• Title/Summary/Keyword: film thickness

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Numerical Study on Optical Characteristics of Multi-Layer Thin Film Structures Considering Wave Interference Effects (파동간섭효과를 고려한 다층 박막 구조의 광학특성에 대한 수치해석 연구)

  • Shim, Hyung-Sub;Lee, Seong-Hyuk
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.5
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    • pp.272-277
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    • 2006
  • The present study is devoted to investigate numerically the optical characteristics of multi-layer thin film structures such as $Si/SiO_2\;and\;Ge/Si/SiO_2$ by using the characteristics transmission matrix method. The reflectivity and the absorptivity rate for thin film structures are estimated for different incident angles of rays and various film thicknesses. In addition, the influence of wavelength on optical characteristics related to complex refractive index is examined. It is found that such wave-like characteristics are observed in predicting reflectivities and depends mainly on film thickness. Moreover, the present study predicts the film thickness for ignoring wave interference effects, and it also discusses the fundamental physics behind optical and energy absorption characteristics appearing in multi-layer thin film structures.

Effects of interfacial shear stress on laminar-wavy film flow (층류-파동 액막 유동에 대한 계면 전단응력의 영향)

  • Kim, Byeong-Ju;Jeong, Eun-Su;Kim, Jeong-Heon
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.22 no.7
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    • pp.992-1000
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    • 1998
  • In the present study the behavior of laminar-wavy film flowing down a vertical plate was studied analytically. The effects of film Reynolds number and interfacial shear stress on the mean film thickness, wave amplitude, wave length, and wave celerity were analysed. The anayltical results on the periodic-wave falling film showed good agreements with experimental data for Re < 100. As the film Reynolds number increased, mean film thickness, wave amplitude, and wave celerity increased, but wave length decreased. Depending on the direction of interfacial shear stress, the shape of wavy interface was disturbed significantly, especially for the intermediate-wave. As the interfacial shear stress increased, for the periodic-wave film, wave amplitude and wave celerity increased, but mean film thickness and wave length decreased.

The Study of Transmittance and Conductivity in ZnO/Ag Multilayer Films (ZnO/Ag Multilayer의 투과율과 전도성에 관한 연구)

  • Kim, Yun-Hae;Kim, Do-Wan;Murakami, Ri-Ichi;Moon, Kyung-Man;Lee, Sung-Yul
    • Journal of Ocean Engineering and Technology
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    • v.25 no.1
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    • pp.39-43
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    • 2011
  • This study has lowered the specific resistance by coating a thin film layer of Ag, playing the role of the electron donor on the ZnO that is used usefully for the transparent conductive oxides. Presently, this study has examined the transmittance and electric characteristics according to the thickness of the Ag thin film layer. Also, this study has observed the transmittance and electric characteristics according to the uppermost ZnO thin film layer of ZnO/Ag/ZnO symmetric film and has conducted the theoretical investigation. In order to observe the transmittance and electric characteristics according to the thickness of the Ag thin film layer and the uppermost ZnO thin film layer, this study conducted the film deposition at room temperature while making use of the DC magnetron sputtering system. In order to see the changes in the thickness of the Ag thin film layer, this study coated a thin film while increasing by 4nm; and, in order to see the changes in the thickness of uppermost ZnO thin film layer, it performed the thin film coating by increasing by 5nm. From the experimental result, the researchers observed that the best transmittance could be obtained when the thickness of the Ag thin film layer was 8nm, but the resistance and mobility increased as the thickness got larger. On the other hand, when the thickness of the uppermost ZnO thin film layer was 20nm, the experiment yielded the best transmittance with excellent electric characteristics. Also, when compared the ZnO/Ag asymmetric film with the ZnO/Ag/ZnO symmetric film, the ZnO/Ag asymmetric film showed better transmittance and electric characteristics.

Electrical and interface characteristics of BST thin films grown by RF magnetron reactive sputtering (RF magnetron reactive sputtering 법으로 제작한 BST 박막의 전기적 및 계면 특성에 관한 연구)

  • 강성준;장동훈;유영섭
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.5
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    • pp.33-39
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    • 1998
  • The BST (Ba$_{1-x}$ Sr$_{x}$TiO$_{3}$)(50/50) thin film has been grown by RF magnetron reactive sputtering and its characteristics such as crystallization, surface roughness, and electrical properties have been investigated with varying the film thickness. The crystallization and surface roughness of BST thin film are investigated by using XRD and AFM, respectively The BST thin film anealed at 800.deg. C for 2 min has pure perovskite structure and good surface roughness of 16.1.angs.. We estimate that the thickness and dielectric constant of interface layer between BST film and electrode are 3nm and 18.9, respectively, by measuring the capacitance with various film thickness. As the film thickness increases form 80nm to 240nm, the dielectric constant at 10kHz increases from 199 to 265 and the leakage current density at 200kV/cm decreases from 0.682.mu.A/cm$^{2}$ to 0.181 .mu.A/cm$^{2}$. In the case of 240nm-thick BST thin film, the charge storage density and leakage current density at 5V are 50.5fC/.mu.m$^{2}$ and 0.182.mu.A/cm$^{2}$, respectively. The values indicate that the BST thin film is a very useful dielectric material for the DRAM capacitor.or.

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Evaporation Process Modeling for Large OLED Mass-fabrication System (대면적 유기EL 양산 장비 개발을 위한 증착 공정 모델링)

  • Lee, Eung-Ki
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.4 s.17
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    • pp.29-34
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    • 2006
  • In order to design an OLED(Organic Luminescent Emitting Device) evaporation system, geometric simulation of film thickness distribution profile is required. For the OLED evaporation process, thin film thickness uniformity is of great practical importance. In this paper, a geometric modeling algorithm is introduced for process simulation of the OLED evaporating process. The physical fact of the evaporating process is modeled mathematically. Based on the developed method, the thickness of the thin-film layer can be successfully controlled.

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Laminar Film Condensation Model of Pure Steam in a Vertical Tube (수직관 내 순수 증기의 층류 액막 응축 모델)

  • Kim, Dong Eok
    • The KSFM Journal of Fluid Machinery
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    • v.17 no.3
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    • pp.33-40
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    • 2014
  • In this study, a new model for calculating the liquid film thickness and condensation heat transfer coefficient in a vertical condenser tube is proposed by considering the effects of gravity, liquid viscosity, and vapor flow in the core region of the flow. In order to introduce the radial velocity profile in the liquid film, the liquid film flow was regarded to be in Couette flow dragged by the interfacial velocity at the liquid-vapor interface. For the calculation of the interfacial velocity, an empirical power-law velocity profile had been introduced. The resulting liquid film thickness and heat transfer coefficient obtained from the proposed model were compared with the experimental data from other experimental study and the results obtained from the other condensation models. In conclusion, the proposed model physically explained the liquid film thinning effect by the vapor shear flow and predicted the condensation heat transfer coefficient from experiments reasonably well.

Thickness-dependent Film Resistance of Thin Porous Film (얇은 다공 구조 박막에서의 두께에 따른 박막 저항 변화)

  • Song, A-Ree;Kim, Chul-Sung;Kouh, Tae-Joon
    • Journal of the Korean Magnetics Society
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    • v.22 no.1
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    • pp.6-10
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    • 2012
  • We have observed the change in the film resistance of thin nickel film up to 13 nm, which is deposited on a porous anodic alumina substrate, prepared by two-step anodization technique under phosphoric acid. The resulting film grows as a porous film, following the pore structure on the surface of the alumina substrate, and the value of the resistance lies above $150k{\Omega}$ within the range of thickness studied here, decreasing very slowly with the film thickness. The observed resistance value is much higher than the reported value of a uniform film at the same thickness. Since the observed value of the surface coverage with the pores is smaller than the critical value, expected from the percolation theory, the pore structure limits the formation of conduction channel across the film. In addition, by comparing to the typical model of thickness-dependent resistivity, we expect that the scattering at the pore edge further increases the film resistance.

Effect of Roundness Error of a Crank Pin Bearing for a Marine Engine on the Minimum Film Thickness (박용엔진 크랭크 핀 베어링의 형상오차가 최소유막두께에 미치는 영향)

  • Ha, Yang-Hyup;Shin, In-Dong;Lee, Sang-Min;Lee, Seung-Jun;Lee, Deug-Woo
    • Tribology and Lubricants
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    • v.27 no.5
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    • pp.256-263
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    • 2011
  • Bearings of marine engines are operated under severe conditions because of dynamic load and low sliding speed. This paper deals with lubrication analysis of a crank pin bearing for a marine diesel engine. Journal center locus and oil film thickness are compared of crank pin bearing. In the past researches, journal bearings have been studied only about the surface of bearing. In addition to this conventional research, this paper analyzes the effect of roundness error of a journal and a bearing on the minimum film thickness. Numerical analysis has been studied by using Reynolds equation and also Half-Sommerfeld condition is applied as boundary condition. Futhermore, this study investigates the effect of roundness error change on the minimum film thickness. The results demonstrate that the bigger amplitude of roundness error yields, the lower minimum oil film thickness is. In comparison to previous research considered a journal and a bearing individually, the results considering a journal and a bearing together show that amplitude of roundness error of journal has very little effect on the minimum oil film thickness.

Numerical Analysis for Conductance Probes, for the Measurement of Liquid Film Thickness in Two-Phase Flow

  • No, Hee-Cheon;F. Mayinger
    • Proceedings of the Korean Nuclear Society Conference
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    • 1995.10a
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    • pp.450-455
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    • 1995
  • A three-dimensional numerical tool is developed to calculate the potential distribution, electric field, and conductance for any types of conductance probes immersed in the wavy liquid film with various shapes of its free surface. The tool is validated against various analytical solutions. It is applied to find out the characteristics of the wire-wire probe, the flush-wire probe and the flush-flush probe in terms of resolution, linearity, and sensitivity. The wire-wire probe shows high resolution and excellent linearity for various film thickness, but comparably low sensitivity for low film thickness fixed. The flush-wire probe shows good linearity and high sensitivity for varying film thickness, but resolution degrading with an increase in film thickness. In order to check the applicability of the three types of probes in the real situation, the Korteweg-de Vries(KdV) two-dimensional solitary wave is simulated. The wire-wire probe is strongly affected by the installation direction of the two wires; when the wires are installed perpendicularly to the flow direction, the wire-wire probe shows large distortion of the solitary wave. In order to measure the transverse profile of waves, the wire-wire probes and the flush-wire probes are required to be separately installed 2mm and 2mm, respectively.

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