• 제목/요약/키워드: guardring

검색결과 4건 처리시간 0.023초

Spiral 인덕터 간 격리방법에 따른 Electromagnetic 커플링 효과 (EM Coupling Effect of sprint inductors by isolation methode in standard CMOS process)

  • 최문호;김한석;정성일;김영석
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.91-92
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    • 2005
  • The electromagnetic coupling effect in standard CMOS process is simulated and evaluated. EM coupling transfer characteristic between planar spiral inductors by isolation methode in standard CMOS have simulated and measured. Measurement results show that suppression of EM coupling effect by ground guardring. The evaluated structures are fabricated 1P5M(one poly, five metal) 0.25um standard CMOS process. These measurement results provide a isolation design guidelines in standard CMOS process for Rf coupling suppression.

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CMOS 공정을 이용한 2차원 SSIMT의 특성 (Characteristics of the 2-D SSIMT using a CMOS Process)

  • 송윤귀;류지구
    • 한국전기전자재료학회논문지
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    • 제20권8호
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    • pp.697-700
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    • 2007
  • A novel 2-Dimensional Suppressed Sidewall Injection Magnetotransistor (SSIMT) with high linearity has been fabricated on the standard CMOS technology and experimentally verified. The novel 2-Dimensional SSIMT overcomes the restriction of the standard CMOS technology. Experimental results of the fabricated 2-Dimensional SSIMT show that the variation of each collector output currents are extremely linear as a function of magnetic field from -200mT to 200mT at $I_B = 1 mA,\;V_{CE} = 5 V\;and\;V_{SE} = 5 V$. The relative sensitivity shows up to 13 %/T. The measured nonlinearity of the fabricated device is about 0.9%.

선형 저밀도 폴리에틸렌과 에틸렌 비닐아세테이트의 혼합비에 따른 체적고유저항 특성 (The Volume Resistivity Properties due to Mixture ratio of Linear Low Density Polyethylene and Ethylene Vinyl Acetate)

  • 박정구;육영수;신현택;신종열;이충호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.552-555
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    • 1999
  • In this paper, the volume resistivity properties due to mixture ration of linear low density polyethylene(LLDPE) and ethylene vinyl acetate(EVA) are studied. Electrodes is composed of upper electrode 37(mm $\Phi$), guardring electrode(inner 55(mm $\Phi$ ), and lower electrode 87(mm $\Phi$ In order to measure the leakage current, We used electrometer and stable oven with temperature controller. Measurement method is to measure the leakage current of next specimen after applying the voltage according to 'Step Apply Methods' for ten minutes. In order to measure the volume resistivity properties, the micro electrometer is used, the range of temperature and applying voltage are 25 to 100[$^{\circ}C$] to 100[V] respectively.

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CMOS 공정에 의한 2차원 SSIMT의 제작 및 특성 (Fabrication and characteristics of 2-Dimensional SSIMT using a CMOS Process)

  • 송윤귀;이지현;최영식;김남호;류지구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.443-446
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    • 2003
  • A 2-Dimensional SSIMT(Suppressed Sidewall Injection Magnetotransistor) sensor with high linearity is presented in this paper. The prototype is fabricated by using the Hynix $0.6{\mu}m$ CMOS Process. The fabricated SSIMT shows that the variation of each collectors current are extremely linear by varing the magnetic induction from -200mT to 200mT at $I_B\;:\;1000{\mu}A,\;V_{CE}\;=\;5V\;and\;V_{SUB}\;=\;5V$. The relative sensitivity is up to 13%/T. At B = 0, magnetic offset is about 40mT, there relative sensitivity is 4.72%/T. The nonlinearity of the fabricated 2-D SSIMT is measured about 1.2%.

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