mn fouling in inside surface of membrane might be caused by the oxidation of soluble manganese (Mn(II)) to insoluble manganese ($MnO_2$) by chlorine containing in backwashing water. The optimal cleaning method for the removal of manganese fouling was consecutive cleaning with the mixture of 1N HCl and 1% of oxalic acid, 0.3% NaOCl, and 1N HCl showing 91% of the restoration of the fouled membrane.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.40 no.2
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• pp.203-214
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• 2014

We measured the contact dermatitis-causing substances concentrations in 28 commercial oxidative hair-coloring products. This study was aimed to provide the fundamental data about oxidative hair-coloring products. We selected 10 oxidation dyes (p-phenylenediamine, toluene-2,5-diamine, m-phenylenediamine, nitro-p-phenylenediamine, p-aminophenol, m-aminophenol, o-aminophenol, p-methylaminophenol, N,N'-bis(2-hydroxyethyl)-p-phenylenediamine sulfate, 2-methyl-5-hydroxyethylaminophenol) and 4 heavy metal (nikel; Ni, chromium; Cr, cobalt; Co, copper; Cu) as contact dermatitis-causing substances. To identify 10 oxidation dyes, hexane-2% sodium sulfite was used for the rapid and simple extraction and ultra performance liquid chromatography (UPLC) analysis was used for simultaneous analysis in 12 minutes. 10 oxidative dyes were detected as indicated on the product packaging and each concentration was lower than prescribed upper concentration limit by pharmaceutical manufacturing standards. And we analysed inductively coupled plasma-optical emission spectrophotometer (ICP-OES) for content search of heavy metal after microwave digestion. The heavy metal average concentration in oxidative hair-coloring products was 0.572 ${\mu}g/g$ for Ni, 3.161 ${\mu}g/g$ for Cr, 2.029 ${\mu}g/g$ for Co, 0.420 ${\mu}g/g$ for Cu, respectively. The average of concentration in powder type (henna) was higher than those of other foam and cream type oxidative hair-coloring products as follows; 1.800 ${\mu}g/g$ for Ni, 10.127 ${\mu}g/g$ for Cr, 7.082 ${\mu}g/g$ for Co, 1.451 ${\mu}g/g$ for Cu. Hair coloring products were classified into the six colors - black, dark brown, brown, dark brown, light brown, red brown and analyzed. Brown color had the highest average concentration of Co and the others had the highest average concentration of Cr.