• Title/Summary/Keyword: film coefficient

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A Study on the Dynamic Characteristics of Truncated Cone Type Squeeze Film Damper Bearing and Rotor System (절단 원추형 Squeeze Film Damper 베어링과 회전축계의 동특성에 관한 연구)

  • 윤석철
    • Journal of the Korean Society of Safety
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    • v.12 no.1
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    • pp.9-18
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    • 1997
  • This paper is a study on the dynamic characteristics of truncated cone type squeeze film damper(SFD) bearing and rotor system. This model can alter the radial oil film gap which Is Important to the performance of rotor-bearing system and manufactured easily to change the shape concept of traditional circular type SFD bearing. In theoretical analysis, the oil film pressure distribution, the oil film force, the film damping coefficient and the eccentricity ratio, etc. were induced with regard to the film inertia effect. The film damping coefficients and optimum design parameters are calculated. When unbalance parameter U is greater than 0.2, the nonlinear vibration such as "Jump" phenomena appears in the vicinity of rotor critical speed. At this time, the increases of bearing parameter U, journal distance S, Reynolds number Re can control this unstable vibration. The experimental results show that SFD hearing and rotor system which are designed according to the design parameters in the stable region are operated stably in rotational speed 9,600rpm without nonsynchronous behavior.

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The R-V Characteristics of $SiO_2 $ & $SiO_2/TiN$ Thin Film Fabricated by RF Sputtering (RF Sputtering으로 제작한 $SiO_2 $$SiO_2/TiN$ 박막의 R-V 특성)

  • 김창석;하충기;김병인
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.10
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    • pp.826-832
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    • 1998
  • In this study the thin films with the structure of Si+SiO$_2$+TiN are made by RF supttering method. TiN, which has small diffusion coefficient and low resistivity, is evaporated between SiO$_2$ and Al layers. It investigates the V-R characteristics depending on the thickness of SiO$_2$ which is used as insulation layer and researches its effects on voltage stability of thin film and varistor. These films show very small resistance valus in negative(-) voltage and large and large value in positive voltage band, and with the increase of voltage, resistance value is rapidly reduced and the satisfactory characteristic of varistor is shown at +1[V]. It is found that resistance value of TiN thin film is small and also TiN thin film has more current than the thin film which is not evaporated by TiN thin film. When Al electrode is evaporated of SiO$_2$ thin film, spiking occurs, but the spiking can be prevented with evaporation of TiN between SiO$_2$ and Al layers and this thin films in made easily because of its good attachment. With the increase of voltage, the resistance is changed into non-linear pattern and the bidirectional varistor characteristic is shown and then its theory can be verified by this experiment. Accordingly, when TiN is evaporated of Si Wafer(n-100), it obtains better voltage-resistance than thin film which is not evaporated and also when varistor character is used electrically to automatic control element such as elimination of flame, power distribution arrestor and constant voltage compensation, satisfactory reproducibilities are expected.

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Characteristics of $\pi$-type attenuators using Ti(N) thin film resistors

  • Cuong, Nguyen Duy;Kim, Dong-Jin;Kang, Byoung-Don;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.50-50
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    • 2007
  • We report the effect of the film thickness on electrical properties of Ti(N) film resistors. The applications of titanium nitride thin film resistor in $\Pi$-type attenuators are also characterized. As film thickness decreases from 100 to 30 nm, temperature coefficient of resistance significantly decreases from -60 to -148 ppm/K, while sheet resistance increases from 37 to $270\;{\Omega}/{\square}$. The characterizations of 20dB-attenuators using thin film resistors are improved in comparison with those using thick film resistors. The $\Pi$-type attenuators using Ti(N) thin film resistors exhibit a attenuation of -19.94 dB and voltage standing wave ratio of 1.16 at a frequency of 2.7 GHz.

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A NUMERICAL ANALYSIS ON THE BEHAVIOR OF LIQUID FILM AROUND A CURVED EDGE (곡률이 있는 모서리 주변에서의 액막 거동에 대한 수치해석적 연구)

  • Lee, Geonkang;Hur, Nahmkeon;Son, Gihun
    • Journal of computational fluids engineering
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    • v.17 no.4
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    • pp.75-80
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    • 2012
  • Due to the effect of surface tension, liquid film around a curved edge of solid surface moves from the corner to the flat surface. During this behavior of liquid film, film sagging phenomenon is easily occurred at the solid surface. Behavior of liquid film is determined with the effects of the properties of liquid film and the geometric factors of solid surface. In the present study, 2-D transient CFD simulations were conducted on the behavior of liquid film around a curved edge. The two-phase interfacial flow of liquid film was numerically investigated by using a VOF method in order to predict the film sagging around a curved edge. In the steady state of behavior of liquid film, the liquid film thickness of numerical result showed a good agreement with experimental data. After verifying the numerical results, the characteristics of behavior of liquid film were numerically analyzed with various properties of liquid film such as surface tension coefficient and viscosity. The effects of geometric factors on film sagging were also investigated to reduce the film sagging around a curved edge.

Characteristics of CrOx Thin-films for High Precision Resistors (고정밀저항용 크롬산화박막의 특성)

  • Seo, Jeong-Hwan;Noh, Sang-Soo;Lee, Eung-Ahn;Kim, Kwang-ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.3
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    • pp.253-258
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    • 2005
  • This paper presents characteristics of CrOx thin-film, which were deposited on $Al_2$O$_3$ wafer by DC reactive magnetron sputtering in an argon-oxide atmosphere for high temperature applications. The present paper deals with a study of the technological characteristics of thin film resistors to provide a control in obtaining temperature coefficients of resistance of given value. The optimized condition of CrOx thin-film were thickness range of 2500 $\AA$ and annealing condition(350 $^{\circ}C$, 1 hr) in oxide partial pressure(3.5${\times}$10$^{-4}$ torr). Under optimum conditions, the CrOx thin-films is obtained a high resistivity, p=340 $\mu$Ωcm, a low temperature coefficient of resistance, TCR=-55 ppm/$^{\circ}C$. The CrOx thin films resistors which were fabricated in this paper had excellent characteristics as high precision resistors.

Fabrication of Tantalum Nitride Thin-Film as High-temperature Strain Gauges (고온 스트레인 게이지용 질화탄탈박막의 제작)

  • Kim, Jae-Min;Choi, Sung-Kyu;Nam, Hyo-Duk;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.97-100
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    • 2001
  • This paper presents the characteristics of Ta-N thin-film strain gauges as high-temperature strain gauges, which were deposited on Si substrate by DC reactive magnetron sputtering in an argon-nitrogen atmosphere(Ar-(4~16%)$N_2$). These films were annealed for 1 hour in $2{\times}10^{-6}$ Torr vaccum furnace range $500\sim1000^{\circ}C$. The optimized conditions of Ta-N thin-film strain gauges were annealing condition($900^{\circ}C$, 1 hr.) in 8% $N_2$ gas flow ratio deposition atmosphere. Under optimum conditions, the Ta-N thin-films for strain gauges is obtained a high resistivity, $\rho=768.93$ ${\mu}{\Omega}cm$, a low temperature coefficient of resistance, TCR=-84 ppm/$^{\circ}C$ and a high temporal stability with a good longitudinal gauge factor, GF=4.12.

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Optimal Friction Materials of Tiny Piezoelectric Ultrasonic Linear Motor

  • Lee, Kyong-Jae;Nahm, Sahn;Kang, Jin-Kyu;Ko, Hyun-Phill;Kang, Chong-Yun;Kim, Hyun-Jae;Yoon, Seok-Jin
    • Transactions on Electrical and Electronic Materials
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    • v.6 no.6
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    • pp.249-255
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    • 2005
  • In recent years, a novel tiny piezoelectric linear motor converting a radial mode vibration to a longitudinal mode vibration driven by the impact force has been developed for a camera optical module. The tiny piezoelectric motor is consisted of a shaft, mobile element, and piezoelectric transducer. In this work, the frictional coefficient and static friction force of the interface between the shaft and the mobile element have been investigated according to their respective materials. It was found that two combinations, namely Pyrex glass or stainless steel for the shaft and stainless steel (SUS) for the mobile element, exhibited good dynamic behaviors in the tiny ultrasonic linear motor, which was newly developed based on operating concepts based on Newton's law.

Frriction and Wear of Siamond-Like Carbon Films Produced by Plasma-Assisted CVD Technique

  • AkihiroTanaka;KazunoriUmeda;KazuyukiMizuhara;Ko, Myoung-Wan;Kim, Seong-Young;Shin, Seung-Yong;Lee, Sang-Hyun
    • The Korean Journal of Ceramics
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    • v.3 no.3
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    • pp.182-186
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    • 1997
  • Diamond-like carbon(DLC) films were deposited on silicon substreates by using an RF plasmaassisted CVD apparatus; the effects of deposition conditions such as CH4 gas pressure and substrate bias voltage on DLC film friction and wear were examined in both friction and scratch tests. In friction tests critical loads at which the friction coefficient increases abruptly depend on substrate bias voltages: critical loads deposited at a bias voltage of -100 V exceed those deposited at other bias voltages. Critical loads are correlated with DLC film hydrogen content. Critical DLC film loads in scratch tests depended considerably less than in friction tests. The friction coefficient of DLC films depends on neither substrate bias voltage nor CH4 gas pressure.

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A Study on the Residual Stress Analysis of a-Si Thin Film Solar Cell (a-Si 박막형 태양전지의 잔류응력 해석에 관한 연구)

  • Hur, Jang-Wook;Kim, Dong-Wook;Choi, Sung-Dae
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.12 no.2
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    • pp.14-19
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    • 2013
  • The size and distribution of residual stresses and the effect of the minimum mesh size were investigated by the a-Si thin film solar cell. Attributed to the difference in coefficient of thermal expansion of the a-Si and Ag concentrated residual stresses at the joint interface of dissimilar materials. The ${\sigma}y$ and ${\tau}xy$ didn't appear in the central part, but ${\sigma}x$ existed. However, ${\sigma}x$, ${\sigma}y$ and ${\tau}xy$ appeared in the edge part and concentrated residual stresses at the interface between a-Si and Ag. Minimum mesh size gets smaller, the concentration of ${\sigma}y$ was significantly and existence area was reduced. As a result, the failure of thin film solar cells during the cutting process can be explained by the residual stresses.

Mechanical Properties of High-Hardness TiNX Thin Films Deposited by Pure Nitrogen Plasma Using Magnetron Sputtering Deposition (마그네트론 스퍼터링 증착법을 사용하여 순수한 질소 플라즈마에 의해 성막된 고경도 TiNX 박막의 역학적 특성)

  • Lee, Chang-Hyun;Rhee, Byung-Roh;Bae, Kang;Park, Chang-Hwan;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.8
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    • pp.514-519
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    • 2017
  • TiN (titanium nitride) films were prepared using the RF magnetron sputtering technique. The films were deposited by pure $N_2$ plasma sputtering. Their mechanical properties, such as nano-indentation hardness, friction coefficient, and surface wettability, have been investigated. X-ray diffraction (XRD) studies revealed that the orientation of $TiN_X$ films changed towards the (111) orientation with decreasing working pressure due to a strong compressive stress during deposition. The strongest TiN (111) orientation was found when the film was deposited at a working pressure of 1 Pa. This film showed the largest hardness (16 GPa) and smallest friction coefficient (0.17) among the studied samples. Moreover, this film was found to be accompanied by a water-repellent surface with water contact angle more than $100^{\circ}$.