• 제목/요약/키워드: hole blocking layer

검색결과 68건 처리시간 0.028초

전계발광 소자에서 정공 차단 물질로서의 4,4',4'-trifluoro-triazine의 특성 (The Characteristices of the 4,4',4'-trifluoro-triazine as a hole Blocking Material in Electroluminescent Devices)

  • 신지원;신동명;손병청
    • 한국응용과학기술학회지
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    • 제17권2호
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    • pp.120-125
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    • 2000
  • The tfTZ(4,4',4''-trifluoro-triazine) was used as a hole blocking material for the electroluminescent devices(ELDs) in this study. In general, the holes are outnumbered the electrons in hole transport and emitting layers because the hole transport is more efficient in most organic ELDs. The hole blocking layer are expected to control the excess holes to increase the recombination of holes and electrons and to decrease current density. The former study using the 2,4,6-triphenyl-1,3,5-triazine(TTA) as hole blocking layer showed that the TTA did not form stable films with vapor deposition technique. The tfTZ can generate stable evaporated films, moreover the fluorine group can lower the highest occupied molecular orbital(HOMO) level, which produces the energy barrier for the holes. The tfTZ has high electron affinities according to the data by the Cyclic-Voltammety(CV) method, which is developed for the measurement of HOMO and lowest occupied molecular orbital(LUMO) level of organic thin films. The lowered HOMO level is made the tfTZ to be applied for a hole blocking layer in ELDs. We fabricated multilayer ELDs with a structure of ITO/hole blocking layer(HBL)/hole transporting layer(HTL)/emitting layer/electrode. The hole blocking properties of this devices is confirmed from the lowered current density values compared with that without hole blocking layer.

Fabrication of $TiO_2$ Blocking Layers for CuSCN Based Dye-Sensitized Solar Cells by Atomic Layer Deposition Method

  • 백장미;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.310.2-310.2
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    • 2013
  • For enhancement of dye-sensitized solar cell performance, TiO2 blocking layer has been used to prevent recombination between electron and hole at the conducting oxide and electrolyte interface. In solid state dye-sensitized solar cells, it is necessary to fabricate pin-hole free TiO2 blocking layer. In this work, we deposited the TiO2 blocking layer on conducting oxide by atomic layer deposition and compared the efficiency. To compare the efficiency, we fabricate solid state dye-sensitized solar cell with using CuSCN as hole transport material. We see the efficiency improve with 40nm TiO2 blocking layer and the TiO2 blocking layer morphology was characterized by SEM. Also, we used this blocking layer in TiO2/Sb2S3/ CuSCN solar cell.

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PBD를 Hole Blocking Layer로 이용한 적색발광의 EL 소자 제작에 관한 연구 (The study on Red device using PBD as a Hole Blocking Layer)

  • 강민웅;김종성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.499-501
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    • 2002
  • 본 연구에서는 ETL층으로 널리 알려져 있는 PBD(2-(4-biphenyl)-5-(4-tert-butylphenyl) -1.3,4oxadiazole)를 HBL(Hole-blocking layer) 물질로 이용 하고 Nile red를 사용하여 적색 발광의 EL(electroluminescence) 소자를 제작 평가하였다. 일반적인 유기 EL 소자의 구조인 Anode/HTL(Hole Transport Layer)/ETL(Electron Transport Layer)/Cathode로 이루어져 있다. 여기에 HTL과 ETL사이에 HBL를 추가하여 EL 소자의 성능을 향상 시킬 수 있으면, 이러한 구조의 최종 소자를 제작 EML(emitting layer; Nile red)의 두께 및 임계전압을 달리 하여 소자 의 특성을 평가 연구 하였다.

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New Hole Blocking Layer를 포함한 OLEDs (New Hole Blocking Layer for low voltage and high efficiency OLEDs)

  • 하미영;김소연;문대규
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.442-443
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    • 2007
  • We have studied new hole blocking layer for effective organic light emitting diodes. The device having a structure of ITO/2TNATA/$\alpha$-NPD/DPVBi : Rubrene(0.7%)/DPVBi/New Hole Blocking layer or BCP/$Alq_3$/LiF/Al has been used. The driving voltage of OLED with BCP(2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline) or New HBL were 5.5V and 4.4V, respectively. As a result, new HBL rather than BCP has a good hole blocking ability.

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Zn(HPB)2를 Hole Blocking Layer로 이용한 OLEDS의 특성 연구 (Study on Properties of OLEDS using Zn(HPB)2 as Hole Blocking Layer)

  • 김동은;김두석;이범종;권영수
    • 한국전기전자재료학회논문지
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    • 제18권12호
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    • pp.1139-1142
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    • 2005
  • Recently, organic light emitting diodes(OLEDs) is widely used as one of the information display techniques. We synthesized 2-(2-hydroxyphenyl)benzoxazole($Zn(HPB)_2$). We studied the luminescent properties of OLEDs using $Zn(HPB)_2$. The ionization potential(IP) and the electron affinity(EA) of $Zn(HPB)_2$ investigated using cyclic-voltammetry(C-V). The IP and EA were 6.5 eV and 3.0 eV, respectively. The PL and EL spectra of $Zn(HPB)_2$ were observed at the wavelength of 450 nm. We used $Zn(HPB)_2$ as an emitting layer and hole blocking layer. At the experiment about hole blocking effect, we inserted $Zn(HPB)_2$ between emiting material layer(EML) and cathode, and between hole transport layer(HTL) and emitting material layer(EML). We measured current density-voltage and luminance-voltage characteristics at room temperature.

$Zn(HPB)_2$를 Hole blocking layer로 이용한 OLEDs의 특성 연구 (A Study on Properties of OLEDs using $Zn(HPB)_2$ as hole blocking layer)

  • 김동은;김병상;권오관;이범종;권영수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.447-448
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    • 2005
  • Recently, organic light emitting diodes(OLEDs) is widely used as one of the information display techniques. We synthesized 2-(2-hydroxyphenyl)benzoxazole($Zn(HPB)_2$). We studied the luminescent properties of OLEDs using $Zn(HPB)_2$. The ionization potential(IP) and the electron affinity(EA) of $Zn(HPB)_2$ investigated using cyclic-voltammetry(C-V). The JP, EA and Eg were 6.5eV, 3.0eV and 3.5eV, respectively. The PL and EL spectra of $Zn(HPB)_2$ were observed at the wavelength of 4S0nm. We used $Zn(HPB)_2$ as an emitting layer and hole blocking layer. At the experiment about hole blocking effect, we inserted $Zn(HPB)_2$ between emitting material layer(EML) and cathode, and hole transport layer(HTL) and emitting material layer(EML). We measured current density-voltage and luminance-voltage characteristics at room temperature.

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PFO : MEH-PPV 발광층과 정공 차단층을 이용한 고분자 발광다이오드의 특성 (Properties of Polymer Light Emitting Diodes Using PFO : MEH-PPV Emission Layer and Hole Blocking Layer)

  • 이학민;공수철;신상배;박형호;전형탁;장호정
    • 반도체디스플레이기술학회지
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    • 제7권2호
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    • pp.49-53
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    • 2008
  • The yellow base polymer light emitting diodes(PLEDs) with double emission and hole blocking layers were prepared to improve the light efficiency. ITO(indium tin oxide) and PEDOT : PSS[poly(3,4-ethylenedioxythiophene) : poly(styrene sulfolnate)] were used as cathode and hole transport materials. The PFO[poly(9,9-dioctylfluorene)] and MEH-PPV[poly(2-methoxy-5(2-ethylhe xoxy)-1,4-phenylenevinyle)] were used as the light emitting host and guest materials, respectively. TPBI[Tpbi1,3,5-tris(N-phenylbenzimidazol-2-yl)benzene] was used as hole blocking layer. To investigate the optimization of device structure, we prepared four kinds of PLED devices with different structures such as single emission layer(PFO : MEH-PPV), two double emission layer(PFO/PFO : MEH-PPV, PFO : MEH-PPV/PFO) and double emission layer with hole blocking layer(PFO/PFO : MEH-PPV/TPBI). The electrical and optical properties of prepared devices were compared. The prepared PLED showed yellow emission color with CIE color coordinates of x = 0.48, y = 0.48 at the applied voltage of 14V. The maximum luminance and current density were found to be about 3920 cd/$m^2$ and 130 mA/$cm^2$ at 14V, respectively for the PLED device with the structure of ITO/PEDOT : PSS/PFO/PFO : MEH-PPV/TPBI/LiF/Al.

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Hole Blocking Layer 사용에 따른 하이브리드 백색 OLED의 색순도 향상에 관한 연구 (Improvement of Color Purity Using Hole Blocking Layer in Hybrid White OLED)

  • 김남규;신훈규;권영수
    • 한국전기전자재료학회논문지
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    • 제27권12호
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    • pp.837-840
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    • 2014
  • Novel materials of $Zn(HPB)_2$ and Ir-complexes were respectively synthesized as blue or red emitting material. White Organic Light Emitting Diodes (OLED) were fabricated by using $Zn(HPB)_2$ for a blue emitting layer, Ir-complexes for a red emitting layer and $Alq_3$ for a green emitting layer. White OLED was fabricated by using double emitting layers of $Zn(HPB)_2$ and $Alq_3:Ir$-complexes, and hole blocking layer of BCP. We also varied the thickness of BCP. When the thickness of BCP layer was 5 nm, white emission was achieved. We obtained a maximum luminance of $3,500cd/m^2$. The CIE coordinates was (0.375, 0.331). From this study, we could propose that the hybrid structure is efficient in lighting application of white OLED by improvement of color purity.

차단층 설계 변수가 GaN 기반 LED 특성에 미치는 영향 (The Effect of Blocking Layer Design Variable on the Characteristics of GaN-based Light-Emitting Diode)

  • 이재현;염기수
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2012년도 추계학술대회
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    • pp.233-236
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    • 2012
  • 본 논문에서는 차단층 설계 변수에 따른 GaN 기반 LED의 출력 특성을 분석하였다. 사용된 LED의 기본 구조는 GaN 버퍼층을 기반으로 GaN 장벽과 InGaN 양자 우물로 이루어진 활성 영역이 AlGaN EBL(Electron Blocking Layer)과 AlGaN HBL(Hole Blocking Layer) 사이에 구성되어 있다. ISE-TCAD를 이용하여 GaN 기반 LED에서 EBL의 Al 몰분율과 두께, HBL의 Al 몰분율과 도핑 농도에 따른 출력 전력과 내부 양자 효율 특성을 분석하였다.

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GaN 기반 발광 다이오드(LED)의 특성 분석 (Characteristic analysis of GaN-based Light Emitting Diode(LED))

  • 이재현;염기수
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2012년도 춘계학술대회
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    • pp.686-689
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    • 2012
  • 본 논문에서는 ISE-TCAD를 이용하여 GaN 기반의 LED특성을 분석하였다. LED는 GaN 버퍼층을 기반으로 GaN 장벽과 InGaN 양자우물로 구성된 활성 영역, AlGaN EBL(Electron Blocking Layer)과 AlGaN HBL(Hole Blocking Layer)로 이루어져 있다. Auger 재결합률, 양자 우물의 폭과 수, EBL의 Al 몰분율의 변화에 따른 LED의 출력 전력 특성을 분석하고 효율 개선을 위한 몇 가지 기준을 제시하였다.

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