• 한국초전도ㆍ저온공학회논문지
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• 제20권3호
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• pp.5-10
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• 2018

This study presents that various grain boundary junctions are prepared by controlling the seed orientation combined with an artificial hole in a melt process REBCO bulk superconductor. Large grain YBCO superconductors have been fabricated with various grain boundary junctions that the angle between the grain boundary and the <001> axis of Y123 crystal is $0^{\circ}$, $30^{\circ}$ and $45^{\circ}$, respectively. The presence of the artificial hole is beneficial for the formation of clean grain boundary junction and single peak trapped magnetic field profiles have been obtained. Artificial hole makes two growth fronts meet at a point on a periphery of the artificial hole. The presence of artificial hole is not likely to affect on the distribution of Y211 particles. The newly formed <110> facet lines are explained by the formation of new Y123/liquid interface with (010) crystallographic plane.

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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• pp.185-188
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• 1999

Biepitaxial Y$_1Ba_2Cu_3O_{7-x}$ (YBCO) and La$_{0.2}Sr_{0.8}MnO_3$ (LSMO) thin films have been prepared on SrTiO$_3$ buffer layer and MgO seed layer grown on Al$_2O_3$(11${\bar{2}}$0)substrates by dc-sputtering with hollow cylindrical targets, respectively. We charaterized Josephson properties and significantly large magnetoresistance in YBCO and LSMO films with 45$^{\circ}$ grain boundary junction, respectively. The observed working voltage (I$_cR_n$) at 77 K in grain boundary junction was below 10${\mu}$V, which is typical I$_cR_n$ value of single biepitaxial Josephson junction. The field magnetoresistance ratio (MR) of LSMO grain boundary juncoon at 77K was enhanced to 13%, which it was significant MR value with high magnetic field sensitivity at a low field of 250 Oe. These results indicate that inserting the insulating layer instead of the grain boundary layer with metallic phase can be possible to apply a new SIS Josephson junction and a novel magnetic device using spin-polarized tunneling junction.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 1997년도 춘계학술대회논문집
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• pp.73-76
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• 1997

Nanocrystalline materials have been modeled as a mixture of the crystallite and the grain boundary phases. The mechanical property has been calculated using the rule of mixtures based on the volume fractions. The critical grain size concept suggested by Nieh and Wadsworth and porous material model suggested by Lee and Kim were applied to the calculation. The theoretical results fit very well with the experimental values

• 한국자기학회:학술대회 개요집
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• 한국자기학회 1999년도 춘계연구발표회 논문개요집
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• pp.26-27
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• 1999

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 2000년도 High Temperature Superconductivity Vol.X
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• pp.293-297
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• 2000

Multiseeding with (100)/(100) grain junctions of top-seeded melt growth (TSMG) processed YBCO superconductors was studied. The effect of the number of seeds and the distance between two seeds on the levitation forces and the trapped magnetic fields of the TSMG-processed YBCO samples was investigated. Multiple seeding shortened the processing time for the fabrication of TSMC-processed YBCO superconductors. The large magnetic field was trapped at the grain junction when two seeds was placed without spacing, while the amount of the magnetic field decreased when the seed distance increased. This is attributed to the increased amount of the residual melt phases around the grain junctions.

• 한국세라믹학회지
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• 제42권5호
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• pp.366-370
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• 2005

Single gram-boundary varistors were fabricated using hydrothermal and vapor phase grown ZnO single crystals and their voltage-current relation was studied. The single crystal bonded single junction varistor showed various voltage-current relationship and different breakdown voltage of 0.24-3V. The different types of non-linear current voltage behaviors was attributed to the variation of electrical conductivity in ZnO single crystals.

• E2M - 전기 전자와 첨단 소재
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• 제8권6호
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• pp.737-743
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• 1995

Two step RTD(Rapid Thermal Diffussion) of P into silicon wafer using tungsten halogen lamp was used to fabricated very shallow n$^{+}$p junction. 1st RTD was performed in the temperature range of 800.deg. C for 60 see and the heating rate was in the 50.deg. C/sec. Phosphrous solid source was transfered on the silicon surface. 2nd RTD process was performed in the temperature range 1050.deg. C, 10sec. Using 2 step RTD we can obtain a shallow junction 0.13.mu.m in depth. After RTD, the Ti-silicide process was performed by the two step RTA(Rapid Thermal Annealing) to reduced the electric resistance and to improve the n$^{+}$p junction diode. The titanium thickness was 300.angs.. The condition of lst RTA process was 600.deg. C of 30sec and that of 2nd RTA process was varied in the range 700.deg. C, 750.deg. C, 800.deg. C for 10sec-60sec. After 2 step RTA, sheet resistance was 46.ohm../[]. Ti-silicide n+p junction diode was fabricated and I-V characteristics were measured.red.

• 한국재료학회지
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• 제3권5호
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• pp.553-561
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• 1993

본 연구에서는 입계의 성질을 이용한 PTCR 재료에 입계 modifier로서 $Bi_2O_3$를 첨가하고 입계의 미세구조와 결함농도를 변화시켜 이에 따른 소결 및 전기적 특성변화를 TMA, XRD, 복합 임피던스방법 등을 이용하여 해석하였다. 실험 결과 Y이 도우핑된 $BaTiO_3$PTCR 재료에 $Bi_2O_3$를 첨가하였을때 약 0.1mol%까지 고용이 되는 것으로 밝혀졌다. $Bi_2O_3$를 고용한계 이하로 첨가시에는 생성되는 vacancy등의 결함으로 말미암아 $Y-BaTiO_3$의 치밀화가 촉진되었으나, 그 이상 첨가하면 치밀화 뿐만 아니라 결정립 성장도 억제되었다. $Bi_2O_3$의 첨가량에 따라 계내에 존재하는 각 이온의 반경, 결함 반응식 및 격자 탄성 변형 에너지 등을 고려하면 $Y-BaTiO_3$결정립 내부에 Ba와 Ti vacancy가 동시에 생길 수 있어 고온저항이 높아짐을 알 수 있었다. BN은 $BaTiO_3$에 고용이 되지 않는 것으로 밝혀졌으며 $B_2O_3$를 주성분으로한 액상형성으로 인하여 저온에서의 급격한 치밀화가 관찰되었다. 또 Ba-Y-Ti-B-O의 비정질 상이 tripie junction에 존재함으로써 상온저항이 크게 변화하였으며, PTCR jump도 높아졌다.

• 한국전기전자재료학회논문지
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• 제14권2호
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• pp.111-116
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• 2001

Poly-Si TFT's(Polysilicon thin filmtransistors) have been actively studied due to their applications in active matrix liquid crystal displays and active pull-up devices of CMOS SRAM's. For such applications, the leakage current has to be in the range of sub-picoampere. However, poly-Si TFT's suffer from anomalous high leakage currents, which is attributed to the emission of the traps present at gain boundaries in the drain junction. The leakage current has been analyzed by the field emission via grain-boundary traps and thermionic field emission over potential barrier located at the grain boundary. We found that the models proposed before are not consistent with the experimental results at far as drain-offset poly-Si TFT's we fabricated concern. In this paper, leakage current of drain-offset poly-Si TFT's with different offset lengths was studied. A conduction model based on the thermionic emission of the tunneling electrons is developed to identify the leakage mechanism. It was found that the effective grain size of the drain-offset region is important factor in the leakage current. A good agreement between experimental and simulated results of the leakage current is obtained.

• 한국진공학회지
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• 제4권2호
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• pp.194-200
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• 1995

2-3nm의 공간분해능을 갖는 전자에너지손실분광법(Electron Energy Loss Spectroscopy, EELS)을 이용하여, 전기적 특성조사된 YBa2Cu3O7-$\delta$ 고온초전도체 쌍결정의 결정경계(grain boundary)에서 산소의 조성변화를 조사하였다. Misorientation angle이 $14^{\circ}$, $28^{\circ}$,$ 30^{\circ}$인 3개의 쌍결정 중에서 Josephson junction 특성을 보인 $28^{\circ}$ 및 $30^{\circ}$결정경계에서의 oxygen 1s absorption edge는 결정내부에서의 oxygen 1s absorption edge와 매우 다름을 알 수 있었다. 이는 결정경계에서의 산소조성이 결정내부에 비해 낮음을 의미하며, 그 영역이 결정경계 부근 20-40nm로, coherence length에 비해 큼을 알 수 있다. 반면에, flux pinningxmr성을 보인 $14^{\circ}$결정경계에서의 oxygen 1s absorption edge는 결정내부에서와 별 차이를 보이지 않았다. 따라서 일반적으로 관찰되어온, misorientation angle이 큰 결정경계에서의 Josephson junction 특성은 결정경계 부근에서 산소의 조성이 낮아지는데에 기인하며, 그 원인은 결정경계면을 통해 산소가 out-diffusion되기 때문인 것으로 생각된다.