• Title/Summary/Keyword: electromigration

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Comparison of Cu wafer and Disc using the electrochemical and Friction method during the CMP (Chemical Mechanical Planarization) (CMP 공정중 전기화학적 방법과 마찰력을 이용하여 Cu wafer와 Disc의 특성 비교)

  • Kang, Young-Jae;Eom, Dae-Hong;Song, Jae-Hoon;Park, Jin-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.1300-1303
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    • 2004
  • Copper는 낮은 저항률과 높은 Electromigration 저항 때문에 반도체 소자에 배선 재료로 사용된다. CMP 공정을 이용 하여 Cu wafer의 여러 가지 특성을 파악하기에는 wafer의 소모량이 많고 고가가의 비용이 예상 되므로, 본 논문에서는 비용절감을 위하여 wafer를 Disc로 대체 하고자 실험을 진행 하였고 Cu wafer와 Disc의 비료 방법은 우선 PM-5 (Genitech. co) 장비를 이용하여 removal rate의 차이점을 알 아 보았으며, 서로의 etch rate을 reomval rate과 비교하였다. EG&G 273A를 통하여 Cu wafer와 disc의 corrosion potential과 $R_p$ (Polarization resistance)값을 서로 비교 하였다. 이 논문에서는 이러한 것들을 서로 비교 하여, Cu wafer와 disc에서의 상관관계를 알고자 하였으며, 만약에 Cu wafer와 disc의 특성이 비슷하다면, Cu wafer 대신에 disc를 이용 하여 실험하여도 되는지에 관하여 조사 하였다.

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토양환경복원과 관련 동전기 기술의 적용에 대한 저항상태에 따른 전기삼투량 변화의 이해

  • 양지원;김상준;박지연;이유진;기대정
    • Proceedings of the Korean Society of Soil and Groundwater Environment Conference
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    • 2003.09a
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    • pp.330-333
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    • 2003
  • Recently electrokinetic process is known to be a promising remediation technology for the contaminated soils with heavy metals, radionuclides, organic matters, and so on. The contaminants in electrokinetic technology are removed mainly by three mechanisms; electroosmosis, electromigration, and electrophoresis. When direct current is introduced between two electrodes planted in soil, a large amount of hydrogen ions is formed and moves from anode to cathode with the other cations contained in electrolyte. The water flow caused by tile movement of cations is called as electroosmosis. Especially for non-ionic pollutants, the electroosmotic flow(EOF) is the most important removal mechanism among them and transports contaminants from anode to cathode along the water flow. In this study, characteristics of electroosmotic flow was investigated according to the resistance state of soil. The decrease, maintenance, and increase of soil resistance could be obtained by controlling ions in soil. When the resistance of soil was decreasing or maintained, the EOF is proportional to electric current and voltage, respectively and when the resistance was increasing, the EOF is proportional to only electric current not voltage.

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Copper MOCVD using catalytic surfactant : Novel concept

  • Hwang, Eui-Seong;Lee, Jihwa
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.30-30
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    • 1999
  • 알루미늄에 비해 전기저항이 낮고 electromigration 및 stress-migration에 대한 저항서이 높은 구리는 차세대 반도체 소자의 배선금속 재료로 여겨지고 있다. 최근 Chemical Mechanical Polishing (CMP) 기술의 도래로 구리배선 공정의 채택이 더욱 앞당겨질 전망이다. 한편, 구리 MOCVD를 위해 다양한 전구체화합물이 합성되었고, 근래에는 Cu(I)(hfc)L (L은 Lewis base 형태의 ligand) 형태의 전구체를 이용한 많은 증착 연구를 통하여 순수하고 전기저항이 낮은 구리 박막의 증착이 보고되었다. 구리 MOCVD의 가장 큰 문제점은 증착속도가 150-$^{\circ}C$20$0^{\circ}C$에서 500$\AA$/min 이하로 낮고 또한 증착된 필름 표면이 매우 거칠다는 데 있다. 이러한 단점으로 인해 전기화학적 증착후 CMP를 적용하는 것이 더욱 경제적이라는 견해가 우세해 지고 있다. 본 강연에서는 박막의 증착 속도와 표면 거칠기를 동시에 향사시키기 위해 catalytic surfactant를 이용한 새로운 MOCVD 개념을 도입하고, 구리 MOCVD에서 단원자층으로 흡착된 요오드 원자가 그 역할을 수행할 수 있음을 보이겠다. 또 요오드원자가 표면반응을 어떻게 수정하여 활성화에너지를 낮추는가를 반응메카니즘으로 밝히고 표면 평탄화의 미시적 해석을 제공하고자 한다. Catalytic Surfactant의 개념은 다른 박막 재료의 MOCVD에도 적용될 수 있으며, 나아가 적절한 기판 표면처리를 통하여 epitaxy도 가능할 것으로 본다.

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Atomic Layer Depositied Tungsten Nitride Thin Films as Diffusion Barrier for Copper Metallization

  • Hwang, Yeong-Hyeon;Lee, In-Hwan;Jo, Byeong-Cheol;Kim, Yeong-Hwan;Jo, Won-Ju;Kim, Yong-Tae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.145-145
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    • 2012
  • 반도체 집적회로의 집적도가 증가함에 따라 RC delay가 증가하며, 금속 배선의 spiking, electromigration 등의 문제로 인해 기존의 알루미늄 금속을 대체하기 위하여 구리를 배선재료로 사용하게 되었다. 하지만 구리는 실리콘 및 산화물 내에서 매우 빠른 확산도를 가지고 있으므로, 구리의 확산을 막아 줄 확산방지막이 필요로 하다. 이러한 확산방지막의 증착은, 소자의 크기가 작아짐에 따라 via/contact과 같은 고단차 구조에도 적용이 가능하도록 기존의 sputtering 증착 방법에서 이를 개선한 collimated sputter, long-throw sputter, ion-metal plasma 등의 방법으로 물리적인 증착법이 지속되어 왔지만, 근본적인 증착방법을 바꾸지 않는 한 한계에 도달하게 될 것이다. 원자층 증착법(ALD)은 CVD 증착법의 하나로, 소스와 반응물질을 주입하는 시간을 분리함으로써 증착하고자 하는 표면에서의 반응을 유도하여 원자층 단위로 원하는 박막을 얻을 수 있는 증착방법이다. 이를 이용하여 물리적 증기 증착법(PVD)보다 우수한 단차피복성과 함께 정교하게 증착두께를 컨트롤을 할 수 있다. 본 연구에서는 이러한 원자층 증착법을 이용하여 구리 배선을 위한 확산방지막으로 텅스텐질화막을 형성하였다. 텅스텐 질화막을 형성하기 위하여 금속-유기물 전구체와 함께 할라이드 계열인 WF6를 텅스텐 소스로 이용하였으며, 이에 대한 원자층 증착방법으로 이루어진 박막의 물성을 비교 평가하여 분석하였다.

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A study on the removal of heavy metals from soils using electrokinetic soil processing and ion exchange membrane (전기장과 이온교환막을 이용한 토양에서의 중금속 제거에 대한 연구)

  • 김순오
    • Economic and Environmental Geology
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    • v.32 no.1
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    • pp.43-51
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    • 1999
  • In order to remediate hazardous waste site, a process of electrokinetically purging chemicals from saturated soil is examined by laboratory experiments. Electrokinetic soil remediation is one of the most promising soil decontamination processes that habe igh removal efficiency and time-effectiveness in low-permeability soils such as clay. Being combined with several mechanisms-electromigration, elec troosmosis, diffusion and electrolysis of water, electrokinetic soil processing can remove non-polar organics as well as ionic contaminants. The objectives of this study are; 1) the exploration of the feasibility of electrokinetic soil processing on the removal of heavy metals, 2) the investigation of applicability to the tailing-soils in aban doned mining area, 3) the examination of effects of soil pH and conductivity on the transport phenomena of elements in soils, and 4) the investigation of the applicability of the ionexchange membrance to the efficient collection of heavy metals removed from contaminated soils. With the result of this study, it is suggested that the removal efficiency is significantly influenced by applied voltage & current, type of purging solutions, soil pH, permeability and zeta potentials of soil. Although further study should be needed, it is possible to collect removed heavy metals with ion-exchange membrance in cathode compartment.

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The Effect of Hydroxy Ethyl Cellulose(HEC) on the Surface Morphology and Mechanical Characteristis of Copper Electrodeposition (구리 전해도금 시 표면형상과 기계적 특성에 미치는 HEC효과)

  • Woo, Tae-Gyu;Park, Il-Song;Lee, Hyun-Woo;Seol, Kyeong-Won
    • Korean Journal of Materials Research
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    • v.16 no.11
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    • pp.710-714
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    • 2006
  • The purpose of this study is to identify the effect of additives and composition on copper surface morphology and mechanical characteristics by copper electrodeposition. Additives such as hydroxy ethyl cellulose(HEC), chloride ion were used in this study. Electrochemical experiments allied to SEM, XRD, AFM and four- point probe were performed to characterize the morphology and mechanical characters of copper in the presence of additives. Among various electrodeposition conditions, the minimum surface roughness of copper foil was obtained when electrodeposited at the current density of 200 mA/$cm^2$ for 68 seconds with 2 ppm of HEC. The minimum value of surface roughness(Rms) was 107.6 nm. It is copper foil is good for electromigration inhibition due to preferential crystal growth of Cu (111) deposited in the electrolyte containing chloride ions(10 ppm) and HEC(1 ppm).

NUCLIDE SEPARATION MODELING THROUGH REVERSE OSMOSIS MEMBRANES IN RADIOACTIVE LIQUID WASTE

  • LEE, BYUNG-SIK
    • Nuclear Engineering and Technology
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    • v.47 no.7
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    • pp.859-866
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    • 2015
  • The aim of this work is to investigate the transport mechanism of radioactive nuclides through the reverse osmosis (RO) membrane and to estimate its effectiveness for nuclide separation from radioactive liquid waste. An analytical model is developed to simulate the RO separation, and a series of experiments are set up to confirm its estimated separation behavior. The model is based on the extended Nernst-Plank equation, which handles the convective flux, diffusive flux, and electromigration flux under electroneutrality and zero electric current conditions. The distribution coefficient which arises due to ion interactions with the membrane material and the electric potential jump at the membrane interface are included as boundary conditions in solving the equation. A high Peclet approximation is adopted to simplify the calculation, but the effect of concentration polarization is included for a more accurate prediction of separation. Cobalt and cesium are specifically selected for the experiments in order to check the separation mechanism from liquid waste composed of various radioactive nuclides and nonradioactive substances, and the results are compared with the estimated cobalt and cesium rejections of the RO membrane using the model. Experimental and calculated results are shown to be in excellent agreement. The proposed model will be very useful for the prediction of separation behavior of various radioactive nuclides by the RO membrane.

Characteristics of Electrokinetic Remediation of Unsaturated Soil I : Experimental Study (불포화토의 동전기 정화 특성 I : 실험적 연구)

  • Kim, Byung Il;Han, Sang Jae;Kim, Soo Sam
    • KSCE Journal of Civil and Environmental Engineering Research
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    • v.26 no.1C
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    • pp.1-8
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    • 2006
  • The purpose of this study is to experimentally analysis the eletrokinetic phenomena and remediation characteristics developed during the application of electrokinetic remediation technique to unsaturated soils contaminated by heavy metals. In the laboratory a series of column tests are performed on degree of saturation for shooting range soil. The test results indicated that Pb is mainly removed under unsaturated conditions by electromigration within diffuse double layer, and if the initial containment concentration is below cation exchange capacity and equals to adsorption per unit soil solid weight, the remedial efficiency decreases with the decreasing of transport efficiency due to the changes in the degree of saturation in the electric gradient of 1V/cm.

Past and Present Research Topics within the Korean Micoelectronics and Packaging Using Social Network Analysis (미래를 향하는 한국 마이크로 패키징 학회지의 과거와 현재 연구영역에 관한 연구)

  • Lee, Hyunjoung;Sohn, Il
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.3
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    • pp.9-17
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    • 2015
  • After its inception in 1994, the Journal of the Microelectronics and Packaging Society has continued to make significant strides in the number and quality of publications within its field. The interest in the microelectronics and packaging research has become more critical as consumer electronic products continue its increasing trend towards thinner and lighter devices that tests the boundaries of electronic devices. This study utilizes social network analysis of all published literature in the Journal for the past 22 years. Using the keywords and abstracts available within each individual article, the publications within the Journal has focused on major topics covering (1) flip chip, (2) reliability, (3) Cu, (4) IMC (intermetallic compounds), and (5) thin film. Using the social network relationship between keywords within articles, flip chip was closely associated with reliability, BGA (ball grid array), contact resistance, electromigration in many of the published research works within the Journal. From the centrality analysis, it was found that flip chip, reliability, Cu, thin film, IMC, and RF (radio frequency) to have a high degree of centrality suggesting these key areas of research have relatively high connectivity with other research topics within the Journal and is central to many of the research fields within the micro-electronics and packaging area. The cohesiveness analysis showed research clustering of five major cohesive sub-groups and was mapped to better understand the major area of research within this field. Research within the field of micro-electronics and packaging converges many disciplines of science and engineering. The continued evolution within this field requires an understanding of the rapidly changing industry environment and the consumer needs.

Cu(dmamb)2 전구체를 이용한 구리박막제조 시 캐리어가스가 박막성장에 미치는 영향

  • Choe, Jong-Mun;Lee, Do-Han;Jin, Seong-Eon;Lee, Seung-Mu;Byeon, Dong-Jin;Jeong, Taek-Mo;Kim, Chang-Gyun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.11a
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    • pp.29.2-29.2
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    • 2009
  • 구리는 낮은 비저항, 높은 열전도도, 우수한 electromigration(EM)저항특성 등을 바탕으로 차세대 nano-scale집적회로의 interconnect application에 적합한 금속재료로서 각광받고 있다. copper interconnect는 damascene process 를주로 이용하는데 CVD를 이용하면 step coverage가우수한 seed layer얻을 수 있어 고집적 소자의 구현이 가능하다. 최근에 비 균등화 반응(disproportionationreaction)을 이용하여 고 순도 구리박막을 제조하기위해 $\beta$-diketonate Cu(I) Lewis-base의 전구체를 많이 이용하는데 그중에서 hexafluoroacetylacetonate(hfac)Cu(I)vinyltrimethylsilane (VTMS)가 널리 이용되고 있다. 그러나 (hfac)Cu(I)(VTMS) 또는 유사계열의 전구체들은 열적안정성및 보관안정성이 부족하여 실제 양산공정에 적합하지 못한 단점이 있었다. 본 연구에 이용된 2가 전구체Cu(dmamb)2는 높은 증기압($70^{\circ}C$, 0.9torr)을 가지며 종래에 주로 이용하던 1가 전구체 (hfac)Cu(VTMS)에 비해 높은 활성화 에너지(~113 kJ/mol)를가짐으로서 열적안정성 및 보관안정성이 우수하다. 다른 한편으로 2가전구체는 안정성이 우수한 만큼 낮은 증기압을 극복하기 위해 리간드에 플루오르를 주로 치환하여 증기압을 높이는데 플루오르는 성장하는 박막의 접착력을약하게 하는 단점을 가진다. 하지만 본 연구에 사용된 Cu(dmamb)2는 리간드에 플루오르를 포함하지 않으며, 따라서 고품질의 박막을 용이한성장환경에서 제조할 수 있는 장점들을 제공한다. 비활성가스 분위기에서 2가전구체는 열에너지에 의해 리간드의 자가환원에따라 금속-리간드 분해가 발생한다. 하지만 수소분위기에서는수소가 환원제로 작용하여 리간드의 분해를 용이하게 하는 특징을 가지며 따라서 비활성분위기일 때 비해 낮은 성장온도를 가진다. 또한 수소는 잔류하는 리간드 및 불순물과 결합하여 휘발성화학종들을 생성하여 고순도의 구리박막제조를 가능하게한다.

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