• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.163-163
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• 2008

반도체 소자가 고집적화 되고 고속화를 필요로 하게 됨에 따라, 기존에 사용되었던 알루미늄이나 텅스텐보다 낮은 전기저항, 높은 electro-migration resistance으로 미세한 금속배선 처리가 가능한 Cu가 주목받게 되었다. 하지만 과잉 디싱 현상과 에로젼을 유도하여 메탈라인 브리징과 단락을 초래할 있고 Cu의 단락인 islands를 남김으로서 표면 결함을 제거하는데 효과적이지 못다는 단점을 가지고 있었다. 특히 평탄화 공정시 높은 압력으로 인하여 Cu막의 하부인 ILD막의 다공성의 low-k 물질의 손상을 초래 할 수 있는 문제점을 해결하기 위하여 기존의 CMP에 전기화학을 결합시킴으로서 낮은 하력에서의 Cu 평탄화를 달성 할 수 있는 기존의 CMP 기술에 전기화학을 접목한 새로운 개념의 ECMP (electrochemical-mechanical polishing) 기술이 생겨나게 되었다. 따라서 본 논문에서는 최적화된 ECMP 공정을 위하여 I-V곡선과 CV법을 이용하여 active. passive. trans-passive 영역의 전기화학적 특징을 알아보았고. Cu막의 표면 형상을 알아보기 위해 Scanning Electron Microscopy (SEM) 측정과 Energy Dispersive Spectroscopy (EDS) 분석을 통해 금속 화학적 조성을 조사하였다.

• JSTS:Journal of Semiconductor Technology and Science
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• v.8 no.1
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• pp.80-84
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• 2008

We systematically investigated the resistive switching properties of thin $TiO_2$ films on Pt/Ti/$SiO_2$/Si substrates that were embedded with a Co ultra thin layer. An in-situ sputtering technique was used to grow both films without breaking the chamber vacuum. A stable bipolar switching in the current-voltage curve was clearly observed in $TiO_2$ films with an embedded Co ultra thin layer, addressing the high and low resistive state under a bias voltage sweep. We propose that the underlying origin involved in the bipolar switching may be attributed to the interface redox reaction between the Co and $TiO_2$ layers. The improved reproducible switching properties of our novel structures under forward and reverse bias stresses demonstrated the possibility of future non-volatile memory elements in a simple capacitive-like structure.

• 한국초전도학회:학술대회논문집
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• v.10
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• pp.189-192
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• 2000

We fabricated rapid single-flux-quantum RS flip-flop circuits with and without Y$_1$Ba$_2$Cu$_3$O$_{7-{\delta}}$(YBCO) ground plane. The circuit consists of SNS-type ramp-edge Josephson junctions that have cobalt-doped YBCO and Sr$_2$AITaO$_6$(SAT) for barrier layer and insulator layer, respectively. The fabricated Josephson junction showed a typical RSJ-like current-voltage(I-V) characteristics above 50K. We sucessfuly demonstrated RS flip-flop at temperatures around 50K. The RS flip-flop fabricated on ground plane showed more definite set and reset state in voltage-flux(V-${\phi}$) modulation curve for read SQUID, which may be attributed to a shielding effect of the YBCO ground plane.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.145-146
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• 2000

Primary emphasis was placed on the electrophoretic deposition of low voltage phosphor to indium-tin oxide-coated glass for the application of field emission display. The phosphor deposited by various parameters, such as deposition time and applied voltages was examined in detail. In addition, a comparison was made by analyzing luminance properties of the phosphor mixed with and without conducting $In_2O_3$ powder of less than 1um size. The measurement was performed as a function of $In_2O_3$ concentration from 3% to 15% by weight. The enhanced impact of indium powder mixing on the phosphor was clearly demonstrated by aging performance curve at 1000V excitation voltages with a current density of $1\;mA/cm^2$

• Journal of Radiation Protection and Research
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• v.31 no.3
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• pp.149-153
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• 2006

An ionization chamber is still widely used in many fields by virtue of its' simple operational characteristics and the possibility of its' various shapes. A parallel type of an ionization chamber for a steel sheet thickness measurement was designed and fabricated. High pure xenon gas, which was pressurized up to 6 atm, was chosen as a filling gas to increase the current response and sensitivity for a radiation. A high pressure gas system was also constructed. The active volume and the incident window size of the fabricated ionization chamber were $30\;cm^3\;and\;12\;cm^2$, respectively. Preliminary tests with a 25 mCi $^{241}Am$ gamma-ray source and evaluation tests in a standard X-ray field were performed. The optimal operation voltage was set from the results of the collection efficiency calculation by using an experimental two-voltage method. Linearity for a variation of the steel sheet thickness, which is the most important factor for an application during a steel sheet thickness measurement, was 0.989 in this study.

• The Transactions of the Korean Institute of Electrical Engineers D
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• v.52 no.5
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• pp.290-294
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• 2003

Using a backpropagation neural network (BPNN), a high power semiconductor device was empirically modeled. The device modeled is a n-LDMOSFET and its electrical characteristics were measured with a HP4156A and a Tektronix curve tracer 370A. The drain-source current $(I_{DS})$ was measured over the drain-source voltage $(V_{DS})$ ranging between 1 V to 200 V at each gate-source voltage $(V_{GS}).$ For each $V_{GS},$ the BPNN was trained with 100 training data, and the trained model was tested with another 100 test data not pertaining to the training data. The prediction accuracy of each $V_{GS}$ model was optimized as a function of training factors, including training tolerance, number of hidden neurons, initial weight distribution, and two gradients of activation functions. Predictions from optimized models were highly consistent with actual measurements.

• Journal of Electrical Engineering and Technology
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• v.9 no.5
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• pp.1447-1453
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• 2014

This paper proposes the new method based on the availability of three points measurement and convexity of photovoltaic (PV) curve characteristic at the maximum power point (MPP). In general, the MPP tracking (MPPT) function is the important part of all PV systems due to their power-voltage (P-V) characteristics related with weather conditions. Then, the analog-to-digital converter (ADC) and low pass filter (LPF) are required to measure the voltage and current for MPPT by the digital controller, which is used to implement the PV power conditioning system (PCS). The measurement and quantization error due to rounding or truncation in ADC and the delay of LPF might degrade the reliability of MPPT. To overcome this limitation, the proposed method is proposed while improving the performances in both steady-state and dynamic responses based on the detailed investigation of its properties for availability and convexity. The performances of proposed method are evaluated with the several case studies by the PSCAD/EMTDC$^{(R)}$ simulation. Then, the experimental results are given to verify its feasibility in real-time.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.743-746
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• 2000

Metal-ferroelectric-insulator-semiconductor(MFIS) devices using Pt/$LiNbO_3$/Si structure were successfully fabricated. The dielectric constant of the AIN film calculated from the capacitance in the accumulation region in the capacitance-voltage(C-V) curve was about 8.2. The gate leakage current density of MIS devices using a aluminum electrode showed the least value of 1$\times$$1O^{-8}$A/$cm^2$ order at the electric field of 500kV/cm. The dielectric constant of $LiNbO_3$film on AIN/Si structure was about 23 derived from 1MHz capacitance-voltage (C-V) measurement and the resistivity of the film at the field of 500kV/cm was about 5.6$\times$ $1O^{13}$ $\Omega$.cm.

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.67 no.4
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• pp.214-220
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• 2018

Light sources induced by gas discharge using rare gases have been widely used in the thin film deposition, the surface modification and the polymer etching. A dielectric barrier discharge (DBD) has been developed in order to consistently emit light and control the wavelength of the emission light. However, much research on the characteristics of the movement of discharge particles is required to improve the efficiency of the light lamp and the life-time of the light apparatus in detail. In this paper, we developed a He DBD discharge simulation tool and investigated the characteristics of discharge particles which were electrons, two positive ions ($He^+$, $He_2^+$) and 5 excited particles ($He^*(1S)$, $He^*(3S)$, $He^*$, $He^{**}$, $He^{***}$). The discharge currents showed the transition from pulse mode to continuous mode with the increase of power. With the accumulated charges on the barrier walls, the discharge current was rapidly increased and caused oscillation of the discharge voltage. As the gas pressure increased, $He_2^+$ and $He^*(3S)$ became the dominant activated particles. The input power was mostly consumed by electrons and $He_2^+$ ion. And the change curve showed that power consumption by electrons increased more with gas pressure than with source voltage or frequency.

• Journal of the Korean Institute of Telematics and Electronics
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• v.24 no.1
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• pp.102-109
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• 1987

This study is carrier out to investigate the carrier injection and the characteristics of trapping for the CVD deposited Al2O3 film on Si substrates. Samples used are metal -Al2O3-Si Structure in which metal field plates are used with Aluminium or God. Canier injection and trapping, which result in flat band voltalge shift, occur at fields as low as 1~2 MV/cm. An approximate method is proposed for computing the location of the centroid of the trapped electrons in this paper. Results show that carriers are trapped near the injecting interface at fields less than about 5MV/cm. Because of continued charging, a steady state can not be reached. Therefore the unique I-V curve is obtained when the traps are initially empty. By utilization of applied voltage on each point of the fresh device sample, it is measured the I-V surves for two polarities of applied voltage. The current densities observed in the Al2O3 films are much larger than those obtained in SiO2.