• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.1859-1861
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• 2005

The ZnO:Al thin films were prepared on glass by Facing Target Sputtering (FTS) system. We investigated electrical, optical, and structural properties of AZO thin film with sputtering current $0.1[A]{\sim}0.6[A]$. We obtained the lowest resistivity $2.3{\times}10^{-4}[{\Omega}-cm]$ at sputtering current 0.6[A] from the 4-point probe and the strong (002) peak at sputtering current 0.3[A] from the X-ray Diffractometer (XRD ). The optical transmittance of AZO thin films show a very high transmittance of $80{\sim}95%$ in the visible range and exhibit the absorption edge of about 350nm.

• Transactions of the Society of Information Storage Systems
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• v.6 no.2
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• pp.68-73
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• 2010

The interest in acquiring high efficiency solar cells has been steadily increasing due to various advantages such as low-cost installation, pollution free and everlasting energy generation. In order to raise the cell efficiency, there has been a lot of effort to develop effective anti-reflection coatings. In this work, the main objective was to investigate the effects of particle size and annealing temperature of silica anti-reflection coatings to maximize the cell efficiency as well as reliability. It was shown that the light transmittance could be increased by a few percent over a certain range of wavelength using the silica coating. Also, the tribological properties of the coating could be improved through the annealing process, which led to better reliability of the coating.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.242-243
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• 2007

Highly transparent conducting aluminum-doped zinc oxide (AZO) thin films were deposited on Corning glass substrate using an Nd:YAG pulsed laser deposition technology. AZO thin films deposited with 650nm thickness showed the best electrical properties of the electrical resistivity of $4.6{\times}10^{-4}[{\Omega}{\cdot}cm]$, a carrier concentration of $9.3{\times}10^{20}[cm^{-3}]$, and a carrier mobility of $31[cm^2/V{\cdot}s]$. Besides, the optical transmittance spectra in visible region (200-800nm) of AZO thin films show an high average transmittance over 90%.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.502-505
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• 2003

We synthesized high thermal photoalignment material with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below $1^{\circ}$. The Voltage-transmittance (V-T) curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.485-486
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• 2005

Fringe-field switching mode which has a horizontal and vertical electric field exhibits high transmittance and wide viewing angle characteristics. In the FFS mode, a passivation layer between common and pixel electrodes exists, which functions as preventing current leakage of fringe-field. In this paper, we have studied LC behavior, transmittance and operating voltage characteristics with applied voltage as a function of the passivation layer thickness and defined optimal value of the layer to be about $0.5{\mu}m$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.440-441
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• 2006

We have studied the narrow viewing angle liquie crystal displays (LCDs) using a hybrid aligned nematic liquid crystal (LC) cell driven by a fringe field. The device using a LC with positive dielectric anisotropy has a relatively low transmittance. This paper describes how to improve light efficiency by optimizing electrode structure. The results show that the device exhibits a high transmittance of 90%, low driving voltage and narrow viewing angle less than $20^{\circ}$ along horizontal direction which is highly effective for private display application.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.218.2-218.2
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• 2013

In this study, CdS thin films were deposited onto glass substrates by radio frequency magnetron sputtering. The films were grown at various substrate temperatures in the range of 100 to $250^{\circ}C$. The effects of substrate temperatures on the structural and optical properties were examined. The XRD analysis revealed that CdS films were polycrystalline and retained the mixed structure of hexagonal wurtzite and cubic phase. The percentages of hexagonal structured crystallites in the films were seen to be increased by increasing substrate temperatures. The film grown at $250^{\circ}C$ showed a relatively high transmittance of 80% in the visible region, with an energy band gap of 2.45 eV. The transmittance date analysis indicated that the optical band gap was closely related to the substrate temperatures.

• Journal of the Korean Society for Heat Treatment
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• v.25 no.2
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• pp.85-89
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• 2012

Transparent conductive ZnO/Ag/ZnO (ZAZ) multilayer films were deposited by Radio frequency (RF) magnetron sputtering and direct current (DC) magnetron sputtering. The effects of post deposition vacuum annealing temperature on the structural, electrical and optical properties of the ZAZ multilayer films were investigated. The thickness of ZAZ films is kept constant at ZnO 50 nm/Ag 5nm/ZnO 45 nm, while the vacuum annealing temperatures were varied from 200 and $400^{\circ}C$, respectively. As-deposited ZAZ films exhibit a sheet resistance of $6.1{\Omega}/{\Box}$ and optical transmittance of 72.7%. By increasing annealing temperature to $200^{\circ}C$, the resistivity decreased to as low as $5.3{\Omega}/{\Box}$ and optical transmittance also increased to as high as 82.1%. Post-deposition annealing of ZAZ multilayer films lead to considerably lower electrical resistivity and higher optical transparency, simultaneously by increased crystallization of the films.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.547-550
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• 2004

Indium tin oxide(ITO) films were prepared as a function of varying the proportion of oxygen$[0{\sim}1.0sccm]$ at fixed he gas[20sccm] by facing targets sputtering(FTS) system. Then electrical and optical properties of ITO thin films were estimated by Hall effect measurement system and UV/VIS-spectrometer. In the result, at very little oxygen rate, we can prepare a low resistivity ITO thin film of $3.40{\times}10^{-4}[\Omega{\cdot}cm]$ and transmittance of over 80%. So we noticed that the ITO thin film with low resistivity and high transmittance was prepared by FTS at room temperature.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.09a
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• pp.97-101
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• 2005

The ZnO:Al thin films were prepared on glass by Facing Target Sputtering (FTS) system. We investigated electrical, optical, and structural properties of AZO thin film with sputter ins current 0.1[A]-0.6[A]. We obtained the lowest resistivity $2.3{\times}\;10^{-4}[{\Omega}-cm]$ at sputtering current 0.6[A] from the 4-point probe and the strong (002) peak at sputtering current 0.3[A] from the X-ray Diffractometer (XRD). The optical transmittance of AZO thin films show a very high transmittance of $80\~95\%$ in the visible range and exhibit the absorpt ion edge of about 350 nm.