• 제목/요약/키워드: gallium-nitride(GaN)

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High-Frequency GaN HEMTs Based Point-of-Load Synchronous Buck Converter with Zero-Voltage Switching

  • Lee, Woongkul;Han, Di;Morris, Casey T.;Sarlioglu, Bulent
    • Journal of Power Electronics
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    • 제17권3호
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    • pp.601-609
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    • 2017
  • Gallium nitride (GaN) power switching devices are promising candidates for high switching frequency and high efficiency power conversion due to their fast switching, low on-state resistance, and high-temperature operation capability. In order to facilitate the use of these new devices better, it is required to investigate the device characteristics and performance in detail preferably by comparing with various conventional silicon (Si) devices. This paper presents a comprehensive study of GaN high electron mobility transistor (HEMT) based non-isolated point-of-load (POL) synchronous buck converter operating at 2.7 MHz with a high step-down ratio (24 V to 3.3 V). The characteristics and performance of GaN HEMT and three different Si devices are analytically investigated and the optimal operating point for GaN HEMT is discussed. Zero-voltage switching (ZVS) is implemented to minimize switching loss in high switching frequency operation. The prototype circuit and experimental data support the validity of analytical and simulation results.

계단형 게이트 구조를 이용한 AlGN/GaN HEMT의 전류-전압특성 분석 (Analysis of Current-Voltage characteristics of AlGaN/GaN HEMTs with a Stair-Type Gate structure)

  • 김동호;정강민;김태근
    • 대한전자공학회논문지SD
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    • 제47권6호
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    • pp.1-6
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    • 2010
  • 본 논문에서는 고출력 고이득 특성을 갖는 고전자이동도 트랜지스터 (high-electron mobility transistor, HEMT)를 구현하기 위하여 계단형 구조의 게이트 전극을 갖는 AlGaN/GaN HEMT를 제안하였고, 소자의 DC 특성의 향상 가능성을 확인하기 위하여 단일 게이트 전극을 갖는 HEMT 및 field-plate 구조의 게이트 전극을 갖는 HEMT 소자와의 특성을 비교 분석하였다. 상용 시뮬레이터를 통해 시뮬레이션 결과, 본 연구에서 제안한 계단형 구조의 게이트 전극을 갖는 AlGaN/GaN HEMT는 드레인 전압의 인가 시, 소자의 내부에서 발생하는 전계가 단일 게이트 전극을 갖는 HEMT에 비해 약 70% 정도 감소하는 특성을 갖는 것을 확인하였고, 전달이득 (transconductance, $g_m$) 특성 역시 단일 게이트 전극구조의 HEMT나 field-plate 구조를 삽입한 HEMT에 비해 약 11.4% 정도 향상된 우수한 DC 특성을 갖는 것을 확인하였다.

상시불통형 p-AlGaN-게이트 질화갈륨 이종접합 트랜지스터의 게이트 전압 열화 시험 (Reliability Assessment of Normally-off p-AlGaN-gate GaN HEMTs with Gate-bias Stress)

  • 금동민;김형탁
    • 전기전자학회논문지
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    • 제22권1호
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    • pp.205-208
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    • 2018
  • 본 연구에서는 상시불통형 p-AlGaN-게이트 질화갈륨(GaN) 이종접합 트랜지스터의 신뢰성 평가를 위한 가속열화 시험 조건을 수립하기 위해 게이트 전압 열화 시험을 진행하였다. 상시불통형 트랜지스터의 동작 조건을 고려하여 기존 상시도통형 쇼트키-게이트 소자평가에 사용되는 게이트 역전압 시험과 더불어 순전압 시험을 수행하여 열화특성을 분석하였다. 기존 상시도통형 소자와 달리 상시불통형 소자에서는 게이트 역전압 시험에 의한 열화는 관찰되지 않은 반면, 게이트 순전압 시험에서 심한 열화가 관찰되었다. 상시불통형 질화갈륨 전력 반도체 소자의 신뢰성 평가에 게이트 순전압 열화 시험이 포함되어야 함을 제안한다.

KOH계열 수용액을 이용한 GaN 박막의 photo-assisted 식각 특성 (Photo-assisted GaN wet-chemical Etching using KOH based solution)

  • 이형진;송홍주;최홍구;하민우;노정현;이준호;박정호;한철구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.339-339
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    • 2010
  • Photo-assisted wet chemical etching of GaN thin film was studied using KOH based solutions. A $2{\mu}m-2{\mu}m$ titanium line-and-space pattern was used as a etching mask. It is found that the etching characteristics of the GaN thin film is strongly dependent on the pattern direction by unisotropic property of KOH based solution. When the pattern was aligned to the [$11\bar{2}0$] directions, ($10\bar{1}n$)-facet is revealed constructing V-shaped sidewalls.

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유기금속기상증착법에 의한 InGaN/GaN 양자점 구조의 성장거동 (Growth Behavior of InGaN/GaN Quantum Dots Structure Via Metal-organic Chemical Vapor Deposition)

  • 정우광;장재민;최승규;김진열
    • 한국재료학회지
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    • 제18권10호
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    • pp.535-541
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    • 2008
  • Growth behavior of InGaN/GaN self-assembled quantum dots (QDs) was investigated with respect to different growth parameters in low pressure metalorganic chemical vapor deposition. Locally formed examples of three dimensional InGaN islands were confirmed from the surface observation image with increasing indium source ratio and growth time. The InGaN/GaN QDs were formed in Stranski-Krastanow (SK) growth mode by the continuous supply of metalorganic (MO) sources, whereas they were formed in the Volmer-Weber (V-W) growth mode by the periodic interruption of the MO sources. High density InGaN QDs with $1{\sim}2nm$ height and $40{\sim}50nm$ diameter were formed by the S-K growth mode. Dome shape InGaN dots with $200{\sim}400nm$ diameter were formed by the V-W growth mode. InN content in InGaN QDs was estimated to be reduced with the increase of growth temperature. A strong peak between 420-460 nm (2.96-2.70 eV) was observed for the InGaN QDs grown by S-K growth mode in photoluminescence spectrum together with the GaN buffer layer peak at 362.2 nm (3.41 eV).

이상적인 열방산 효과를 위한 GaN on Diamond 구조의 제안과 접합매개층 종류에 따른 열전달 시뮬레이션 비교 (Suggestion and Design of GaN on Diamond Structure for an Ideal Heat Dissipation Effect and Evaluation of Heat Transfer Simulation as Different Adhesion Layer)

  • 김종철;김찬일;양승한
    • 한국전기전자재료학회논문지
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    • 제30권5호
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    • pp.270-275
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    • 2017
  • Current progress in the development of semiconductor technology in applications involving high electron mobility transistors (HEMT) and power devices is hindered by the lack of adequate ways todissipate heat generated during device operation. Concurrently, electronic devices that use gallium nitride (GaN) substrates do not perform well, because of the poor heat dissipation of the substrate. Suggested alternatives for overcoming these limitations include integration of high thermal conductivity material like diamond near the active device areas. This study will address a critical development in the art of GaN on diamond (GOD) structure by designing for ideal heat dissipation, in order to create apathway with the least thermal resistance and to improve the overall ease of integrating diamond heat spreaders into future electronic devices. This research has been carried out by means of heat transfer simulation, which has been successfully demonstrated by a finite-element method.

6-18 GHz Reactive Matched GaN MMIC Power Amplifiers with Distributed L-C Load Matching

  • Kim, Jihoon;Choi, Kwangseok;Lee, Sangho;Park, Hongjong;Kwon, Youngwoo
    • Journal of electromagnetic engineering and science
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    • 제16권1호
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    • pp.44-51
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    • 2016
  • A commercial $0.25{\mu}m$ GaN process is used to implement 6-18 GHz wideband power amplifier (PA) monolithic microwave integrated circuits (MMICs). GaN HEMTs are advantageous for enhancing RF power due to high breakdown voltages. However, the large-signal models provided by the foundry service cannot guarantee model accuracy up to frequencies close to their maximum oscillation frequency ($F_{max}$). Generally, the optimum output load point of a PA varies severely according to frequency, which creates difficulties in generating watt-level output power through the octave bandwidth. This study overcomes these issues by the development of in-house large-signal models that include a thermal model and by applying distributed L-C output load matching to reactive matched amplifiers. The proposed GaN PAs have successfully accomplished output power over 5 W through the octave bandwidth.

AlGaN/GaN Based Ultra-wideband 15-W High-Power Amplifier with Improved Return Loss

  • Jeong, Jin-Cheol;Jang, Dong-Pil;Shin, Dong-Hwan;Yom, In-Bok;Kim, Jae-Duk;Lee, Wang-Youg;Lee, Chang-Hoon
    • ETRI Journal
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    • 제38권5호
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    • pp.972-980
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    • 2016
  • An ultra-wideband microwave monolithic integrated circuit high-power amplifier with excellent input and output return losses for phased array jammer applications was designed and fabricated using commercial $0.25-{\mu}m$ AlGaN/GaN technology. To improve the wideband performance, resistive matching and a shunt feedback circuit are employed. The input and output return losses were improved through a balanced design using Lange-couplers. This three-stage amplifier can achieve an average saturated output power of 15 W, and power added efficiency of 10% to 28%, in a continuous wave operation over a frequency range of 6 GHz to 18 GHz. The input and output return losses were demonstrated to be lower than -15 dB over a wide frequency range.

GaN-FET 기반의 고효율 및 고전력밀도 경계전류모드 능동 클램프 플라이백 컨버터 최적설계 (Optimal Design of GaN-FET based High Efficiency and High Power Density Boundary Conduction Mode Active Clamp Flyback Converter)

  • 이창민;구현수;지상근;유동균;강정일;한상규
    • 전력전자학회논문지
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    • 제24권4호
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    • pp.259-267
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    • 2019
  • An active clamp flyback (ACF) converter applies a clamp circuit and circulates the energy of leakage inductance to the input side, thereby achieving a zero-voltage switching (ZVS) operation and greatly reducing switching losses. The switching losses are further reduced by applying a gallium nitride field effect transistor (GaN-FET) with excellent switching characteristics, and ZVS operation can be accomplished under light load with boundary conduction mode (BCM) operation. Optimal design is performed on the basis of loss analysis by selecting magnetization inductance based on BCM operation and a clamp capacitor for loss reduction. Therefore, the size of the reactive element can be reduced through high-frequency operation, and a high-efficiency and high-power-density converter can be achieved. This study proposes an optimal design for a high-efficiency and high-power-density BCM ACF converter based on GaN-FETs and verifies it through experimental results of a 65 W-rated prototype.