• 한국원자력학회:학술대회논문집
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• 한국원자력학회 1998년도 춘계학술발표회논문집(1)
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• pp.777-782
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• 1998

To terminate the progression of the sever accident and mitigate the accident consequences, corium coaling has been suggested as one of most important design features considered in the swore accident mitigation. Till now, some kinds of cooling methodologies have been identified and, specially the corium cooling at the reactor cavity has been considered as one of the most promising cooling methodologies. Moreover, several design requirements related to the cerium cooling at the reactor cavity have been also suggested and applied to the design of the next generation reactor. In this study technical description are briefly described for the important issues related to the cerium cooling at the reactor cavity, i.e. cavity area, cavity flooding system, etc., and simple evaluation for those items have been performed considering present technical levels the experiment and analytical works..

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.416-417
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• 2006

Nanostructured ceria powder was synthesized by a thermochemical process and investigated its applicability for an oxygen gas sensor. An amorphous precursor powders prepared by spray drying a cerium-nitrate solution were transformed successfully into nanostructured ceria by heat-treatment in air atmosphere. The powders were a loose agglomerated structure with extremely fine $CeO_2$ particles about 15 nm in size, resulting in a very high specific surface area $(110\;m^2/g)$. The oxygen sensitivity and the response time $t_{90}$ measured at sintered sample at $1000^{\circ}C$ was about -0.25 and very short, i.e., $3{\sim}5$ seconds, respectively.

• 반도체디스플레이기술학회지
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• 제20권1호
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• pp.37-41
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• 2021

We report on the formation of anodic aluminum oxide (AAO) film using sulfuric acid containing cerium salt. When the temperature of the sulfuric acid containing cerium salt changes from 5 ℃ to 20 ℃, the current density and the thickness growth rate increase. The surface morphology of the AAO film change according to the temperature of the electrolytes. And that affected the breakdown voltage and the plasma etch rate. The breakdown voltage per unit thickness was the highest at 15 ℃, and the plasma etch rate was the lowest at 10 ℃ at 2.80 ㎛/h.

• Nuclear Engineering and Technology
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• 제53권2호
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• pp.583-591
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• 2021

Various compositions of CeO₂-Ce₃Si₂ (0, 10, 30, 50, and 100 wt%Ce₃Si₂) composites were fabricated using conventional sintering and spark plasma sintering. Lower relative density, enhanced interdiffusion of oxygen and silicon, and silicide agglomerations from the congruent melting of Ce₃Si₂ at 1390 ℃ were only observed from conventionally-sintered pellets. Thermal conductivity of spark plasma sintered CeO₂-Ce₃Si₂ composites was calculated from the measured thermal diffusivity, specific heat, and density, which exhibited dense (>90 %TD) and homogeneous microstructure. The composite with 50 wt%Ce₃Si₂ exhibited 55% higher thermal conductivity than CeO₂ at 500 ℃, and 81% higher at 1000 ℃.

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 2003년도 추계학술발표대회 요약집
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• pp.185-185
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• 2003

• 한국방사성폐기물학회:학술대회논문집
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• 한국방사성폐기물학회 2011년도 추계학술논문요약집
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• pp.495-496
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• 2011

• Bulletin of the Korean Chemical Society
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• 제15권4호
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• pp.293-297
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• 1994

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 1999년도 추계학술발표회요약집
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• pp.189-189
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• 1999

• 한국전기전자재료학회논문지
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• 제18권9호
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• pp.803-809
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• 2005

Cerium ammonium nitrate (CAN) and nitric acid was used an etchant and an additive for Ru etching and polishing. pH and Eh values of the CAN and nitric acid added chemical solution satisfied the Ru etching condition. The etch rate increased linearly as the concentration of CAN increased. Nitric acid added solution had the high etch rate. But micro roughness of etched surfaces was not changed before and after etching, The removal rate of Ru film was the highest in $1wt\%$ abrasive added slurry, and not increased despite the concentration of alumina abrasive increased to $5wt\%$. Even Ru film was polished by only CAN solution due to the friction. The highest removal rate of 120nm/min was obtained in 1 M nitric acid and $1wt\%$ alumina abrasive particles added slurry. The lowest micro roughness value was observed in this slurry after polishing. From the XPS analysis of etched Ru surface, oxide layer was founded on the etched Ru surface. Therefore, Ru was polished by chemical etching of CAN solution and oxide layer abrasion by abrasive particles. From the result of removal rate without abrasive particle, the etching of CAN solution is more dominant to the Ru CMP.

• 한국재료학회지
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• 제23권1호
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• pp.31-34
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• 2013

Trivalent cerium-ion-doped $Y_3(Al,\;Ga)_5O_{12}$ nanoparticle phosphor nanoparticles were synthesized using the reverse micelle process. The Ce doped $Y_3(Al,\;Ga)_5O_{12}$ particles were obtained from nitrate solutions dispersed in the nanosized aqueous domains of a micro emulsion consisting of cyclohexane as the oil phase and poly(oxyethylene) nonylphenyl ether (Igepal CO-520) as the non-ionic surfactant. The crystallinity, morphology, and thermal properties of the synthesized $Y_3(Al,\;Ga)_5O_{12}:Ce^{3+}$ powders were characterized by thermogravimetry-differential thermal analysis (TGA-DTA), X-ray diffraction analysis (XRD), scanning electron microscopy (SEM), and transmission electron microscopy. The crystallinity, morphology, and chemical states of the ions were characterized; the photo-physical properties were studied by taking absorption, excitation, and emission spectra for various concentrations of cerium. The photo physical properties of the synthesized $Y_3(Al,\;Ga)_5O_{12}:Ce^{3+}$ powders were studied by taking the excitation and emission spectra for various concentrations of cerium. The average particle size of the synthesized YAG powders was below $1{\mu}m$. Excitation spectra of the $Y_3Al_5O_{12}$ and $Y_3Al_{3.97}Ga_{1.03}O_{12}$ samples were 485 nm and 475 nm, respectively. The emission spectra of the $Y_3Al_5O_{12}$ and $Y_3Al_{3.97}Ga_{1.03}O_{12}$ were around 560 nm and 545 nm, respectively. $Y_3(Al,\;Ga)_5O_{12}:Ce^{3+}$ is a red-emitting phosphor; it has a high efficiency for operation under near UV excitation, and may be a promising candidate for photonic applications.