• Corrosion Science and Technology
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• v.13 no.3
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• pp.102-106
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• 2014

Nickel electrodeposition from sulfamate bath has several benefits such as low internal stress, high current density and good ductility. In nickel deposited layers, sulfur induces high temperature embrittlement, as Ni-S compound has a low melting temperature. To overcome high temperature embrittlement problem, adding manganese is one of the good methods. Manganese makes Mn-S compound having a high melting temperature above $1500^{\circ}C$. In this work, the mechanical properties of Ni-Mn deposited layers were investigated by using various process variables such as concentration of Mn$(NH_2SO_3)_2$, current density, and bath temperature. As the Mn content of electrodeposited layers was increased, internal stress and hardness were increased. By increasing current density, internal stress increased, but hardness decreased. With increasing the bath temperature from 55 to $70^{\circ}C$, internal stress of Ni deposit layers decreased, but hardness didn't change by bath temperature. It was likely that eutectoid manganese led to lattice deformation, and the lattice deformation increased hardness and internal stress in Ni-Mn layers. Increasing current density and decreasing bath temperature would increase a mount of $H_2$ absorption, which was a cause for the rise of internal stress.

• Proceedings of the IEEK Conference
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• 2003.07b
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• pp.719-722
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• 2003

This work investigates the device degradation p-channel PD SOI devices at various applied voltages as well as stress temperatures with respect to Body-Contact SOI (BC-SOI) and Floating-Body SOI (FB-SOI) MOSFETs. It is observed that the drain current degradation at the gate voltage of the maximum gate current is more significant in FB-SOI devices than in BC-SOI devices. For a stress at the gate voltage of the maximum gate current and elevated temperature, it is worth noting that the $V_{PT}$ Will be decreased by the amount of the HEIP plus the temperature effects. For a stress at $V_{GS}$ = $V_{DS}$ . the drain current decreases moderately with stress time at room temperature but it decreases significantly at the elevated temperature due to the negative bias temperature instability.

• Journal of the Korean institute of surface engineering
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• v.44 no.4
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• pp.137-143
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• 2011

The internal stress and magnetic properties (coercivity and squareness) of Ni-Fe nano thin film synthesized by electrodeposition method were studied as a function of acidic chloride bath conditions (composition and temperature) and current density. Fe deposition patterns were different depending on the temperature of the solution, the stress of film decreased with increasing the solution temperature, and the depending on the amount of Fe deposition showed a parabolic shape. The grain size of film was inversely proportional to stress of thin film. The internal stress of thin film and magnetic properties were deeply relevant, and the stress of thin film had a relationship with bath conditions and grain size of the thin film surface.

• Journal of the Korean institute of surface engineering
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• v.37 no.1
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• pp.40-48
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• 2004

Hardness and internal stress are very important in nickel electroforming. Nickel sulfamate bath has been widely used in electroforming because of its low internal stress and moderate hardness. Nickel sulfamate bath without chloride was chosen to investigated the effect of plating variable such as temperature, PH, current density and sodium naphthalene trisulfonate as addition agent on the hardness and internal stress. It was found that hardness increased with increasing temperature and decreasing current density and ranged from 150∼310 DPH. The hardness was highest at $55^{\circ}C$ and 10∼40 mA/$\textrm{cm}^2$. The internal stress increased with increasing current density and decreasing temperature. It was minimum at PH 3.0∼3.8. Low internal stress within $\pm$1,500 psi was obtained at both $50^{\circ}C$ and $55^{\circ}C$ in 10-20 mA/$\textrm{cm}^2$. The addition of sodium naphthalene trisulfonate was found to be effective in refine columnar grains thus resulted in decreasing internal stress, increasing hardness and improving brightness.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09b
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• pp.1251-1252
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• 2006

In order to investigate 95% retained critical current of Bi-2223/Ag tapes under various stress-strain conditions, load cell attached tension and bending apparatus was used. The critical current of stress-strained tape was degraded below 95% retained critical current when tension and bending was simultaneously applied together. But only one of this tension or bending did not degrade the tape below 95% retained critical current. Deformation temperature was important to maintain the 95% retained Ic of Bi-2223/Ag tapes after bending or tension deformation because mechanical strength of tapes can be changed drastically between room temperature and 77 K.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.6
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• pp.436-441
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• 1999

Joule heating effect in EM(Electromigration) test were performed on a bend test structure. EM test is done under high current densities(1.0-2.5MA/cm2), which leads to joule heating. Since joule heating is added to the controlled oven(stress) temperature, themetal line temperature is higher than the stress temperature. The increase in the stress temperature due to joule heating is important because EM phenomena and metal line failure are related to the stress temperature. In this paper, metal line was stressed with a current density of 1.0 MA/$cm^2$, 1.5MA/$cm^2$, 2.0MA/$cm^2$, 2.5MA/$cm^2$, for 1200 sec and temperature increase due to joule heating was less than $10^{\circ}C$. Also it took 30 minutes for the metal line to equalized with oven temperature. Recommendations are given for the EM test to determine the initial resistance of EM test structure under stress temperature and current density.

• Resources Recycling
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• v.14 no.1
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• pp.55-63
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• 2005

This study investigated the electrochemical recovery of palladium in a HCl solution that is used for palladium leaching. The high acidity of HCl solution and the low concentration of Pd ions increased the cathodic overpotential and reduced the limiting current density. Lowering the current density produced dense deposits; however, they were under high tensile stress. Raising the temperature affected both the densification and the stress, which enabled the attainment of dense Pd deposits under low stress. Lowering the current density and raising the temperature up to 70$^{\circ}C$ was recommended for the recovery of palladium as sound bulk Pd deposits. Current efficiency was over 85% at the initial stage of recovery may decrease the current efficiency, since a low Pd ion concentration results in a low limiting current density.

• Corrosion Science and Technology
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• v.11 no.6
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• pp.275-279
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• 2012

Ni-W alloy deposits have lately attracted the interest as an alternative surface treatment method for hard chromium electrodeposits because of higher wear resistance, hardness at high temperature, and corrosion resistance. This study deals with influences of process variables, such as electodeposition current density, plating temperature and pH, on the internal stress of Ni-W nanocrystalline deposits. The internal stress was increased with increasing the applied current density. With increasing applied current density, the grain size of the deposit decreases and concentration of hydrogen in the deposit increases. The subsequent release of the hydrogen results in shrinkage of the deposit and the introduction of tensile stress in the deposit. Consequently, for layers deposited at high current density, cracking occurs readily owing to high tensile stress value. By increasing the temperature of the electrodeposition from $60^{\circ}C$ to $80^{\circ}C$, the internal stress was decreased. It seems that an increase in the number of active ions overcoming the activation energy at elevated temperature caused a decline in the concentration polarization and surface diffusion. It decreased the level of hydrogen absorption due to the lessened hydrogen evolution reaction. Therefore, the lower level of hydrogen absorption degenerated the hydride on the surface of the electrode, resulting in the reduction of the internal stress of the deposits. By increasing the pH of the electrodeposition from 5.6 to 6.8, the internal stress in the deposits were slightly decreased. It is considered that the decrease in internal stess of deposits was due to supply of W complex compound in cathode surface, and hydrogen ion resulted from decrease of activity.

• Journal of the Korean Vacuum Society
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• v.1 no.1
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• pp.176-182
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• 1992

t-Stress and junction leakage current characteristics of CVD-tungsten have been investigated. Stressversus continuous annealing temperature plot. shows hysteresis curve where the stress level of the cooling curveis higher than that of the heating curve. It is found that the thermal and intrinsic stress of tungsten film depositedby SiH4 reduction is higher than that by Hz reduction.The tungsten film deposited by SiHl reduction is in the tensile stress state below 700"Cnd the stress ofthe film decreses with increasing annealing temperature. The stress state changes into compressive stress atabout 700"Cnd the compressive stress increases rapidly with increasing temperature.Leakage current of the n+/p diode increases rapidly especially in the range of 400-450$^{\circ}$C with increasingdeposition temperature of the CVD-W by SiH4 reduction, which is due to the Si consumption by W encroachment.On the other hand leakage current of the n+/p diode slightly increases with increasing SiH4/WF6 ratio.h increasing SiH4/WF6 ratio.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.3
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• pp.244-252
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• 2002

The electrical and dielectric behavior fort DC accelerated aging stress of P $r_{6}$ $O_{11}$-based Zno varistors cnsisting of ZnO-P $r_{6}$ $O_{11}$-CoO-C $r_2$ $O_3$-E $r_2$ $O_3$ were investigated with sintering temperature in the range of 1325~1345$^{\circ}C$. The varistor ceramics with increasing sintering temperature were more densified. A more densified varistors leaded to high stability for DC accelerated aging stress. Furthermore, the stability for DC accelerated aging stress was increased with the leakage current and dtan $\delta$/dV decreasing in order of 1325longrightarrow1335longrightarrow1345longrightarrow134$0^{\circ}C$ in sintering temperature. It was found that the stability for DC stress is affected more greatly by the leakage current and dtan $\delta$/dV than the densification. It is considered that the stability of varistors for DC stress can be estimated by considering the factors, such as the densification, leakage current, and dtan $\delta$/dV. As a result, the varistor sintered at 134$0^{\circ}C$ exhibited the highest stability, with %$\Delta$ $V_{lmA}$=-1.54%, %$\Delta$$\alpha$=-2.49%, %$\Delta$ $I_{\ell}$=+240.68%, 5%$\Delta$tan$\delta$=+29.96%.96%.96%.%.