The Korean Journal of Ceramics

한국세라믹학회 (The Korean Ceramic Society)
권호 표지

Frriction and Wear of Siamond-Like Carbon Films Produced by Plasma-Assisted CVD Technique

  • AkihiroTanaka (Mechanical Engineering Laboratory, Agency of Industrial Science and Technology) ;
  • KazunoriUmeda (Mechanical Engineering Laboratory, Agency of Industrial Science and Technology) ;
  • KazuyukiMizuhara (Mechanical Engineering Laboratory, Agency of Industrial Science and Technology) ;
  • Ko, Myoung-Wan (Korea Academy of Industrial Technology, Materials Process Technology Center) ;
  • Kim, Seong-Young (Korea Academy of Industrial Technology, Materials Process Technology Center) ;
  • Shin, Seung-Yong (Korea Academy of Industrial Technology, Materials Process Technology Center) ;
  • Lee, Sang-Hyun (Korea Academy of Industrial Technology, Materials Process Technology Center)
  • 발행 : 1997.09.01
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초록

Diamond-like carbon(DLC) films were deposited on silicon substreates by using an RF plasmaassisted CVD apparatus; the effects of deposition conditions such as CH4 gas pressure and substrate bias voltage on DLC film friction and wear were examined in both friction and scratch tests. In friction tests critical loads at which the friction coefficient increases abruptly depend on substrate bias voltages: critical loads deposited at a bias voltage of -100 V exceed those deposited at other bias voltages. Critical loads are correlated with DLC film hydrogen content. Critical DLC film loads in scratch tests depended considerably less than in friction tests. The friction coefficient of DLC films depends on neither substrate bias voltage nor CH4 gas pressure.

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