• 제목/요약/키워드: copolymer thin films

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A Pathway to Microdomain Alignment in Block Copolymer/Nanoparticle Thin Films under Electric Field

  • Bae, Joonwon
    • Bulletin of the Korean Chemical Society
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    • 제35권9호
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    • pp.2689-2693
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    • 2014
  • The control over microstructure in block copolymer thin films using external electric fields has become an interesting research topic. In this article, the effect of nanoparticle on the microdomain alignments in block copolymer (polystyrene-b-poly(2-vinylpyridine)/nanoparticle (Au) thin films under electric fields has been examined with transmission electron microscopy. The homogeneous dispersion of Au nanoparticles into the block copolymer matrix was achieved by surface modification of nanoparticles with compatible ligands. Compared with the phenomenon seen in the pristine block copolymer thin films, a peculiar alignment behavior was observed in the block copolymer/nanoparticle hybrid thin films under electric fields. In addition, the different pathways observed in the pristine and nanoparticle incorporated block copolymer thin films were also monitored as a function of exposure time. This work can provide the fundamental information for understanding microdomain alignment in block copolymer/nanoparticle thin films under external electric fields.

Thermally Induced Mesophase Development in Ethanesilica Films via Macromolecular Templating Approach

  • Cho, Whirang;Char, Kook-Heon;Kwon, Su-Yong
    • Macromolecular Research
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    • 제17권9호
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    • pp.697-702
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    • 2009
  • Mesoporous ethanesilica thin film was prepared using PEO-PLGA-PEO triblock copolymers as structure-directing agents and (1,2-bis(triethoxysilyl) ethane BTESE; bridged organosilicates) as inorganic precursors via one-step sol-gel condensation of ethanesilica precursors. The mesostructure of ethanesilica films is critically dependent on the processing experimental parameters after the hydrolyzed silica sol mixture was spin-cast. This study examined the effects of the block copolymer template/organosilica precursor ratio in the casting solution and aging period before calcination of the mesostructure. It was further demonstrated that mesoscopic ordering of organosilicate thin films is induced by the rearrangement of block copolymer template/organosilica hybrid during thermal decomposition of the PEO-PLGA-PEO triblock copolymer. The mesoporous structure and morphology were characterized by SAXS, TEM and solid-state NMR measurement.

공중합체/나노입자 복합체 박막 내 미세구조의 전기장 하에서의 거동 (Behavior of Microdomains in Block Copolymer/Nanoparticle Nanocomposite Thin Films under Electric Field)

  • 배준원
    • 공업화학
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    • 제28권3호
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    • pp.290-293
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    • 2017
  • 블록공중합체와 나노입자로 이루어진 박막은 많은 관심을 불러 일으켜 왔다. 그리고, 이 혼성체들의 물성과 거동을 조절하기 위해서 다양한 방법이 접근되어 왔다. 본 연구에서는, 블록 공중합체와 나노입자로 이루어진 복합체를 박막 형태로 제조한 후, 이를 전기장에 조사하여 박막 내부 구조의 변화와 거동을 살펴보고자 한다. 본 실험에서는 폴리스티렌과 폴리(2-비닐피리딘)으로 구성된 블록공중합체를 사용하였고, 영구 쌍극자를 포함하는 CdSe 나노 입자를 그 속에 도입하였다. 이를 스핀코팅을 통해 박막 형태로 제조하였고, 전기장을 조사하여 전자현미경 방법으로 내부의 구조변화를 고찰하였다. 결과적으로 도입된 나노입자는 전기장에 의해 부여된 힘에 영향을 거의 받지 않고 블록공중합체의 내부에 존재하였으며, 공중합체의 내부 미세상은 전기장의 영향을 받아 전기장 방향으로 배향하였다. 이는 향후 이종으로 구성된 나노복합체의 전기장 하에서의 거동을 파악하는 데 도움이 될 것이다.

Block Copolymer Thin Films: Nanotemplates for New Functional Nanomaterials

  • Kim, Jin-Kon;Lee, Jeong-In;Yang, Seung-Yun
    • 한국고분자학회:학술대회논문집
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    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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    • pp.81-82
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    • 2006
  • In this study, the applications of the block copolymer thin films are introduced. For this purpose, we first obtained cylindrical nanodomains in polystyrene-block-poly(methyl methacrylate) copolymer perpendicularly oriented to a substrate. Then, nanoporous templates were prepared after removing the PMMA nanodomains by UV treatment. By using electropolymerization, high density nanowire arrays of conducting polymer of poly(pyrrole) and poly( 3-hexyl thiopene) were obtained and their electric properties were measured. Also, these nanoporous thin films were found to be very useful for the separation of human Rhinovirus type 14 (HRV 14), major pathogen of a common cold in humans, from the buffer solution.

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Epitaxial Self-Assembly of Block Copolymer Thin Film for Nanofabrication

  • Kim, Sang-Ouk
    • 한국고분자학회:학술대회논문집
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    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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    • pp.293-293
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    • 2006
  • Self-assembled nanostructures of block copolymer thin films have gathered significant attention due to their potential applications as templates for nanofabrication. However the lack of a robust strategy to control the structure formation in thin film geometries has been considered a major obstacle for the practical application. In this presentation 'epitaxial self-assembly' will be introduced as a successful strategy to control the self-assembled nanostructure of block copolymer. Chemically patterned surfaces prepared by advanced lithographic techniques successfully registered nanodomains in block copolymer thin film without any single defect over an arbitrarily large area.

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PS-PB-PS 삼블럭 공중합체 박막형판에서의 금의 자기응집에 의한 Nano-Scale 패턴형성 (Nano-Scale Patterning by Gold Self-Assembly on PS-PB-PS Triblock Copolymer Thin Film Templates)

  • Kim, G.;Libera, M.
    • Elastomers and Composites
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    • 제34권1호
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    • pp.45-52
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    • 1999
  • 본 논문에서는 미세 상분리된 블럭 공중합체 박막의 특이상에서 금 입자들이 어떻게 자기응집(self assemble) 되고 잘 배열된 패턴을 형성하는지를 살펴보았다. 본 연구에서는 원통형 모폴로지를 갖는 PS-PB-PS 삼블럭 공중합체(30wt% PS) 박막(${\sim}100nm$)을 0.1wt% 톨루엔 용액으로부터 캐스팅하여 고분자 박막 형판(template)으로 사용하였다. 각각의 상이한 용매 증발조건으로부터 PB matrix내에 수평배열 PS cylinder와 수직 PS cylinder를 함께 갖는 막이 얻어졌다. 블럭 공중합체박막의 표면 및 bulk 몰폴로지를 살펴보기 위하여 단면투과전자현미경(TEM)을 사용하였다. Nano-scale 패턴을 얻기 위하여는 소량의 금입자를 블럭 공중합체 박막상에 증발시켰다. 캐스팅된 상태 그 대로의 박막형판이 사용되어질때 금입자들은 표면 장력이 적은 PB상에 우선적으로 자기응집(self as-semble)하여 비교적 잘 배열된 nano-scale의 패턴을 형성하였다. 그러나 열처리(annealing)에 의하여 표면장력이 적은 PB-rich충이 형성된 후에는 금입자의 자기응집에 의한 패턴은 관찰되지 않았다.

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진공증착법에 의한 P(VDF-TrFE) 공중합체 박막의 제조 (Fabrication of P(VDF-TrFE) copolymers thin films by physical vapor deposition method)

  • 윤종현;정무영;이선우;박수홍;이상희;임응춘;유도현;이덕출
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.367-370
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    • 2000
  • In this study, thin films of 70/30 and 80/20 mol% P(VDF-TrFE) copolymers were fabricated by physical vapor deposition method. In order to determine the optimum deposition condition, the copolymer thin films were fabricated in the heating temperature of 260$^{\circ}C$, 280$^{\circ}C$, and 300$^{\circ}C$. The deposition rate was measured in a real time by thickness monitor. The surface image of prepared thin films was analyzed by using AFM. From the results of TG-DTA,70/30 and 80/20 mol% P(VDF-TrFE) copolymers were observed the Curie transition point below the melting point. As the results of AFM and FT-IR analysis, we determined that the optimum deposition temperature was 300$^{\circ}C$.

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Nanostructure formation in thin films of block copolymers prepared by controlled radical polymerization

  • Voit, B.;Fleischmann, S.;Messerschmidt, M.;Leuteritz, A.
    • 한국고분자학회:학술대회논문집
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    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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    • pp.99-100
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    • 2006
  • Orthogonally protected block copolymers of based on p-hydroxystyrene were prepared with high control via nitroxy mediated radical polymerization using an alkoxyamine as an unimolecular initiator. Thin films of partially protected block copolymer were prepared by spin or dip coating. A well defined nanostructure could be observed as a result of phase separation e.g. cylinders in a matrix oriented perpendicular or parallel to the substrate. The nanostructure of the polymeric films can be defined by the block copolymer composition and it determines surface properties and allows further, selective functionalization, e.g. via click chemistry. The thin films can be designed in a way to allow a patterning based on a thermal or photochemical stimulus.

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70/30 mol% P(VDF-TrFE) 공중합체 박막의 주팍수에 따른 유전특성 (Dielectric properties of 70/30 mol% P(VDF-TrFE) copolymer thin films with freqeuncy)

  • 윤종현;정무영;박수홍;임응춘;이상희;박상현;이덕출
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.470-473
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    • 2001
  • In this study, 70/30 mol% P(VDF-TrFE) copolymer thin films were prepared by physical vapor deposition, and dielectric properties with frequency were investigated. From results of TA(Thermal Analysis), the Curie transition temperature and melting temperature were observed at 118.8$^{\circ}C$ and 146$^{\circ}C$, respectively. Therefore, while thin films were prepared, the substrate temperature was varied from 30$^{\circ}C$ to 90$^{\circ}C$. The dielectric constant decreased with increasing frequency. At measuring frequency of 1kHz, the relative dielectric constant increased from 3.643 to 23.998 with increasing substrate temperature from 30$^{\circ}C$ to 90$^{\circ}C$. As a result of dielectric loss factor, ${\alpha}$-relaxation and ${\beta}$-relaxation were observed near at 100Hz and 1MHz, respectively. And the magnitude of ${\alpha}$-relaxation decreased and that of ${\beta}$-relaxation increased with increasing substrate temperature.

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Order-to-disorder Behavior of Block Copolymer Films

  • 류두열;김은혜;최승훈
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.6.2-6.2
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    • 2011
  • Block copolymer (BCP) self-assembly in a film geometry has recently been the focus of increased research interest due to their potential use as templates and scaffolds for the fabrication of nanostructured materials. The phase behavior in a thin film geometry that confines polymer chains to the interfaces will be influenced by the interfacial interactions at substrate/polymer and polymer/air and the commensurability between the equilibrium period (L0) of the BCP and the total film thickness. We investigated the phase transitions for the films of block copolymers (BCPs) on the modified surface, like the order-to-disorder transition (ODT) by in-situ grazing incidence small angle x-ray scattering (GISAXS) and transmission electron microscopy (TEM). The selective interactions on the surface by a PS-grafted substrate provide the preferential interactions with the PS component of the block, while a random copolymer (PS-r-PMMA) grafted substrate do the balanced interfacial interactions on the surface. The thickness dependence of order-to-disorder behavior for BCP films will be discussed in terms of the surface interactions.

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