• ETRI Journal
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• v.28 no.4
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• pp.529-532
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• 2006

This letter describes a compact printed helical resonator and its application to a microwave oscillator circuit implemented in coplanar waveguide (CPW) technology. The high quality (Q)-factor and spurious-free characteristic of the resonator contribute to the phase noise reduction and the harmonic suppression of the resulting oscillator circuit, respectively. The designed resonator showed a loaded Q-factor of 180 in a chip area of only 40% of the corresponding miniaturized hairpin resonator without any spurious resonances. The fully planar oscillator incorporated with this resonator showed an additional phase noise reduction of 10.5 dB at a 1 MHz offset and a second harmonic suppression enhancement of 6 dB when compared to those of a conventional CPW oscillator without the planar helical resonator structure.

• Journal of electromagnetic engineering and science
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• v.6 no.3
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• pp.160-164
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• 2006

This paper describes a compact printed helical resonator and its application to a microwave oscillator circuit implemented in coplanar waveguide(CPW) technology. The high Q-factor and spurious-free characteristic of the resonator contribute to the phase noise reduction and the harmonic suppression of the resulting oscillator circuit, respectively. The designed resonator resonating at the frequency of 5.5 GHz showed a loaded Q of 180 in a chip area of only 40 % of the corresponding miniaturized hairpin resonator without any spurious resonances. The fully planar oscillator incorporated with this resonator showed additional phase noise reduction of 10.5 dB at 1 MHz offset and a second harmonic suppression enhancement of 6 dB when compared to those of a conventional CPW oscillator without the planar helical resonator(PHR) structure.

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.364-366
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• 1997

An experimental helical resonator plasma system that can be applied to the next generation semiconductor processing was fabricated and its characteristics was investigated. Helical resonator plasma can operate both in a capacitive and an inductive mode. Such sources will produce an extended plasma for the capacitive mode and a plasma concentrated in the resonator for the inductive mode. Plasma parameters were measured with Double Langmuir Probes. Plasma densities of $10^{11}{\sim}10^{12}cm^{-3}$ were produced in argon for pressure in the $2{\sim}120\;mTorr$ range. From the results, we conclude that helical resonator plasma can be applied to the next generation semiconductor processing.

• Proceedings of the IEEK Conference
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• 2000.06b
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• pp.282-285
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• 2000

Four helical resonators are distributed in a 2 ${\times}$ 2 array by modifying upper part of the conventional reactive ion etching(RIE) type LCD etcher in order to prepare a large area plasma source. Since the resonance condition of the RF signal to the helical antenna, one RF power supply is used for delivering the power efficiently to all four helical resonators without an impedance matching network Previous work of 2 ${\times}$ 2array inductively coupled plasma(ICP)requires one matching circuit to each ICP antenna for more efficient power deliverly Distributions of ion density and electron temperature are measured in terms of chamber pressure, gas flow rate and RF power . By adjusting the power distribution among the four helical resonator units, argon plasma density of higher than 10$\^$17/㎥ with the uniformity of better than 7％ can be obtained in the 620 ${\times}$ 620$\textrm{mm}^2$ chamber.

• Journal of the Korean Vacuum Society
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• v.8 no.2
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• pp.172-179
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• 1999

The axial distributions of plasma density in a helical resonator plasma with the external magnetic field have been measured using Langmuir probes. Net RF power is set to 200W and chamber pressure is varied from 0.4 mTorr to 100mTorr there are three kinds of eternal magnetic field structure applied on the helical resonator plasma. One is a uniform magnetic field, the second is a positive gradient magnetic field and the third is a negative gradient magnetic field. In the three magnetic field structures, the negative gradient magnetic field is found to show the highest increase in plasma density on the substrate compared with other magnetic structures. Plasma density profile in helical resonator is well consistent with electromagnetic field pattern obtained by computer simulation. It is also found that axial magnetic fields do not affect plasma density distribution in the plasma reactor region, but induce the increase of plasma density in the process chamber region. In order to avoid the nonuniformity of radial density profile, weak magnetic fields under 100G are applied.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.5
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• pp.309-314
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• 1999

The magnetized helical resonator plasma etcher has been built. Electron density and temperature were measured as functions of rf source power, axial magnetic field, and pressure. The results show electron density increases as the magnetic field increases and reached $2\times1012cm^{-3}$,/TEX>. The oxide etch rate and selectivity to polysilicon were investigated as the above mentioned conditions and self-bias voltage. We can obtain the much improved oxide etch selectivity to polysilicon (60 : 1) by applying the external axial weak magnetic field in magnetized helical resonator plasma etcher.

• Proceedings of the Materials Research Society of Korea Conference
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• 1996.05a
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• pp.49-49
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• 1996

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.22 no.9
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• pp.820-826
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• 2011

In this paper, an efficiency improvement method in the wireless power transfer system based on magnetic resonance is proposed. A combined helical-spiral structure is adopted for self-resonant coil and source and device coils are designed using circular loop structure. The proposed resonator utilizing combined helical-spiral structure yields 13 % efficiency improvement over that of an existing helical type resonator when the transmitting and receiving coils are separated by 120 mm. In addition, the size can be reduced by 33 % comparing to the previous resonator.

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.376-378
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• 1997

Plasma density and its axial distribution and uniformity on the substrate in a helical resonator plasma in the external magnetic field have been measured using Langmuir probes. Net RF power is set to 200W and chamber pressure is varied from $1{\times}10^{-1}Torr$ to $1{\times}10^{-4}Torr$. There are three kinds of external magnetic field structure applied on the helical resonator plasma. One is a uniform magnetic field, another is a plus gradient magnetic field and the third is a minus gradient magnetic field. Of the three magnetic field structure, the minus gradient magnetic field is found to show the highest increase in plasma density on the substrate compared with other magnetic structures. In order to avoid radial density ununiformity, weak magnetic fields under 100Gauss are applied.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.10 no.10
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• pp.2639-2645
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• 2009

This paper describes a CPW oscillator using a spiral resonator. Spiral resonators are very useful in design CPW oscillators since they show a relatively higher Q than CPW hairpin and helical resonators. Prior to the design of oscillators, three CPW resonators are designed and compared. Electromagnetic (EM) simulation are performed for an improved design in design the CPW resonators and oscillators. Three oscillators are designed at 5.7 GHz using the mentioned CPW resonators. The measured output power of three CPW oscillators using the helical, hairpin, and spiral resonators are 2.55 dBm, 2.64 dBm, and 4.98 dBm, respectively. In addition, the size of three resonators are $102.15mm^2,\;130.05mm^2,\;80.625mm^2$, respectively, so it is proven that the proposed CPW oscillator using the spiral resonator has a smaller size than the others.