• Title/Summary/Keyword: electron temperature measurement

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Correlation between spin density and Vth instability of IGZO thin-film transistors

  • Park, Jee Ho;Lee, Sohyung;Lee, Hee Sung;Kim, Sung Ki;Park, Kwon-Shik;Yoon, Soo-Young
    • Current Applied Physics
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    • v.18 no.11
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    • pp.1447-1450
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    • 2018
  • The electron spin resonance (ESR) detects point defect of the In-Ga-Zn oxide (IGZO) like singly ionized oxygen vacancies and excess oxygen, and get spin density as a parameter of defect state. So, we demonstrated the spin density measurement of the IGZO film with various deposition conditions and it has linear relationship. Moreover, we matched the spin density with the total BTS and the threshold voltage ($V_{th}$) distribution of the IGZO thin film transistors. The total BTS ${\Delta}V_{th}$ and the $V_{th}$ distribution were degraded due to the spin density increases. The spin density is the useful indicator to predict $V_{th}$ instability of IGZO TFTs.

Effect of the Substrate Temperature on the Copper Oxide Thin Films

  • Park, Ju-Yeon;Gang, Yong-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.71-71
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    • 2010
  • Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different substrate temperature. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was about 170 nm. AFM images show that the surface roughness of copper oxide films was increased with increasing substrate temperature. As the substrate temperature increased, monoclinic CuO (111) peak appeared and the crystal size decreased while the monoclinic CuO (-111) peak was independent on the substrate temperature. The oxidation states of Cu 2p and O 1s resulted from XPS were not affected on the substrate temperature. The contact angle measurement was also studied and indicated that the surface of copper oxide thin films deposited high temperature has more hydrophobic surface than that of deposited at low temperature.

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THE MORPHOLOGY OF CHROMIUM AND LIF MEASUREMENT OF ATOMIC ARSENIC IN LAMINAR DIFFUSION FLAMES

  • Yoon, Young-Bin
    • 한국연소학회:학술대회논문집
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    • 1997.06a
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    • pp.61-68
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    • 1997
  • The morphology and size distribution of chromium oxides and the concentration measurement of atomic arsenic have been studied in laminar diffusion flames. Nitrogen was added to vary flame temperatures in hydrogen flames. Ethene flames were used in order to investigate the potential for interaction between the soot aerosol that is formed in these flames and the chromium aerosol. Two sources of chromium compounds were introduced: chromium nitrate and chromium hexacarbonyl. A detailed investigation of the morphology was carried out by scanning electron microscopy (SEM). The amounts of Cr(VI) and total Cr were determined by a spectrophotometric method and by X-ray fluorescence spectrometry, respectively. Also, LIF was used for the measurement of atomic arsenic, which was excited at 197.2 nm and was detected at 249.6 nm. Results showed that the morphology of the particles varied with the flame temperature and with the chromium source. The particles were characterized by porous structures, cenospheres and agglomerated dense particles when chromium nitrate solution was added to the flames. At low to moderate temperatures, porous sintered cenospheric structures were formed, in some cases with a blow hole. At higher temperatures, an agglomerated cluster which was composed of loosely sintered submicron particles was observed. It was also found that the emission of Cr(VI) from the undiluted $H_2$ flame was more than 10 times larger than in the 50% $H_2$ / 50% $N_2$ flame on a mass basis. Single point LIF measurement of atomic arsenic indicated that arsenic exist only in the low temperature, fuel rich region.

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Dielectric Characteristics of Epoxy Molding Compound irradiated with Electron Beam (전자선 조사된 에폭시 몰딩 컴파운드의 유전 특성)

  • 홍능표;박우현;이성용;김대수;이수원;홍진웅
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.289-292
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    • 1995
  • In this experiment the specimen is selected for epoxy resin used in the molding compound materials for the power semiconductors. The specimen was divided into the two parts. one is a specimen without irradiation, the other is irradiated with electron beam, of which dose is 1[Mrad], 2[Mrad], 4[Mrad], 8[Mrad] and 24[Mrad], respectively. From the analysis for the physical properties of the specimen, the carbonyl group which is asffact the electrical properties is decreased according to increase the dose of the electron beam. In the measurement of dielectric characteristics among the electrical properties, the frequency dependance of the dielectric characteristics is confirmed that its ${\beta}$-peak is represented by one peak due to attribute to the main chain below 50[$^{\circ}C$], and two peak above the temperature 100[$^{\circ}C$].

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The Effect of Electron Beam Irradiation for Volumn Resistivity in the Molding Compound for Power Semiconductor (전력용 반도체 몰딩재료의 체척고유저항에 미치는 전차선 조사의 영향)

  • Lee, Yong-Woo;Hong, Nung-Pyo;Park, Woo-Hyun;Ga, Chul-Hyun;Lee, Soo-Won;Hong, Jin-Woong
    • Proceedings of the KIEE Conference
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    • 1995.11a
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    • pp.370-372
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    • 1995
  • This paper mainly, describes the electrical characteristics caused by the change of structure in solid state of specimen by electron beam irradiation of high temperature-low expension type molding materials of power semiconductor element. The experiments on physical properties and electrical characteristics for the specimen irradiated electron beam are carried ont. For the investigation on physical properties, XRD analysis is used. And for the experiment of electrical characteristics, measurement of volumn resistivity is used.

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A Study on the Space Charge Measurement Technique and Carrier Polarity of Insulating Materials on Power Cable (전력케이블용 절연재료의 캐리어 극성 및 공간전하 측정기술에 관한 연구-PE-EVA에서의 하전입자의 거동)

  • 국상훈;박중순;강용철;권영수
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.41 no.2
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    • pp.185-191
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    • 1992
  • In this paper, it is attempted to distinguish the charged particles and to judge the polarity by the use of Thermally Stimulated Current(TSC) and Temperature Gradient Thermally Stimulated Surface Potential Measurement(TG-TSSP)with experimental insulation material XLPE-EVA for power cables which is made by blending cross-linked polyethylene(XLPE) and ethylene-vinylacetate copolymer(EVA). In addition, it is performed to investigate the effect of EVA blending. From the experimental results, it is known that for the case of XLPE-EVA blended experimental material, the generation of space charged electric field is not obtained in the high temperature region due to the obatruction of the injection of trapping carrier by the electron and the positive hole.

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A Study on properties of ZnO thin film for Film Bulk Acoustic Resonator (FBAR) application (FBAR 응용을 위한 ZnO 박막의 특성에 대한 연구)

  • Jeong, Young-Hak;Lee, Kyu-Il;Kim, Eun-Kwon;Lee, Jong-Duk;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.688-692
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    • 2004
  • In this paper, zinc oxide (ZnO) films with c-axis (002) orientation have been successfully deposited on the Al/Si substrate by rf magnetron sputtering method. The deposited films were characterized by substate temperature. Physical and structural properties of the deposited films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) measurement. Electrical Properties of the deposited films were investigated by 4-poing probe and LCR meter measurement. The optimal condition in this experimental result was found at foot of the substrate temperature and shown good film quality for FBAR application.

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Measurement of Lattice Parameter of Primary Si crystal in Rheocast Hypereutectic Al-Si Alloy by Convergent Beam Electron Diffraction Technique (수렴성빔 전자회절법을 이용한 리오캐스팅시킨 과공정 Al-Si합금에서 실리콘초정의 격자상수 측정)

  • Lee, Jung-Ill;Kim, Gyeung-Ho;Lee, Ho-In
    • Applied Microscopy
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    • v.25 no.3
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    • pp.99-107
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    • 1995
  • The morphological changes of primary solid particles as a function of process time on hypereutectic Al-15.5wt%Si alloy during semi-solid state processing with a shear rate of $200s^{-1}$ are studied. In this alloy, it was observed that primary Si crystals are fragmented at the early stage of stirring and morphologies of primary Si crystals change from faceted to spherical during isothermal shearing for 60 minutes. To understand the role of Al dissolved in the primary Si crystal by shear stress at high temperature, lattice parameters of the primary Si crystals are determined as a variation of high order Laue zone(HOLZ) line positions measured from convergent beam electron diffraction(CBED) pattern. The lattice parameter of the primary Si crystal in the rheocast Al-15.5wt%Si alloy shows tensile strain of about 5 times greater than that of the gravity casting. Increase of the lattice parameter by rheocasting is due to the increased amount of Al dissolved in the primary Si crystal accelerated by shear stress at high temperature. The amounts of solute Al in the primary Si crystal are measured quantitatively by EPMA method to confirm the CBED analysis.

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Self-Cleaning and Photocatalytic Performance of TiO2 Coating Films Prepared by Peroxo Titanic Acid

  • Yadav, Hemraj M.;Kim, Jung-Sik
    • Korean Journal of Materials Research
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    • v.27 no.11
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    • pp.577-582
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    • 2017
  • Self-cleaning and photocatalytic $TiO_2$ thin films were prepared by a facile sol-gel method followed by spin coating using peroxo titanic acid as a precursor. The as-prepared thin films were heated at low temperature($110^{\circ}C$) and high temperature ($400^{\circ}C$). Thin films were characterized by X-ray diffraction(XRD), Field-emission scanning electron microscopy(FESEM), UV-Visible spectroscopy and water contact angle measurement. XRD analysis confirms the low crystallinity of thin films prepared at low temperature, while crystalline anatase phase was found the for high temperature thin film. The photocatalytic activity of thin films was studied by the photocatalytic degradation of methylene blue dye solution. Self-cleaning and photocatalytic performance of both low and high temperature thin films were compared.

Effect of High-Temperature Spinning and PVP Additive on the Properties of PVDF Hollow Fiber Membranes for Microfiltration

  • Cha, Bong-Jun;Yang, Jung-Mok
    • Macromolecular Research
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    • v.14 no.6
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    • pp.596-602
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    • 2006
  • The effect of high-temperature spinning and poly(vinyl pyrrolidone) (PVP) additive on poly(vinylidene fluoride) (PVDF) hollow fiber membranes was investigated using differential scanning calorimetry, X-ray diffraction measurement, and scanning electron microscopy, together with the corresponding microfiltration performances such as water flux, rejection rate, and elongational strength. Using high-temperature spinning, porous hollow fiber membranes with particulate morphology were prepared through PVDF crystallization. The particulate structure of the membranes was further modified by the addition of miscible PVP with PVDF. Due to these effects, the rejection rate and strength of the fibers were increased at the expense of reduced water flux and mean pore size, which indicates that high-temperature spinning and PVP addition are vary effective to control the morphology of PVDF hollow fiber membranes for microfiltration.