• Journal of the Microelectronics and Packaging Society
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• v.8 no.3
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• pp.69-75
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• 2001

Photoimageable thick film technology is a new technology in that the lithography process such as exposure and development is applied to the conventional thick film process. Line resolution of 25 $\mu\textrm{m}$ width and 25 $\mu\textrm{m}$ space could be obtained by laminating green sheet, printing photoimageable Ag paste, exposing the test patterns, developing, and co-firing. In case of using the alumina substrate, 20 $\mu\textrm{m}$ fine line could be also obtained by similar process. Test results showed that exposing power density and developing time were the most important processing parameters for the fine line formation. Microstrip and series gap resonators with well-defined line morphology and good transmission characteristics in high frequency were formed by this new technology, and thereby dielectric constant and loss of test substrate were calculated.

• Proceedings of the IEEK Conference
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• 2000.06d
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• pp.198-201
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• 2000

We propose a method for analyzing the document structure. This method consists of two processes, segmentation and classification. The segmentation first divides a low resolution image, and then finely splits the original document image using projection profiles. The classification deterimines each segmented region as text, line, table or image. An experiment with 238 documents images shows that the segmentation accuracy is 99.1% and the classification accuracy is 97.3%.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.31A no.7
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• pp.69-75
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• 1994

A very fine pattern formation process using double exposure is investigated, which can overcome the resolution limit of optical wafer stepper. The very fine pattern can be obtained by moving the edge profile of large pattern by means of moving the stepper stage. The simulation results show that the light transmittance decrease bellow 9%, and the contrast increase to 16.6% for the 0.3$\mu$m photoresist pattern exposeed by the double exposure using i-line wafer stepper. And the experimental results show that fine photoresist pattern as short as 0.2$\mu$m can be obtained without a loss of photoresist thickness. Also, it proves that the depth of focus for 0.3$\mu$m pattern is longer than $1.5\mu$m. And, the very fine negative photoresist pattern was formmed by using the double exposure technique and the image reversal process.

• Journal of the Korean Ceramic Society
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• v.44 no.3 s.298
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• pp.157-161
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• 2007

Line width under $100\;{\mu}m$ with good resolution is difficult to achieve using conventional thick-film process utilizing screen printing method. However combined with lithography technology finer line and space for miniaturization and highly integrated package is achievable. In this study, photosensitive Ag paste of optimum formulation used for thick film lithography technology was fabricated by various Ag powder, glass powder and additives. As the result, line width of $30\;{\mu}m$ with good definition and reduced mismatch during co-firing with LTCC substrate was acquired. Formulated Ag paste was used to pattern embedded fine line inductor with over 90% yield.

• Proceedings of the Korea Institute of Convergence Signal Processing
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• 2006.06a
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• pp.25-28
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• 2006

In this paper, we say the shading correction system supporting multi-resolution for camera. The shading effect is caused by non-uniform illumination, non-uniform camera sensitivity, or even dirt and dust on glass (lens) surfaces. In general this shading effect is undesirable [1]. Eliminating it is frequently necessary for subsequent processing and especially when quantitative microscopy is the fine goal. The proposed system is available on thirty nine kinds of image resolutions scanned by interlaced and progressive type. Moreover, the system is using various continuous quadratic equations instead of using the piece-wise linear curve which is composed of multiple line segments. Finally, the system could correct the correct effect without discontinuity in any image resolution. The proposed system is also experimentally demonstrated with Xilinx Virtex FPGA XCV2000E- 6BG5560 and the TV set.

• Journal of The Korean Astronomical Society
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• v.29 no.spc1
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• pp.217-218
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• 1996

The results of the Crab pulsar observations with the photometrical MANIA (Multichannel Analysis of Nanosecond Intensity Alterations) complex at the 6-m telescope are presented. More than 12 millions photons in UBVR-bands simultaneously with time resolution of $10^{-7}s$ were detected. Using the original software for search for optical pulsar period, we obtained the light curves of the object with time resolution of about 3.3 ${\mu}s$. Their detailed analysis gives the spectral change during pulse and subpulse, the shape of the pulse peaks, which are plateaus (with the duration of about 50${\mu}s$ for the main pulse), limits for an amplitude of fine temporal (stochastic and regular) structure of pulse and sub pulse and the interpulse space intensity. The results of CCD-spectroscopy of the Crab pulsar show that its summarized spectrum is flat. There are no lines, neither emission nor absorbtion ones. Upper limit for line intensity or depth is $3.5\%$ with the confidence probability of $95\%$.

• The KIPS Transactions:PartA
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• v.10A no.3
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• pp.247-254
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• 2003

This paper describes a Delay Locked Loop (DLL) with low supply voltage and wide lock range for Synchronous DRAM which employs Double Data Rate (DDR) technique for faster data transmission. To obtain high resolution and fast lock-on time, a new type of phase detector is designed. The new counter and lock indicator structure are suggested based on the Dual-clock dual-data Flip Flop (DCDD FF). The DCDD FF reduces the size of counter and lock indicator by about 70%. The delay line is composed of coarse and fine units. By the use of fast phase detector, the coarse delay line can detect minute phase difference of 0.2 nsec and below. Aided further by the new type of 3-step vernier fine delay line, this DLL circuit achieves unprecedented timing resolution of 25psec. This DLL spans wide locking range from 500MHz to 500MHz and generates high-speed clocks with fast lock-on time of less than 5 clocks. When designed using 0.25 um CMOS technology with 1.8V supply voltage, the circuit consumes 32mA at 500MHz locked condition. This circuit can be also used for other applications as well, such as synchronization of high frequency communication systems.

• The Bulletin of The Korean Astronomical Society
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• v.38 no.2
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• pp.87.2-87.2
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• 2013

We studied a fine-scale half ring-like structure around a pore seen from the high spectral and the high spatial resolution data. Our observations were carried out using the Fast Imaging Solar Spectrograph (FISS) and the InfraRed Imaging Magnetograph (IRIM) installed at the 1.6 meter New Solar Telescope of Big Bear Solar Observatory (BBSO) on 2012 July 19. During the observations, we found a fine-scale half ring-like structure located very close to a pore (~0.4 arcsec apart from the pore). It was seen in the far wing images of the $H{\alpha}$ and Ca II $8542{\AA}$ lines, but it was not seen in the line center images of two lines. The length of the structure is about 4200 km and the width is about 350 km. We determined its line-of-sight velocity using the Doppler shift of the centroid of the Ti II line ($6559.6{\AA}$, close to the $H{\alpha}$ line) and determined horizontal velocity using the NAVE method. we also investigated the magnetic configurations using the Stokes I, Q, U, and V maps of the IRIM. As a results, we found that it has a high blue-shift velocity (~2km) faster than the photospheric features and has a strong horizontal component of the magnetic field. Based on our findings, we suggest that it is associated with small flux emergence, which occurs very close to the pore. Even though it is very small structure, this kind of magnetic configuration can be in chare of the upper chromosphere heating, especially above the pore.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.19 no.4
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• pp.553-561
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• 2010

In flat panel display or semiconductor industries, they install the equipments with fine line width and high throughput for fabrication and inspection. The equipments are required to have the linear stage which can position the work-piece with high speed, fine resolution on wide range of motion. In this paper, a precision planar linear XY stage is proposed. The stage has a symmetric planar window configuration and is guided by air-bearings on granite plate. The symmetric planar window configuration makes the stage has robustness against dynamic and thermal disturbances. The air-bearings let the stage move smooth on straight guide bar and flat granite surface. The stage is actuated by linear motor with Halbach magnet array (HMA). HMA generates more confined magnetic flux than conventional array. The linear motors are optimized by using sequential quadratic programming (SQP) with the several constraints that are thermal dissipation, required power, force ripple and so on. The planar linear XY stage with the symmetric planar configuration and the linear motors is implemented and then the performance such as force ripple, resolution and stroke are evaluated.

• Journal of electromagnetic engineering and science
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• v.6 no.2
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• pp.110-116
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• 2006

A reflective array type surface acoustic wave(SAW) dispersive delay line(DDL) with high time-bandwidth at the V/UHF-band is designed and fabricated for compressive receiver applications. This type of the SAW DDL has the properties of the relative bandwidth of 20 %, the time delay of 49.89 usec, the insertion loss of 38.5 dB and the side lobe rejection of 39 dB. In comparison with a commercial SAW DDL, the insertion loss, amplitude ripple and side lobe rejection are improved by $1.5dB{\pm}0.6dB$ and 4 dB respectively. Using the fabricated SAW DDL, the prototype of the compressive receiver is developed. It is composed of RF converter, fast tunable LO, chirp LO, A/D converter, signal processing unit and control unit. This prototype system shows a fine frequency resolution of below 30 kHz with high scan rate.