• Journal of the Optical Society of Korea
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• 제1권2호
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• pp.67-73
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• 1997

Light wave diffraction from multiple superposed volume gratings is inestigated using a perturbative iteration method of the integral equation of Maxwell's wave equation. The host material and index gratings are anisotropic and non-coplanar multiple volume gratings are considered. In this method, the paraxial approximation and lack of backward scattering in conventional coupled mode theory are not assumed. Systematic analysis of anisotropic wave diffraction due to multiple noncoplanar volume index gratings is performed in increasing level of diffraction orders corresponding to successive iterations.

• 한국광학회:학술대회논문집
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• 한국광학회 1989년도 제4회 파동 및 레이저 학술발표회 4th Conference on Waves and lasers 논문집 - 한국광학회
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• pp.193-195
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• 1989

A simple fabrication technique of diffraction gratings with short periods is presented. We can see that the monitoring of diffracted light from photoresist gratings during the development process provides optimum conditions for exposure and development processes. With this technique reproducibility and high quality of diffraction gratings is expected.

• 한국의상디자인학회지
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• 제6권2호
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• pp.15-20
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• 2004

These days are referred to as 'the times of textile fashion,' owing to the emphasis on textile design in the fashion industry. Accordingly, apparel companies have increased their interests in developing new types of textiles to overcome the limits of style and silhouette. Now the ultra-fashion of textile, a new way of process and design development, is given much more attention. A Moire interference pattern has a longer wavy circle of interference, an effect of intensity interference, than one made by piling more than one reflecting plate or transmitting plate. Till now, Moire interference patterns have been used to confirm scientific theory and to measure the structure of a body or a subject in areas such as physics and medical science. Work has also been done on the Moire interference effects on TV screens said to cause dizziness and eye strain. This study focuses on the new types of textiles by creating the appearance of the Moire phenomena. Contrary to the present usual stationary patterns of textiles, it is a varying pattern according to the different gratings, different angles, piling gratings, and the movements of the human bodies. In the preceding study, we observed Moire fringes formed by overlapping two different or same kinds of gratings such as parallel line gratings, square gratings, conic gratings and semicircular gratings and tried to find a promising possibility of new textiles through the method of clothes design simulation.

• 전자공학회논문지D
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• 제35D권8호
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• pp.82-88
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• 1998

We propose and design a new type of anrrow band-pass optical filter based on two fiber gratings with different reflection wavelength. The ripples occur in the spectra of the filter with two uniform fiber gratings. Our simulation results also show that the ripples disappear with the fiber gratings apodized to both gaussian and hyperbolic tangent function. The hyperbolic tangent function seems to be a better apodization function for improving the filter's performance in terms of narrow pass bandwidth and high transmission.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1999년도 추계종합학술대회 논문집
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• pp.309-312
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• 1999

Fiber Bragg gratings have many applications such as fiber sensors, band-stop filters, add-drop filters, and mode convertors. In this paper, we present the fabrication method of various fiber Bragg gratings by using continuous wave UV-Argon(frequency-doubled Argon) laser. In our experiments, hydrogenation of fibers was used to enhance photosensitivity of fiber. And we fabricated fiber gratings by the phase mask method.

• 한국정밀공학회지
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• 제24권9호
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• pp.68-75
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• 2007

The pitch and orthogonality of two-dimensional (2D) gratings have been measured by using a metrological atomic force microscope (MAFM) and measurement uncertainty has been analyzed. Gratings are typical standard artifacts for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2D gratings, it is important to certify the pitch and orthogonality of 2D gratings accurately for nano-metrology using precision microscopes. In the measurement of 2D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme was required to overcome some limitations of current MAFM such as nonnegligible thermal drift and slow scan speed. Two kinds of 2D gratings, each with the nominal pitch of 300 nm and 1000 nm, were measured using line scans for the pitch measurement of each direction. The expanded uncertainties (k = 2) of measured pitch values were less than 0.2 nm and 0.4 nm for each specimen, and those of measured orthogonality were less than 0.09 degree and 0.05 degree respectively. The experimental results measured using the MAFM and optical diffractometer were coincident with each other within the expanded uncertainty of the MAFM. As a future work, we also proposed another scheme for the measurements of 2D gratings to increase the accuracy of calculated peak positions.

• International Journal of Precision Engineering and Manufacturing
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• 제9권2호
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• pp.18-22
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• 2008

The pitch and orthogonality of two-dimensional (2-D) gratings were measured using a metrological atomic force microscope (MAFM), and the measurement uncertainty was analyzed. Gratings are typical standard devices for the calibration of precision microscopes, Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2-D gratings, it is important to certify the pitch and orthogonality of such gratings accurately for nanometrology. In the measurement of 2-D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme is required to overcome limitations such as thermal drift and slow scan speed. Two types of 2-D gratings with nominal pitches of 300 and 1000 nm were measured using line scans to determine the pitch measurement in each direction. The expanded uncertainties (k = 2) of the measured pitch values were less than 0.2 and 0.4 nm for each specimen, and the measured orthogonality values were less than $0.09^{\circ}$ and $0.05^{\circ}$, respectively. The experimental results measured using the MAFM and optical diffractometer agreed closely within the expanded uncertainty of the MAFM. We also propose an additional scheme for measuring 2-D gratings to increase the accuracy of calculated peak positions, which will be the subject of future study.

• 천문학회보
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• 제36권2호
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• pp.150.2-150.2
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• 2011

Volume Phase Holographic (VPH) gratings are getting more popular as dispersion elements in spectrographs. High efficiency, compact configuration, and easy handling are driving many visual spectrographs to use VPH gratings for their main dispersers or for their cross-dispersers in higher resolution spectrographs. More recently, VPH gratings are being adopted in near-infrared by some spectrographs and by a number of next generation instrument projects. IGRINS (Immersion Grating Infrared Spectrograph) uses a VPH grating as a cross-disperser in each H or K band arm. J or H band performance of VPH gratings has been proven by other instruments. But K-band VPH gratings are new to the field. In this presentation, we are going to present test results we have got so far for verification of H-band VPH gratings and development of K-band VPH gratings.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 추계종합학술대회 논문집
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• pp.371-374
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• 1998

The Scattering of arbitrarily shaped gratings covered with dielectric slab is considered. The total field in each region is expressed in terms of incident field and scattered field by induced currents on the surface of the grating. Some numerical results is presented nd compared with previous ones in cases of several gratings.

• Journal of the Optical Society of Korea
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• 제18권6호
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• pp.685-690
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• 2014

Microholographic gratings were prepared on an aluminum oxide ($Al_2O_3$) surface using a 140-fs pulse at a center wavelength of 800 nm. The $Al_2O_3$ was deposited on a silicon wafer and on indium tin oxide glass to a thickness of approximately 25 nm using an atomic layer deposition process. The silicon wafer substrate exhibited reflection-type gratings that were measured as a function of the incidence angle. The diffraction efficiency of the fabricated gratings was measured, with a maximum diffraction efficiency of 45% at an incidence angle of approximately $30^{\circ}$.