• 제목/요약/키워드: etched surface

Search Result 753, Processing Time 0.023 seconds

The Development of Optical Temperature Sensor Based on the Etched Bragg Gratings

  • Ahn, Kook-Chan;Lee, Sang-Mae
    • International Journal of Aeronautical and Space Sciences
    • /
    • v.2 no.2
    • /
    • pp.56-64
    • /
    • 2001
  • An optical temperature sensor based on the etched planar waveguide Bragg grating is developed and its performance is explored using theoretical and experimental methods. The planar waveguide is designed and fabricated using optical lithography and wet chemical etching. An efficient butt coupled optical fiber is used to examine the spectral characteristics of the grating sensor, and to investigate the grating parameters. The typical bandwidth and reflectivity of the surface etched grating has been ~0.2 nm and ~7%, respectively, at a wavelength of ~1,552 nm. The temperature-induced wavelength change of the optical sensor is found to be slightly non-linear over ${\sim}200^{\circ}C$ temperature range. Theoretical models for the grating response of the sensor based on waveguide and classical laminated plate deformation theories agree with experiments to within acceptable tolerance.

  • PDF

Microprocessing of Ferrite Using Focused Laser Beam in $CCl_2F_2$ Gas Atmosphere ($CCl_2F_2$ 가스분위기에서 집속레이저빔을 이용한 페라이트의 미세가공)

  • Lee, Kyoung-Cheol;Lee, Cheon
    • Proceedings of the KIEE Conference
    • /
    • 1998.07g
    • /
    • pp.2553-2555
    • /
    • 1998
  • A single crystal Mn-Zn ferrite was directly etched by focused $Ar^+$ laser beam in $CCl_2F_2$ gas atmosphere. AES has been performed for locally investigating the surface composition of an etched layer. MnCl, ZnCl being created after the substrate and $CCl_2F_2$ chemically reacting was remained in the vicinity of laser irradiation area because of their low vapor pressure. Various patterns using computer were formed on the substrate. The etched grooves and patterned shapes were observed by SEM measurement.

  • PDF

EFFECTS OF VARIOUS SURFACE TREATMENTS FOR TITANIUM ON SURFACE MICRO ROUGHNESS, STATIC WETTABILITY, FIBRONECTIN ADSORPTION (표면 처리 방법에 따른 타이타늄의 미세 표면 거칠기, 표면 젖음성, fibronectin 흡착량에 미치는 영향)

  • Shin Hwa-Sub;Kim Young-Su;Shin Sang-Wan
    • The Journal of Korean Academy of Prosthodontics
    • /
    • v.44 no.4
    • /
    • pp.443-454
    • /
    • 2006
  • Purpose: This study aims to get the fundamental data which is necessary to the development direction of implant surface treatment hereafter, based on the understanding the surface structure and properties of titanium which is suitable for the absorption of initial tissue fluid by researching effects of additional surface treatments fir sandblasted with large git and acid-etched(SLA) titanium on surface micro-roughness, static wettability, fibronectin adsorption Materials and Method: In the Control groups, the commercial pure titanium disks which is 10mm in diameter and 2mm in thickness were treated with HCI after sandblasting with 50$\mu$m $Al_2O_3$. The experiment groups were made an experiment each by being treated with 1) 22.5% nitric acid according to SLA+ASTM F86 protocol, 2) SLA+30% peroxide, 3) SLA+NaOH, 4) SLA+ Oxalic acid, and 5) SLA+600$^{\circ}C$ heating. In each group, the value of Ra and RMS which are the gauges of surface roughness was measured, surface wettability was measured by analyzing with Sessile drop method, and fibronectin adsorption was measured with immunological assay. The significance of each group was verified by (SPSS, ver.10.0 SPSS Inc.) Kruskal-Wallis Test. (α=0.05) And the correlation significance between Surface micro-roughness and surface wettability. surface roughness and fibronectin adsorption, and surface wettability and fibronectin adsorption was tested by Spearman's correlation analysis. Result: All measure groups showed the significant differences in surface micro-roughness, surface wettability, and fibronectin adsorption. (p<0.05) There was no significance in correlation among the surface micro-roughness, surface wettability, and fibronectin adsorption. (p>0.05) Conclusion: Surface micro-roughness and surface wettability rarely affected the absorption of initial tissue fluid on the surface of titanium.

A Surface Etching for Synthetic Diamonds with Nano-Thick Ni Films and Low Temperature Annealing

  • Song, Jeongho;Noh, Yunyoung;Song, Ohsung
    • Journal of the Korean Ceramic Society
    • /
    • v.52 no.4
    • /
    • pp.279-283
    • /
    • 2015
  • Ni (100 nm thick) was deposited onto synthesized diamonds to fabricate etched diamonds. Next, those diamonds were annealed at varying temperatures ($400{\sim}1200^{\circ}C$) for 30 minutes and then immersed in 30 wt% $HNO_3$ to remove the Ni layers. The etched properties of the diamonds were examined with FE-SEM, micro-Raman, and VSM. The FE-SEM results showed that the Ni agglomerated at a low annealing temperature (${\sim}400^{\circ}C$), and self-aligned hemisphere dots formed at an annealing temperature of $800^{\circ}C$. Those dots became smaller with a bimodal distribution as the annealing temperature increased. After stripping the Ni layers, etch pits and trigons formed with annealing temperatures above $400^{\circ}C$ on the surface of the diamonds. However, surface graphite layers existed above $1000^{\circ}C$. The B-H loop results showed that the coercivity of the samples increased to 320 Oe (from 37 Oe) when the annealing temperature increased to $600^{\circ}C$ and then, decreased to 150 Oe with elevated annealing temperatures. This result indicates that the coercivity was affected by magnetic domain pinning at temperatures below $600^{\circ}C$ and single domain behavior at elevated temperatures above $800^{\circ}C$ consistent with the microstructure results. Thus, the results of this study show that the surface of diamonds can be etched.

THE SHEAR BOND STRENGTHS OF COMPOSITE RESINS TO GLASS IONOMER CEMENTS BY SURFACE TREATMENT AND ELAPSED TIME (광중합 GIC충전후 경과시간 및 표면처리에 따른 복합레진과의 결합강도에 관한 연구)

  • Chung, Hye-In;Kim, Shin;Chung, Tae-Sung
    • Journal of the korean academy of Pediatric Dentistry
    • /
    • v.24 no.1
    • /
    • pp.82-94
    • /
    • 1997
  • For the purpose of establishing the most appropriate method of bonding between glass ionomer liners and composite resin and comparing the materials for sandwich technique, an experiment was performed to measure the shear bond strengths between the two with the variables in the surface treatment of liners and elapsed time till composite buildup. Materials used were Vitrebond and Fuji II LC, each as the restorative and liner respectively, and each group was subdivided by surface treatment (acid etching and sandblasting) and time elapsed from GIC filling to composite buildup (immediately, 1 day, 7 days), consisting 12 groups as a whole. Each subgroup was composed of 10 specimens and the shear bond strength between GIC liners and composite resin was measured under UTM and analyzed. The result were as follows: 1. The shear bond strength between two materials was highest when initially filled Fuji II LC was sandblasted after 1 days and composite built-up (Group FS1). And the lowest value was found when GIC was acid-etched after 7 days and composite built-up (Group FE7). Significant difference was found between the two groups. (P<0.01) 2. In regard of surface treatment of GI liners, acid-etched group (VE) showed higher bond strength than sandblasted group (VS) for Vitrebond. But, the reverse was true for Fuji II LC. (P<0.05) 3. In regard to the time elapsed from GI filling to composite buildup, the group of 1 day elapse showed relatively higher strength for Vitrebond. On the contrary, immediate buildup group (FE0) was stronger for acid-etched group and 1 day elapse group(FS1) was higher for sand-blasted group in Fuji II LC. (P<0.05)

  • PDF

Surface Topography and Photoluminescence of Chemically Etched Porous Si (화학식각법에 의해 형성된 다공질실리콘의 표면형상 및 발광특성)

  • Kim, Hyeon-Su;Min, Seok-Gi
    • Korean Journal of Materials Research
    • /
    • v.4 no.4
    • /
    • pp.379-384
    • /
    • 1994
  • Room-temperature photoluminescent porous Si has been formed by etching Si wafer u-ith the solution of $HF:HNO_{3}: H_{2}O$=l : 5 : 10. We have observed photoluminescence(PL) spectra similar to those reported recently for porous-Si films formed by anodic etching with HF solutions. We have also investigated the dependence of PI, spectra on the etching time which was varied from 1 to 10 minutes. We found that 5-minute etching gave us the strongest PL intensity. We also found by atomic force microscopy( AFM) measurements that the surface fearure size became smaller for longer etching time and the average feature size of the etched Si wafer for 5-minute was about 1, 500~2, 000$\AA$. This indicates that the surface feature of the etched porous Si affects the PL intensity of the sample.

  • PDF

A STUDY ON THE TENSILE BOND STRENGTH OF ETCHED BASE METALS (식각된 비 귀금속 합금과 법랑질간의 접착 인장강도에 대한 연구)

  • Park, Sang-Won;Yang, Hong-So
    • The Journal of Korean Academy of Prosthodontics
    • /
    • v.25 no.1
    • /
    • pp.303-316
    • /
    • 1987
  • The purpose f this study was to evaluate the effect of resin film thickness on the tensile bond strength and to compare the tensile bond strengths of 4 differently treated metal surfaces. For the experiment, seventy metal specimens were cast with Verabond and divided into I, II, III, groups. The metal specimens in group I were electrolytically etched and cemented with Panavia under finger pressure. Cement film thickness was regulated with metal spacers. The metal specimens in Group II were treated by 4 methods, such as electrolytic etching method, salt-roughened method, EZ-oxisor method , chemical etching method and cemented with Panavia. In group III, electrolytically etched metal specimens were cemented with Hy-Bond. The etched surface of metal specimens and the cement film thickness were examined under the scanning electron microscope. Results were as follows; 1. The tensile bond strength showed no significant difference between $30{\mu}m,\;80{\mu}m,\;130{\mu}m$ film thicknessspecimens. 2. There was no significant difference in the tensile bond strength between the 4 differently treated metal specimens. 3. The tensile bond strength showed significant difference between Panavia and Hy-Bond. 4. Scanning electron microscope photograph revealed that tile interdendritic eutectic was removed in electrolytically etched metal surfaces hilt even dendritic arm was removed in Chemically etched metal surfaces. 5. The metal surfaces which were air-abraded with $50{\mu}m$ aluminum oxide showed roughness and small crack on scanning electron microscope photograph.

  • PDF

Orthodontic bonding to acid- or laser-etched prebleached enamel

  • Ozdemir, Fulya;Cakan, Umut;Gonul, Nese;Cakan, Derya Germec
    • The korean journal of orthodontics
    • /
    • v.43 no.3
    • /
    • pp.141-146
    • /
    • 2013
  • Objective: Bonding forces of brackets to enamel surfaces may be affected by the procedures used for bleaching and enamel etching. The aim of this study was to investigate the bonding strength of orthodontic brackets to laser-etched surfaces of bleached teeth. Methods: In a nonbleached control group, acid etching (group A) or Er:YAG laser application (group B) was performed prior to bracket bonding (n = 13 in each group). Similar surface treatments were performed at 1 day (groups C and D; n = 13 in each subgroup) or at 3 weeks (groups E and F; n = 13 in each subgroup) after 38% hydrogen peroxide bleaching in another set of teeth. The specimens were debonded after thermocycling. Results: Laser etching of bleached teeth resulted in clinically unacceptable low bonding strength. In the case of acid-etched teeth, waiting for 3 weeks before attachment of brackets to the bleached surfaces resulted in similar, but not identical, bond strength values as those obtained with nonbleached surfaces. However, in the laser-etched groups, the bonding strength after 3 weeks was the same as that for the nonbleached group. Conclusions: When teeth bleached with 38% hydrogen peroxide are meant to be bonded immediately, acid etching is preferable.

Evaluation of different enamel conditioning techniques for orthodontic bonding

  • Turkoz, Cagri;Ulusoy, Cagri
    • The korean journal of orthodontics
    • /
    • v.42 no.1
    • /
    • pp.32-38
    • /
    • 2012
  • Objective: The aim of this study was to compare the effects of different enamel conditioning techniques for bracket bonding. Methods: Ninety-one human premolars were randomly divided in six groups of 15 specimens each. The enamel surfaces of the teeth were etched with 35% orthophosphoric acid in Group 1, with a self-etching primer in Group 2, sandblasted in Group 3, sandblasted and etched with 35% orthophosphoric acid in Group 4, conditioned by Er:YAG laser in Group 5 and conditioned by Er:YAG laser and etched with 35% phosphoric acid gel respectively in Group 6. After enamel conditioning procedures, brackets were bonded and shear bonding test was performed. After debonding, adhesive remnant index scores were calculated for all groups. One tooth from each group were inspected by scanning electron microscope for evaluating the enamel surface characteristics. Results: The laser and acid etched group showed the highest mean shear bond strength (SBS) value ($13.61{\pm}1.14$ MPa) while sandblasted group yielded the lowest value ($3.12{\pm}0.61$ MPa). Conclusions: Although the SBS values were higher, the teeth in laser conditioned groups were highly damaged. Therefore, acid etching and self-etching techniques were found to be safer for orthodontic bracket bonding. Sandblasting method was found to generate inadequate bonding strength.

A study on etching mechanism of SBT thin flim by using Ar/$CHF_3$plasma (Ar/$CHF_34$플라즈마를 이용한 SBT 박막에 대한 식각 메카니즘 연구)

  • 서정우;장의구;김창일;이원재;유병곤
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.13 no.3
    • /
    • pp.183-187
    • /
    • 2000
  • In this study the SrBi$_2$Ta$_2$$O_{9}$ (SBT) thin films were etched by using magnetically enhanced inductively coupled Ar/CHF$_3$plasma as function of CHF$_3$/(Ar+CHF$_3$)gas mixing ratio. Maximum etch rate of SBT thin films was 1650 $\AA$/min and the selectivities of SBT to Pt and photoresist(PR) were 1.35 and 0.94 respectively under CHF$_3$/(Ar+CHF$_3$) of 0.1 For study on etching mechanism of SBT thin film X-ray photoelectron spectroscopy (XPS) surface analyses and secondary ion mass spectrometry (SIMS) mass analysis of etched SBT surfaces were performed. Among the elements of SBT thin film. M(Sr, Bi, Ta)-O bonds are broken by Ar ion bombardment and form SrF and TaF$_2$by chemical reaction with F. SrF and TaF$_2$are removed more easily by Ar ion bombardment. Scanning electron microscopy(SEM) was used for the profile examination of etched SBT film and the cross-sectional SEM profile of etched SBT film under CHF$_3$(Ar+CHF$_3$) of 0.1 was about 85$^{\circ}$X>.

  • PDF