• 제목/요약/키워드: ethyl silicate

검색결과 52건 처리시간 0.034초

Ethyl Silicate Bonded Alumina as a Ceramic Binder

  • N, Korobova;Dea-Wha, Soh
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.103-107
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    • 2002
  • Ethyl silicate was used as organic binder for alumina refractories. In the present work only 15% of the water required for complete hydrolysis of ethyl silicate was initially added. The balance was provided from the atmosphere under controlled conditions of temperature and rh. The purpose of detailing the possible binder problem areas is more to indicate that the binder can have an effect on ceramic operations.

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Anti-corrosive Effects of Multi-Walled Carbon Nano Tube and Zinc Particle Shapes on Zinc Ethyl Silicate Coated Carbon Steel

  • Jang, JiMan;Shon, MinYoung;Kwak, SamTak
    • Corrosion Science and Technology
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    • 제15권1호
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    • pp.1-5
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    • 2016
  • Zinc ethyl silicate coatings containing multi walled carbon nanotubes (MWCNTs) were prepared, to which we added spherical and flake shaped zinc particles. The anti-corrosive effects of MWCNTs and zinc shapes on the zinc ethyl silicate coated carbon steel was examined, using electrochemical impedance spectroscopy and corrosion potential measurement. The results of EIS and corrosion potential measurement showed that the zinc ethyl silicate coated with flake shaped zinc particles and MWCNT showed lesser protection to corrosion. These outcomes were in agreement with previous results of corrosion potential and corrosion occurrence.

Self-Cleaning 실리케이트계 표면보호제를 적용한 콘크리트 표층부의 특성 (Property of Concrete Surface layer Using Self-Cleaning Silicate Concrete Impregnant)

  • 송훈;이종규;추용식
    • 한국건설순환자원학회논문집
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    • 제1권3호
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    • pp.233-239
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    • 2013
  • 콘크리트의 표면보호제은 표면으로부터 함침제를 함침시켜 표층부의 개질을 목적으로 사용하며 주로 Silane계 및 Silicate계 재료가 사용된다. 일반적으로 이용되는 Silicate는 Sodium과 Lithium silicate이며 탄산화한 부분의 알칼리 부여와 성능저하가 예상되는 콘크리트 부재의 구체 강화 등 성능회복을 목적으로 사용한다. 본 연구에서는 Self-Cleaning 실리케이트계 콘크리트 표면보호제로서 TEOS, $TiO_2$, Lithium silicate를 사용하여 노출 및 컬러 콘크리트 등의 고기능성이 요구되는 건축물에 적용이 가능한 Self-Cleaning 실리케이트계 콘크리트 표면보호제를 제조하였다. 또한 제조된 표면보호제의 건축물 적용을 위한 표면접촉각, 방오성능, 표면특성 및 조직관찰 등의 성능을 검토하였다. 실험결과 Self-Cleaning 실리케이트계 콘크리트 표면보호제를 적용한 시험체는 접촉각 $20^{\circ}$ 이하의 친수성을 보였고 기능성 부여가 가능하므로 표면보호제로서 사용이 가능하다.

침투성 함침제에 따른 콘크리트 표층부의 개질특성 (Surface Layer Change of Concrete with Concrete Impregnant)

  • 송훈;신현욱;추용식;이종규
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2013년도 추계 학술논문 발표대회
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    • pp.200-201
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    • 2013
  • This study is interested in manufacturing the concrete surface impregnants including tetra ethyl ortho silicate, alkali silicate for the repair of the exposed concrete and the color concrete requiring the advanced function in view of the concrete appearance. The surface layer change and porosity properties was tested for the review of application. The result of this study show that the effective silicate are tetra ethyl ortho silicate and alkali silicate t. The adhesion in tension is slightly increased but the reinforcement of concrete substrate is slight. So, the concrete impregnant of this study is more desirable for the improvement of durability rather than the reinforcement.

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화순산 경질점토에 미치는 분쇄조제의 효과에 관한 연구 (Effect of Grinding Aids on Hwasun Flint Clay)

  • 박금철;장영재
    • 한국세라믹학회지
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    • 제27권5호
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    • pp.619-624
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    • 1990
  • This study deals with the effectiveness and its reaction of stearic acid, ethyl silicate and ethylene glycol as grinding aids in grinding of Hwasun flint clay by dry ball milling process. Results are follows ; 1) It was effective that stearic acid and ethyl silicate act as the grinding aids in grinding of Hwasun flint clay. Also, it was proven that addition of stearic acid and ethyl silicate was the most effective in 1.0 and 0.75wt%, respectively. 2) The addition of ethylene glycol below 0.5wt% showed better result than none, but when added more than 0.5wt% it behaved as the inhibitor of grinding process. 3) It was investigated that grinding aids increased the ability of the particle dispression by reducing the strong chhesive forces which is caused by extensive surface tension of water.

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실리콘 웨이퍼위에 증착된 실리케이트 산화막의 CMP 슬러리 오염 특성 (CMP Slurry Induction Properties of Silicate Oxides Deposited on Silicon Wafer)

  • 김상용;서용진;이우선;장의구
    • 한국전기전자재료학회논문지
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    • 제13권2호
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    • pp.131-136
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    • 2000
  • We have investigated the slurry induced metallic contaminations of undoped and doped silicate oxides surface on CMP cleaning process. The metallic contaminations by CMP slurry were evaluated in four different oxide films, such as plasma enhanced tetra-ethyl-orthyo-silicate glass(PE-TEOS), O3 boro-phos-pho-silicate glass(O3-BPSG), PE-BPSG, and phospho-silicate glass(PSG). All films were polished with KOH-based slurry prior to entering the post-CMP cleaner. The Total X-Ray fluorescence(TXRF) measurements showed that all oxide surfaces are heavily contaminated by potassium and calcium during polishing which is due to a CMP slurry. The polished O3-BPSG films presented higher potassium and calcium contaminations compared to PE-TEOS because of a mobile ions gettering ability of phosphorus. For PSG oxides, the slurry induced mobile ion contamination increased with an increase of phosphorus contents. In addition, the polishing removal rate of PSG oxides had a linear relationship as a function of phosphorus contents.

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Ethyl Silicate로부터 Silicon Nitride의 합성(I) (Synthesis of Silicon Nitride from Ethyl Silicate(I))

  • 오일환;박금철
    • 한국세라믹학회지
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    • 제25권4호
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    • pp.415-423
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    • 1988
  • Mixtures of carbon and silica (about 0.46${\mu}{\textrm}{m}$) which was synthesized by the hydrolysis of ethyl silicate, the molar ratio of silica/carbon was fixed as 1/10(weight ratio : 1/2), were nitrided in the temperature range 135$0^{\circ}C$~150$0^{\circ}C$. The phse of the product Si3N4 was $\alpha$ phase and the morphology was hexagnoal prism and the nitridation reaction was completed in 5 hrs at 150$0^{\circ}C$ or 7hrs at 145$0^{\circ}C$. The reaction rate above 150$0^{\circ}C$ was diffusion-controlled, following Jander equation. Activation energy Q was derived from the Arrhenius plot and the value was about 101kcal/mol. Axis ratio of Lattice constants(c/a) was 0.726 and unit volume was $\AA$3, the larger the molar ratio of carbon/Alkoxide was, the smaller the particle size of $\alpha$Si3N4 was.

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Ethyl Silicate의 가수분해에 의한 단분산 Silica 미립자의 합성(1) (Synthesis of Monodispersed Silica Fine Particle by Hydrolysis of Ethyl Silicate(1))

  • 오일환;박금철
    • 한국세라믹학회지
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    • 제24권5호
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    • pp.500-506
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    • 1987
  • In order to synthesize monodispersed spherical silica fine particles, we investigated the reaction of hydrolysis of 0.05∼4.0 mole Si(OC2H5)4-0.01∼7.60mole NH3 -0.24∼38.40 mole H2O-2.62∼16.88mole C2H5OH systems. The range of the composition of solution which spherical silica particles were formed was enlarged according to an increase in concentration of Si(OC2H5)4. Larger particles were obtained at higher molar ratios of Si(OC2H5)4/C2H5OH, NH3/H2O and H2O/Si(OC2H5)4 and at a lower reaction temperature.

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Polishing Mechanism of TEOS-CMP with High-temperature Slurry by Surface Analysis

  • Kim, Nam-Hoon;Seo, Yong-Jin;Ko, Pil-Ju;Lee, Woo-Sun
    • Transactions on Electrical and Electronic Materials
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    • 제6권4호
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    • pp.164-168
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    • 2005
  • Effects of high-temperature slurry were investigated on the chemical mechanical polishing (CMP) performance of tetra-ethyl ortho-silicate (TEOS) film with silica and ceria slurries by the surface analysis of X-ray photoelectron spectroscopy (XPS). The pH showed a slight tendency to decrease with increasing slurry temperature, which means that the hydroxyl $(OH^-)$ groups increased in slurry as the slurry temperature increased and then they diffused into the TEOS film. The surface of TEOS film became hydro-carbonated by the diffused hydroxyl groups. The hydro-carbonated surface of TEOS film could be removed more easily. Consequently, the removal rate of TEOS film improved dramatically with increasing slurry temperature.

Ethyl Silicate로부터 Silicon Nitride의 합성(II) : 실화반응에서 첨가제의 영향 (Synthesis of Silicon Nitride from Ethyl Silicate(II) : Effect of Additive on the Nitridation of Silicon Nitride)

  • 오일환;박금철
    • 한국세라믹학회지
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    • 제25권5호
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    • pp.561-569
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    • 1988
  • Mixtures of very small amounts of additive, carbon and silica(about 0.46${\mu}{\textrm}{m}$) which synthesized by the hydrolysis of ethyl silicate, the molar ratio of SiO2/C was fixed to 1/10, was nitrided at 145$0^{\circ}C$. It was considered that the optimum amount of additive to promote the nitridation reaction was below 2.0wt%. By the addition of additive, the nitridation reaction was promoted and formation of $\beta$-Si3N4 was promoted at 145$0^{\circ}C$ for 1hour, but, the nitridation reaction was decreased and the ratio of $\alpha$/$\beta$ of Si3N4, was increased at 145$0^{\circ}C$ for 5 hours. The crystal phase was $\alpha$ phase and the nitridation reaction was promoted and the particle size of silicon nitride was become smaller by the addition of $\alpha$-Si3N4, but silicon nitride of whisker-like form was produced by the addition of transition elements. There was a difference in the lattice constants of $\alpha$-Si3N4, but no difference in its of $\beta$-Si3N4 according to kinds of added substance and reaction time.

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