• 제목/요약/키워드: electrochemical deposition

검색결과 468건 처리시간 0.024초

CBD(Chemical Bath Deposition) 법으로 제조된 전기화학식 캐패시터용 NiO 나노박편 필름 (Nickel Oxide Nano-Flake Films Synthesized by Chemical Bath Deposition for Electrochemical Capacitors)

  • 김영하;박수진
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.163.2-163.2
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    • 2010
  • In this work, nano-flake shaped nickel oxide (NiO) films were synthesized by chemical bath deposition technique for electrochemical capacitors. The deposition was carried out for 1 and 2 h at room temperature using nickel foam as the substrate and the current collector. The structure and morphology of prepared NiO film were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). And, electrochemical properties were characterized by cyclic voltammetry, galvanostatic charge-discharge, and AC impedence measurement. It was found that the NiO film was constructed by many interconnected NiO nano-flakes which arranged vertically to the substrate, forming a net-like structure with large pores. The open macropores may facilitate the electrolyte penetration and ion migration, resulted in the utilization of nickel oxide due to the increased surface area for electrochemical reactions. Furthermore, it was found that the deposition onto nickel foam as substrate and curent collector led to decrease of the ion transfer resistance so that its specific capacitance of a NiO film had high value than NiO nano flake powder.

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전기화학증착법으로 양극산화 알루미늄(AAO) 템플레이트를 이용한 Ni 나노와이어의 제조 및 성장에 관한 연구 (Fabrication and Growth of Ni Nanowires by using Anodic Aluminum Oxide(AAO) Template via Electrochemical Deposition)

  • 심성주;조권구;김유영
    • 한국분말재료학회지
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    • 제18권1호
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    • pp.49-55
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    • 2011
  • Ni nanowires were fabricated using anodic aluminum oxide (AAO) membrane as a template by electrochemical deposition. The nanowires were formed within the walls of AAO template with 200 nm in pore diameter. After researching proper voltage and temperature for electrochemical deposition, the length of Ni nanowires was controlled by deposition time and the supply of electrolyte. The morphology and microstructure of Ni nanowires were investigated by field emission scanning electron microscope (FE-SE), X-ray diffraction (XRD) and transmission electron microscope (TEM).

Growing High-Quality Ir-Sb Nanostructures by Controlled Electrochemical Deposition

  • Nisanci, Fatma Bayrakceken
    • Journal of Electrochemical Science and Technology
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    • 제11권2호
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    • pp.165-171
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    • 2020
  • The electrochemical preparation and spectroscopic characterisation of iridium-antimony (Ir-Sb) species is important owing to their potential applications as nanostructure materials. Nanostructures, i.e. nanoflower and nanodisk, of Ir-Sb were electrodeposited on conductive substrates using a practical electrochemical method based on the simultaneous underpotential deposition (UPD) of Ir and Sb from the IrCl3 and Sb2O3 at a constant potential. Electrochemical UPD mechanism of Ir-Sb was studied using cyclic voltammetry and potential-controlled electrochemical deposition techniques. Herein, X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy, X-ray photoelectron and Raman spectroscopy were used to determine the morphological and structural properties of the electrochemically-synthesised Ir-Sb nanostructures.

Pulsed Electrochemical Deposition for 3D Micro Structuring

  • Park, Jung-Woo;Ryu, Shi-Hyoung;Chu, Chong-Nam
    • International Journal of Precision Engineering and Manufacturing
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    • 제6권4호
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    • pp.49-54
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    • 2005
  • In this paper, micro structuring technique using localized electrochemical deposition (LECD) with ultra short pulses was investigated. Electric field in electrochemical cell was localized near the tool tip end region by applying pulses of a few hundreds of nano second duration, Pt-Ir tip was used as a counter electrode and copper was deposited on the copper substrate in mixed electrolyte of 0.5 M $CuSO_4$ and 0.5 M $H_2SO_4$, The effectiveness of this technique was verified by comparison with ECD using DC voltage. The deposition characteristics such as size, shape, surface, and structural density according to applied voltage and pulse duration were investigated. The proper condition was selected based on the results of the various experiments. Micro columns less than $10{\mu}m$ in diameter were fabricated using this technique. The real 3D micro structures such as micro spring and micro pattern were made by the presented method.

Electrodeposition of SnO2-doped ZnO Films onto FTO Glass

  • Yoo, Hyeonseok;Park, Jiyoung;Kim, Yong-Tae;Kim, Sunkyu;Choi, Jinsub
    • Journal of Electrochemical Science and Technology
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    • 제10권1호
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    • pp.61-68
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    • 2019
  • Well aligned $SnO_2$-doped ZnO nanorods were prepared by single step or 2-step electrochemical depositions in a mixture solution of zinc nitrate hexahydrate, ammonium hydroxide solution and 0.1 M tin chloride pentahydrate. The morphologies of electrochemically deposited $SnO_2$-doped ZnO were transformed from plain (or network) structures at low reduction potential to needles on hills at high reduction potential. Well aligned ZnO was prepared at intermediate potential ranges. Reduction reagent and a high concentration of Zn precursor were required to fabricate $SnO_2$ doped ZnO nanorods. When compared to results obtained by single step electrochemical deposition, 2-step electrochemical deposition produced a much higher density of nanorods, which was ascribed to less potential being required for nucleation of nanorods by the second-step electrochemical deposition because the surface was activated in the first-step. Mechanisms of $SnO_2$ doped ZnO nanorods prepared at single step or 2-step was described in terms of applied potential ranges and mass-/charge- limited transfer.

전기화학적 도금을 이용한 wrap-around 게이트 나노구조의 제작 (Fabrication of wrap-around gate nanostructures from electrochemical deposition)

  • 안재현;홍수헌;강명길;황성우
    • 전기전자학회논문지
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    • 제13권2호
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    • pp.126-131
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    • 2009
  • Wrap-around 전계효과 트랜지스터는 채널과 전극간의 커플링을 매우 커서 채널길이가 짧아지면서 생기는 단채널효과(short channel effect)를 개선시킬 수 있는 이유로 많은 관심을 불러왔다. 본 논문에서는 실리콘 나노와이어를 이용하여 상향식의 wrap-around 전계효과 트랜지스터(FET)의 제작 공정을 소개한다. 소자의 제작 공정은 크게 전자빔 리소그래피, 유전영동(dielectrophoresis)을 이용한 나노와이어의 효과적 정렬 그리고 게이트 전극의 전기 화학적 도금(electrochemical deposition)을 이용한 생성 등의 방법들로 이루어진다. 전기 화학적 도금을 위한 용액은 독성을 띄지 않는 유기물 용액을 사용하였다. 액체 질소를 이용하여 polymethyl methacrylate(PMMA)가 전기화학적 도금시 형태를 잃지 않게 함으로써, 패터닝된 PMMA가 wrap-around 게이트 나노구조를 제작하기 위한 나노 템플릿으로 사용될 수 있도록 하였다.

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초단펄스 전해증착을 이용한 마이크로 형상 제작 (Microfabrication by Localized Electrochemical Deposition Using Ultra Short Pulses)

  • 박정우;류시형;최덕기;주종남
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1199-1202
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    • 2003
  • In this research, microfabrication technique using localized electrochemical deposition is presented. Electric field is localized near the tip end region by applying ultra short pulses. Platinum tip is used as the counter electrode and copper is deposited on the copper substrate in 0.5 M CuSO$_4$ and 0.5 M H$_2$SO$_4$ electrolyte. The deposition characteristics such as size, shape, and structural density according to pulse duration and applied voltage are investigated. Micro-columns less than 10 $\mu\textrm{m}$ in diameter are fabricated using the presented technique. The process can be potentially used for three dimensional metal structure fabrications with micrometer feature size.

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전기화학적 전착에 의한 ZnSe박막 구조 및 발광특성 (Structural and luminescent properties of ZnSe thin films by electrochemical deposition)

  • 김환동;최길호;윤도영
    • 반도체디스플레이기술학회지
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    • 제7권4호
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    • pp.19-22
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    • 2008
  • Thin film has been an increasing important subject of intensive research, owing to the fact that these films possess desirable optical, electrical and electrochemical properties for uses in many semi-conducting nano-crystal applications, such as light-emitting diodes, lasers and solar cell applications. Here, ZnSe thin films were deposited by electrochemical method for the applications of light emitting diode. Electrochemical deposition of ZnSe thin film is not easy, because of the high difference of reduction potential between zinc ion and selenium acid. In order to handle the band gap of ZnSe crystal thin films easily, electrochemical methods are promising to manufacture these films economically. Therefore we have investigated the present study to characterize zinc selenide thin films deposited on ITO glass plates electrochemically. The luminescent properties of ZnSe films have been evaluated by UV-Vis spectrometer and luminescence spectrometer. And the morphology of the film surface has been discussed qualitatively from SEM images.

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