• 제목/요약/키워드: heat treatment heat source

검색결과 212건 처리시간 0.025초

Hot Wall Epitaxy(HWE)법에 의한 Cdln2S4 단결정 박막 성장과 열처리 효과 (The Effect of Thermal Annealing and Growth of Cdln2S4 Single Crystal Thin Film by Hot Wall Epitaxy)

  • 홍광준;이관교
    • 한국전기전자재료학회논문지
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    • 제15권11호
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    • pp.923-932
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    • 2002
  • A stoichiometric mixture of evaporating materials for CdIn$\_$2/S$\_$4/ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, CdIn$\_$2/S$\_$4/ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by hot wall epitaxy(HWE) system. The source and substrate temperatures were 630 $\^{C}$ and 420 $\^{C}$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of CdIn$\_$2/S$\_$4/ single crystal thin films measured from Hall effect by van der Pauw method are 9.01$\times$10$\^$16/ cm$\^$-3/ and 219 ㎠/V$.$s at 293 K, respectively. From the optical absorption measurement, the temperature dependence of energy band gap on CdIn$\_$2/S$\_$4/ single crystal thin films was found to be Eg(T) = 2.7116 eV - (7.74 $\times$ 10$\^$-4/ eV) T$\^$2//(T+434). After the as-grown CdIn$\_$2/S$\_$4/ single crystal thin films was annealed in Cd-, S-, and In-atmospheres, the origin of point defects of CdIn$\_$2/S$\_$4/ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of V$\_$cd/, V$\_$s/, Cd$\_$int/ and S$\_$int/ obtained by PL measurements were classified as donors or accepters type. And we concluded that the heat-treatment in the S-atmosphere converted CdIn$\_$2/S$\_$4/ single crystal thin films to an optical p-type. Also, we confirmed that In in CdIn$\_$2/S$\_$4/GaAs did not from the native defects because In in CdIn$\_$2/S$\_$4/ single crystal thin films existed in the form of stable bonds.

Hot Wall Epitaxy(HWE)법에 의한 CdGa2Se4 단결정 박막 성장과 열처리 효과 (The Effect of Thermal Annealing and Growth of CdGa2Se4 Single Crystal Thin Film by Hot Wall Epitaxy)

  • 홍명석;홍광준
    • 한국전기전자재료학회논문지
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    • 제20권10호
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    • pp.829-838
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    • 2007
  • The stochiometric mix of evaporating materials for the $CdGa_2Se_4$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $CdGa_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $630^{\circ}C$ and $420^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD).The carrier density and mobility of $CdGa_2Se_4$ single crystal thin films measured from Hall effect by van der Pauw method are $8.27{\times}10^{17}\;cm^{-3},\;345\;cm^2/V{\cdot}s$ at 293 K. respectively. The temperature dependence of the energy band gap of the $CdGa_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $Eg(T)\;=\;2.6400\;eV\;-\;(7.721{\times}10^{-4}\;eV/K)T^2/(T+399\;K)$. After the as-grown single crystal $CdGa_2Se_4$ thin films were annealed in Cd-, Se-, and Ga -atmospheres, the origin of point defects of single crystal $CdGa_2Se_4$ thin films has been investigated by PL at 10 K. The native defects of $V_{Cd}$, $V_{Se}$, $Cd_{int}$, and $Se_{int}$ obtained by PL measurements were classified as donors or accepters. We concluded that the heat-treatment in the Cd-atmosphere converted single crystal $CdGa_2Se_4$ thin films to an optical p-type. Also, we confirmed that Ga in $CdGa_2Se_4/GaAs$ did not form the native defects because Ga in single crystal $CdGa_2Se_4$ thin films existed in the form of stable bonds.

광발광 측정법에 의한 $AgGaS_2$ 단결정 박막의 점결함 연구 (Study on Point Defect for $AgGaS_2$ Single Crystal Thin film Obtained by Photoluminescience Measurement Method)

  • 홍광준;김경석
    • 비파괴검사학회지
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    • 제25권2호
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    • pp.117-126
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    • 2005
  • [ $AgGaS_2$ ] 단결정 박막을 수평 전기로에서 합성한 $AgGaS_2$ 다결정을 증발원으로하여, hot wall epitaxy(HWE) 방법으로 증발원과 기판 (반절연성 -GaAs (100))의 온도를 각각 $590^{\circ}C,\;440^{\circ}C$로 고정하여 성장하였다. 이때 단결정 박막의 결정성은 광발광 스펙트럼과 이중결정 X-선 요동곡선 (DCRC)으로 부터 구하였다. $AgGaS_2$의 광흡수 스펙트럼으로부터 구한 온도에 의존하는 에너지 밴드갭 $E_g(T)$는 Varshni. 공식에 fitting한 결과 $E_g(T)=2.7284 eV-(8.695{\times}10^{-4}eV/K)T^2/T(T+332K)$를 잘 만족하였다. 성장된 $AgGaS_2$, 단결정 박막을 Ag, Ga, S분위기에서 각각 열처리하여 10K에서 photoluminescience(PL) spectrum을 측정하여 점 결함의 기원을 알아보았다. PL 측정으로부터 얻어진 $V_{Ag},\;V_s,\;Ag_{int}$, 그리고 $S_{int}$는 주개와 받개로 분류되어졌다. $AgGaS_2$ 단결정 박막을 Ag분위기에서 열처리하면 n형으로 변환됨을 알 수 있었다. 또한, Ca 분위기에서 열처리하면 열처리 이전의 PL스펙트럼을 보이고 있어서, $AgGaS_2$ 단결정 박막에서 Ga은 안정된 결합의 형태로 있기 때문에 자연 결함의 형성에는 관련이 없음을 알았다.

Hot Wall Epitaxy(HWE)법으로 성장된 CuGaSe$_2$ 단결정 박막 성장의 열처리 효과 (The Effect of Thermal Annealing for CuGaSe$_2$ Single Crystal Thin Film Grown by Hot Wall Epitaxy)

  • 박창선;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.352-356
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    • 2003
  • A stoichiometric mixture of evaporating materials for $CuGaSe_2$ single crystal am films was prepared from horizontal electric furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CuGaSe_2$, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.615\;{\AA}\;and\;11.025\;{\AA}$, respectively. To obtain the single crystal thin films, $CuGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $450^{\circ}C$, respectively, The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuGaSe_2$ single crystal thin films measured with Hall effect by van der Pauw method are $9.24{\times}10^{16}\;cm^{-3}$ and $295\;cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CuGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)\;:\;1.7998\;eV\;-\;(8.7489\;{\times}\;10^{-4}\;eV/K)T^2(T\;+\;335\;K)$. After the as-grown $CuGaSe_2$ single crystal thin films was annealed in Cu-, Se-, and Ga-atmospheres, the origin of point defects of $CuGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{CU}$, $V_{Se}$, $CU_{int}$, and $Se_{int}$, obtained by PL measurements were classified as a donors or accepters type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuGaSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that Ga in $CuGaSe_2/GaAs$ did not form the native defects because Ga in $CuGaSe_2$ single crystal thin films existed in the form of stable bonds.

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Hot Wall Epitaxy (HWE)법에 의한 $CuInSe_2$ 단결정 박막 성장과 점결함 (Growth and photoluminescience propeties for $CuInSe_2$ single crystal thin film by Hot Wall Epitaxy)

  • 홍광준;이상열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.111-112
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    • 2005
  • To obtain the single crystal thin films, $CuInSe_2$, mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wail epitaxy (HWE) system. The source and substrate temperatures were 620$^{\circ}C$ and 410$^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobilily of $CuInSe_2$ single crystal thin films measured with Hall effect by van der Pauw method are $9.62\times10^{16}$ $cm^{-3}$ and $296cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the CulnSe$_2$ obtained from the absorption spectra was well described by the Varshni's relation E$_g$(T) = 1.1851 eV - ($8.99\times10^{-4}$ ev/K)T$_2$/(T + 153K). After the as-grown $CuInSe_2$ single crystal thin films was annealed in Cu-, Se-, and In-atmospheres the origin of point defects of $CuInSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The nat ive defects of V$_{Cu}$, $V_{Se}$, Cu$_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or accepters type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuInSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that In in $CuInSe_2$/GaAs did not form the native defects because In in $CuInSe_2$ single crystal thin films existed in the form of stable bonds.

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선식에서 분리한 Enterobacter sakazakii의 복합동정 및 RAPD를 이용한 genotyping (Multiple Confirmation and RAPD-genotyping of Enterobacter sakazakii Isolated from Sunsik)

  • 최재원;김윤지;이종경;김영호;권기성;황인균;오세욱
    • 한국식품과학회지
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    • 제40권1호
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    • pp.101-105
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    • 2008
  • 시판되고 있는 선식 원료를 수거하여 최근 새로운 식중독균으로 보고되고 있는 Enterobacter sakazakii 분리 실험을 실시하였다. 그 결과 총 23종의 선식 원료 중 8개의 선식 원료에서 E.sakazakii로 추정되는 콜로니를 분리할 수 있었으며 API 20E kit를 이용하여 1차적으로 동정한 결과, 다시마 분말, 멸치 분말, 현미 분말, 청국장 분말 및 멥쌀 분말에서 E. sakazakii를 분리할 수 있었다. 이후 3 종의 primer를 이용한 PCR을 실시하여 2차적으로 동정하였다. 또한, 분리된 균주에 대한 RAPD-PCR을 실시하여 최종적으로 8종의 분리균으로 molecular typing을 할 수 있었다.

HEMM Al-SiO2-X 복합 분말을 Al-Mg 용탕에서 자발 치환반응으로 제조된 Al-Si-X/Al2O3 복합재료의 조직 및 마멸 특성 (Microstructure Evaluation and Wear Resistance Property of Al-Si-X/Al2O3 Composite by the Displacement Reaction in Al-Mg Alloy Melt using High Energy Mechanical Milled Al-SiO2-X Composite Powder)

  • 우기도;김동건;이현범;문민석;기웅;권의표
    • 한국재료학회지
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    • 제18권6호
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    • pp.339-346
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    • 2008
  • Single-crystal $ZnIn_2S_4$ layers were grown on a thoroughly etched semi-insulating GaAs (100) substrate at $450^{\circ}C$ with a hot wall epitaxy (HWE) system by evaporating a $ZnIn_2S_4$ source at $610^{\circ}C$. The crystalline structures of the single-crystal thin films were investigated via the photoluminescence (PL) and Double-crystal X-ray rocking curve (DCRC). The temperature dependence of the energy band gap of the $ZnIn_2S_4$ obtained from the absorption spectra was well described by Varshni's relationship, $E_g(T)=2.9514\;eV-(7.24{\times}10^{-4}\;eV/K)T2/(T+489K)$. After the as-grown $ZnIn_2S_4$ single-crystal thin films was annealed in Zn-, S-, and In-atmospheres, the origin-of-point defects of the $ZnIn_2S_4$ single-crystal thin films were investigated via the photoluminescence (PL) at 10 K. The native defects of $V_{Zn}$, $V_S$, $Zn_{int}$, and $S_{int}$ obtained from the PL measurements were classified as donor or acceptor types. Additionally, it was concluded that a heat treatment in an S-atmosphere converted $ZnIn_2S_4$ single crystal thin films into optical p-type films. Moreover, it was confirmed that In in $ZnIn_2S_4$/GaAs did not form a native defects, as In in $ZnIn_2S_4$ single-crystal thin films existed in the form of stable bonds.

LiF:Mg,Cu,Na,Si TL 소자의 선량계적 특성 (Dosimetric Properties of LiF:Mg,Cu,Na,Si TL pellets)

  • 남영미;김장렬;장시영
    • Journal of Radiation Protection and Research
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    • 제26권1호
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    • pp.7-12
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    • 2001
  • 최근 개발된 방사선량 측정용 LiF:Mg,Cu,Na,Si TL 소자의 글로우 곡선, 방출스펙트럼, 광자에 대한 선량의존성, 에너지의존성 및 페이팅 등과 같은 물리적 및 선량계적 특성들을 연구하였다. LiF:Mg,Cu,Na,Si TL 소자는 LiF:Mg,Cu,Na,Si TL 분말에 압력을 가한 후 소결하는 방법으로 제조되었다. 방사선에 대한 특성을 알아보기 위하여 광자선 조사는 한국원자력연구소의 X선 발생 장치 및 $^{137}Cs$ ${\gamma}$선 원격조사장치를 이용하였으며, 사용된 광자선 에너지 범위는 20-662keV, 선량 범위는 $10^{-6}-10^{-2}\;Gy$이었다. 글로우 곡선은 수동형의 TLD 판독장치 (System 310, Teledyne)로 질소를 흘리면서 선형적인 가열률로 측정하였으며, TL 강도는 글로우 곡선을 전체 적분한 면적으로 평가하였다. $5^{\circ}C\;s^{-1}$의 선형적인 가열률로 측정한 글로우 곡선은 5개의 피크들로 분리되었으며, $234^{\circ}C$에 나타나는 주피크의 활성화에너지는 2.34 eV, 진동수인자는 $1.00{\times}10^{23}$이고, 방출스펙트럼은 410nm를 중심으로한 단일한 분포로 나타났다. 선량의존성은 100Gy 이상까지 선형성을 나타내었으며, $^{137}Cs$에 대한 저에너지 광자의 상대적인 에너지 반응값은 20% 범위 이내였다. 또한 실온에서 1년간 보관하였을 때, 시간경과에 따른 TL 감도의 감소가 거의 없는 좋은 페이딩 특성을 보였다.

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태양전지용 $CuGaSe_2$ 단결정 박막 성장과 열처리 효과 (The Effect of Thermal Annealing and Growth of $CuGaSe_2$ Single Crystal Thin Film for Solar Cell Application)

  • 홍광준;유상하
    • 한국태양에너지학회 논문집
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    • 제23권2호
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    • pp.59-70
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    • 2003
  • A stoichiometric mixture of evaporating materials for $CuGaSe_2$ single crystal thin films was prepared from horizontal electric furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CuGaSe_2$, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.615{\AA}$ and $11.025{\AA}$, respectively. To obtain the single crystal thin films, $CuGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $450^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuGaSe_2$ single crystal thin films measured with Hall effect by van der Pauw method are $5.01\times10^{17}cm^{-3}$ and $245cm^2/V{\cdot}s$ at 293K. respectively. The temperature dependence of the energy band gap of the $CuGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T)=1.7998 eV-($8.7489\times10^{-4}$ eV/K)$T^2$/(T+335K). After the as-grown $CuGaSe_2$ single crystal thin films was annealed in Cu-, Se-, and Ga-atmospheres, the origin of point defects of $CuGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{CU},\;V_{Se},\;Cu_{int}$ and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuGaSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that Ga in $CuGaSe_2$/GaAs did not form the native defects because Ga in $CuGaSe_2$ single crystal thin films existed in the form of stable bonds.

분젠 예혼합 화염을 활용한 아산화질소 처리기술에 관한 연구 (Treatment Technology of N2O by using Bunsen Premixed Flame)

  • 진시영;서재근;김희재;신승환;남동현;김성민;김대해;윤성환
    • 해양환경안전학회지
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    • 제27권1호
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    • pp.153-160
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    • 2021
  • 아산화질소(Nitrous oxide, N2O)는 지구온난화 물질의 하나로 이산화탄소에 비해 지구온난화효과가 310배 강하고 분해하는데 120년이 소요되기 때문에 오존층 파괴에 주범으로 알려져 있다. 따라서 본 연구에서는 N2O를 저감하기 위해 고온 열분해 기술을 적용하여 N2O 저감 공정에서 발생하는 NOx 배출 특성에 대해 조사하였다. 고온 유동장을 형성하기 위해 동축 분젠 예혼합 화염을 열원으로 채택하였으며 실험 변수로는 노즐출구속도, 동축류 속도 및 N2O 희석률로 설정하였다. 실험 결과, NO 생성률은 노즐출구속도 및 동축류 유량에 관계없이 N2O 희석률이 증가함에 따라 증가하였다. N2O의 경우에는 연소 불안정성(Kelvin Helmholtz 불안정)이 억제된 안정된 예혼합 화염에서 다량으로 배출되었는데, 이는 화염 면 부근에서 감소된 N2O의 체류시간으로 인해 열분해 시간이 충분하지 않기 때문인 것으로 사료된다. 따라서 N2O의 저감 효율을 증진시키기 위해서는 K-H 불안정성이 발생되는 노즐출구속도를 선정하여 화염 면 부근에서 발생되는 와류(toroidal vortex) 형태의 유동 구조를 형성하는 것이 N2O의 체류시간을 증가시키는데 효과적인 것으로 판단된다.