1 |
S. Flickyngerova, M. Netrvalova, L. Prusakova, I. Novotny, P. Sutta and V. Tvarozek : Vacuum, 84 (2009) 215-217.
DOI
|
2 |
V. Khranovskyy, U. Grossner, O. Nilsen, V. Lazorenko, G.V. Lashkarev, B.G. Svensson and R. Yakimova : Thin Solid Films, 515 (2006) 472-476.
DOI
ScienceOn
|
3 |
S. Suzuki, T. Miyata, M. Ishii and T. Minami : Thin Solid Films, 434 (2003) 14-19.
DOI
ScienceOn
|
4 |
Daeil Kim : Appl. Surf. Sci., 218 (2003) 71-78.
DOI
ScienceOn
|
5 |
G. Fang, D. Li and B. Yao : Vacuum, 68 (2002) 363-372.
DOI
|
6 |
Y. Kim, Y. Lee, S. Heo, H. Lee, J. Kim, S. Kim, J. Chae, J. Choi and Daeil Kim : Optics Comm., 284 (2011) 2303-2306.
DOI
ScienceOn
|
7 |
Daeil Kim : Displays, 31 (2010) 155-159.
DOI
|
8 |
Daeil Kim : Appl. Surf. Sci., 256 (2010) 1774-1777.
DOI
ScienceOn
|
9 |
B. D. CullityElements of X-ray Diffraction, (Additionwesley, Reading, MA, 1978), 102-121.
|
10 |
C. Yang, S. Lee, T. Lin and S. Chen : Thin Solid Films, 516 (2008) 1984.
DOI
|
11 |
J. H. Park, J. H. Chae and Daeil Kim : J. Alloy. Comp., 478 (2009) 330-333.
DOI
ScienceOn
|
12 |
G. Haacke : J. Appl. Phys., 47 (1976) 4086-4089.
DOI
ScienceOn
|
13 |
H. M. Lee, Y. J. LEE and I. S. Kim : Vacuum, 86 (2012) 1494-1498.
DOI
ScienceOn
|