• Title/Summary/Keyword: condenser and objective lenses

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The development of scanning electron microscopy (전자현미경 개발)

  • Oh H. J.;Chang D. Y.;Yang H. N.;Kim D. H.;Park M, J.;Shim C. H.;Kim C. S.
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2005.05a
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    • pp.15-18
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    • 2005
  • We have designed and fabricated a thermal scanning electron microscopy. It includes an electron source, two condenser lenses, one objective lens, a scanning coil and a stigmator coil for focusing in column and also have a secondary electron detector for constructing the image in chamber with a high vacuum condition and control part for operating the SEM. Especially, in order for us to find out the optical characteristics, our attention and studies have been concentrated on the effects of two condenser lenses and one objective lens for high resolution with SEM. Finally, we developed a high resolution thermal scanning electron microscopy.

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A Study on Design and Analysis for Magnetic Lenses of a Scanning Electron Microscope using Finite Element Method (유한요소법을 사용한 주사전자 현미경의 전자렌즈 설계 및 해석에 관한 연구)

  • Park, Keun;Jung, Hyun-Woo;Park, Man-Jin;Kim, Dong-Hwan;Jang, Dong-Young
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.9
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    • pp.95-102
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    • 2007
  • The scanning electron microscope (SEM) is one of the most popular instruments available for the measurement and analysis of the micro/nano structures. It is equipped with an electron optical system that consists of an electron beam source, magnetic lenses, apertures, deflection coils, and a detector. The magnetic lenses playa role in refracting electron beams to obtain a focused spot using the magnetic field driven by an electric current from a coil. A SEM column usually contains two condenser lenses and an objective lens. The condenser lenses generate a magnetic field that forces the electron beams to form crossovers at desired locations. The objective lens then focuses the electron beams on the specimen. The present work concerns finite element analysis for the electron magnetic lenses so as to analyze their magnetic characteristics. To improve the performance of the magnetic lenses, the effect of the excitation current and pole-piece design on the amount of resulting magnetic fields and their peak locations are analyzed through the finite element analysis.

Design and Analysis of an Objective Lens for a Scanning Electron Microscope by Coupling FE Analysis and Ray Tracing (유한요소해석과 광선추적을 연계한 주사전자 현미경 대물렌즈의 설계 및 해석)

  • Park, Keun;Lee, Jae-Jin;Park, Man-Jin;Kim, Dong-Hwan;Jang, Dong-Young
    • Journal of the Korean Society for Precision Engineering
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    • v.26 no.11
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    • pp.92-98
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    • 2009
  • The scanning electron microscope (SEM) contains an electron optical system in which electrons are emitted and moved to form a focused beam, and generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system usually contains two condenser lenses and an objective lens. The condenser lenses generate a magnetic field that forces the electron beams to form crossovers at desired locations. The objective lens then focuses the electron beams on the specimen. The present study covers the design and analysis of an objective lens for a thermionic SEM. A finite element (FE) analysis for the objective lens is performed to analyze its magnetic characteristics for various lens designs. Relevant beam trajectories are also investigated by tracing the ray path of the electron beams under the magnetic fields inside the objective lens.

Beam Focusing Performance of Electrostatic Lens using SIMION Simulator (SIMION 시뮬레이터를 이용한 정전렌즈의 빔 집속 성능)

  • Oh, Maeng-Ho;Jeong, In-Sung;Lee, Jong-Hang
    • Journal of the Korean Society for Precision Engineering
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    • v.26 no.4
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    • pp.128-133
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    • 2009
  • Focused-ion-beam (FIB) system is capable of both machining and measuring in nano-scale; hence nano-scale focusing quality is important. This paper investigates design parameters of two electrostatic lenses in order to achieve the best ion beam focusing performance. Commercial SIMION simulator is used to optimize the dimensions of the condenser and objective lenses and investigate the influence of assembly error on focusing quality The simulation results show that the beam focusing quality is not influenced by angle deviation within ${\pm}0.02\;deg$ and geometrical eccentricity within ${\pm}50$ micrometers.

Realization for Each Element for capturing image in Scanning Electron Microscopy (주사 전자 현미경에서 영상 획득에 필요한 구성 요소 구현)

  • Lim, Sun-Jong;Lee, Chan-Hong
    • Laser Solutions
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    • v.12 no.2
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    • pp.26-30
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    • 2009
  • Scanning Electron Microscopy (SEM) includes high voltage generator, electron gun, column, secondary electron detector, scan coil system and image grabber. Column includes electron lenses (condenser lens and objective lens). Condenser lens generates fringe field, makes focal length and control spot size. Focal length represents property of lens. Objective lens control focus. Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lens and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. In this paper, we describe the result of research to develop the core elements for low-resolution SEM.

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Performance Experiment of Electron Beam Convergence Instrument (Finishing 용 전자빔 집속 장치의 성능 실험)

  • Lim, Sun Jong
    • Laser Solutions
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    • v.18 no.3
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    • pp.6-8
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    • 2015
  • Finishing process includes deburring, polishing and edge radiusing. It improves the surface profile of specimen and eliminates the alien substance on surface. Deburring is the elimination process for debris of edges. Polishing lubricates surfaces by rubbing or chemical treatment. There are two types for electron finishing. The one is using pulse beam. The other is using the convergent and scanning electron beam. Pulse type device appropriates the large area process. But it does not control the beam dosage. Scanning type device has advantages for dosage control and edge deburring. We design the convergence and scan type. It has magnetic lenses for convergence and scan device for scanning beam. Magnetic lenses consist of convergent and objective lens. The lenses are designed by the specification(beam size and working distance). In this paper, we evaluate the convergence performance by pattern process. Also, we analysis the results and important factors for process. The important factors for process are beam size, pressure, stage speed and vacuum. These results will be utilized into systematizing pattern shape and the factors.