• 제목/요약/키워드: deposition date

검색결과 27건 처리시간 0.022초

A Study on the Application of Countermeasure for the Reduction of the Ingestion Dose After Nuclear Accidents

  • Hwang, Won-Tae;Suh, Kyung-Suk;Kim, Eun-Han;Park, Young-Gil;Han, Moon-Hee;Gyuseong Cho
    • 한국원자력학회:학술대회논문집
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    • 한국원자력학회 1998년도 춘계학술발표회논문집(2)
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    • pp.583-588
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    • 1998
  • The effectiveness of dose reduction resulting from the application of countermeasures for ingestion pathways after nuclear accidents was investigated together with the derivation of optimized intervention levels for Korean foodstuffs. The radioactivity in foodstuffs was predicted from a dynamic food chain model DYNACON for the date which the deposition occurs. The effectiveness of countermeasures strongly depended on radionuclides, foodstuffs and date of deposition.

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HIGH-THROUGHPUT PROCESS FOR ATOMIC LAYER DEPOSITION

  • Shin, Woong-Chul;Choi, Kyu-Jeong;Baek, Min;Kim, Mi-Ry
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 추계학술발표대회
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    • pp.23.2-23.2
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    • 2009
  • Atomic layer deposition (ALD)have been proven to be a very attractive technique for the fabrication of advanced gate dielectrics and DRAM insulators due to excellent conformality and precise control of film thickness and composition, However, one major disadvantages of ALD is its relatively low deposition rate (throughput) because the deposition rate is typically limited by the time required for purging process between the introduction of precursors. In order to improve its throughput, many efforts have been made by commercial companies, for example,the modification reactor and development of precursors. However, any promising solution has not reported to date. We developed a new concept ALD system(Lucida TM S200) with high-throughput. In this process, a continuous flow of ALD precursor and purging gas are simultaneously introduced from different locations in the ALD reactor. A cyclic ALD process is carried out by moving the wafer holder up and down. Therefore, the time required for ALD reaction cycle is determined by speed of the wafer holder and vapor pressure of precursors. We will present the operating principle of our system and results of deposition.

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동적섭식경로모델 DYNACON에 대한 입력변수의 민감도분석 (Sensitivity Analysis of Input Parameters for a Dynamic Food-Chain Model DYNACON)

  • 황원태;이근창;한문회;조규성
    • Journal of Radiation Protection and Research
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    • 제25권1호
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    • pp.11-19
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    • 2000
  • 동적섭식경로모델 DYNACON에 대한 입력변수의 민감도 분석을 장반감기 핵종 $(^{137}Cs,\;^{90}Sr)$에 대해 침적시점의 함수로 평가하였다. 또한 장, 단기간 음식물 (곡류, 엽채류, 우유) 오염에 대한 입력변수의 영향이 고찰되었다. 입력변수는 LHS 기법으로 표본 추출되었으며, 민감도 지수는 PRCC로 나타냈다. 핵종과 음식물의 종류에 따른 민감도 지수는 침적시점 뿐 아니라 장, 단기간 오염에 있어서도 뚜렷이 다르게 나타났다. 작물의 성장기 침적의 경우 장, 단기간 오염 모두 잎흡수에 의한 오염 관련변수가 중요하였다. 또한 작물의 비성장기 침적의 경우 단기간 오염에 있어서도 잎흡수에 의한 오염 관련변수가 중요하였다. 장기간 오염의 경우 잎흡수에 의한 오염 관련변수의 영향은 줄고 뿌리흡수에 의한 오염 관련변수의 영향이 증가하였다. 특히 이러한 현상은 작물의 성장기 침적에 비해 비성장기 침적의 경우에, $^{l37}Cs$ 침적에 비해 $^{90}Sr$ 침적의 경우에 보다 뚜렷하였다. 목초의 성장기 침적의 경우 우유로의 핵종 전달계수, 젖소의 일일 목초 섭취량과 같은 가축 특성 관련변수가 상대적으로 우유의 오염에 중요한 입력변수로 나타났다.

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원자력 사고후 우유에 대한 비상대응의 정당화/최적화를 위한 방법론 및 적용연구 (A Methodology for Justification and Optimization of Countermeasures for Milk After a Nuclear Accident and Its Application)

  • 황원태;한문희;김은한;조규성
    • Journal of Radiation Protection and Research
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    • 제23권4호
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    • pp.243-249
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    • 1998
  • 원자력 사고 후 우유에 대한 비상대응방법론을 비용/편익 분석법에 근거하여 고안하였다. 목초의 왕성한 성장시기인 8월 15일을 방사성물질의 침적시점(사고시점)으로 가정하여 지표위 방사성물질의 농도, 침적 후 대응행위의 시작시점과 수행기간의 함수로써 적용결과를 논의하였다. 침적 후 우유내 방사성물질의 농도는 동적섭식경로모델 DYNACON으로부터 예측되었다 대응행위로는 침적 후 첫해에 피폭을 효과적으로 줄일 수 있고 수행하기 용이한 섭취금지와 비오염 사료대체가 고려되었다. 대응행위 수행에 따른 총비용은 피폭부담과 금전비용의 합으로 평가하였다. 침적 후 신속한 대응은 소요되는 금전비용에 대한 피폭저감 측면에서 중요한 변수였다. 많은 경우 비오염 사료대체는 섭취금지보다 비용측면에서 효과적인 대응행위였다. 대응행위를 빨리 취할수록 대응행위의 정당화 및 최적기간은 증가하였다.

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Effect of Agricultural Countermeasures on Ingestion Dose Following a Nuclear Accident

  • Keum, Dong-Kwon;Jeong, Hyojoon;Jun, In;Lim, Kwang-Muk;Choi, Yong-Ho;Lee, So-Hyeon;Jung, Tae-Jong
    • Journal of Radiation Protection and Research
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    • 제44권1호
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    • pp.8-14
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    • 2019
  • Background: Management of an agricultural food product system following a nuclear accident is indispensable for reducing radiation exposure due to ingestion of contaminated food. The present study analyzes the effect of agricultural countermeasures on ingestion dose following a nuclear accident. Materials and Methods: Agricultural countermeasures suitable for domestic farming environments were selected by referring to the countermeasures applied after the Fukushima accident in Japan. The avertable ingestion doses that could be obtained by implementing the selected countermeasures were calculated using the Korean Agricultural Countermeasure Analysis Program (K-ACAP) to investigate the efficiency of each countermeasure. Results and Discussion: Of the selected countermeasures, the management of crops was effective when radionuclide deposition occurred during the growing season of plants. Treatment by soil additive and topsoil removal was effective when deposition occurred during the nongrowing season of plants. The disposal of milk was not effective owing to the small contribution of milk to the overall ingestion dose. Clean feeding of livestock was effective when deposition occurred during the growing season of fodder plants such as pasture and rice-straw. Finally, the effect of food restriction increased with the soil deposition density of radionuclide. The practical effect of countermeasures was very small when the avertable ingestion dose was absolutely low. Conclusion: The agricultural countermeasures selected to reduce the radionuclide ingestion dose after a nuclear accident must be made appropriate by considering the accident situation, such as the soil deposition density of the radionuclide and the deposition date in relation to farming cycles.

스퍼터링 및 셀렌화 열처리에 의한 $CuInSe_2$ 박막제조 ($CuInSe_2$ thin film is manufactured by the Sputtering and Selenization process)

  • 문동권;안세진;윤재호;곽지혜;이희덕;윤경훈
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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    • pp.83-84
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    • 2009
  • Thin film solar cells based on CIGS continue to be a leading candidate for thin film photovoltaic devices due to their appropriate bandgap, long-term stability, and low-cost production. To date, the most successful technique for the deposition of a CIGS absorber layer has been based on the co-evaporation However, the evaporation process is difficult to scale-up for large-area manufacturing the sputtering and Selenizaton process has been a promising method for low-cost and large-scale production of high quality CIGS In this study, we have used Cu and CuIn alloy targets for precursor deposition the precursor deposited by sputtering Cu and CuIn targets and $CuInSe_2$ thin film is manufactured by Selenization process

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DEPOSITION OF A-SIC:H FILMS ON AN UNHEATED SI SUBSTRATE BY LOW FREQUENCY (50Hz) PLASMA Cvd

  • Shimozuma, M.;Ibaragi, K.;Yoshion, M.;Date, H.;Yoshida, K.;Tagashira, H.
    • 한국표면공학회지
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    • 제29권6호
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    • pp.797-802
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    • 1996
  • Hydrogenated amorphous silicon carbide (a-SiC:H) films have been deposited on unheated substrates by low frequency (50Hz) plasma using $SiH_4+CH_4+H_2$ gas mixtures. Deposition rate, refractive index, optical band gap, Vickers hardness and IR spectrum of the deposited a -SiC:H films have been measured for various rations of gas flow rates k(=$CH_4/SiH_4$, 0.5k4) with a constant $H_2$ flow rate (100sccm). As k increases, the deposition rate of the a-SiC:H films increases up to the maximum value of about 220nm/h at k=2.5, and then it decreases. The refractive index of the films was 2.6 for k=2.5, while the optical band gap of the films was 3.3eV for k=2.2. The maximum value of Vickers hardness of the films was 1500Hv at k=1. The infrared transmission measurement shows that the films contain both Si-C and Si-$CH_3$ bonds.

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축산환경의 오염 잠재력 : 축산오염 물질의 발생과 대기환경계 순환 (The Pollution Potential of Animal Production Systems : Origin and Atmospheric Cycling of Their Pollutants)

  • 김기현;김동균;윤종만
    • 한국축산시설환경학회지
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    • 제1권2호
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    • pp.155-164
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    • 1995
  • Despite considerable progresses made in our understanding of environmental fate of pollutants stemming from animal production systems, relatively little is known about the processes and mechanisms regulating their dispersement (via emission) into and deposition from the earth's atmospheric system. Here we present and summarize up-to-date knowledge on this topic with a main emphasis on their origin, physico-chemical characteristics, and geochemical distribution behavior.

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진공증착법을 이용한 PVDF 박막의 제작 (The manufacture of poly(vinylidene fluoride) thin film through vapor deposition method)

  • 박수홍;임응춘;한상옥;진경시;정해덕;박강식;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1190-1192
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    • 1995
  • Poly(vinylidene fluoride)(PVDF) is one of the most studied polymers in the latest date. The interest in PVDF lies in its remarkable piezoelectric and pyroelectric properties. Also, PVDF has at least four known crystalline structures(; they are referred to as the ${\alpha},\;{\beta},\;{\gamma}\;and\;{\alpha}_p$ phase or forms II, I, III and $IV_p$). In this study, the manufactured PVDF thin film through vapor deposition method had form II(; the glass at $70^{\circ}C$). This thin film was investigated by x-ray diffraction(XRD), Fourier Transform Infrared(FT-IR) spectroscopy and Differential Thermal Analysis(DTA). XRD and FT-IR indicate crystallization forms from the glass at $70^{\circ}C$ into form II.

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나노 다층 TiAlSiN 박막의 고온 산화 (High-temperature Oxidation of Nano-multilayered TiAlSiN Filems)

  • 이동복;김민정
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.189-189
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    • 2016
  • In this study, the Al-rich AlTiSiN thin films that consisted of TiN/AlSiN nano-multilayers were deposited on the steel substrate by magnetron sputtering, and their high-temperature oxidation behavior was investigated, which has not yet been adequately studied to date. Since the oxidation behavior of the films depends sensitively on the deposition method and deposition parameters which affect their crystallinity, composition, stoichiometry, thickness, surface roughness, grain size and orientation, the oxidation studies under various conditions are imperative. AlTiSiN nano-multilayer thin films were deposited on a tool steel substrate, and their oxidation behavior of was investigated between 600 and $1000^{\circ}C$ in air. Since the amount of Al which had a high affinity for oxygen was the largest in the film, an ${\alpha}-Al_2O_3-rich$ scale formed, which provided good oxidation resistance. The outer surface scale consisted of ${\alpha}-Al_2O_3$ incoporated with a small amount of Ti, Si, and Fe. Below this outer surface scale, a thin ($Al_2O_3$, $TiO_2$, $SiO_2$)-intermixed scale formed by the inwardly diffusing oxygen. The film oxidized slower than the $TiO_2-forming$ kinetics and TiN films, but faster than ${\alpha}-Al_2O_3-forming$ kinetics. During oxidation, oxygen from the atmosphere diffused inwardly toward the reaction front, whereas nitrogen and the substrate element of iron diffused outwardly to a certain extent.

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