• Proceedings of the Korean Institute of Building Construction Conference
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• 2003.11a
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• pp.91-95
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• 2003

There is a problem to be solved for improvement of durability and safety supervision. When you do the waterproofing and anticorrosive work of main concrete from the design stage, the material and method of construction need to be correctly applied to appropriate circumstance conditions. Epoxy have mostly been used for concrete water tank structure. Lately, lots of subjects on adaption of polyurea resin waterproofing and anticorrosive are under discussion. Then, we attempt to approach by evaluating and comparing every capabilities with another waterproofs in this study. Performance evaluation items include the adherence performance, the imprint of seal performance, temperature dependence performance, promotion weatherizing ability, inner chemical performance, drinking water eruptive performance. Through the experiment analysis, we found that the polyurea resin waterproofing membrane is dominantly superior to other waterproofs. According to this study, we suggest the polyurea resin waterproofing membrane as a new waterproofing material for concrete structure.

• Journal of the Korea Institute of Building Construction
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• v.2 no.1
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• pp.131-138
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• 2002

There is a problem to be solved for improvement of durability and safety supervision. When you do the waterproofing work of main concrete from the design stage, the material and method of construction need to be correctly applied to appropriate circumstance conditions. Epoxy have mostly been used for concrete water tank structure. Lately, lots of subjects on adaption of polyurea resin waterproofing and anticorrosive are under discussion. Then, we attempt to approach by evaluating and comparing every capabilities with another waterproofs in this study. Performance evaluation items include the adherence performance, the imprint of seal performance, temperature dependence performance, promotion weatherizing ability, Inner chemical performance. drinking water eruptive performance. Through the experiment analysis, we found that the polyurea resin waterproofing membrane is dominantly superior to other waterproofs. According to this study, we suggest the polyurea resin waterproofing membrane as a new waterproofing material for concrete structure.

• Proceedings of the Korean Institute of Building Construction Conference
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• 2003.05a
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• pp.91-95
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• 2003

There is a problem to be solved for improvement of durability and safety supervision. When you do the waterproofing and anticorrosive work of main concrete from the design stage, the material and method of construction need to be correctly applied to appropriate circumstance conditions. Epoxy have mostly been used for concrete water tank structure. Lately, lots of subjects on adaption of polyurea resin waterproofing and anticorrosive are under discussion. Then, we attempt to approach by evaluating and comparing every capabilities with another waterproofs in this study. Performance evaluation items include the adherence performance. the imprint of seal performance, temperature dependence performance. promotion westernizing ability, inner chemical performance. drinking water eruptive performance. Through the experiment analysis, we found that the polyurea resin waterproofing membrane is dominantly superior to other waterproofs. According to this study, we suggest the polyurea resin waterproofing membrane as a new waterproofing material for concrete structure.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.17 no.5
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• pp.8-15
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• 2018

Films with special properties (e.g., water-repellent films, optical films, anti-reflection films, and flexible films) are referred to as functional films. Recently, there has been interest in fine patterning methods for film fabrication. In particular there have been many studies that use a UV nanoimprint process involving a UV curing method. In this paper, a polymer film was fabricated by the UV nanoimprint process with a micro-pattern, and its durability was evaluated by a wear test and a nano-indentation test. The film mechanical properties (such as coefficient of friction, hardness, and modulus of elasticity) were measured. Moreover, the choice of PUA type resin used in the UV nanoimprint process was confirmed to impact the durability of the thin film. Despite making the polymer film samples using the same method and PUA type resin, different coefficient of friction, hardness, and modulus of elasticity values were obtained. PUA 4 resin had the most favorable coefficient of friction, hardness, and modulus of elasticity. This material is predicted to produce a high durability functional film.

• Tribology and Lubricants
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• v.26 no.5
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• pp.297-302
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• 2010

This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.1119-1122
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• 2004

In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 － 70 nm features of the EPS were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.

• Proceedings of the Materials Research Society of Korea Conference
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• 2010.05a
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• pp.24.2-24.2
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• 2010

고분자 몰드를 이용한 nanoimprint lithography (NIL)는 고분자소재의 유연성과 투명성으로 인하여, 유기전자소자나 유연한 디스플레이소자 등 다양한 응용이 가능하다. 하지만, 고분자소재는 일반적으로 열저항성과 내구성이 낮아서, 고분자 몰드를 이용한 패턴형성 시, 자외선 경화방식이 주로 사용된다. 만약 복제가 쉽고, 가격이 저렴하며, 열저항성과 내구성이 강한 고분자 몰드를 제작한다면, thermoplastic-NIL 기술에 적용할 수가 있기 때문에, 고온을 요구하는 소자의 패턴형성 공정에 사용 가능하다. 본 연구에서는 이러한 고분자 몰드 제작을 위하여, 열저항성과 내구성이 강한 polyimide 필름과 polyurethane acrylate (PUA)를 기반으로 제작된 resin을 이용하였다. 먼저 Polyimide 필름 위에 자외선 노광을 사용하여, PUA resin 을 경화시킴으로써 패턴을 형성하였다. 이렇게 만들어진 몰드를 thermoplastic-NIL기술에 적용함으로써, Si 기판 위에 sub-마이크로 급 패턴을 형성하였다. 또한, 제작된 고분자 몰드를 사용하여 반복적인 NIL 공정을 수행함으로써 몰드의 내구성을 확인하였으며, 곡면 기판 위에 NIL을 함으로써 몰드의 유연성을 확인 할 수 있었다.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.29 no.9 s.240
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• pp.1169-1174
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• 2005

Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. In particular, ultraviolet-nanoimprint lithography (UV-NIL) is applicable to large area imprint easily. We have proposed a new UV-NIL process using an elementwise patterned stamp (EPS), which consists of a number of elements, each of which is separated by channel. Experiments on UV-NIL are performed on an EVG620-NIL using the EPS with 3mm channel width. The replication of uniform sub 70 nm lines using the EPS is demonstrated. We investigate the nonuniformity of residual layer caused by wafer deformation in experiment with varying wafer thickness. Severely deformed wafer works as an obstacle in spreading of dropped resin, which causes nonuniformity of thickness of residual layer. Numerical simulations are conducted to analyze aforementioned phenomenon. Wafer deformation in the process is simulated by using a simplified model, which is a good agreement with experiments.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.502-503
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• 2005

본 연구에서는 TFT-LCD(Thin Film Transistor-Liquid Crystal Display)의 배경광원인 BLU(Back Light Unit)의 고효율화, 고품질화를 통한 원가 절감을 달성하기 위해 BLU의 대표적 핵심부품중에 하나인 프리즘 시트를 사용하지 않는 구조의 MNT용 BLU를 개발하는데 목적을 두었다. 고효율의 BLU를 만들기위하여 17인치 BLU의 도광판의 상, 하면에 Prism 형상을 구현하였으며, 광학적 시뮬레이션을 통하여 먼저 가능성을 검토하였고, UV에 반응하는 Resin을 경화시키는 방법을 이용하여 일반 도광판에 프리즘형상을 각인(Imprint)시키는 방법으로 실물을 재현하였다. 실험 결과 프리즘 시트를 사용하지 않는 구조의 MNT용 17인치 BLU에서 중심휘도 4,984nit, 균일도 70% 달성하였다.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2007.10a
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• pp.364-367
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• 2007

In nano-imprint lithography (NIL) process, which has shown to be a good method to fabricate polymeric patterns, several kinds of pattern defects due to thermal effects during polymer flow and mold release operation have been reported. A typical defect in NIL process with high aspect ratio and low resist thickness pattern is a resist fracture during the mold release operation. It seems due to interfacial adhesion between polymer and mold. However, in the present investigation, FEM simulation of NIL molding process was carried out to predict the defects of the polymer pattern and to optimize the process by FEA. The embossing operation in NIL process was investigated in detail by FEM. From the analytical results, it was found that the lateral flow of polymer resin and the applied pressure in the embossing operation induce the weld line and the drastic lateral strain at the edge of pattern. It was also shown that the low polymer-thickness result in the delamination of polymer from the substrate. It seems that the above phenomena cause the defects of the final polymer pattern. To reduce the defect, it is important to check the initial resin thickness.