• 한국세라믹학회지
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• 제35권3호
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• pp.259-263
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• 1998

WSi2/CVD-Si/SiO2/Si-substrate의 폴리사이드 구조에서 실리콘 증착 POCl3 확산 그리고 WSi2 증착 유무에 따른 Thin oxide 특성을 연구했다 WSi2 막을 증착하지 않은 CVD-Si/SiO2/Si-substrate 구조에서 CVD-Si을 po-lycrystalline-Si으로 증착한 시편이 amorphous-Si을 증착한 시편보다 산화막 불량이 적다 WSi2 를 증착시킨 WSi2/CVD-Si/SiO2./Si-substrate의 구조에서 CVD-Si의 polycrystalline-Si 혹든 amorphous-Si 의 막 증착에 따른 thin oxide의 불량율 차이는 미미하다 산화막 불량은 CVD-Si에 확산시킨 인(P) 증가 즉 면저항(sheet resistance) 감소로 증가한다. Thin oxide의 절연특성은 WSi2 증착으로 저하된다 WSi2 증착으로 산화막 두께는 증가하나 막 특성은 열등해져 산화막 절연성이 떨어진다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.710-713
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• 2003

The PZT(KP12) powder was synthesized by sintering at $1250^{\circ}C$ for 2hrs and wet milling for 24 hrs. The PZT composite mixed with PVdF was fabricated into bulk, sheet, and plate type and the characteristics of three types were estimated. The bulk type which has PZT volume percent of 70 showed the best piezoelectric constant. Dielectric constant increased exponentially as an increase of PZT volume percent. The figure of merit of bulk and plate type was better than pure PZT over PZT volume percent of 50.

• 한국세라믹학회지
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• 제30권2호
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• pp.139-147
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• 1993

Two sheets of high strength cement paste using ordinary Portland cement and water soluble polymer (polyacrylamide) were made by kneading with a twin roll mill. A carbon fiber layer out between two sheet of the cement paste, and then carbon fiber reinforced high strength cement composites were prepared by pressing them. The mechanical properties of the composites were investigated through the observation of the microstructure and the application of fracture mechanics. When the carbon fiber was added with 0.2 and 0.3wt% to the composites the flexural strength and Young's modulus were about 110∼116MPa and 74∼77GPa respectively, and critical stress intensity was about 3.14MPam1/2. It can be considered that the strength improvement of high strength cement fiber composites may be due to the removal of macropores and the increase of various fracture toughness effects; grain bridging, frictional interlocking, polymer fibril bridging and fiber bridging.

• 한국세라믹학회지
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• 제31권6호
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• pp.595-600
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• 1994

Ni0.3Zn0.7Fe2O4 ferrite specimens were fabricated by dry pressing and tape casting method. The properties of each specimen were measured and compared. In order to design and manufacture the chip devices effectively, one important criterion can be that the sintered density of the laminated body should approach close to that of the dry pressed body which is regarded as standard. This requirement could be satisfied by controlling the solid loading of the ferrite sheet, lamination temperature and pressure. Using the optimum conditions (solid loading 55 wt%, lamination temperature 6$0^{\circ}C$, lamination pressure 400 kg/$\textrm{cm}^2$, sintered at 125$0^{\circ}C$ 2h) a sintered ferrite, with the density of 5.18g/㎤ and permeability of 1390 at 0.5 MHz, were obtained.

• 한국세라믹학회지
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• 제38권1호
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• pp.15-21
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• 2001

전자파 차폐 및 반사방지용으로 사용되는 SiO$_2$/ITO 이층박막의 전기적 특성에 미치는 전이금속이온의 영향에 대해 고찰하고 전자파 차폐이론식으로부터 박막의 전도특성에 모사하여 효과적인 전자파 차폐효과를 얻기 위한 전도막을 설계하고자 하였다. ITO 상층부에 전이금속염을 첨가한 실리카 복합졸을 코팅하여 SiO$_2$/ITO 이층막을 제조한 결과 최저 표면저항치를 나타내는 첨가량은 전이금속의 종류에 따라 차이를 보이지만 Sn 및 Zn이 첨가된 졸로부터 형성된 박막은 $10^{5}$Ω/$\square$ 이하의 낮은 저항치를 보였으며 가장 안정된 표면저하을 나타내었다. 또한 전자파 차폐효과와 전도박막의 표면저항을 차폐이론식으로부터 모사한 결과 Zn과 Sn의 전이금속염이 첨가된 SiO$_2$/ITO 투명전도막은 TCO99에서 정한 전자파 차폐기준에 부합하였다.다.

• 한국세라믹학회지
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• 제34권6호
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• pp.601-610
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• 1997

In cofiring of multilayered alumina with tungsten, the change of camber with lamination condition was experimented and the effect of sintering shrinkage of alumina and tungsten was investigated. From the exact measurement of sintering shrinkage of tungsten thick film, as lamination pressure increased, the sintering shrinkage of alumina decreased but that of tungsten thick film was not changed. So it was though that the main factor which induced the sintering shrinkage difference between ceramics and metal with lamination condition was the change of sintering shrinkage of ceramics. In case of high lamination pressure, high green sheet density, the cofired specimen showed low camber due to low shrinkage difference between alumina and tungsten and there was a linear relation between camber and shrinkage difference. It was found that this shrinkage difference could change the thickness of tungsten film and the microstructure within via hole during cofiring.

• 한국세라믹학회지
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• 제31권1호
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• pp.74-78
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• 1994

Degradation of thin oxide by doped poly-Si and its improvement were studied. The gate oxide can be degraded by phosphorous in poly-Si doped POCl3. The degradation is increased with the decrement of sheet resistance and poly-Si thickness. Oxide failures of amorphous-Si are higher than those of poly-Si. In-situ double deposition of amorphous-Si, 54$0^{\circ}C$/30 nm, and poly-Si, 6$25^{\circ}C$/220 nm, forms the mismatch structure of grain boundary between amorphous-Si and poly-Si, and suppresses the excess phosphorous on oxide surface by the mismatch structure. The control of phosphorous through grain boundary improves the oxide reliability.

• 한국세라믹학회지
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• 제30권11호
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• pp.974-978
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• 1993

Glass viscosity effects on the electrical properties and microstructure of RuO2 based thick film resistors (TFR) using alumina modified lead borosilicate glasses were studied. AT 85$0^{\circ}C$, the glass viscosities were increased from 4.24Pa.s to 51.5Pa.s when the alumina was added from none to 14 weight percent to the standard glass of 63% PbO, 25% B2O3 and 12% SiO2. The resistivities of resistors were generally decreased and the microstructure development was retarded as the viscosity of the glass increased. This is contrary to the generally accepted thought that the low resistivity is due to fast microstructure development kinetics in TFR. Even though the glass viscosity retards the microstructure development kinetics, the overall network formations are favored for higher viscosity of glass, such that the sheet resistivities were decreased as the glass viscosity increased.

• 한국세라믹학회지
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• 제31권4호
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• pp.381-388
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• 1994

A new process which co-fires the low-firing-substrate and copper conductor was studied to achieve good bond strength and low sheet resistance of conductor. Cupric oxide is used as the precursor of conductive material in the new method and the firing atmosphere of the new process is changed sequently in air H2N2. The addition of cupric oxide and variations of firing atmosphere permited complete binder-burnout in comparison with the conventional method and contributed to the improvement of resistance and bonding behaviors. The potimum conditions of this experiment to obtain the satisfactory resistance and bond strength are as follows (binder-burnout temperature in air; 55$0^{\circ}C$, reducing temperature in H2; 40$0^{\circ}C$ for 30 min, ratio of copper and cupric oxide; 60:40~30:70 wt%). The bonding mechanism between the substrate and metal was explained by metal diffusion layer in the interface and the bond strength mainly depended on the stress caused by the difference of shrinkage and thermal expansion coefficient between the substrate and metal.

• 한국세라믹학회지
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• 제12권1호
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• pp.5-11
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• 1975

Thick film resistor paste was made utilizing oxide materials such as SnO, SnO＋Sb2O3, and SnO＋Zn. The oxide materials were mixed respectively with Q-12 glass powder and finally suspended in ethyl cellulose dissolved in ethyl cellosolve. Thick film resistor was made by screen printing the paste on the alumina substrate and firing it at a suitable temperature. Among thick films made from the resistor paste, the thick film containing 85% SnO and fired at $600^{\circ}C$ demonstrated the finest electrical properties showing 10 K ohm in sheet resistance, 110 ppm/$^{\circ}C$ in TCR. In general, TCR of the thick films made from the oxide-mixture paste is good in linearity, therefore it is suggested the oxide-mixture paste is utilized as the negative thermistor.