• Journal of the Korean Society for Precision Engineering
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• v.27 no.4
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• pp.102-108
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• 2010

Projection microstereolithography is a process of fabricating a micro-structure by using dynamic mask such as digital micromirror device(DMD). DMD shapes the beam into cross-sectional image of structure. Photocurable resin is cured by the beam and stacked layer on top of layer. It is difficult to deliver the beam from the DMD to the photocurable resin without any distortions. We assume that the beam exposed to the resin by 1 pixel of DMD has Gaussian distribution, so the shaped beam reflected by the DMD affects its neighboring area. Curing pattern corresponding to a cross-sectional images is predicted by superposition of pixels of Gaussian distribution and it is similar to cured shape.

• Korean Journal of Materials Research
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• v.17 no.7
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• pp.352-357
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• 2007

Since a pattern defects "repair" system using a diode pumped solid state laser for Flat Panel Display (FPD) was suggested, a lot of laser systems have been explored and developed for mass-production microfabrication process. A maskless lithography system using 405 nm violet laser and Digital Micromirror Device (DMD) has been developed for PDP and Liquid Crystal Display (LCD) Thin Film Transistor (TFT) photolithography process. In addition, a "Laser Direct Patterning" system for Indium Tin Oxide (ITO) for Plasma Display Panel(PDP) has been evaluated one of the best successful examples for laser application system which is applied for mass-production lines. The "heat" and "solvent" free laser microfabrications process will be widely used because the next-generation flat panel displays, Flexible Display and Organic Light Emitting Diode (OLED) should use plastic substrates and organic materials which are very difficult to process using traditional fabrication methods.

• Journal of the Optical Society of Korea
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• v.14 no.3
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• pp.266-276
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• 2010

In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 ${\mu}m$ resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 ${\mu}m$ line width.

• ETRI Journal
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• v.40 no.3
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• pp.366-375
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• 2018

Recently, techniques involving head-mounted displays (HMDs) have attracted much attention from academia and industry owing to the increased demand for virtual reality and augmented reality applications. Because HMDs are positioned near to users' eyes, it is important to solve the accommodation-vergence conflict problem to prevent dizziness. Therefore, holography is considered ideal for implementing HMDs. However, within the Nyquist region, the accommodation effect is limited by the space-bandwidth-product of the signal, which is determined by the sampling number of spatial light modulators. In addition, information about the angular spectrum is duplicated over the Fourier domain, and it is necessary to filter out the redundancy. The size of the exit-pupil of the HMD is limited by the Nyquist sampling theory. We newly propose a holographic HMD with an expanded exit-pupil over the Nyquist region by using the time-multiplexing method, and the accommodation effect is enhanced. We realize time-multiplexing by synchronizing a high-speed digital micromirror device and a liquid-crystal shutter array. We also demonstrate the accommodation effect experimentally.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.243-244
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• 2013

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.1013-1014
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.659-660
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.06a
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• pp.681-682
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• 2007

• Proceedings of the Optical Society of Korea Conference
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• 2006.07a
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• pp.213-214
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• 2006

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.11a
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• pp.449-450
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• 2010