• 제목/요약/키워드: delta doped

검색결과 177건 처리시간 0.025초

중·저온형 고체산화물 연료전지 공기극 물질로 사용되는 이중층 페로브스카이트와 컴플렉스 페로브스카이트의 전기 전도도 비교 (Comparison of Electrical Conductivities in Complex Perovskites and Layered Perovskite for Cathode Materials of Intermediate Temperature-operating Solid Oxide Fuel Cell)

  • 김정현
    • 한국세라믹학회지
    • /
    • 제51권4호
    • /
    • pp.295-299
    • /
    • 2014
  • Electrical conductivities of complex perovskites, layered perovskite and Sr doped layered perovskite oxides were measured and analyzed for cathode materials of Intermediate Temperature-operating Solid Oxide Fuel Cells (IT-SOFCs). The electrical conductivities of $Sm_{1-x}Sr_xCoO_{3-\delta}$ (x = 0.3 and 0.7) exhibit a metal-insulator transition (MIT) behavior as a function of temperature. However, $Sm_{0.5}Sr_{0.5}CoO_{3-\delta}$ (SSC55) shows metallic conductivity characteristics and the maximum electrical conductivity value compared to the values of $Pr_{0.5}Sr_{0.5}CoO_{3-\delta}$ (PSC55) and $Nd_{0.5}Sr_{0.5}CoO_{3-\delta}$ (NSC55). The electrical conductivity of $SmBaCo_2O_{5+\delta}$ (SBCO) exhibits a MIT at about $250^{\circ}C$. The maximum conductivity is 570 S/cm at $200^{\circ}C$ and its value is higher than 170 S/cm over the whole temperature range tested. $SmBa_{0.5}Sr_{0.5}Co_2O_{5+\delta}$ (SBSCO), 0.5 mol% Sr and Ba substituted at the layered perovskite shows a typically metallic conductivity that is very similar to the behavior of the SSC55 cathode, and the maximum and minimum electrical conductivity in the SBSCO are 1280 S/cm at $50^{\circ}C$ and 280 S/cm at $900^{\circ}C$.

Reliability Characteristics of La-doped High-k/Metal Gate nMOSFETs

  • Kang, C.Y.;Choi, R.;Lee, B.H.;Jammy, R.
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • 제9권3호
    • /
    • pp.166-173
    • /
    • 2009
  • The reliability of hafnium oxide gate dielectrics incorporating lanthanum (La) is investigated. nMOSFETs with metal/La-doped high-k dielectric stack show lower $V_{th}$ and $I_{gate}$, which is attributed to the dipole formation at the high-k/$SiO_2$ interface. The reliability results well correlate with the dipole model. Due to lower trapping efficiency, the La-doping of the high-k gate stacks can provide better PBTI immunity, as well as lower charge trapping compared to the control HfSiO stacks. While the devices with La show better immunity to positive bias temperature instability (PBTI) under normal operating conditions, the threshold voltage shift (${\Delta}V_{th}$) at high field PBTI is significant. The results of a transconductance shift (${\Delta}G_m$) that traps are easily generated during high field stress because the La weakens atomic bonding in the interface layer.

Electrochemical Approach in Plasma Display Panel Glass Melts doped with Sulfate and Sulfide II. Square Wave Voltammetry

  • Kim, Ki-Dong
    • 한국세라믹학회지
    • /
    • 제45권7호
    • /
    • pp.375-379
    • /
    • 2008
  • Redox behavior was observed in alkali alkaline earth silicate PDP (Plasma Display Panel) glass melts doped with sulfate and sulfide by square wave voltammetry (SWV). According to voltammograms produced at a temperature range of 1100 to $1400^{\circ}C$ and frequency range of 5 to 1000 Hz, both melts showed the same behavior in which there is one reduction peak at low frequency but another peak at an increase of frequency. Based on the frequency dependence of the peak current, self diffusivity of $S^{4+}$ was determined. Based on the temperature dependence of the peak potential, standard enthalpy (${\Delta}H^0$) and standard entropy (${\Delta}S^0$) for the reduction of $S^{4+}$ to $S^0$ were calculated.

저압 유기금속기상 성장법에 의한 AlGaAs/GaAs 양자 우물에 델타 도우핑된 채널 FET 특성 (Characteristics of AlGaAs/GaAs Quantum-Well Delta-Doped Channel FET's by Low Pressure Metalorganic Chemical Vapor Deposition)

  • 장경식;정동호;이정수;정윤하
    • 전자공학회논문지A
    • /
    • 제29A권4호
    • /
    • pp.33-37
    • /
    • 1992
  • AlGaAs/GaAs quantum well delta-doped channel FET's have been successfully fabricated using by low-pressure metalorganic chemical vapor deposition(LP-MOCVD). The FET's with a gate dimension of 1.8$\mu$m $\times$ 100$\mu$m have a maximum transconductance of 190 mS/mm and a maximum current density of 425 mA/nm. The devices show extremely broad transconductances with a large voltage swing of 2.4V. The S-parameter measurements have indicated that the current gain and power gain cutoff frequencies of the device were 7 and 15 GHz, respectively. These values are among the best performance reported for GaAs based heterojunction FET's with a similar device geometry.

  • PDF

산화환원반응용 백금 촉매 지지체를 위한 질소 도핑된 단백질계 탄소의 제조 (Synthesis of Nitrogen Doped Protein Based Carbon as Pt Catalysts Supports for Oxygen Reduction Reaction)

  • 이영근;안건형;안효진
    • 한국재료학회지
    • /
    • 제28권3호
    • /
    • pp.182-188
    • /
    • 2018
  • Nitrogen (N)-doped protein-based carbon as platinum (Pt) catalyst supports from tofu for oxygen reduction reactions are synthesized using a carbonization and reduction method. We successfully prepare 5 wt% Pt@N-doped protein-based carbon, 10 wt% Pt@N-doped protein-based carbon, and 20 wt% Pt@N-doped protein-based carbon. The morphology and structure of the samples are characterized by field emission scanning electron microscopy and transmission electron micro scopy, and crystllinities and chemical bonding are identified using X-ray diffraction and X-ray photoelectron spectroscopy. The oxygen reduction reaction are measured using a linear sweep voltammogram and cyclic voltammetry. Among the samples, 10 wt% Pt@N-doped protein-based carbon exhibits exellent electrochemical performance with a high onset potential of 0.62 V, a high $E_{1/2}$ of 0.55 V, and a low ${\Delta}E_{1/2}=0.32mV$. Specifically, as compared to the commercial Pt/C, the 10 wt% Pt@N-doped protein-based carbon had a similar oxygen reduction reaction perfomance and improved electrochemical stability.

평면도파로형 광증폭기 제작을 위한 $Er^+$이 첨가된 $SiO_2$ 박막 특성 (The Characteristics $Er^+$ Doped $SiO_2$ Thin Film for the Fabrication of the Planar Light Waveguide Amplifier)

  • 최영복;문동찬
    • 한국전기전자재료학회논문지
    • /
    • 제11권9호
    • /
    • pp.739-745
    • /
    • 1998
  • The objective of this paper is to provide experimental data of Er(rare- earth)doped $SiO_2$thin film made by sputtering methods. The deposition rate of silica glass by sputtering method was 55$\AA$/min. In EDD measurements, the average Er concentration in the deposited film was 0.77(wt%). After annealing at $900^{\circ}C$, the Cl concentration decreased from 3.79(wt%) to 1.52(wt%). The refractive indices of the core $n_1$, cladding $n_2$ were 1.458, 1.558 respectively at 632.8 nm. The refractive index difference between core and cladding, $\Delta$n was 0.1. The refractive index profile of core and cladding interface shows step profile. In the study, $SiO_2$ glass films of Si wafer were successfully doped with active erbium. Therefore, this experimental data will be applicable for fabrications of Er doped planar integrated optical device.

  • PDF