• Macromolecular Research
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• 제12권1호
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• pp.112-118
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• 2004

With the goal of enhancing the creep resistance of ultra-high molecular weight polyethylene (UHMWPE), we performed gamma irradiation and post-irradiation annealing at a low temperature, and investigated the crystalline structures and mechanical properties of the samples. Electron spin resonance spectra reveal that most of the residual radicals are stabilized by annealing at 100$^{\circ}C$ for 72 h under vacuum. Both the melting temperature and crystallinity increase after increasing the dose and by post-irradiation annealing. When irradiated with the same dose, the quenched sample having a higher amorphous fraction exhibits a lower swell ratio than does the slow-cooled sample. The measured tensile properties correlate well to the crystalline structure of the irradiated and annealed samples. For enhancing creep resistance, high crystallinity appears to be more critical than a high degree of crosslinking.

• 열처리공학회지
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• 제35권4호
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• pp.211-219
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• 2022

It is known that superplastic materials with ultrafine grains have high elongation mainly due to grain boundary sliding. Therefore, in the present study we examined the influence of grain refinement, caused by a repetitive cold rolling and annealing process, on both superplastic elongation and superplastic deformation mechanism. The cold rolling and annealing process was repetitively applied up to 4 times using Fe-10Mn-3.5Si alloy. High-temperature tensile tests were conducted at 763 K with an initial strain rate of 1 × 10^-3 s^-1 using the specimens. The superplastic elongation increased with the number of the repetitive cold rolling and annealing process; in particular, the 4 cycled specimen exhibited the highest elongation of 372%. The primary deformation mechanism of all specimens was grain boundary sliding between recrystallized α-ferrite and reverted γ-austenite grains. The main reason for the increase in elongation with the number of the repetitive cold rolling and annealing process was the increase in fractions of fine recrystallized α-ferrite and reverted γ-austenite grains, which undergo grain boundary sliding.

• 한국전자통신학회논문지
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• 제19권1호
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• pp.47-52
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• 2024

본 연구에서는 유리 기판 위에 BZO박막을 제작한 후, 열처리 온도가 박막의 전기적 및 광학적 특성에 미치는 영향을 조사하였다. XRD 분석 결과, 열처리 온도에 무관하게 모든 박막이 c-축 배향성을 나타내었다. 열처리 온도가 400에서 600℃ 로 증가함에 따라 반가폭(FWHM)은 1.65에서 1.07° 로 감소하였다. 가시광 영역(400-800nm)에서의 평균 투과도는 열처리 온도에 큰 영향 없이 85% 이상의 높은 값을 나타내었다. Hall 측정결과, 열처리 온도에 따라 캐리어 농도와 이동도는 증가하였고 비저항은 감소하였다. 600℃ 에서 열처리한 BZO박막의 비저항과 캐리어 농도는 각각 9.75 × 10^-2 Ω·cm 과 4.21×10¹⁹ cm^-3 로 가장 우수한 값을 나타내었다. 향후 BZO박막의 공정 조건과 열처리 조건을 최적화시킨다면, 차세대 광전자 소자에 응용될 수 있는 매우 유망한 재료로 주목받을 것으로 기대된다.

• 한국분말재료학회지
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• 제4권1호
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• pp.48-54
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• 1997

NiAl powders containing oxide dispersoids have been produced by mechanical alloying process in a controlled atmosphere using high energy attrition mill. The powders have been consolidated by hot extrusion and hot pressing followed by isothermal annealing to induce microstructure coarsening to improve high temperature properties. Grain growth and dispersoid coarsening kinetics have been investigated as functions of annealing time and temperature. Coarsening of dispersion strengthen NiAl and dispersoid has been discussed. Some clues of secondary recrystallization have been investigated. Mechanical property measurements have been also made and correlated with the microstructures.

• Progress in Superconductivity
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• 제12권1호
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• pp.32-35
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• 2010

Potassium doped $BaFe_2As_2$ superconducting thin films by using an ex situ pulsed laser deposition technique were fabricated in various conditions to find out an optimal growth condition. Controlled conditions were annealing temperature, annealing time, and mass of potassium. The $Ba_{1-x}K_xFe_2As_2$ thin films which has most good quality is fabricated at a condition of annealing temperature at $700^{\circ}C$, annealing time of 60 minutes, and 0.6 g of potassium lumps. In this condition we were able to fabricate good quality films with high transition temperature of ~ 39 K.

• 한국재료학회지
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• 제33권11호
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• pp.439-446
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• 2023

Changes in the microstructure and mechanical properties of as-roll-bonded AA6061/AA5052/AA1050 three-layered sheet with increasing annealing temperature were investigated in detail. The commercial AA6061, AA5052 and AA1050 sheets with 2 mm thickness were roll-bonded by multi-pass rolling at ambient temperature. The roll-bonded Al sheets were then annealed for 1 h at various temperatures from 200 to 400 ℃. The specimens annealed up to 250 ℃ showed a typical deformation structure where the grains are elongated in the rolling direction in all regions. However, after annealing at 300 ℃, while AA6061 and AA1050 regions still retained the deformation structure, but AA5052 region changed into complete recrystallization. For all the annealed materials, the fraction of high angle grain boundaries was lower than that of low angle grain boundaries. In addition, while the rolling texture of the {110}<112> and {123}<634> components strongly developed in the AA6061 and AA1050 regions, in the AA5052 region the recrystallization texture of the {100}<001> component developed. After annealing at 350 ℃ the recrystallization texture developed in all regions. The as-rolled material exhibited a relatively high tensile strength of 282 MPa and elongation of 18 %. However, the tensile strength decreased and the elongation increased gradually with the increase in annealing temperature. The changes in mechanical properties with increasing annealing temperature were compared with those of other three-layered Al sheets fabricated in previous studies.

• 한국진공학회지
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• 제21권3호
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• pp.136-141
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• 2012

열처리 공정으로 제조한 $In_2Se_3$ 박막의 구조 및 광학적 물성을 조사하여 보고한다. 기판위에 스퍼터링 방법으로 인듐(In: indium)을 증착하고 셀레늄 분위기에서 열처리 온도를 변화시키며 In-Se 박막을 제조하였다. 열처리 온도가 증가함에 따라 $In_2Se_3$ 박막의 형성과 상의 변화를 관찰 할 수 있었다. 낮은 열처리 온도(${\leq}150^{\circ}C$)에서는 In의 뭉침 현상을 관찰할 수 있었고 열처리 온도가 $250^{\circ}C$ 부터 $In_2Se_3$ 박막이 형성되며 $350^{\circ}C$ 에서 ${\gamma}-In_2Se_3$ 상이 형성됨을 알 수 있었다. 열처리 온도가 $400^{\circ}C$로 증가면 wurtzite 구조의 고품질 ${\gamma}-In_2Se_3$ 박막을 얻을 수 있었다. 열처리 온도가 증가함에 따라 $In_2Se_3$ 박막의 밴드갭이 증가함을 알 수 있었고, 열처리 온도 $400^{\circ}C$에서 제조된 ${\gamma}-In_2Se_3$ 결정질 박막의 밴드갭이 1.796eV임을 알았다.

• 한국전기전자재료학회논문지
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• 제11권10호
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• pp.796-803
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• 1998

Intrinsic and proximity gettering are popular processes to get higher cumulative production yield and usually adopt multi-step annealing and high energy ion implantation, respectively. In order to test the combined processed of these, high energy \ulcornerAs\ulcorner ion implantation and 2-step annealing process were adopted. After the ion implantation followed by 2-step annealing, the wafers were cleaved and etched with Wright etchant. The morphology of cross section on samples was inspected by FESEM. The concentration profile of As was measured by SRP. The location and type of secondary defects inspected by HRTEM were dependent on the 1st annealing temperatures. That is, a line of dislocation located at $1.5mutextrm{m}$ apart from the surface at $600^{\circ}C$ lst annealing was changed to some dislocation lines or loops nearby the surface at 100$0^{\circ}C$. The density of dislocation line was reduced but the size of the defects was enlarged as the temperature increased.

• Current Photovoltaic Research
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• 제1권2호
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• pp.97-102
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• 2013

Aluminum-doped zinc oxide (AZO) thin films were prepared by dc magnetron sputtering at room temperature and the effect of heat treatment on the structural, electrical and optical properties of the films were examined. As the annealing temperature and time increased, the resistivity decreased and the transmittance improved. All AZO films had c-axis oriented (002) plane of ZnO, regardless of the annealing process employed. As the annealing temperature and time increased, the crystallinity of AZO thin films increased due to the formation of a new ZnO phase in which Al was substituted for Zn. However, at the high annealing temperature of $400^{\circ}C$, the resistivity of the films increased via separation of Zn and Al from ZnO phase due to their low melting points. X-ray diffraction, field emission scanning electron micrograph and Hall effect measurement confirmed the formation of uniformly distributed new grains of ZnO substituted with Al. The variation of Al contents in AZO films was shown to be the primary factor for the changes in resistivity and carrier concentration of the films.

• 열처리공학회지
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• 제10권4호
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• pp.246-254
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• 1997

The 6.5wt %Si-Fe alloy sheets were made by the twin roll process. The magnetic properties and microstructures of sheets annealed in the sulfur atmosphere were studied. In the as-prepared sheet, non-oriented columnar grains about $10{\mu}m$ in diameter were observed, which grew from the surface to the inner part of the sheet. When the annealing temperature was around $700^{\circ}C$, the primary recrystallization was formed around the middle part of the sheet thickness, and the grain size increased with increasing annealing temperature. At the annealing temperature of $900^{\circ}C$, the grain size became $30{\sim}40{\mu}m$. Around the annealing temperature, the motive force of the grain growth is the grain boundary energy. However, above $1000^{\circ}C$ the surface energy played an important role in the observed grain growth. When the sheet were annealed at $1200^{\circ}C$, the grains whose (100) planes were paralled to the thin plate surface grew, and all sheet surfaces were covered with these grains after 1 hour annealing. This phenomenon is called tertiary recrystallization. A difference in surface energy between (100) and (110) surfaces provides a driving force for growth of tertiary grains. The coercive force was 0.27 mOe and the AC core loss $W_{12/50}$ was 0.38w/kg for the 6.5wt%Si-Fe alloy.