• Title/Summary/Keyword: electric deposition

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The development of ultrasonic transmitter to enhance the efficiency of heat transfer rate in boiler (보일러내 열 전달 효율 개선을 위한 초음파발신기 개발)

  • Heo, Pil-Woo;Lee, Yang-Lae;Lim, Eui-Su;Koh, Kwang-Sik
    • Journal of Sensor Science and Technology
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    • v.12 no.2
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    • pp.95-101
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    • 2003
  • Ultrasonic transmitter used for scale prevention in boiler or heat exchanger is composed of the magnetostrictive material which transforms electric energy into ultrasonic wave and the horn which amplifies generated ultrasonic wave and transfers it into medium loaded. In this paper, we have performed the shape design for magnetostrictive material and analyzed a few type of horns which amplify generated ultrasonic wave and found each solution theoretically. Final length of the horn has been determined by measuring the sound pressure in medium between theoretical value and experience data. At last we have given the results of our study for the effects of ultrasonic wave irradiated by manufactured ultrasonic transmitter on preventing scale deposition on test pipe under the similar condition to boiler.

In-Situ Heat Cooling using Thick Graphene and Temperature Monitoring with Single Mask Process

  • Kwack, Kyuhyun;Chun, Kukjin
    • Journal of Sensor Science and Technology
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    • v.24 no.3
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    • pp.155-158
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    • 2015
  • In this paper, in-situ heat cooling with temperature monitoring is reported to solve thermal issues in electric vehicle (EV) batteries. The device consists of a thick graphene cooler on top of the substrate and a platinum-based resistive temperature sensor with an embedded heater above the graphene. The graphene layer is synthesized by using chemical vapor deposition directly on the Ni layer above the Si substrate. The proposed thick graphene heat cooler does not use transfer technology, which involves many process steps and does not provide a high yield. This method also reduces the mechanical damage of the graphene and uses only one photomask. Using this structure, temperature detection and cooling are conducted simultaneously using one device. The temperature coefficient of resistance (TCR) of a $1{\times}1mm^2$ temperature sensor on 1-$\grave{i}m$-thick graphene is $1.573{\times}10^3ppm/^{\circ}C$. The heat source cools down $7.3^{\circ}C$ from $54.4^{\circ}C$ to $47.1^{\circ}C$.

A Study on the properties of aluminum nitride films on the Al7075 deposited by pulsed DC reactive magnetron sputtering

  • Kim, Jung-hyo;Cha, Byung-Chul;Lee, Keun-Hak;Park, Won-Wook
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.11a
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    • pp.179-180
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    • 2012
  • Aluminum alloys are widely known as non-ferrous metal with light weight and high strength. Consequently, these materials take center stage in the aircraft and automobile industry. The Al7075 aluminum alloy is based on the Al-Zn-Mg-Cu and one of the strongest wrought aluminum alloys. Aluminum nitride has ten times higher thermal conductivity($319W/m{\cdot}K$) than Al2O3 and also has outstanding electric insulation($1{\times}1014{\Omega}{\cdot}cm$). Furthermore, it has high mechanical property (430 MPa) even though its co-efficient of thermal expansion is less than alumina For these reasons, it has great possibilities to be used for not only the field which needs high strength lightweight but also electronic material field because of its suitability to be applied to the insulator film of PCB or wafer of ceramic with high heat conduction. This paper investigates the mechanical properties and corrosion behavior of aluminum alloy Al7075 deposited with aluminum nitride thin films To improve the surface properties of Al7075 with respect to hardness, and resistance to corrosion, aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films.

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Ferroelectric and Magnetic Properties of BiFeO3 Thin Films Deposited on SrTiO3 Substrate (SrTiO3기판 위에 증착한 BiFeO3박막의 강유전 및 자기적 특성)

  • Lee, Eun-Gu;Kim, Sun-Jae;Lee, Jae-Gab
    • Journal of the Korean Ceramic Society
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    • v.45 no.6
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    • pp.358-362
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    • 2008
  • $BiFeO_3$ films were hetero-epitaxially grown on $SrTiO_3$ substrate with a various orientation by pulse laser deposition. $BiFeO_3$ films grown on (111) $SrTiO_3$ substrate have a rhombohedral structure, identical to that of single crystals. On the other hand, films grown on (110) or (001) $SrTiO_3$ substrate are monoclinically distorted from the rhombohedral structure due to the epitaxial constraint. The easy axis of spontaneous polarization is close to [111] for the variously oriented films. Dramatically enhanced polarization and magnetization have been found for $BiFeO_3$ thin films grown on $SrTiO_3$ substrate comparing to that of $BiFeO_3$ crystals. The results are explained in terms of an epitaxially-induced transition between cycloidal and homogeneous spin states, via magneto-electric interactions.

Effect of Nano Buffer Layer on Property and Growth of Carbon Thin Film (탄소계 박막의 성장과 특성에 대한 나노 Buffer Layer의 영향)

  • ;Takashi lkuno;Kenjirou Oura
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.1
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    • pp.53-59
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    • 2003
  • Using Platinum-silicide (PtSi) formed between silicon substrate and carbon film, we have improved the field emission of electrons from carbon films. Pt films were deposited on n-Si(100) substrates at room temperature by DC sputter technique. After deposition, these PtSi thin films were annealed at 400 ~ $600^{\circ}C$ in a vacuum chamber, and the carbon films were deposited on those Pt/Si substrates by laser ablation at room temperature. The field emission property of C/Pt/Si system is found to be better than that of C/Si system and it is showed that property was improved with increasing annealing temperature. The reasons why the field emission from carbon film was improved can be considered as follows, (1)the resistance of carbon films was decreased due to graphitization, (2)electric field concentration effectively occurred because the surface morphology of carbon film deposited on Pt/si substrates with rough surface, (3)it is showed that annealing induced reaction between Pt film and Si substrate, as a consequence that the interfacial resistance between Pt film and Si substrate was decreased.

Direct Bonding Characteristics of 2 inch 3C-SiC Wafers for MEMS in Hash Environments (극한환경 MEMS용 2 inch 3C-SiC 기판의 직접접합 특성)

  • Chung, Yun-Sik;Ryu, Ji-Goo;Kim, Kyu-Hyun;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.387-390
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    • 2002
  • SiC direct bonding technology is very attractive for both SiCOI(SiC-on-insulator) electric devices and SiC-MEMS(micro electro mechanical system) fields because of its application possibility in harsh environments. This paper presents pre-bonding techniques with variation of HF pre-treatment conditions for 2 inch SiC wafer direct bonding using PECVD(plasma enhanced chemical vapor deposition) oxide. The PECVD oxide was characterized by XPS(X-ray photoelectron spectrometer) and AFM(atomic force microscopy). The characteristics of the bonded sample were measured under different bonding conditions of HF concentration and an applied pressure. The bonding strength was evaluated by the tensile strength method. The bonded interface was analyzed by using IR camera and SEM(scanning electron microscope). Components existed in the interlayer were analyzed by using FT-IR(fourier transform infrared spectroscopy). The bonding strength was varied with HF pre-treatment conditions before the pre-bonding in the range of $5.3 kgf/cm^2$ to $15.5 kgf/cm^2$

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Fabrications of Pd/poly 3C-SiC schottky diodes for hydrogen gas sensor at high temperatures (고온 가스센서용 Pd-다결정 3C-SiC 쇼트키 다이오드 제작)

  • Ahn, Jeong-Hak;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.78-79
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    • 2008
  • In this paper, poly 3C-SiC thin films were grown on $SiO_2$/Si by atmospheric pressure chemical vapor deposition (APCVD) using HMDS, $H_2$, and Ar gas at $1100^{\circ}C$ for 30 min, respectively. And then, palladium films were deposited on poly 3C-SiC by RF magnetron sputter. Thickness, uniformity, and quality of these samples were performed by SEM. Crystallinity and preferred orientationsof palladium were analyzed by XRD. And Pd/poly 3C-SiC schottky diodes were fabricated and characterized by current-voltage measurements. Its electric current density Js and barrier height voltage were measured as $2\times10^{-3}$ A/$cm^2$, 0.58 eV, respectively. And these devices operated about $350^{\circ}C$. From results, Pd/poly 3C-SiC devices are promising for high temperature hydrogen sensor and applications.

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Characterization of Cu-doped ZnO thin film and its application of SAW devices (Cu 도핑된 ZnO 박막의 물성 및 SAW 소자 응용)

  • LEE, Jin-Bock;LEE, Hye-Jung;SHIN, Wan-Chul;SEO, Soo-Hyung;PARK, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.1488-1490
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    • 2000
  • ZnO:Cu thin films are deposited by using an RF magnetron co-sputtering system with Cu chips attached on ZnO target. Structural and electrical properties are analyzed as a function of deposition conditions, such as Cu chip areas, $O_2/(Ar+O_2)$ ratios, and working pressures, The results show that a higher electrical resistivity above $10^{10}$ ${\Omega}cm$ along with an excellent c-axial growth can be easily achieved by Cu-doping. SAW filters based on the ZnO:Cu films are also fabricated to estimate the electric-mechanical coupling coefficient($K^{2}_{eff}$). Higher $K^{2}_{eff}$ and lower insertion losses are observed for ZnO:Cu films, compared with those for ZnO films.

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Preparation of Diamond Thin film for Electric Device and Crystalline Growth (전자 디바이스용 다이아몬드 박막의 제조 및 결정성장 특성)

  • Kim, Gru-Sik;Park, Soo-Gil;Son, Won-Keun;Fujishiama, Akira
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.1720-1723
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    • 2000
  • Boron doped conducting diamond thin film were grown on Si substrate by microwave plasma chemical vapor deposition from a gaseous feed of hydrogen, acetone/methanol and solid boron. The doping level of boron was controlled from 0ppm to $10^4$ppm (B/C). The Si substrate was tilted ca. 10$^{\circ}$ to make Si substrate have different height and temperature. Experimental results show that same condition but different temperature of Si substrate by height made different crystalline of diamond thin film. There were appeared 3$\sim$4 step of different crystalline morphology of diamond. To characterize the boron-doped diamond thin film, Raman spectroscopy was used for identification of crystallinity. To survey surface morphology, microscope was used. Grain size was changed gradually by different temperature due to different height. The Raman spectrum of film exhibited a sharp peak at 1334$cm^{-1}$, which is characteristic of crystalline diamond. The lower position of diamond film position, the more non-diamond component peak appeared near 1550$cm^{-1}$.

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Fabrication of coated conductor stacked multi-filamentary wire (적층형 초전도 다심 선재 제조)

  • Yun, K.S.;Ha, H.S.;Oh, S.S.;Moon, S.H.;Kim, C.J.
    • Progress in Superconductivity and Cryogenics
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    • v.14 no.1
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    • pp.4-7
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    • 2012
  • Coated conductors have been developed to increase piece length and critical current for electric power applications. Otherwise, Many efforts were carried out to reduce AC loss of coated conductor for AC applications. Twisting and cabling processes are effective to reduce AC loss but, these processes can not be applied for tape shaped coated conductor. It is inevitable to have thin rectangular shape because coated conductor is fabricated by thin film deposition process on metal substrate. In this study, round shape superconducting wire was first fabricated using coated conductors. First of all, Ag coated conductor was used. coated conductor was slitted to several wires with narrow width below 1mm. 12ea slitted wires were parallel stacked on top of another until making up the square cross-section. The bundle of coated conductors was heat treated to stick on each other by diffusion bonding and then copper plated to make round shape wire. Critical current of round wire was measured 185A at 77K, self field.