• Title/Summary/Keyword: in situ process

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Effect of Brush Treatment and Brush Contact Sequence on Cross Contaminated Defects during CMP in-situ Cleaning

  • Kim, Hong Jin
    • Tribology and Lubricants
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    • v.31 no.6
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    • pp.239-244
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    • 2015
  • Chemical mechanical polishing (CMP) is one of the most important processes for enabling sub-14 nm semiconductor manufacturing. Moreover, post-CMP defect control is a key process parameter for the purpose of yield enhancement and device reliability. Due to the complexity of device with sub-14 nm node structure, CMP-induced defects need to be fixed in the CMP in-situ cleaning module instead of during post ex-situ wet cleaning. Therefore, post-CMP in-situ cleaning optimization and cleaning efficiency improvement play a pivotal role in post-CMP defect control. CMP in-situ cleaning module normally consists of megasonic and brush scrubber processes. And there has been an increasing effort for the optimization of cleaning chemistry and brush scrubber cleaning in the CMP cleaning module. Although there have been many studies conducted on improving particle removal efficiency by brush cleaning, these studies do not consider the effects of brush contamination. Depending on the process condition and brush condition, brush cross contamination effects significantly influence post-CMP cleaning defects. This study investigates brush cross contamination effects in the CMP in-situ cleaning module by conducting experiments using 300mm tetraethyl orthosilicate (TEOS) blanket wafers. This study also explores brush pre-treatment in the CMP tool and proposes recipe effects, and critical process parameters for optimized CMP in-situ cleaning process through experimental results.

Development of in-situ Passivation System for High Efficiency and Long Lifetime of Flexible OLED Display (고효율 장수명의 Flexible OLED 디스플레이를 위한 in-situ Passivation System 개발)

  • Kim, Kwan-Do
    • Journal of IKEEE
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    • v.21 no.1
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    • pp.85-88
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    • 2017
  • This study focused on the development of in-situ passivation system and characterization of OLED display. The thin film passivation process with thin film layers was investigated using in-situ passivation technique in the cluster system. Thin films of $SiO_2$, SiNx passivation were manufactured using PECVD, which enables the deposition process at room temperature. The cluster system was created to develop in-situ passivation process, which OLED and thin film were fabricated in the cluster system without exposing to the atmospheric environment. It is expected that the in-situ passivation system of OLED with organic and inorganic layer provides the leading technique to develop flexible OLED.

A Study on Mechanical Properties and Fracture Behaviors of In-situ Liquid Mixing Processed FeAl/TiC Intermetallic Matrix Composite (In-situ Liquid Mixing 방법으로 제조된 FeAl/TiC 금속간화합물 복합재료의 기계적 특성과 파괴양상에 관한 연구)

  • Chung, Euihoon;Park, Ikmin;Park, Yongho
    • Korean Journal of Metals and Materials
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    • v.48 no.7
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    • pp.683-689
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    • 2010
  • In this study, FeAl based intermetallic matrix composites reinforced with in-situ synthesized TiC particles were fabricated by an in-situ liquid mixing process. The microstructures, mechanical properties and fracture behaviors of the in-situ liquid mixing processed composite were investigated and compared with the vacuum suction casting processed composite. The results showed that the in-situ formed TiC particles exhibited fine and uniform dispersion in the liquid mixing processed composite, while significant grain boundary clustering and coarsening of TiC particles were obtained by the vacuum suction process. It was also shown in both types of composites that the hardness and bending strength were increased with the increase of the TiC volume fractions. Through the study of fractography in the bending test, it was considered that the TiC particles prohibited brittle intergranular fracture of FeAl intermetallic matrix by crack deflections. Because of the uniformly distributed fine TiC particles, the bending strength of the liquid mixing processed composite was superior to that of the casting processed composite.

Mixing Effect by the Geometry of Static Mixer with Turbulent In-Situ Mixing Process (난류 용탕 In-Situ 합성법을 위한 스태틱 믹서의 형상에 따른 혼합 효과)

  • Lee, Dae-Sung;Kim, Hyo-Geun;Ha, Man-Yeong;Park, Yong-Ho;Park, Ik-Min
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.29 no.12 s.243
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    • pp.1307-1312
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    • 2005
  • Turbulent in-situ mixing process is a new material process technology to get dispersed phase in nanometer size by controlling reaction of liquid/liquid, liquid/solid and liquid/gas, flow and solidification speed simultaneously. In this study mixing, the key technology to this synthesis method will be studied by computational fluid dynamics. For the simulation of mixing of liquid metal, static mixers will be investigated. Two inlets for different liquid metal meet and merge like 'Y' shape tube. The tube has various shapes such as straight and curved. Also, the radius of curve will be varied. The performance of mixer will be evaluated with quantitative analysis with coefficient of variance of mass fraction. Also, detailed plots of intersection will be presented to understand effect of mixer shape on mixing.

The process optimization of in-situ H$_2$ bake and GeH$_4$ clean in low temperature Si epitaxy using design of experiment (저온 Si계 에피 성장기술에서 실험계획법에 의한 in-situ H$_2$ bake 및 GeH$_4$ clean 공정 최적화)

  • 이경수
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.11a
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    • pp.54-58
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    • 1994
  • H$_2$ bake and GeH$_4$ clean are used as a in-situ pre-clean method in low temperature Si based epitaxial growth technology using rapid thermal processing chemical vapor deposition (RTPCVD). In this paper, the H$_2$ bake and GeH$_4$ clean processes are optimized for low surface defect density using Taguchi method. In H$_2$ bake process, the epitaxial growth temperature affects dominantly on the surface defect density, and the next affecting factors are H$_2$ bake temperature and rinse time in de-ionised water. In GeH$_4$ clean process, GeH$_4$ clean temperature affects most strongly on the surface defect density, and the minor factor is GeH$_4$flow rate. The optimum process conditions predicted fly Taguchi method agree well with tile experimental data in both in-situ clean processes.

In-situ monitoring technique for deposition process of CdS buffer layer for CIGS thin film solar cells (CIGS 박막 태양전지용 CdS 버퍼층 제조 공정의 in-situ 모니터링 기술)

  • Kown, Young-Jun;Ahn, Se-Jin;Yoon, Jae-Ho;Yoon, Kyung-Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2008.05a
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    • pp.434-435
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    • 2008
  • An in-situ monitoring technique for deposition process of CdS buffer layer was developed in this work. A quartz crystal microbalance (QCM) was used to measure the frequency change during the CdS deposition process and the relation ship between frequency change and film thickness and optical transmittance was investigated. The film thickness shows a linear relationship with frequency change, demonstrating that frequency change measured by QCM can be used a in-situ monitoring tool for CdS deposition process.

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Differences in Characteristics of Recycled ONP for CaCO3 Adding Techniques (CaCO3 첨가법에 따른 재생 ONP의 특성변화)

  • Ahn, Young-Jun;Nam, Seong-Young;Um, Nam-Il;Ahn, Ji-Whan;Han, Choon
    • Journal of the Korean Ceramic Society
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    • v.51 no.2
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    • pp.97-102
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    • 2014
  • In order to improve the refresh rate of old newspaper(ONP), PCC shape-controlling experiments were carried out. The effect of a PCC polymorph on improving the quality of old newspaper was studied for a transformation from waste paper to eco-friendly paper. The synthesis of PCC consists of an in-situ process and a loading process to enhance the refresh rate of old newspaper. The characteristics between the in-situ process and the loading process could be analysed by SEM analyses of coated fiber surfaces. The retention rate ranges from 65 to 67% after the application of the in-situ process, and that after the loading process ranges from 55 to 58%. The retention rates thus show a difference of about 7-10%. In addition, the whiteness and ERIC characteristics of the in-situ process gave more efficient results than those of the loading process.

Study on P-type in-situ doped Polysilicon Films (P형 in-situ 도핑 폴리실리콘 막질에 관한 연구)

  • Oh, Jung-Sup;Lee, Sang-Eun;Noh, Jin-Tae;Lee, Sang-Woo;Bae, Kyoung-Sung;Roh, Yong-Han
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.3
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    • pp.208-212
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    • 2008
  • This paper reports physical properties of in situ boron doped silicon films made from boron source gas and silane ($SiH_4$) gas in a conventional low-pressure chemical vapor deposition vertical furnace. If the p-type polysilicon is formed by boron implantation into undoped polysilicon, the plasma nitridation (PN) process is added on the oxide in order to suppress boron penetration that can be caused during the thermal treatments used in fabrication. In-situ boron doped polysilicon deposition can complete p-type polysilicon film with only one deposition process and need not the PN process, because there is not interdiffusion of dopant at the intermediate temperatures of the subsequent steps. Since in-situ boron doped polysilicon films have higher work function than that of n-type polysilicon and they are compatible with the underlying oxide, they may be promising materials for improving memory cell characteristics if we make its profit of these physical properties.

Application of in-situ CaCO3 forming process on recycled fibers for optical property improvement (고지의 광학적특성 개선을 위한 in-situ 탄산칼슘처리기술의 적용)

  • Park, Dong-Hui;Lee, Min-Woo;Lee, Jong-Kyu;Ahn, Ji-Whan;Seo, Yung-Bum
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.44 no.4
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    • pp.8-15
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    • 2012
  • Optical property improvements for ONP (old newspaper) and OMG (old magazine) were attempted by application of in-situ $CaCO_3$ formation process on recycled fiber surfaces. Washing treatment of ONP and OMG resulted in 35~40% yield loss for around 6% brightness improvement. Washing plus bleaching process with $H_2O_2$ and FAS (formamidine sulfinic acid) improved brightness and ERIC values a little more with the same amount of yield loss as washing treatment. In-situ $CaCO_3$ formation method improved those optical properties much better than the washing plus bleaching method without loss of yield, and better than the case of adding high brightness PCC up to the same ash level. It can be said that the in-situ $CaCO_3$ formation method may be used as an effective alternative for upgrading optical properties of recycled fibers.