• 제목/요약/키워드: colloidal dispersion

검색결과 53건 처리시간 0.024초

이종혼합부유물질의 양에 따른 electrokinetic potential 및 surface energy profile의 변화 양상 (Variation of the Electrokinetic Potential and Surface Energy Profile of a Binary Mixture Dispersion with Mixing Ratio)

  • 김희진;정혜원;김동수
    • 한국물환경학회지
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    • 제28권1호
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    • pp.115-120
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    • 2012
  • Different colloidal particles generally co-exist in the water and wastewater. Thus, there needs to identify practical electrokinetic characteristics of the particles, comparing with the case when each colloidal material is independently distributed. In this study, changes of overall zeta potential was examined through mixed dispersions of $TiO_{2}$ and $MnO_{2}$. The mixing ratios were classified into 3-type in order to distinguish the effects of the proportions of each particle from those of total concentration in colloidal suspensions. The types are single colloidal dispersions of $TiO_{2}$ and $MnO_{2}$ (1:0, 0:1), mixed dispersions at different ratios (0.75:0.25, 0.5:0.5, 0.25:0.75), and a mixed dispersion with doubled concentration (1:1), respectively. It showed that the overall variation of zeta potential as a function of pH was intensified in a colloidal dispersion with the ratio of 1:1. It was concerned that the double action of ion would contribute to this result. On the one hand, the zeta potentials of each colloidal dispersion commonly decreased at the state of strong acid and base under the influence of compression of the electric double layer. The changing patterns were also considered through calculating total interaction energy between colloidal particles based on DLVO theory and measuring turbidity of the colloidal dispersions.

Dispersion Polymerization of Styrene Employing Lyophilic Comonomer in the Absence of Stabilizer: Synthesis of Impurity-free Microspheres

  • Han, Hye-Kyung;Lee, Jeong-Woo;Hong, Jin-Ho;Shim, Sang-Eun
    • Macromolecular Research
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    • 제17권7호
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    • pp.469-475
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    • 2009
  • We investigated the feasibility of dispersion polymerization without any stabilizer, which has been considered essential for ensuring colloidal stability. By employing small amounts of a lyophilic comonomer, 4-vinyl pyridine, styrene was successfully polymerized by dispersion polymerization in aqueous alcohol without stabilizer to afford stable poly(styrene-co-4-vinyl pyridine) copolymer microspheres. The stable microspheres were produced in the 4-vinyl pyridine range of 2-15 wt% to styrene. Without 4-vinyl pyridine, severely coagulated particles were obtained, implying that the poly(4-vinyl pyridine) moiety endowed colloidal stability. The polymerization kinetics, behavior, and properties of the ultimate particles showed general features of dispersion polymerization. The study results suggest that stabilizer- tree dispersion polymerization is possible, thereby facilitating the synthesis of impurity(stabilizer)-tree polymer particles.

구리 CMP 적용을 위한 산성 콜로이드 실리카를 포함한 준무연마제 슬러리 연구 (A Study on Semi Abrasive Free Slurry including Acid Colloidal Silica for Copper Chemical Mechanical Planarization)

  • 김남훈;김상용;서용진;김태형;장의구
    • 한국전기전자재료학회논문지
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    • 제17권3호
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    • pp.272-277
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    • 2004
  • The primary aim of this study is to investigate new semi-abrasive free slurry including acid colloidal silica and hydrogen peroxide for copper chemical-mechanical planarization (CMP). In general, slurry for copper CMP consists of colloidal silica as an abrasive, organic acid as a complex-forming agent, hydrogen peroxide as an oxidizing agent, a film forming agent, a pH control agent and several additives. We developed new semi-abrasive free slurry (SAFS) including below 0.5% acid colloidal silica. We evaluated additives as stabilizers for hydrogen peroxide as well as accelerators in tantalum nitride CMP process. We also estimated dispersion stability and Zeta potential of the acid colloidal silica with additives. The extent of enhancement in tantalum nitride CMP was verified through anelectrochemical test. This approach may be useful for the application of single and first step copper CMP slurry with one package system.

Fractal Nature of Magnetic Colloidal Dispersion with Cobalt Iron Oxide and Metal Iron Particles

  • Yoon, Kwan Han;Lee, Young Sil
    • Korean Chemical Engineering Research
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    • 제60권1호
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    • pp.125-131
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    • 2022
  • The microstructure of highly aggregated colloidal dispersions was investigated by probing the rheological behavior of magnetic suspensions. The dynamic moduli as functions of frequency and strain amplitude are shown to closely resemble that of colloidal gels indicating the formation of network structure. The two types of characteristic critical strain amplitudes, γc and γy, were characterized in terms of the changing microstructure. The amplitude of γc indicates the transition from linear to nonlinear viscoelasticity and depends only on particle volume fraction not magnetic interactions. The study of scaling behavior suggests that it is related to the breakage of interfloc, i.e., floc-floc structure. However, yielding strain, γy, was found to be independent of particle volume fraction as well as magnetic interaction. It relates to extensive deformation resulting in yielding behavior. The scaling of elastic constant, Ge, implies that this yielding behavior and hence γy is due to the breakage of long-range interfloc interactions. Also, the deformation of flocs due to increase strain was indicated from the investigation of the fractal nature.

Dispersion stability of ultra-fine $BaTiO_3$ suspensions in aqueous medium

  • Chun, M.P.;Chung, Y.B.;Ma, Y.J.;Cho, J.H.;Kim, B.I.
    • 한국결정성장학회지
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    • 제15권6호
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    • pp.239-243
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    • 2005
  • The effect of pH and particle size on the dispersion stability of ultra-fine $BaTiO_3$ suspensions in aqueous medium have been investigated by means of zeta potential, sediment experiments, and powder properties (particle analysis, specific surface area) etc. Zeta potential as a function of pH for two particles of different size increases from -75 to +10 mV with decreasing pH from 8.5 to 1.4. The curve of zeta potential for small particle (150 nm) has slow slope than that of large particle (900nm), giving IEP (isoelectric point) value of pH=1.6 for small particle and pH=1.9 for large particle respectively, which means that it is more difficult to control zeta potential with pH fur small particle than large particle. The dispersion stability of $BaTiO_3$ particles in aqueous medium was found to be strongly related with the agglomeration of colloidal suspensions with time through the sedimentation behaviors of colloidal particles with time and pH value.

사파이어 웨이퍼 CMP 공정 신뢰성 향상을 위한 혼합 나노실리카 콜로이달 슬러리 (Mixed Nano Silica Colloidal Slurry for Reliability Improvement of Sapphire Wafer CMP Process)

  • 정찬홍
    • 한국신뢰성학회지:신뢰성응용연구
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    • 제14권1호
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    • pp.11-19
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    • 2014
  • A colloidal silica slurry has been manufactured by mixing nano silica powders having different grain size to improve the reliability of Sapphire wafer CMP process. The main reliability problem of CMP process such as the breaking of wafer can be prevented by reducing the size of particles in a slurry. While existing commercial colloidal silica slurries are usually made of single grain size silica powder of about 120nm, in the present study 40nm and 100nm silica powders are mixed to achieve a similar removal rate. The new colloidal silica slurry showed wafer removal rate of $3.04{\mu}m/120min$ while that of a commercial colloidal silica slurry was $3.03{\mu}m/120min$. The roughness was less than $4{\AA}$ and scratch was 0. It is also expected that the reduction of the size of nano silica particles can improve the dispersion stability and prolong the useful life of the slurry.

Material and rheological properties of (glycidoxypropyl) trimethoxysilane modified colloidal silica coatings

  • Kang Hyun Uk;Park Jung Kook;Kim Sung Hyun
    • Korea-Australia Rheology Journal
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    • 제16권4호
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    • pp.175-182
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    • 2004
  • Colloidal coating solution was prepared to enhance the hydrophilic property of the film surface. Water and ethanol were used as the dispersion media and (glycidoxypropyl) trimethoxysilane (GPS) as a binder in the colloidal silica coatings. Ethylene diamine was added to the colloidal silica solution as the curing agent. The colloidal silica solution was regarded as a hard-sphere suspension model with low volume fraction of the silica particles. Rheological properties of the silica suspensions modified with GPS have been investigated as a function of pH and concentration. The acidic solution showed high viscosity change by fast hydrolysis reaction and adsorption of the organic binders on the surface of silica particles. However, the hydrolysis was slow at the basic condition and the binders combined with themselves by condensation. The viscosity change was smallest at pH 7. The viscosity increased with the curing time after adding ethylenediamine, and the increase of viscosity at low pH was higher than that at high pH. The hydrophilic properties of the coating film were investigated by the contact angle of water and film surface. The smallest contact angle was shown under the strong acidic condition of pH 2.

준 무연마제 슬러리를 아용한 Cu CMP 연구 (Study on Cu CMP by using Semi-Abrasive Free Slurry)

  • 김남훈;임종흔;엄준철;김상용;김창일;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.158-161
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    • 2003
  • The primary aim of this study is to investigate new semi-abrasive free slurry including acid colloidal silica and hydrogen peroxide for copper chemical-mechanical planarization (CMP). In general, slurry for copper CMP consists of colloidal silica as an abrasive, organic acid as a complex-forming agent, hydrogen peroxide as an oxidizing agent, a film forming agent, a pH control agent and several additives. We developed new semi-abrasive free slurry (SAFS) including below 0.5% acid colloidal silica. We evaluated additives as stabilizers for hydrogen peroxide as well as accelerators in tantalum nitride CMP process. We also estimated dispersion stability and Zeta potential of the acid colloidal silica with additives. The extent of enhancement in tantalum nitride CMP was verified through anelectrochemical test. This approach may be useful for the application of single and first step copper CMP slurry with one package system.

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Steric Stabilization에 의한 석유분산매 자성유체의 제조 (Preparation of Kerosine-Based Magnetic Ferrofluid by Steric Stabilizaton)

  • 신학기;장현명;김태옥
    • 한국세라믹학회지
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    • 제27권5호
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    • pp.684-692
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    • 1990
  • Ultrafine magnetite powder for the ferromagnetic fluid was prepared by an addition of alkaline solution to the solution containing Fe2+ and Fe3+ ions at 6$0^{\circ}C$. The optimum condition of the magnetite synthesis was delineated by examining such various physico-chemical properties as Fe2+/Fe+3 ratio in the powder, phase characteristics, MHC and $\sigma$max. A new scheme for the steric stabilization of colloidal dispersion was proposed using the concept of the buffer group action for the increased interfacial density of the stabilizing moieties at colloid particle/dispersion medium interface. The proposed concept was successfully applied to the preparation of the kinetically stable kerosinebased ferrofluid using Tween and Span as dispersants. In the dispersion of magnetite particles in a kerosine, Tween(polyoxyethylene sorbitan oleate) acts as a primary stabilizer which provides an anchor group, whereas Span(sorbitan oleate) can be classified as a secondary stabilizer which adsorbs on the surface of magnetite particle through the action of the buffer group. Dispersion studies using various quantities of Tween and Span supported the concept of the buffer group action for increased dispersion characteristics of the kerosine based ferromagnetic fluid.

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