• Title/Summary/Keyword: catalytic chemical vapor deposition

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Growth of Carbon Nanotubes on Different Catalytic Substrates (촉매금속(Ni-Cu)의 적층 증착법에 의한 탄소나노튜브의 성장)

  • 배성규;이세종;조성진;이득용
    • Journal of the Korean Ceramic Society
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    • v.41 no.3
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    • pp.247-252
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    • 2004
  • 노튜브의 길이는 급격히 증가하였지만 촉매금속의 적층방법에 따른 탄소나노튜브의 성장 형태는 큰 차이가 없었다. 특히, ICBD 방법에 의해 Ni 촉매금속을 증착한 경우 다른 방법에 비하여 직선적인 탄소나노튜브가 관찰되었다. ^x Carbon nanotubes were grown on SiO$_2$/Si substrates by applying $C_2$H$_2$ gas through chemical vapor deposition process. It was found that carbon nanotubes were grown successfully on the substrates with catalytic films under 20 $\AA$ total thickness. The increase in reaction temperature from 50$0^{\circ}C$ to 80$0^{\circ}C$ resulted in longer carbon nanotube, but there was no clear tendencies with different types of catalytic layers. It was evident that carbon nanotubes became more straight on the substrate with Ni catalytic film produced by ICBD method.

Platinum Model Catalysts Dispersed on Alumina with Regular Pores (규칙적 세공을 가진 알루미나에 분산된 백금 모형촉매)

  • 윤천호;임헌성
    • Journal of the Korean institute of surface engineering
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    • v.33 no.4
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    • pp.261-265
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    • 2000
  • Geometrically and chemically well defined Pt/alumina model catalysts have been prepared. To this end, we fabricated electrochemically alumina supports in which pores of constant size, length and shape were regularly distributed over a wide area of the surface. Platinum particles were dispersed on the pore surfaces via organometallic chemical vapor deposition technique using (trimethyl) methylcyclopentadienylplatinum (IV) as a precursor. The chemical composition of the alumina plane surfaces was examined by Auger electron spectroscopy and the adsorption characteristics of the platinum particles were studied by thermal desorption spectroscopy. A variety of industrial catalytic problems are now open for further investigation utilizing the Pt/alumina model catalysts.

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Effect of Ammonia Gas on Growth of Chemically Vapor-Deposited Carbon Nanotubes (화학기상증착법에 의한 탄소나노튜브의 성장에 미치는 암모니아 가스의 영향)

  • Lee, Dong-Gu
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.5
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    • pp.418-423
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    • 2010
  • Carbon nanotubes (CNTs) were synthesized by Fe-catalytic chemical vapor deposition (CVD) method about $800^{\circ}C$. The influence of process parameters such as pretreatment conditions, gas flow ratio, processing time, etc on the growth of CNTs was investigated by field emission scanning electron microscopy, transmission electron microscopy, and Raman spectroscopy. Ammonia was added to acetylene source gas before and during the CNT growth. Different types of CNTs formed depending upon the processing condition. It was found that ammonia prevented amorphous carbons from adsorbing to the outer wall of CNT, resulting in purification of CNTs during CNT growth.

Al$_2$O$_3$ formation on Si by catalytic chemical vapour deposition

  • Ogita, Yoh-Ichiro;Shinshi Iehara;Toshiyuki Tomita
    • Electrical & Electronic Materials
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    • v.16 no.9
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    • pp.63.1-63
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    • 2003
  • Catalytic chemical vapor deposition (Cat-CVD) has been developed to deposit alumina(Al$_2$O$_3$) thin films on silicon (Si) crystal using N$_2$ bubbled tir-methyl aluminium [Al(CH$_3$)$_3$, TMA] and molecular oxygen (O$_2$) as source species and tungsten wires as a catalyzer. The catalyzer dissociated TMA at approximately 600$^{\circ}C$ The maximum deposition rate was 18 nm/min at a catalyzer temperature of 1000 and substrate temperature of 800$^{\circ}C$. Metal oxide semiconductor (MOS) diodes were fabricated using gates composed of 32.5-nm-thick alumina film deposited as a substrate temperature of 400oC. The capacitance measurements resulted in a relatively dielectric constant of 7, 4, fixed charge density of 1.74*10e12/$\textrm{cm}^2$, small hysteresis voltage of 0.12V, and very few interface trapping charge. The leakage current was 5.01*10e-7 A/$\textrm{cm}^2$ at a gate bias of 1V.

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Synthesis and Microstructure of Single-Walled Carbon Nanotubes by Catalytic Chemical Vapor Deposition Method (촉매화학기상증착법에 의한 단일벽 탄소나노튜브의 합성과 미세구조)

  • Kim, Jong-Sik;Kim, Gwan-Ha;Kim, Chang-Il
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.7
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    • pp.359-363
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    • 2006
  • Single-walled carbon nanotubes (SWCNTs) with few defects and very small amount of amorphous carbon coating have been synthesized by catalytic decomposition of methane in $H_2$ over well-dispersed metal particles supported on MgO. The yield of SWCNTs was estimated to be 88.5% and the purities of SWCNTs thus obtained were more than 90%. Peak of the radial breathing mode in the Raman spectrum demonstrated that the diameters of synthesized CNTs are in the range 0.4-2.0 nm. Our results also indicated that MgO support materials are useful to a large-scale synthesis of high-quality SWCNTs. Increasing temperature could remarkably increase the yield and also improve the quality of SWCNTs from catalytic decomposition of methane. The morphologies and microstructures of the synthesized carbon materials were characterized by scanning electron microscopy (SEM), Thermogravimetric analysis (TGA), Raman spectroscopy, and X-ray diffraction (XRD).

GROWTH OF CARBON NANOTUBES ON GLASS BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (마이크로웨이브 플라즈마 화학기상증착장비를 사용한 유리기판상의 탄소나노튜브의 합성)

  • Lee, Jae-Hyeoung;Choi, Sung-Hun;Choi, Won-Seok;Hong, Byung-You;Kim, Jeong-Tae;Lim, Dong-Gun;Yang, Kea-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.99-100
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    • 2005
  • We have grown carbon nanotubes (CNTs) with a microwave plasma chemical vapor deposition (MPECVD) method, which has been regard as one of the most promising candidates for the synthesis of CNTs due to the vertical alignment, the low temperature and the large area growth. We use methane ($CH_4$) and hydrogen ($H_2$) gas for the growth of CNTs. 60 nm thick Ni catalytic layer were deposited on the TiN coated glass substrate by RF magnetron sputtering method. In this work, we report the effects of pressure on the growth of CNTs. We have changed pressure of processing (10 $\sim$ 20 Torr) deposition of CNTs. SEM (Scanning electron microscopy) images show diameter, length and cross section state CNTs.

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Nano-thick Nickel Silicide and Polycrystalline Silicon on Glass Substrate with Low Temperature Catalytic CVD (유리 기판에 Catalytic CVD 저온공정으로 제조된 나노급 니켈실리사이드와 결정질 실리콘)

  • Song, Ohsung;Kim, Kunil;Choi, Yongyoon
    • Korean Journal of Metals and Materials
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    • v.48 no.7
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    • pp.660-666
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    • 2010
  • 30 nm thick Ni layers were deposited on a glass substrate by e-beam evaporation. Subsequently, 30 nm or 60 nm ${\alpha}-Si:H$ layers were grown at low temperatures ($<220^{\circ}C$) on the 30 nm Ni/Glass substrate by catalytic CVD (chemical vapor deposition). The sheet resistance, phase, microstructure, depth profile and surface roughness of the $\alpha-Si:H$ layers were examined using a four-point probe, HRXRD (high resolution Xray diffraction), Raman Spectroscopy, FE-SEM (field emission-scanning electron microscopy), TEM (transmission electron microscope) and AES depth profiler. The Ni layers reacted with Si to form NiSi layers with a low sheet resistance of $10{\Omega}/{\Box}$. The crystallinty of the $\alpha-Si:H$ layers on NiSi was up to 60% according to Raman spectroscopy. These results show that both nano-scale NiSi layers and crystalline Si layers can be formed simultaneously on a Ni deposited glass substrate using the proposed low temperature catalytic CVD process.

CNT Growth Behavior on Ti Substrate by Catalytic CVD Process with Temperature Gradient in Tube Furnace (촉매 화학기상증착 공정에서 온도구배 설정을 통한 타이타늄 기판에서의 CNT 성장 거동)

  • Park, Ju Hyuk;Byun, Jong Min;Kim, Hyung Soo;Suk, Myung-Jin;Oh, Sung-Tag;Kim, Young Do
    • Journal of Powder Materials
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    • v.21 no.5
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    • pp.371-376
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    • 2014
  • In this study, modified catalytic chemical vapor deposition (CCVD) method was applied to control the CNTs (carbon nanotubes) growth. Since titanium (Ti) substrate and iron (Fe) catalysts react one another and form a new phase ($Fe_2TiO_5$) above $700^{\circ}C$, the decrease of CNT yield above $800^{\circ}C$ where methane gas decomposes is inevitable under common CCVD method. Therefore, we synthesized CNTs on the Ti substrate by dividing the tube furnace into two sections (left and right) and heating them to different temperatures each. The reactant gas flew through from the end of the right tube furnace while the Ti substrate was placed in the center of the left tube furnace. When the CNT growth temperature was set $700/950^{\circ}C$ (left/right), CNTs with high yield were observed. Also, by examining the micro-structure of CNTs of $700/950^{\circ}C$, it was confirmed that CNTs show the bamboo-like structure.

Growth of vertically aligned carbon nanotubes on a large area Si substrates by thermal chemical vapor deposition

  • Lee, Cheol-Jin;Park, Jung-Hoon;Son, Kwon-Hee;Kim, Dae-Woon;Lyu, Seung-Chul;Park, Sung-Hoon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.212-212
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    • 2000
  • Since the first obserbvation of carbon nanotubes, extensive researches have been done for the synthesis using arc discharge, laser vaporization, and plasma-enhanced chemical vapor deposition. Carbon nanotubes have unique physical and chemical properties and can allow nanoscale devices. Vertically aligned carbon nanotubes with high quality on a large area is particularly important to enable both fundamental studies and applications, such as flat panel displays and vacuum microelectronics. we have grown vertically aligned carbon nanotubes on a large area of Si substrates by thermal chemical vapor deposition using C2H2 gas at 750-950$^{\circ}C$. we deposited catalytic metal on Si susbstrate using thermal evaporation. The nanotubes reveal highly purified surface. The carbon nanotubes have multi-wall structure with a hollow inside and it reveals bamboo structure agreed with base growth model. Figure 1 shows SEM micrograph showing vertically aligned carbon nanotubes whih were grown at 950$^{\circ}C$ on a large area (20mm${\times}$30mm) of Si substrates. Figure 2 shows TEM analysis was performed on the carbon nanotubes grown at 950$^{\circ}C$ for 10 min. The carbon nanotubes are multi-wall structure with bamboo shape and the lack of fringes inside the nanotube indicates that the core of the structure is hollow. In our experiment, carbon nanotubes grown by the thermal CVD indicate base growth model.

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Synthesis of vertically aligned thin multi-walled carbon nanotubes on silicon substrates using catalytic chemical vapor deposition and their field emission properties (촉매 화학 기상 증착법을 사용하여 실리콘 기판위에 수직 정렬된 직경이 얇은 다중층 탄소나노튜브의 합성과 그들의 전계방출 특성)

  • Jung, S.I.;Choi, S.K.;Lee, S.B.
    • Journal of the Korean Vacuum Society
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    • v.17 no.4
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    • pp.365-373
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    • 2008
  • We have succeeded in synthesizing vertically aligned thin multi-walled carbon nanotubes (VA thin-MWCNTs) by a catalytic chemical vapor deposition (CCVD) method onto Fe/Al thin film deposited on a Si wafers using an optimum amount of hydrogen sulfide ($H_2S$) additive. Scanning electron microscope (SEM) images revealed that the as-synthesized CNT arrays were vertically well-oriented perpendicular to the substrate with relatively uniform length. Transmission electron microscope (TEM) observations indicated that the as-grown CNTs were nearly catalyst-free thin-MWCNTs with small outer diameters of less than 10nm. The average wall number is about 5. We suggested a possible growth mechanism of the VA thin-MWCNT arrays. The VA thin-MWCNTs showed a low turn-on electric field of about $1.1\;V/{\mu}m$ at a current density of $0.1\;{\mu}A/cm^2$ and a high emission current density about $2.5\;mA/cm^2$ at a bias field of $2.7\;V/{\mu}m$. Moreover, the VA thin-MWCNTs presented better field emission stability without degradation over 20 hours (h) at the emission current density of about $1\;mA/cm^2$.