• 제목/요약/키워드: electron diffraction pattern

검색결과 216건 처리시간 0.027초

The high thermal stability induced by a synergistic effect of ZrC nanoparticles and Re solution in W matrix in hot rolled tungsten alloy

  • Zhang, T.;Du, W.Y.;Zhan, C.Y.;Wang, M.M.;Deng, H.W.;Xie, Z.M.;Li, H.
    • Nuclear Engineering and Technology
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    • 제54권8호
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    • pp.2801-2808
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    • 2022
  • The synergistic effect of ZrC nanoparticle pining and Re solution in W matrix on the thermal stability of tungsten was studied by investigating the evolution of the microstructure, hardness and tensile properties after annealing in a temperature range of 1000-1700 ℃. The results of metallography, electron backscatter diffraction pattern and Vickers micro-hardness indicate that the rolled W-1wt%Re-0.5 wt% ZrC alloy has a higher recrystallization temperature (1600 ℃-1700 ℃) than that of the rolled pure W (1200 ℃), W-0.5 wt%ZrC (1300 ℃), W-0.5 wt%HfC (1400-1500 ℃) and W-K-3wt%Re alloy fabricated by the same technology. The molecular dynamics simulation results indicated that solution Re atoms in W matrix can slow down the self-diffusion of W atoms and form dragging effect to delay the growth of W grain, moreover, the diffusion coefficient decrease with increasing Re content. In addition, the ZrC nanoparticles can pin the grain boundaries and dislocations effectively, preventing the recrystallization. Therefore, synergistic effect of solid solution Re element and dispersed ZrC nanoparticles significantly increase recrystallization temperature.

Effect of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films

  • Kumar, Davinder;Singh, Avtar;Kaur, Navneet;Katoch, Apoorva;Kaur, Raminder
    • 한국재료학회지
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    • 제32권5호
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    • pp.249-257
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    • 2022
  • Transparent thin films of pure and nickel-doped ZrO2 are grown successfully by sol-gel dip-coating technique. The structural and optical properties according to the different annealing temperatures (300 ℃, 400 ℃ and 500 ℃) are investigated. Analysis of crystallographic properties through X-ray diffraction pattern reveals an increase in crystallite size due to increase in crystallinity with temperature. All fabricated thin films are highly-oriented along (101) planes, which enhances the increase in nickel doping. Scanning electron microscopy and energy dispersive spectroscopy are employed to confirm the homogeneity in surface morphology as well as the doping configuration of films. The extinction coefficient is found to be on the order of 10-2, showing the surface smoothness of deposited thin films. UV-visible spectroscopy reveals a decrease in the optical band gap with the increase in annealing temperature due to the increase in crystallite size. The variation in Urbach energy and defect density with doping and the change in annealing temperature are also studied.

Resistive Switching Effects of Zinc Silicate for Nonvolatile Memory Applications

  • Im, Minho;Kim, Jisoo;Park, Kyoungwan;Sok, Junghyun
    • 한국전기전자재료학회논문지
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    • 제35권4호
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    • pp.348-352
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    • 2022
  • Resistive switching behaviors of a co-sputtered zinc silicate thin film (ZnO and SiO2 targets) have been investigated. We fabricated an Ag/ZnSiOx/highly doped n-type Si substrate device by using an RF magnetron sputter system. X-ray diffraction pattern (XRD) indicated that the Zn2SiO4 was formed by a post annealing process. A unique morphology was observed by scanning electron microscope (SEM) and atomic force microscope (AFM). As a result of annealing process, 50 nm sized nano clusters were formed spontaneously in 200~300 nm sized grains. The device showed a unipolar resistive switching process. The average value of the ratio of the resistance change between the high resistance state (HRS) and the low resistance state (LRS) was about 106 when the readout voltage (0.5 V) was achieved. Resistance ratio is not degraded during 50 switching cycles. The conduction mechanisms were explained by using Ohmic conduction for the LRS and Schottky emission for the HRS.

Application of nanoparticles in extending the life of oil and gas transmission pipeline

  • Yunye, Liu;Hai, Zhu;Jianfeng, Niu
    • Structural Engineering and Mechanics
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    • 제84권6호
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    • pp.733-741
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    • 2022
  • The amount of natural gas that is used on a worldwide scale is continuously going up. Natural gas and acidic components, such as hydrogen sulfide and carbon dioxide, cause significant corrosion damage to transmission lines and equipment in various quantities. One of the fundamental processes in natural gas processing is the separation of acid gases, among which the safety and environmental needs due to the high toxicity of hydrogen sulfide and also to prevent wear and corrosion of pipelines and gas transmission and distribution equipment, the necessity of sulfide separation Hydrogen is more essential than carbon dioxide and other compounds. Given this problem's significance, this endeavor aims to extend the lifespan of the transmission lines' pipes for gas and oil. Zinc oxide nanoparticles made from the environmentally friendly source of Allium scabriscapum have been employed to accomplish this crucial purpose. This is a simple, safe and cheap synthesis method compared to other methods, especially chemical methods. The formation of zinc oxide nanoparticles was shown by forming an absorption peak at a wavelength of about 355 nm using a spectrophotometric device and an X-ray diffraction pattern. The size and morphology of synthesized nanoparticles were determined by scanning and transmission electron microscope, and the range of size changes of nanoparticles was determined by dynamic light scattering device.

나노 구조의 패턴을 갖는 n-type GaN 기판을 이용한 380 nm UV-LED의 광 추출 효율 개선 (Improvement in Light Extraction Efficiency of 380 nm UV-LED Using Nano-patterned n-type Gan Substrate)

  • 백광선;조민성;이영곤;;송영호;김승환;김재관;전성란;이준기
    • 한국재료학회지
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    • 제21권5호
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    • pp.273-276
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    • 2011
  • Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.

수렴성전자회절에 의한 n-형 세라믹 초전도체 $Nd_{2-x}Ce_xCuO_{4-\upsilon}$의 결정구조 전이 연구 (Inestigation on the Structural Transition of n-type Ceramic Superconductor, $Nd_{2-x}Ce_xCuO_{4-\upsilon}$ System of CBED)

  • 김정식;유광수
    • 한국세라믹학회지
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    • 제34권2호
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    • pp.139-144
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    • 1997
  • 결정학적으로 T' 구조인 Nd2-xCexCuO4-$\delta$ 회토류 구리산화물 초전도체는 지금까지 매우 복잡한 미세구조를 지닌 것으로써 잘 알려져 있다. 이 구리산화물 초전도체가 초전도 특성을 띠려면, Nd3+ 이온이 Ce4+ 이온에 의해 소량 치환되고 동시에 산소환원이 필요하다. 본 연구에서는 투과전자현미경의 수렴성 전자회절(CBED)패턴을 이용하여 Nd2-xCexCuO4-$\delta$ 의 Ce 미량 첨가와 미량의 산소환원에 따른 결정구조의 전이 발생 여부에 관하여 고찰하였다. 세 가지의 서로 다른 시편 Nd2CuO3,Nd1.85Ce0.15CuO4 와Nd1.85Ce0.15CuO3.965을 고상소결에 의하여 만들어 이들 각각 시편에 대한 CBED패턴을 주사투과전자현미경(STEM)으로 관찰하였다. 그리고 실험에 의하여 얻은 이들 HOLZ선들과 컴퓨터 계산에 의해 그려진 이론적인 HOLZ선들과 비교하는 방법에 의하여 Nd1.85Ce0.15CuO4의 격자상수를 구하였다.

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Chemisorption of CO on ultrathin epitaxial Ni films n Cu(001) surface

  • E.K. Hwang;J.J. Oh;Lee, J.S.;Kim, S.K.;Kim, J.S.;Kim, J.S.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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    • pp.182-182
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    • 1999
  • The chemisorption effect of CO on the Ni/Cu(001) surface was investigated using LEED(Low Energy Electron Diffraction) and EELS(Electron Energy Loss Spectrscopy0 under the UHV conditions. after mounting the Cu(001) single crystal in the UHV chamber (base pressure 1$\times$10-10Torr), a clean surface was obtained after a few cycles of repeated Ar+ ion sputtering and annealing at about 40$0^{\circ}C$. The epitaxial thin Ni films were formed on the Cu(001) by evaporation from 99.999% Ni block. The pseudomorphic growth and the orderness of the thin Ni films were monitored by c(2$^{\circ}C$2) LEED pattern. CO adlayers on Ni epitaxial thin films were prepared by dosing pure CO has through a leak valve. After CO adsorpton at room temperature, two pairs of peaks were observed by EELS, whose relative intensities are changed as the film thickness is varied and time is elapsed. These two pair of peaks are likely related to different bonding sites (-top and bridge sites) of C-Ni as well as C-O vibration. Experimental results and qualitative interpretation of the spectra wille be discussed. The possibility of using EELS in combination with probe species (CO) to investigate the nature of thin film growth is mentioned. We will report the experimental result of O2 dosage on Ni film and interaction of CO and O2.

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초청정한 Si 기판 위에서 Ti의 초기 반응 (Initial Reactions of Ti on the Atomically Clean Si Substrates)

  • 전형탁
    • 분석과학
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    • 제5권3호
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    • pp.303-308
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    • 1992
  • Ti과 Si의 초기 반응이 Titanium Silicide의 표면 거칠기 (Surface roughness)를 고찰하기 위해 연구하였다. 형성기구는 In-situ AES와 LEED의 측정장비로 연구하였다. Ti의 하나나 두 원자층이 초고진공에서 원자적으로 깨끗한 Si 기판 위에 증착되었다. Reconstruction이 된 $7{\times}7$ Si(111) 표면이 초 고진공하에서 얻어졌으며 박막의 증착은 Quartz Crystal Oscillator로 측정되었다. In-situ 측정 결과 Ti과 Si의 초기 반응이 실온에서 일어났으며 Disorder막을 형성하였다. 낮은 온도($200^{\circ}C{\sim}300^{\circ}C$)에서 Ti과 Si의 Intermixing이 고찰되었고 $400^{\circ}C$ 근처에서 $1{\times}1$ Si(111) LEED 패턴이 관찰되었다. 이것은 Disorder막이 Order막으로 변화가 생긴 것을 나타낸다. 더 높은 온도에서 $7{\times}7$ Si(111) LEED 패턴이 재관찰되었는데 이것은 3차원적인 $TiSi_2$의 형성을 증명하는 것이다.

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왕겨를 통한 실리카 나노스페어의 제작과 특성 (Fabrication and property of silica nanospheres via rice-husk)

  • 임유빈;곽도환;;이현철;김영순;양오봉;신형식
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 추계학술대회 논문집
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    • pp.619-619
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    • 2009
  • Recently, silica nanostructures are widely used in various applicationary areas such as chemical sensors, biosensors, nano-fillers, markers, catalysts, and as a substrate for quantum dots etc, because of their excellent physical, chemical and optical properties. Additionally, these days, semiconductor silica and silicon with high purity is a key challenge because of their metallurgical grade silicon (MG-Si) exhibit purity of about 99% produced by an arc discharge method with high cast. Tremendous efforts are being paid towards this direction to reduce the cast of high purity silicon for generation of photovoltaic power as a solar cell. In this direction, which contains a small amount of impurities, which can be further purified by acid leaching process. In this regard, initially the low cast rice-husk was cultivated from local rice field and washed well with high purity distilled water and were treated with acid leaching process (1:10 HCl and $H_2O$) to remove the atmospheric dirt and impurity. The acid treated rice-husk was again washed with distilled water and dried in an oven at $60^{\circ}C$. The dried rice-husk was further annealed at different temperatures (620 and $900^{\circ}C$) for the formation of silica nanospheres. The confirmation of silica was observed by the X-ray diffraction pattern and X-ray photoelectron spectroscopy. The morphology of obtained nanostructures were analyzed via Field-emission scanning electron microscope(FE-SEM) and Transmission electron microscopy(TEM) and it reveals that the size of each nanosphares is about 50-60nm. Using the Inductively coupled plasma mass spectrometry(ICP-MS), Silica was analyzed for the amount of impurities.

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XRD와 XPS를 사용한 산화아연 박막의 결함형성과 산소연관 결합사이의 상관성 (Correlation between Oxygen Related Bonds and Defects Formation in ZnO Thin Films by Using X-ray Diffraction and X-ray Photoelectron Spectroscopy)

  • 오데레사
    • 한국재료학회지
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    • 제23권10호
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    • pp.580-585
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    • 2013
  • To observe the formation of defects at the interface between an oxide semiconductor and $SiO_2$, ZnO was prepared on $SiO_2$ with various oxygen gas flow rates by RF magnetron sputtering deposition. The crystallinity of ZnO depends on the characteristic of the surface of the substrate. The crystallinity of ZnO on a Si wafer increased due to the activation of ionic interactions after an annealing process, whereas that of ZnO on $SiO_2$ changed due to the various types of defects which had formed as a result of the deposition conditions and the annealing process. To observe the chemical shift to understand of defect deformations at the interface between the ZnO and $SiO_2$, the O 1s electron spectra were convoluted into three sub-peaks by a Gaussian fitting. The O 1s electron spectra consisted of three peaks as metal oxygen (at 530.5 eV), $O^{2-}$ ions in an oxygen-deficient region (at 531.66 eV) and OH bonding (at 532.5 eV). In view of the crystallinity from the peak (103) in the XRD pattern, the metal oxygen increased with a decrease in the crystallinity. However, the low FWHM (full width at half maximum) at the (103) plane caused by the high crystallinity depended on the increment of the oxygen vacancies at 531.66 eV due to the generation of $O^{2-}$ ions in the oxygen-deficient region formed by thermal activation energy.