• 한국재료학회지
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• 제6권6호
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• pp.632-635
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• 1996

조성 변조된 비정질 Fe80Zr20박막의 자기적 성질과 기계적 성질 변화를 전해적 방법에 의한 수소 취입 시간의 함수로 측정하여, 그 상관 관계를 연구하였다. 박막의 Young's modulus는 진동 cantilever 시료의 공명 주파수를 , 10-4nm의 측정 감도를 지닌 laser heterodyne interferometer를 써서 측정하였다. 농도 2N의 인산 전해액에 침적된 시료에 26.3mA/$\textrm{cm}^2$의 전류를 흘려 이루어진 수소취입에 의해, Fe80Zr20 박막의 포화자화 정도는 8배, Young's modulus는 18배 가량 증가하였다. Fe80Zr20박막의 자기적 성질의 변화가 원자적 scale의 미세 구조 변화에 의한 것이라는 간접적인 증거를 제공하였으며, cantilever 시료의 공명주파수 측정을 통하여 박막재료의 기계적 성질을 연구할 수 있는 새로운 가능성을 제시하였다.

• 한국정밀공학회지
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• 제21권11호
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• pp.75-82
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• 2004

A metrological atomic force microscope (M-AFM) was developed fur the length measurements of nanometer range, through the modification of a commercial AFM. To eliminate nonlinearity and crosstalk of the PZT tube scanner of the commercial AFM, a two-axis flexure hinge scanner employing built-in capacitive sensors is used for X-Y motion instead of PZT tube scanner. Then two-dimensional displacement of the scanner is measured using two-axis heterodyne laser interferometer to ensure the meter-traceability. Through the measurements of several specimens, we could verify the elimination of nonlinearity and crosstalk. The uncertainty of length measurements was estimated according to the Guide to the Expression of Uncertainty in Measurement. Among several sources of uncertainty, the primary one is the drift of laser interferometer output, which occurs mainly from the variation of refractive index of air and the thermal stability. The Abbe error, which is proportional to the measured length, is another primary uncertainty source coming from the parasitic motion of the scanner. The expanded uncertainty (k =2) of length measurements using the M-AFM is √(4.26)$^2$+(2.84${\times}$10$^{-4}$ ${\times}$L)$^2$(nm), where f is the measured length in nm. We also measured the pitch of one-dimensional grating and compared the results with those obtained by optical diffractometry. The relative difference between these results is less than 0.01 %.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.1380-1383
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• 2004

The scanning type XY stage is frequently used these days as precision positioning system in equipment for semiconductor or display element. It is requested higher velocity and more precise accuracy for higher productivity and measuring performance. The position accuracy of general stage is primarily affected by the geometric errors caused by parasitic motion of stage, misalignments such as perpendicular error, and thermal expansion of structure. In the case of scanning type stage, H type frame is usually used as base stage which is driven by two actuators such as linear motor. In the point view of scanning process, the stage is used in moving motion. Therefore, dynamic variation is added as significant position error source with other parasitic motion error. Because the scanning axis is driven by two actuators with two position detectors, 2 dimensional position errors have different characteristic compared to general tacked type XY stage. In this study 2D position error of scanning stage is analyzed by 1D heterodyne interferometer calibrator, which can measure 1D linear position error, straightness error, yaw error and pitch error, and perpendicular error. The 2D position error is evaluated by diagonal measurement (ISO230-6). The yaw error and perpendicular error are compensated on the base stage of scanning axis. And, the horizontal straightness error is compensated by cross axis compensation. And, dynamic motion error in scanning motion is analyzed.

• Journal of the Optical Society of Korea
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• 제15권4호
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• pp.394-397
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• 2011

For the purpose of fabricating off-axis aspheric optics, we propose an 8-axis-polishing machine combined with a testing tower whose height is up to 9 m. The proposed polishing machine was designed and analyzed by using a well-known finite element method. The eight axes of the machine have a synchronized motion generated by a computer, and each axis was calibrated by a heterodyne laser interferometer or an optical encoder. After calibration, the maximum positioning error of the machine was less than 2 ${\mu}m$ within a whole 2 m ${\times}$ 2 m area. A typical fabrication result of a ${\phi}1.5$ m concave mirror was also described in this manuscript.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.216-219
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• 2005

In precision length measurements using optical interferometry based on homodyne or heterodyne principles, it is crucial to have frequency-stabilized monochromatic light sources. To the end, we investigate the possibility of utilizing the optical comb constituted by ultrashort femtosecond pulse lasers generated from a gain medium of titanium-doped aluminium oxide $(Ti:Al_2O_3)$. The optical comb is stabilized by locking to the caesium atomic clock, which allows all the modes of the comb to maintain an extremely high level of frequency stabilization to precision of one part in $10^{16}$. Then, high precision length measurements are realized by extracting a single or group of particularly wanted optical frequency components or by adopting a third-party light source locked to the comb. Required measurement system setup will be presented in detail along with experimental results.

• 한국정밀공학회지
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• 제22권4호
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• pp.84-91
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• 2005

We measured the pitch of one-dimensional (ID) grating specimens using a metrological atomic force microscope (M-AFM). The ID grating specimens a.e often used as a magnification standard in nano-metrology, such as scanning probe microscopy (SPM) and scanning electron microscopy (SEM). Thus, we need to certify the pitch of grating specimens fur the meter-traceability in nano-metrology. To this end, an M-AFM was setup at KRISS. The M-AFM consists of a commercial AFM head module, a two-axis flexure hinge type nanoscanner with built-in capacitive sensors, and a two-axis heterodyne interferometer to establish the meter-traceability directly. Two kinds of ID grating specimens, each with the nominal pitch of 288 nm and 700 nm, were measured. The uncertainty in pitch measurement was evaluated according to Guide to the Expression of Uncertainty in Measurement. The pitch was calculated from 9 line scan profiles obtained at different positions with 100 ㎛ scan range. The expanded uncertainties (k = 2) in pitch measurement were 0.10 nm and 0.30 nm for the specimens with the nominal pitch of 288 nm and 700 nm. The measured pitch values were compared with those obtained using an optical diffractometer, and agreed within the range of the expanded uncertainty of pitch measurement. We also discussed the effect of averaging in the measurement of mean pitch using M-AFM and main components of uncertainty.

• 한국정밀공학회지
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• 제22권12호
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• pp.51-60
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• 2005

This paper describes a robust control scheme for high-speed and long stroke scanning motion of high precision linear motor system consisting of linear motor, air bearing guide and position measurement system using heterodyne interferometer. Nowadays, semiconductor process and inspection of wafer or LCD need high speed and long travel length for their high throughput and extremely small velocity fluctuations or tracking errors. In order to satisfy these conditions, linear motor system are widely used because they have large thrust force and do not need motion conversion mechanisms such as ball screw, rack & pinion or capstan with which the system are burdened. However linear motors have a problem called force ripple. Force ripple deteriorates the tracking performances and makes periodic position errors. So, force ripple must be compensated. To maximize the tracking performance of linear motor system, we propose the control scheme which is composed of a robust control method, Time Delay Controller (TDC) and a feedforward control method, Zero Phase Error Tracking Control (ZPETC) for accurate tracking a given trajectory and an adaptive force ripple compensation (AFC) algorithm fur estimating and compensating force ripple. The adaptive ripple compensation is continuously refined on the basis of tracking error. Computer simulation results based on modeled parameters verify the effectiveness of the proposed control scheme for high-speed, long stroke and high precision scanning motion and show that the proposed control scheme can achieve a sup error tracking performance in comparison to conventional TDC control.

• 한국광학회지
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• 제9권6호
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• pp.362-367
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• 1998

중심거리측정법은 서로 붙어있는 두 입자 중심점간의 거리를 측정하여 입자의 지름을 구하는 방법이다. 표면장력에 의해 배열이 형성된 시편 입자들의 초점군을 투과식 광학현미경에 평행 레이저광을 입사시켜 얻어내고 CCD 카메라로 영상을 받아 전산 분석하였다. Global lab image라는 영상처리 프로그램으로 초점들의 중심점을 찾고 붙어있는 입자들의 중심점간 거리를 화소(CCD 카메라의 pixel)단위로 계산하였으며, 화소의 좌표는 레이저 간섭계로 변위를 읽는 이송대를 이용하여 교정하였다. 기존의 측정방법을 개선하여 빠른 시간에 간편하게 측정하면서도 표준입자의 배율고정에 충분한 불확도를 얻을 수 있었다. 본 실험에는 NIST 인증물질인 3$\mu\textrm{m}$와 10$\mu\textrm{m}$ 폴리스티렌구(NIST SRM 1962, 1960)를 측정하였으며, 1%이하의 불확도(신뢰도 99% 수준)로써 NIST 결과와비교하였다.

• 전자공학회논문지D
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• 제36D2호
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• pp.20-30
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• 1999

85-115GHz 주파수 범위의 100GHz 대역과 125-175GHz 주파수 범위를 갖는 150GHz 대역을 동시에 관측하기 위한 헤테로다인 방식의 이중채널 수신기에 사용될 단측파대 여파기의 이론을 제시하고 이를 근거로 설계, 제작한 후 성능을 측정하였다. 여파기의 이론은 편파 회전 특성을 갖는 Martin-Puplett 간섭계의 원리를 도입하여 전개하였다. 설계와 제작은 빔의 전송손실을 최소화하고 중간주파수와 관련된 경로차를 고려하여 두 빔의 결합 손실을 최소화하는데 주안점을 두었다. 두 주파수 대역을 동시에 관측하기 위해서는 우주전파가 각각 다른 빔의 경로로 전송되어야 하므로 두 개의 단측파대 여파기가 각각 제작되었다. 주파수에 따른 여파기의 이론적인 최적 경로차와 중간주파수 및 대역폭을 계산하였다. 네트웍 분석기와 자체에서 제작한 빔 측정장치를 이용하여 여파기의 성능을 측정하고 이론치와 비교하였다. 주파수에 따른 최적 경로차에 대한 이론치와 측정치를 비교해 본 결과 거의 일치하는 특성을 보여 제시된 설계 이론의 타당성과 정밀한 제작이 검증되었고, 두 대역 여파기의 이미지 제거비는 약 22dB이상을 갖는 우수한 성능을 보였다. 제작된 여파기는 이중채널 수신기에 설치되어 우주전파를 성공적으로 관측함으로서 그 성능이 입증되었다.