• 제목/요약/키워드: conventional tunneling

검색결과 77건 처리시간 0.188초

2단계 AlOx 절연층 공정에서 하부절연층의 산화시간에 따른 터널자기저항 특성연구 (Tunnel Magnetoresistance with Plasma Oxidation Time in Double Oxidized Barrier Process)

  • 이영민;송오성
    • 한국재료학회지
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    • 제12권3호
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    • pp.200-204
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    • 2002
  • We fabricated TMR devices which have double oxidized tunnel barrier using plasma oxidation method to form homogeneously oxidized AlO tunnel barrier. We sputtered 10 $\AA$-bottom Al layer and oxidized it by varying oxidation time for 5, 10, 20 sec. Subsequent sputtering of 13 $\AA$ - Al was performed and the matallic layer was oxidized for 120 sec. The electrical resistance changed from 700$\Omega$ to 2700$\Omega$ with increase of oxidation time, while variation of MR ratio was little spreading 27~31% which is larger than that of TMR device of ordinary single tunnel barrier. We calculated effective barrier height and width by measuring I-V curves, from which we found the barrier height was 1.3~1.5 eV, sufficient for tunnel barrier, and the barrier width(<16.2 $\AA$) was smaller than that of directly measured value by the tunneling electron microscopy. Our results may be caused by insufficient oxidation of Al precursor into $Al_2O_3$. However, double oxidized tunnel barriers were superior to conventional single tunnel barrier in uniformity and density. We found that the external magnetic field to switch spin direction of ferromagnetic layer of pinned layer breaking ferro-antiferro exchange coupling was increased as bottom layer oxidation time increased. Our results imply that we were able to improve MR ratio and tune switching field by employing double oxidized tunnel barrier process.

Gate-Induced Drain Leakage를 줄인 새로운 구조의 고성능 Elevated Source Drain MOSFET에 관한 분석 (Analysis of a Novel Elevated Source Drain MOSFET with Reduced Gate-Induced Drain Leakage and High Driving Capability)

  • 김경환;최창순;김정태;최우영
    • 대한전자공학회논문지SD
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    • 제38권6호
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    • pp.390-397
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    • 2001
  • GIDL(Gate-Induced Drain-Leakage)을 줄일 수 있는 새로운 구조의 ESD(Elevated Source Drain) MOSFET을 제안하고 분석하였다. 제안된 구조는 SDE(Source Drain Extension) 영역이 들려진 형태를 갖고 있어서 SDE 임플란트시 매우 낮은 에너지 이온주입으로 인한 저활성화(low-activation) 효과를 방지 할 수 있다. 제안된 구조는 건식 식각 및 LAT(Large-Angle-Tilted) 이온주입 방법을 사용하여 소오스/드레인 구조를 결정한다. 기존의 LDD MOSFET과의 비교 시뮬레이션 결과, 제안된 ESD MOSFET은 전류 구동능력은 가장 크면서 GIDL 및 DIBL(Drain Induced Barrier Lowering) 값은 효과적으로 감소시킬 수 있음을 확인하였다. GIDL 전류가 감소되는 원인으로는 최대 전계의 위치가 드레인 쪽으로 이동함에 따라 최대 밴드간 터널링이 일어나는 곳에서의 최대 전계값이 감소되기 때문이다.

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Shear strength behaviors of grouts under the blasting induced vibrations

  • Sagong, Myung;Choi, Il Yoon;Lee, Jun S.;Cho, Chung-sik
    • Geomechanics and Engineering
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    • 제21권2호
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    • pp.207-213
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    • 2020
  • Umbrella Arch Method (UAM) often employed in the tunnel construction under poor rock mass conditions in Korea. Insertion of steel pipes at the periphery of the tunnel and infiltration of grouts along the pipes into the rock masses increases tunnel stability. There are two major effects of grouts expected at the tunnel face: 1) increase of face stability by enhancing the frictional resistance of discontinuities and 2) decrease of permeability along the rock masses. Increase of resistance and decrease of permeability requires a certain curing time for the grout. In Korea, we require 24 hours for curing of grout, which means no progress of excavation for 24 hours after infiltration of grouts. This step delays the tunnel construction sequences. To eliminate such inefficiency, we propose MTG (Method for Tunnel construction using Grouting technology), which uses extended length of steel pipes (14 m) compared to conventional pipe roof method (12 m). The merit of MTG is the reduction of curing time. Because of the approximately 2 m extension of the length of steel pipe, blasting can be done after infiltration of grouting. For this paper, we conducted experiments on the shear strength behaviors of grout infilled rock joint with elapsing of curing time and blasting induced vibration. The results show that blasting induced vibration under MTG does not influence the mechanical features of grout material, which indicates no influence on the mechanical behaviors of grout, contributing to the stability of tunnels during excavation. This result indicates that MTG is a cost effective and fast construction method for tunneling in Korea.

Pulsed Ferrite Magnetic Field Generator for Through-the-earth Communication Systems for Disaster Situation in Mines

  • Bae, Seok;Hong, Yang-Ki;Lee, Jaejin;Park, Jihoon;Jalli, Jeevan;Abo, Gavin S.;Kwon, Hyuck M.;Jayasooriya, Chandana K.K.
    • Journal of Magnetics
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    • 제18권1호
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    • pp.43-49
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    • 2013
  • A pulsed ferrite magnetic field generator (FMFG) was designed for the use in the 1000 m long through-the-earth (TTE) communication system for mining disaster situations. To miniaturize the TTE system, a ferrite core having 10,000 of permeability was used for the FMFG. Attenuation of the magnetic field intensity from the FMFG (200-turn and 0.18 m diameter) was calculated to be 89.95 dB at 1000 m depth soil having 0.1 S/m of conductivity. This attenuation was lower than 151.13 dB attenuation of 1 kHz electromagnetic wave at the same conditions. Therefore, the magnetic-field was found to be desirable as a signal carrier source for TTE communications as compared to the electromagnetic wave. The designed FMFG generates the magnetic field intensity of $1{\times}10^{-10}$ Tesla at 1000 m depth. This magnetic field is detectable by compact magnetic sensors such as flux gate or magnetic tunneling junction sensor. Therefore, the miniature FMFG TTE communication system can replace the conventional electromagnetic wave carrier type TTE system and allow reliable signal transmission between rescuer and trapped miners.

로드헤더 장비사양 검토 및 굴착효율 예측 모델 개발 (Development of roadheader performance prediction model and review of machine specification)

  • 정재훈;임주휘;이재원;강한별;김도훈;신영진
    • 한국터널지하공간학회 논문집
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    • 제25권3호
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    • pp.221-243
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    • 2023
  • 국내 도심지 터널 공사에서 발파로 인한 진동 및 소음 방지를 위한 대안으로 로드헤더 공법 적용사례가 늘고 있다. 그러나 국내의 암반 대상 로드헤더 적용사례가 극히 적어 로드헤더 장비선정과 굴착효율 평가에 한계가 있다. 특히 로드헤더 굴착효율 평가를 위해 현재는 해외 현장에서 경험적으로 개발된 모델식을 적용하고 있으나 국내 암종 및 지질조건에 대한 검증이 부족한 실정이다. 본 연구에서는 해외 문헌 연구를 통하여 로드헤더 장비사양 결정방법과 굴착효율 평가 모델을 조사하였다. 이를 바탕으로 국내 현장 대상 장비선정을 위한 사양 검토와 더불어 현장 대상 암석강도와 굴착효율의 상관모델식을 제안하고 설계 굴착효율 예측 모델과 비교하였다. 또한 로드헤더 절삭이론 모델식을 이용한 굴착효율 산정의 간편법을 제안함으로써 굴착효율을 평가하고 기존 경험적 예측 모델과 비교 검증하였다.

Surface state Electrons as a 2-dimensional Electron System

  • Hasegawa, Yukio
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.156-156
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    • 2000
  • Recently, the surface electronic states have attracted much attention since their standing wave patterns created around steps, defects, and adsorbates on noble metal surfaces such as Au(111), Ag(110), and Cu(111) were observed by scanning tunneling microscopy (STM). As a typical example, a striking circular pattern of "Quantum corral" observed by Crommie, Lutz, and Eigler, covers a number of text books of quantum mechanics, demonstrating a wavy nature of electrons. After the discoveries, similar standing waves patterns have been observed on other metal and demiconductor surfaces and even on a side polane of nano-tubes. With an expectation that the surface states could be utilized as one of ideal cases for studying two dimensionakl (sD) electronic system, various properties, such as mean free path / life time of the electronic states, have been characterized based on an analysis of standing wave patterns, . for the 2D electron system, electron density is one of the most importnat parameters which determines the properties on it. One advantage of conventional 2D electron system, such as the ones realized at AlGaAs/GaAs and SiO2/Si interfaces, is their controllability of the electrondensity. It can be changed and controlled by a factor of orders through an application of voltage on the gate electrode. On the other hand, changing the leectron density of the surface-state 2D electron system is not simple. On ewqy to change the electron density of the surface-state 2D electron system is not simple. One way to change the electron density is to deposit other elements on the system. it has been known that Pd(111) surface has unoccupied surface states whose energy level is just above Fermi level. Recently, we found that by depositing Pd on Cu(111) surface, occupied surface states of Cu(111) is lifted up, crossing at Fermi level around 2ML, and approaches to the intrinsic Pd surface states with a increase in thickness. Electron density occupied in the states is thus gradually reduced by Pd deposition. Park et al. also observed a change in Fermi wave number of the surface states of Cu(111) by deposition of Xe layer on it, which suggests another possible way of changing electron density. In this talk, after a brief review of recent progress in a study of standing weaves by STM, I will discuss about how the electron density can be changed and controlled and feasibility of using the surface states for a study of 2D electron system. One of the most important advantage of the surface-state 2D electron system is that one can directly and easily access to the system with a high spatial resolution by STM/AFM.y STM/AFM.

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이종접합 태양전지에서의 Bi-Layer 구조를 통한 향상된 개방전압특성에 대한 고찰 (A Study on Improved Open-Circuit Voltage Characteristics Through Bi-Layer Structure in Heterojunction Solar Cells)

  • 김홍래;정성진;조재웅;김성헌;한승용;수레쉬 쿠마르 듄겔;이준신
    • 한국전기전자재료학회논문지
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    • 제35권6호
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    • pp.603-609
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    • 2022
  • Passivation quality is mainly governed by epitaxial growth of crystalline silicon wafer surface. Void-rich intrinsic a-Si:H interfacial layer could offer higher resistivity of the c-Si surface and hence a better device efficiency as well. To reduce the resistivity of the contact area, a modification of void-rich intrinsic layer of a-Si:H towards more ordered state with a higher density is adopted by adapting its thickness and reducing its series resistance significantly, but it slightly decreases passivation quality. Higher resistance is not dominated by asymmetric effects like different band offsets for electrons or holes. In this study, multilayer of intrinsic a-Si:H layers were used. The first one with a void-rich was a-Si:H(I1) and the next one a-SiOx:H(I2) were used, where a-SiOx:H(I2) had relatively larger band gap of ~2.07 eV than that of a-Si:H (I1). Using a-SiOx:H as I2 layer was expected to increase transparency, which could lead to an easy carrier transport. Also, higher implied voltage than the conventional structure was expected. This means that the a-SiOx:H could be a promising material for a high-quality passivation of c-Si. In addition, the i-a-SiOx:H microstructure can help the carrier transportation through tunneling and thermal emission.