• Title/Summary/Keyword: etched surface

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Novel SAW-based pressure sensor on $41^{\circ}YX\;LiNbO_3$ ($41^{\circ}YX\;LiNbO_3$ 기반 SAW 압력센서 개발)

  • Wang, Wen;Lee, Kee-Keun;Hwang, Jung-Soo;Kim, Gen-Young;Yang, Sang-Sik
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.43 no.1 s.343
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    • pp.33-40
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    • 2006
  • This paper presents a novel surface acoustic wave (SAW)-based pressure sensor, which is composed of single phase unidirectional transducer (SPUDT), three reflectors, and a deep etched substrate for bonding underneath the diaphragm. Using the coupling of modes (COM) theory, the SAW device was simulated, and the optimized design parameters were extracted. Finite Element Methods (FEM) was utilized to calculate the bending and stress/strain distribution on the diaphragm under a given pressure. Using extracted optimal design parameters, a 440 MHz reflective delay line on 41o YX LiNbO3 was developed. High S/N ratio, shan reflection peaks, and small spurious peaks were observed. The measured S11 results showed a good agreement with simulated results obtained from coupling-of-modes (COM) modeling and Finite Element Method (FEM) analysis.

A Study on the Surface of the Dry Etched TaN Thin Film by Adding The CH4 Gas in BCl3/Ar Inductively Coupled Plasma (BCl3/Ar 유도결합 플라즈마 안에 CH4 가스 첨가에 따른 건식 식각된 TaN 박막 표면의 연구)

  • Woo, Jong-Chang;Choi, Chang-Auck;Yang, Woo-Seok;Joo, Young-Hee;Kang, Pil-Seung;Chun, Yoon-Soo;Kim, Chang-Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.5
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    • pp.335-340
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    • 2013
  • In this study, the plasma etching of the TaN thin film with $CH_4/BCl_3/Ar$ gas chemistries was investigated. The etch rate of the TaN thin film and the etch selectivity of TaN to $SiO_2$ was studied as a function of the process parameters, including the amount of $CH_4$. X-ray photoelectron spectroscopy (XPS) and Field-emission scanning electron microscopy (FE-SEM) was used to investigate the chemical states of the surface of the TaN thin film.

Glass Thinning by Fluoride Based Compounds Solution with Low Hydrofluoric acid Concentration (저불산 불소계 화합물 수용액을 이용한 글라스 박판화)

  • Kim, Ho-Tae;Gang, Dong-goo;Kim, Jin-Bae
    • Applied Chemistry for Engineering
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    • v.20 no.5
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    • pp.557-560
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    • 2009
  • In this study, a new wet etching method and the solution for thinning the glass with the thickness below $100{\mu}m$ were investigated. For the preparation of etching solution with low hydrofluoric acid, it was effective to use $NH_4F$ or $NH_4HF_2$ as a main ingredient with the addition of sulfuric acid or nitric acid. Influence of the composition of mixed acid solution and the temperature on the etching rate was investigated. The addition of anionic surfactant provides the function to prevent the adhesion of sludge generated by the etching reaction. A new wet etching pilot device equipped with streaming generation parts was used to test etching of commercial non-alkali glass and soda lime glass. The non-alkali glass with the thickness of 640 ${\mu}m$ and soda lime glass with the thickness of $500{\mu}m$ were etched to $45{\mu}m$ and $100{\mu}m$, respectively, by using the pilot device. After the etching by pilot device, the roughness degree of the glass surface was maintained at $0.01{\sim}0.02{\mu}m$.

Fabrication and Characterization of Macro/Mesoporous SiC Ceramics from SiO2 Templates (실리카 주형을 이용한 메크로/메조다공성 탄화규소 세라믹의 제조와 비교특성)

  • ;Hao Wang
    • Journal of the Korean Ceramic Society
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    • v.41 no.7
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    • pp.528-533
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    • 2004
  • Macroporous SiC with pore size 84∼658 nm and mesoporous SiC with pore size 15∼65 nm were respectively prepared by infiltrating low viscosity preceramic polymer solutions into the various sacrificial templates obtained by natural sedimentation or centrifuge of 20∼700 nm silica sol, which were subsequently etched off with HF after pyrolysis at 1000∼140$0^{\circ}C$ in an argon atmosphere. Three-dimensionally long range ordered macroporous SiC ceramics derived from polymethylsilane (PMS) showed surface area 584.64$m^2$g$^{-1}$ when prepared with 112nm silica sol and at 140$0^{\circ}C$, whereas mesoporous SiC from polycarbosilane (PCS) exhibited the highest surface area 619.4 $m^2$g$^{-1}$ with random pore array when prepared with 20-30 nm silica sol and at 100$0^{\circ}C$. Finally, tile pore characteristics of porous SiC on the types of silica sol, polymers and pyrolytic conditions were interpreted with the analytical results of SEM, TEM, and BET instruments.

Etching characteristics of gold thin films using inductively coupled Ar/$CF_4/Cl_2$ plasma (Ar/$CF_4/Cl_2$ 유도 결합 플라즈마에 의한 gold 박막의 식각특성)

  • Kim, Nam-Kyu;Chang, Yun-Seong;Kim, Dong-Pyo;Kim, Chang-Il;Chang, Eui-Goo;Lee, Byeong-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.190-194
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    • 2002
  • In this study, the etching of Au thin films have been performed in an inductively coupled CF4/Cl2/Ar plasma. The etch properties were measured as the CF4 adds from 0 % to 30 % to the Cl2/(Cl2 + Ar) gas mixing ratio of 0.2. Other parameters were fixed at a rf power of 700 W, a dc bias voltage of 150 V, a chamber pressure of 15 mTorr, and a substrate temperature of $30^{\circ}C$. The highest etch rate of the Au thin film was 370 nm/min at a 10 % additive CF4 into Cl2/(Cl2 + Ar) gas mixing ratio of 0.2. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. From x-ray photoelectron spectroscopy (XPS) analysis, the intensities of Au peaks are changed. There is a chemical reaction between Cl and Au. Au-Cl is hard to remove on the surface because of its high melting point and the etching products can be sputtered by Ar ion bombardment. We obtained the cleaned and steep profile.

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Shear bond strength of resin cement to an acid etched and a laser irradiated ceramic surface

  • Kursoglu, Pinar;Karagoz Motro, Pelin Fatma;Yurdaguven, Haktan
    • The Journal of Advanced Prosthodontics
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    • v.5 no.2
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    • pp.98-103
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    • 2013
  • PURPOSE. To evaluate the effects of hydrofluoric acid etching and Er,Cr:YSGG laser irradiation on the shear bond strength of resin cement to lithium disilicate ceramic. MATERIALS AND METHODS. Fifty-five ceramic blocks ($5mm{\times}5mm{\times}2mm$) were fabricated and embedded in acrylic resin. Their surfaces were finished with 1000-grit silicon carbide paper. The blocks were assigned to five groups: 1) 9.5% hydrofluoric-acid etching for 60 s; 2-4), 1.5-, 2.5-, and 6-W Er,Cr:YSGG laser applications for 60 seconds, respectively; and 5) no treatment (control). One specimen from each group was examined using scanning electron microscopy. Ceramic primer (Rely X ceramic primer) and adhesive (Adper Single Bond) were applied to the ceramic surfaces, followed by resin cement to bond the composite cylinders, and light curing. Bonded specimens were stored in distilled water at $37^{\circ}C$ for 24 hours. Shear bond strengths were determined by a universal testing machine at 1 mm/min crosshead speed. Data were analyzed using Kruskal-Wallis and Mann-Whitney U-tests (${\alpha}$=0.05). RESULTS. Adhesion was significantly stronger in Group 2 ($3.88{\pm}1.94$ MPa) and Group 3 ($3.65{\pm}1.87$ MPa) than in Control group ($1.95{\pm}1.06$ MPa), in which bonding values were lowest (P<.01). No significant difference was observed between Group 4 ($3.59{\pm}1.19$ MPa) and Control group. Shear bond strength was highest in Group 1 ($8.42{\pm}1.86$ MPa; P<.01). CONCLUSION. Er,Cr:YSGG laser irradiation at 1.5 and 2.5 W increased shear bond strengths between ceramic and resin cement compared with untreated ceramic surfaces. Irradiation at 6 W may not be an efficient ceramic surface treatment technique.

Aspect ratio enhancement of ZnO nanowires using silicon microcavity

  • Kar, J.P.;Das, S.N.;Choi, J.H.;Lee, Y.A.;Lee, T.Y.;Myoung, J.M.
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.34.1-34.1
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    • 2009
  • A great deal of attention has been focused on ZnO nanowires for various electronics and optoelectronics applications. in the pursuit of next generation nanodevices, it would be highly preferred if well-ordered ZnO nanowires of lower dimension could be fabricated on silicon. Before the growth of nanowires, silicon substrates were selectively etched using silicon nitride as masking layer. Vertical aligned ZnO nanowires were grown by metal organic chemical vapor deposition on patterned silicon substrate. The shape of nanostructures was greatly influenced by the micropatterned surface of the substrate. The aspect ratio, packing fraction and the number density of nanowires on top surface are around 10, 0.8 and $10^7\;per\;mm^2$, respectively, whereas the values are 20, 0.3 and $5\times10^7\;per\;mm^2$, respectively, towards the bottom of the cavity. XRD patterns suggest that the nanostructures have good crystallinity. High-resolution transmission electron microscopy confirmed the single crystalline growth of the ZnO nanowires along [0001] direction.

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INFLUENCES OF SILANE CONCENTRATION FOR FILLER SILANIZATION ON THE PROPERTIES OF COMPOSITES (필러의 실란처리농도가 복합레진의 특성에 미치는 영향)

  • 조태희;박상진
    • Restorative Dentistry and Endodontics
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    • v.26 no.1
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    • pp.23-31
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    • 2001
  • The purpose of this study was to search the optimal silane concentrations for filler- silanization of seven experimental composites. Silica filer was a 25micron crushed type. 0.0%, 0.5%, 1.0%, 1.5%, 2.0%, 2.5%, and 3.0% silane($\gamma$-methacrylooxypropyltrimethoxysilane)were added into silica-filler with weight percentage (wt%). Mixtures(silica filler/silane)were reacted at 6$0^{\circ}C$ for 72hours, and crushed into fine particles those were used as fillers for 7 experimental composites. Monomer was a 3 : 1 mixture of Bis-GMA and TEGDMA containing 0.2% tertiary amine and 0.4% camphoroquinone for light curability. A ratio for mixing the monomer and filler was 75% and 25% respectively. Seven experimental composites was classified with the concentration of silane treated, and the specimen number for each test was 10. Specimens with 6mm diameter and 3mm height dimension for measuring the diametral tensile strength were destroyed with 1mm/min cross-head speed on Instron universal testing machine (No. 4467, USA). Shear bond strength was measured on the specimens bonded to bovine enamel etched with 37% phosphoric acid solution for 1 minute Fractured surfaces were observed by SEM (Hitachi S-3200, Japan) among that of the highest values measured from each groups. Following results were obtained: 1. Experimental composites containing silanized filter showed the significantly higher diametral tensile strength and shear bond strength than the composites containing un-silanized fillers(Group1) (p<0.05). 2. In silanized filler composite resins(Group 2~7), Diametral tensile strength of Group 3 showed the significantly higher than that of Group 2 and Group 6(p<0.05). 3. Shear bond strength was higher in Group 3 than that of Group 7 (p<0.05)in silanized fillers composite resins. 4. Fracture surface was formed in resin matrixes on the specimens from composites containing the fillers treated with 0.5% 1.0%, and 1.5% silane. These results mean that the optimal silane concentrations are exist for each fillet with its size and surface area, and that 1.0% is a optimal value for concentration to coat the 25$\mu\textrm{m}$ filler with silane.

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Nano-structured Carbon Support for Pt/C Anode Catalyst in Direct Methanol Fuel Cell

  • Choi Jae-Sik;Kwon Heock-Hoi;Chung Won Seob;Lee Ho-In
    • Journal of Powder Materials
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    • v.12 no.2 s.49
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    • pp.117-121
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    • 2005
  • Platinum catalysts for the DMFC (Direct Methanol Fuel Cell) were impregnated on several carbon supports and their catalytic activities were evaluated with cyclic voltammograms of methanol electro-oxidation. To increase the activities of the Pt/C catalyst, carbon supports with high electric conductivity such as mesoporous carbon, carbon nanofiber, and carbon nanotube were employed. The Pt/e-CNF (etched carbon nanofiber) catalyst showed higher maximum current density of $70 mA cm^{-2}$ and lower on-set voltage of 0.54 V vs. NHE than the Pt/Vulcan XC-72 in methanol oxidation. Although the carbon named by CNT (carbon nanotube) series turned out to have larger BET surface area than the carbon named by CNF (carbon nanofiber) series, the Pt catalysts supported on the CNT series were less active than those on the CNF series due to their lower electric conductivity and lower availability of pores for Pt loading. Considering that the BET surface area and electric conductivity of the e-CNF were similar to those of the Vulcan XC-72, smaller Pt particle size of the Pt/e-CNF catalyst and stronger metal-support interaction were believed to be the main reason for its higher catalytic activity.

Characterization of saturation of CR-39 detector at high alpha-particle fluence

  • Ghazaly, M. El;Hassan, Nabil M.
    • Nuclear Engineering and Technology
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    • v.50 no.3
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    • pp.432-438
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    • 2018
  • The occurrence of saturation in the CR-39 detector reduces and limits its detection dynamic range; nevertheless, this range could be extended using spectroscopic techniques and by measuring the net bulk rate of the saturated CR-39 detector surface. CR-39 detectors were irradiated by 1.5 MeV high alpha-particle fluence varying from $0.06{\times}10^8$ to $7.36{\times}10^8\;alphas/cm^2$ from Am-241 source; thereafter, they were etched in a 6.25N NaOH solution at a temperature of $70^{\circ}C$ for different durations. Net bulk etch rate measurement of the 1.5 MeV alpha-irradiated CR-39 detector surface revealed that rate increases with increasing etching time and reaches its maximum value at the end of the alpha-particle range. It is also correlated with the alpha-particle fluence. The measurements of UV-Visible (UV-Vis) absorbance at 500 and 600 nm reveal that the absorbance is linearly correlated with the fluence of alpha particles at the etching times of 2 and 4 hour. For extended etching times of 6, 10, and 14.5 hour, the absorbance is saturated for fluence values of $4.05{\times}10^8$, $5.30{\times}10^8$, and $7.36{\times}10^8\;alphas/cm^2$. These new methods pave the way to extend the dynamic range of polymer-based solid state nuclear track detectors (SSNTDs) in measurement of high fluence of heavy ions as well as in radiation dosimetry.