• Title/Summary/Keyword: field emission emitter

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Fabrication and characterization of silicon field emitter array with double gate dielectric (이중 게이트 절연막을 가지는 실리콘 전계방출 어레이 제작 및 특성)

  • 이진호;강성원;송윤호;박종문;조경의;이상윤;유형준
    • Journal of the Korean Vacuum Society
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    • v.6 no.2
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    • pp.103-108
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    • 1997
  • Silicon field emitter arrays (FEAs) have been fabricated by a novel method employing a two-step tip etch and a spin-on-glass (SOG) etch-back process using double layered thermal/tetraethylortho-silicate (TEOS) oxides as a gate dielectric. A partial etching was performed by coating a low viscous photo resist and $O_2$ plasma ashing on order to form the double layered gate dielectric. A small gate aperture with low gate leakage current was obtained by the novel process. The hight and the end radius of the fabricated emitter was about 1.1 $\mu\textrm{m}$ and less than 100$\AA$, respectively. The anode emission current from a 256 tips array was turned-on at a gate voltage of 40 V. Also, the gate current was less than 0.1% of the anode current.

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A New Structure of Triode-type CNT-FEAs for Enhanced Electron Emission and Beam Focusing

  • Jun, Pil-Goo;Kwak, Byung-Hwak;Noh, Hyung-Wook;Lee, Soo-Myun;Uh, Hyung-Soo;Park, Sang-Sik;Ko, Sung-Woo;Cho, Euo-Sik;Lee, Jong-Duk
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.456-458
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    • 2004
  • We proposed a novel triode-type carbon nanotube field emitter arrays in which extracted gate is surrounded by CNT emitters. We carried out 3-dimensional numerical calculations of electrostatic potential for the proposed CNT-FEAs using the finite element method and compared the results with those obtained from the structure of conventional CNT-FEAs. It was found that the proposed structure could reduce the turn-on voltage for electron emission and improve beam focusing.

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A Study on the Surface Treatment of CNT Paste Emitter by Ar Ion Irradiation (아르곤 이온빔을 이용한 CNT 페이스트 에미터의 표면처리에 관한 연구)

  • Kwon, Sang-Jik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.5
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    • pp.456-461
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    • 2007
  • In this study, a surface treatment method using accelerated Ar ions was experimented for exposing the carbon nanotubes (CNT) from the screen-printed CNT paste. After making a cathode electrode on the glass substrate, photo sensitive CNT paste was screen-printed, and then back-side was exposed by UV light. Then, the exposed CNT paste was selectively remained by development. After post-baking, the remained CNT paste was bombarded by accelerated Ar ions for removing some binders and exposing only CNTs. As results, the field emission characteristics were strongly depended on the accelerating energy, bombardment time, and the power of RF plasma ion source. When Ar ions accelerated with 100 eV energy from the 100 W RF plasma source are bombarded on the CNT paste surface for 10 min, the emission level and the uniformity were best.

Fabrication of Field Emission Device Using Carbon Nanotubes Synthesized by Thermal Chemical Vapor Deposition (열 화학 기상 증착법을 이용한 탄소 나노 튜브 전계 방출 소자의 제조)

  • Yu, W.J.;Cho, Y.S.;Choi, G.S.;Kim, D.J.;Kim, H.Y.;Yoon, S.K.
    • Korean Journal of Materials Research
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    • v.13 no.5
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    • pp.333-337
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    • 2003
  • We report a new fabrication process for carbon nanotube field emitters with high performance. The key of the fabrication process is trim-and-leveling the carbon nanotubes grown in trench structures by employing a planarization process, which leads to a uniform distance from the carbon nanotube tip to the electrode. In order to enable this processing, spin-on-glass liquid is applied over the CNTs grown in trench to have them stubborn adhesion among themselves as well as to the substrate. Thus fabricated emitters reveal an extremely stable emission and aging characteristics with a large current density of 40 ㎃/$\textrm{cm}^2$ at 4.5 V/$\mu\textrm{m}$. The field enhancement factor calculated from the F-N plot is $1.83${\times}$10^{5}$ $cm^{-1}$ , which is a very high value and indicates a superior quality of the emitter originating from the nature of open-tip and high stability of the carbon nanotubes obtained new process.

Fabrication of Triode-Type CNT-FED by A Screen-printing of CNT Paste

  • Kwon, Sang-Jik;Shon, Byeong-Kyoo;Chung, Hak-June;Lee, Sang-Heon;Choi, Hyung-Wook;Lee, Jong-Duk;Lee, Chun-Gyoo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.866-869
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    • 2004
  • A carbon nanotube field emission display(CNT FED) panel with a 2 inch diagonal size was fabricated by using a screen printing of a prepared photo-sensitive CNT paste and vacuum in-line sealing technology. After a surface treatment of the patterned CNT, only the carbon nanotube tips are uniformly exposed on the surface. The diameter of the exposed CNTs are usually about 20nm. The sealing temperature of the panel was around 390 $^{\circ}C$ and the vacuum level was obtained with $1.4{\times}10^{-5}$torr at the sealing. The field emission properties of the diode type CNT FED panel were characterized Now, we are developing a triode type CNT FED with a self-aligned gate-emitter structure.

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Characterization of Triode-type CNT-FED Fabricated using Photo-sensitive CNT Paste

  • Kwon, Sang-Jik;Chung, Hak-June;Lee, Sang-Heon;Choi, Hyung-Wook;Shin, Young-Hwa;Lee, Dal-Ho;Lee, Jong-Duk
    • Journal of Information Display
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    • v.5 no.4
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    • pp.18-22
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    • 2004
  • A carbon nanotube field emission display (CNT FED) panel with a 2 inch diagonal size was fabricated through screen printing of a prepared photo-sensitive CNT paste and vacuum in-line sealing technology. After surface treatment of the patterned CNT, only the carbon nanotube tips are uniformly exposed on the surface. The diameter of the exposed CNTs are usually about 20nm. The sealing temperature of the panel is around 390 $^{\circ}C$ and the vacuum level is obtained with $1.4{\times}10^{-5}$torr at the sealing. The field emission properties of the diode type CNT FED panel are characterized. Currently, we are in the process of developing a triode type CNT FED with a self-aligned gate-emitter structure.

Fabrication of Novel Metal Field Emitter Arrays(FEAs) Using Isotropic Silicon Etching and Oxidation

  • Oh, Chang-Woo;Lee, Chun-Gyoo;Park, Byung-Gook;Lee, Jong-Duk;Lee, Jong-Ho
    • Journal of Electrical Engineering and information Science
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    • v.2 no.6
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    • pp.212-216
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    • 1997
  • A new metal tip fabrication process for low voltage operation is reported in this paper. The key element of the fabrication process is that isotropic silicon etching and oxidation process used in silicon tip fabrication is utilized for gate hole size reduction and gate oxide layer. A metal FEA with 625 tips was fabricated in order to demonstrate the validity of the new process and submicron gate apertures were successfully obtained from originally 1.7$\mu\textrm{m}$ diameter mask. The emission current above noise level was observed at the gate bias of 50V. The required gate voltage to obtain the anode current of 0.1${\mu}\textrm{A}$/tip was 74V and the emission current was stable above 2${\mu}\textrm{A}$/tip without any disruption. The local field conversion factor and the emitting area were calculated as 7.981${\times}$10\ulcornercm\ulcorner and 3.2${\times}$10\ulcorner$\textrm{cm}^2$/tip, respectively.

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표면처리후 탄소나노튜브 캐소드의 전계방출 특성에 미치는 재 열처리에 관한 연구

  • Ha, Sang-Hun;Jeong, Dae-Hwa;Kim, Hoe-Bong;Jo, Yeong-Rae
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.32.2-32.2
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    • 2009
  • 높은 효율성을 가지는 전계방출 디스플레이(field emission displays)를 개발하기 위해 탄소나노튜브 음극소자 (CNT cathodes)의 표면처리에 대한 연구가 활발히 진행되고 있다. 열처리가 끝난 탄소나노튜브 음극소자(CNT cathodes)의 표면에는 유기성 바인더들이 타면서 잔여물들이 생성되게 되는데 이러한 잔여물들은 전계방출을 하는데 있어서 방해요소가 된다. 전계방출이 용이하게 하기 위해서는 이러한 잔여물들을 효과적으로 제거해 주어야한다. 표면처리의 방법으로는 여러 가지가 존재하는데 그중에서 테이핑 방법을 이용한 표면처리는 열처리 후에 남은 잔여물들을 제거하면서 CNTs를 돌출시키는 효율적인 방법이다. 하지만 이러한 테이핑 방법으로도 완벽하게 잔여물을 제거하기란 쉽지 않다. 본 연구는 첫 번째 열처리가 끝난 시편을 테이핑 방법을 이용하여 표면 처리를 실시하고 그것으로 끝나는 것이 아니라 표면처리가 끝난 시편에 두 번째 열처리를 실시하여 탄소나노튜브 음극소자(CNT cathodes)에 남아있는 잔여물들을 좀 더 효과적으로 제거해 주는데 그 목적이 있다. 재열처리시 온도는 $330^{\circ}C$ ~ $420^{\circ}C$까지 $30^{\circ}C$의 차이를 주어 4단계에 걸쳐 실험을 실시하였고 재열저리를 하기전과 재열처리를 실행한 후의 전류밀도의 차이를 관찰하여 효과적으로 잔여물들이 제거되었는지에 대해서 알아보았다. 재열처리를 실행하였을 때 재열처리를 하기 전에 비하여 전류밀도에서 우월하였으며 $360^{\circ}C$ 부근에서 가장 많은 차이를 보였다.

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The Vertical Growth of CNTs by DC Bias-Assisted PECVD and Their Field Emission Properties. (플라즈마 화학 기상 증착법에서 DC bias가 인가된 탄소나노튜브의 수직성장과 전계방출 특성)

  • 정성회;김광식;장건익;류호진
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.4
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    • pp.367-372
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    • 2002
  • The vertically well-aligned carbon nanotubes(CNTs) were successfully grown on Ni coated silicon wafer substrate by DC bias-assisted PECVD(Plasma Enhanced Chemical Vapor Deposition). As a catalyst, Ni thin film of thickness ranging from 15~30nm was prepared by electron beam evaporator method. In order to find the optimum growth condition, the type of gas mixture such as $C_2H_2-NH_3$ was systematically investigated by adjusting the gas mixing ratio at $570^{\circ}C$ under 0.4Torr. The diameter of the grown CNTs was 40~200nm and the diameter of the CNTs increased with increasing the Ni particles size. TEM images clearly showed carbon nanotubes to be multiwalled. The measured turn-on field was $3.9V/\mu\textrm{m}$ and an emission current of $1.4{\times}10^4A/\textrm{cm}^2$ was $7V/\mu\textrm{m}$. The CNTs grown by bias-assisted PECVD was able to demonstrate high quality in terms of vertical alignment, crystallization of graphite and the processing technique at low temperature of $570^{\circ}C$ and this can be applied for the emitter tip of FEDs.

A gas display device with electron emitter

  • Son, Seung-Hyun;Nam, Mun-Ho;Kim, Jung-Min;Cho, Sung-Hee;Jang, Sang-Hun;Kim, Gi-Young;Han, In-Su;Kim, Dae-Hyun;Cho, Young-Mi;Kim, Chang-Wook;Park, Hyoung-Bin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1253-1256
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    • 2007
  • A display device combining plasma display panel (PDP) and field emission display (FED) is proposed to achieve high luminous efficiency. The device can avoid the main energy loss channels of both PDP (ion loss) and FED (low CL efficiency). $2{\sim}6$”-diagonal test panels with carbon nano-tube (CNT) electron emitter and Xenon ambient gas showed the luminous efficiency of 4.14lm/W and brightness of $263cd/m^2$ at 35V (1kHz, 1% duty), indicating that it is a good candidate for the low voltage driven, highly efficient next generation display.

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