• Journal of Korean Ophthalmic Optics Society
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• v.8 no.2
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• pp.91-97
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• 2003

The behaviors of diamond deposition using microwave plasma chemical vapor deposition method have been studied by varying the concentration of methane in the methane - hydrogen gas mixture. The carbonization is checked from peak intensities of D($sp^3$) and G($sp^2$) peaks in Raman spectra. The hydronization and C-H bonding status in films can also be determined from FTIR results. Both the bonding strength of C-H and the ratio of $sp^3$ to $sp^2$ in bonding are found to be slightly dependent of partial pressure of $CH_4$ Judging from above results, we can conclude that the best value for partial pressure of $CH_4$ in growing process of thick films is about 13.8%.

• Journal of the Korea Institute of Military Science and Technology
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• v.12 no.4
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• pp.483-490
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• 2009

In this paper, a novel low-damage silicon nitride passivation for 100nm InAlAs/InGaAs MHEMTs has been developed using remote ICPCVD. The silicon nitride deposited by ICPCVD showed higher quality, higher density, and lower hydrogen concentration than those of silicon nitride deposited by PECVD. In particular, we successfully minimized the plasma damage by separating the silicon nitride deposition region remotely from ICP generation region, typically with distance of 34cm. The silicon nitride passivation with remote ICPCVD has been successfully demonstrated on GaAs MHEMTs with minimized damage. The passivated devices showed considerable improvement in DC characteristics and also exhibited excellent RF characteristics($f_T$of 200GHz).The devices with remote ICPCVD passivation of 50nm silicon nitride exhibited 22% improvement(535mS/mm to 654mS/mm) of a maximum extrinsic transconductance($g_{m.max}$) and 20% improvement(551mA/mm to 662mA/mm) of a maximum saturation drain current ($I_{DS.max}$) compared to those of unpassivated ones, respectively. The results achieved in this work demonstrate that remote ICPCVD is a suitable candidate for the next-generation MHEMT passivation technique.

• Proceedings of the Korean Society For Composite Materials Conference
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• 2003.10a
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• pp.25-28
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• 2003

Carbon nanotubes(CNTs), since their first discovery, have been considered as new promising materials in various fields of applications including field emission displays, memory devices, electrodes, NEMS constituents, hydrogen storages and reinforcements in composites due to their extra-ordinary properties. The carbon nanotube reinforced nanocomposites have attracted attention owing to their outstanding mechanical and electrical properties and are expected to overcome the limit of conventional materials. Various application areas are possible for carbon nanotube reinforced nanocomposites through the functionalization of carbon nanotubes. Carbon nanotube reinforced polymer matrix nanocomposites have been fabricated by liquid phase process including surface functionalization and dispersion of CNTs within organic solvent. In case of carbon nanotube reinforced polymer matrix nanocomposites, the mechanical strength and electrical conducting can be improved by more than an order of magnitude. The carbon nanotube reinforced polymer matrix nanocomposites can be applied to high strength polymers, conductive polymers, optical limiters and EMI materials. In spite of successful development of carbon nanotube reinforced polymer matrix nanocomposites, the researches on carbon nanotube reinforced inorganic matrix nanocomposites show limitations due to a difficulty in homogeneous distribution of carbon nanotubes within inorganic matrix. Therefore, the enhancement of carbon nanotube reinforced inorganic nanocomposites is under investigation to maximize the excellent properties of carbon nanotubes. To overcome the current limitations, novel processes, including intensive milling process, sol-gel process, in-situ process and spark plasma sintering of nanocomposite powders are being investigated. In this presentation, current research status on carbon nanotube reinforced nanocomposites with various matrices are reviewed.

• The Journal of Internal Korean Medicine
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• v.19 no.1
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• pp.247-270
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• 1998

The more society has complicated, the more we have met stressful circumstance. And it is found that many physical and mental symptoms induced by stress. Soyosan(SYS) is one of the well-known oriental medicine for the treatment of general syndrome induced by emotional stress. This study was taken to know effects of SYS water extract on immune-depressed mice induced by stress. The results obtained in this study were as follows : 1. SYS inhibited murine weight-loss induced by stress 2. In vivo& in vitro, SYS increased phagocytic activity. 3. SYS enhanced the production of such reactive oxygen intermediates as superoxide and hydrogen peroxide from macrophages. 4. In vitro, SYS little influenced the production of reactive nitrogen intermediates. 5. SYS increased the number of the rosette forming cells of spleen. 6. SYS changed the ratio of helper and suppressor T cells by increasing $CD4^+$ T cells and decreasing $CD8^+$ T cells. 7. SYS increased cytotoxic activity on human lymphoma cell line(K562). 8. SYS increased the plasma level of GH and DHEA. whereas it decreased that of ACTH and cortisol. According to the above results, it might be considered that SYS would be used for immune-depressive disease induced by stress.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.35 no.11A
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• pp.1091-1096
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• 2010

Stiction in microelectromechanical systems (MEMS) has been a major failure mechanism. Especially, in RF MEMS switches, moving parts often suffered in-use and release related stiction problems. Some materials and methods have been used to prevent this problem. Diamond-like carbon (DLC) has not only been used as a protective material owing to its good mechanical properties but also has been used as a hydrophobic material. Its properties could be controlled by post annealing treatment in various conditions. We synthesized DLC films using a radio frequency plasma enhanced chemical vapor deposition (RF PECVD) method on silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gas. Then, the change of the hydrophobic property of the films was investigated undervarious annealing temperatures in nitrogen and in oxygen ambient. The films, that were annealed above $700^{\circ}C$ in nitrogen ambient, showed a high contact angle of water (> $90^{\circ}$) even though their mechanical property was sacrificed to some degree. The structural variation and the changes of the hydrophobic and mechanical properties of the DLC films were analyzed by Raman spectrum, contact angle measurement, surface profiler, and a nanoindentation test.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.3
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• pp.116-121
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• 2006

Most high-k materials are well known not to be etched easily, Some problems such as low etch rate poor sidewall angle, plasma damage, and process complexity were emerged from the high-density DRAM fabrication. Chemical mechanical polishing (CMP) by a damascene process was proposed to pattern this high-k material was polished with some commercial silica slurry as a function of pH variation. Sufficient removal rate with adequate selectivity to realize the pattern mask of tera-ethyl ortho-silicate (TEOS) film for the vertical sidewall angle were obtained. The changes of X-ray diffraction pattern and dielectric constant by CMP process were negligible. The planarization was also achieved for the subsequent multi-level processes. Our new CMP approach will provide a guideline for effective patterning of high-k material by CMP technique.

• Korean Journal of Materials Research
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• v.6 no.7
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• pp.661-670
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• 1996

리모트 수소 플라즈마를 이용하여 실리콘 웨이퍼 표면 위에 있는 금속불순물의 제거 및 제거기구에 관하여 조사하였다. 실리콘의 표면과 내부분석을 위하여 TXRF(total reflection x-ray fluorescence)와 SPV(surface photovoltage), AFM(atomic force microscope)을 사용하였다. TXRF 분석결과 리모트 수소 플라즈마가 금속오염물질 제거에 상당한 효과가 있는 것으로 나타났다. TXRF분석결과 리모트 수소 플라즈마가 금속오염물질 제거에 상당한 효과가 있는 것으로 나타났다. 리모트 수소플라트마 처리 후 금속오염은 금속원소의 종류에 따라 1010atoms/$\textrm{cm}^2$-1011atoms/$\textrm{cm}^2$수준이었다. SPV분석결과를 보면 수소 플라즈마 처리에 의해 minority carrier 수명이 전반적으로 증가하였다. AFM 분석을 통하여 수소 플라즈마 처리가 표면 손상을 일으키지 않으며 표면의 거칠기에 나쁜 영향을 미치지 않음을 알 수 있었다. 또한 본 실험에서 나타난 결과들을 종합해 볼 때 금속오염물의 제거기구는 자연산화막 혹은 수소로 passivate된 실리콘 웨이퍼 표면을 수소 플라즈마에서 발생된 수소원자가 실리콘표면을 약하게 에칭할 때 떨어져 나가는 'lift-off'가 유력한 것으로 판단된다.

• Korean Journal of Materials Research
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• v.4 no.2
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• pp.227-232
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• 1994

Diamondlike carbon thin film has been fabricated with low discharging frequency, 450KHz by plasma enhanced chemical vapor deposition. Its physical properties such as optical band gap, microhardness and internal stress have been compared with 13.56MHz film. Optical band gap of 450KHz DLC thin film was less than 13.56MHz film and it was found that C-H bond concentration and total hydrogen contents in the film decreased greatly as the result of FT-IR and CHN analysis. Also, when DLC thin film was fabricated with low discharging frequency, it was expected that the adhesion of the film to the substrate was improved by the great decrease of internal stress without any considerable decrease of microhardness.

• Analytical Science and Technology
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• v.8 no.4
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• pp.487-492
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• 1995

The chemical compositions and pyrolysis characteristics of oil shales and source rocks distributed in the southwestern and southeastern parts of the Korean peninsular have been investigated. In order to compare the results of Korean samples with those of shales giving high oil yields, two Colorado oil shale samples and one Paris source rock samples were also investigated. Chemical compositions of the samples were analysed by means of gravimetry, CHN analysis, X-ray diffraction method, inductively coupled plasma atomic emission spectrometry and atomic absorption spectrometry. A custom made pyrolyser and a Rock-Eval system were used for the pyrolysis studies. Pyrolyses of the samples were carried out by means of a temperature controlling device to $600^{\circ}C$ at a heating rate of $5^{\circ}C/min$ with a helium flow rate of $1200m{\ell}/min$. The results of pyrolysis study indicated that Colorado shale samples belong to type I and all the other samples belong to type II.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.11a
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• pp.165-166
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• 2012

표면의 젖음성은 어플리케이션의 매우 중요한 점으로, 이것은 표면에너지와 표면의 조도에 의해 결정된다. 표면의 젖음성을 낮추기 위하여 저온 PECVD 공정을 통해 초소수성 박막을 만들었다. $SiO_xC_yH_z$ 필름을 만들기 위하여 RF power을 사용하였고, HMDS (hexamethyl-disilazane) precursor과 함께 수소 기체를 통해 증착하였다. 이 실험에서는 수소와 RF power를 변수로 진행하였고, 이것은 소수성 박막의 표면에너지를 변화시켰다. 필름을 합성한 후 contact angle measurement 및 AFM을 사용해 표면에너지와 표면조도를 관찰하였다. 또한 필름의 화학적 결합을 알기 위해 FT-IR을 이용하였다. 여기에서 표면의 에너지는 표면의 조도와 화학적 결합상태에 의해서 영향을 받았음을 알 수 있었다.