• 분석과학
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• 제7권3호
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• pp.253-260
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• 1994

Low power-low flow 유도결합 플라즈마 원자방출 분광법(ICP-AES)에서 분석적 특성에 대해 연구하였다. Low power ICP에서는 moderate power ICP보다 알짜세기는 감소하지만 바탕세기도 감소하여 알짜세기에 대한 바탕세기의 비는 오히려 증가하였다. Low power ICP에서도 작동조건에 따라 moderate power와 비슷한 검출한계를 얻을 수 있으며, 검량곡선도 $10^4{\sim}10^5$ 정도의 직선성을 가질 수 있었다. 알칼리 금속에 의한 이온화 방해영향은 시료운반기체의 사용량을 증가시킬수록 증가하지만, RF power의 변화에 대해서는 큰 차이가 없었다.

• 한국응용과학기술학회지
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• 제23권4호
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• pp.273-279
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• 2006

Water quality has been deteriorated by the increasing amount of industrial waste water that is due to the better standard of living. In order to lessen the polluted water and substantially reutilize it at factories, a new method is needed. The plasma generator, which uses discharge current below 1,500 voltage and processes at extremely low temperature, has more strong oxidization than current method and an advantage of miniaturizing the apparatus in dealing with waster water by producing carrier gas at room temperature. This study were measured on the 3 kinds of waster water to the plasma generator for 120 minutes. As results, COD was almost decreased and removed in 15 minutes. The results suggest that the plasma generator can be used reduce COD and removal of color for various waster water, which can be reutilized as industrial water, It would be of benefit to the country like Korea in which qualified water is deficient.

• 조명전기설비학회논문지
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• 제25권10호
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• pp.116-124
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• 2011

In this work, the effect of the initial concentration of methanol and ethanol, and the addition of oxygen molecules were discussed to improve the hydrogen generation using non-thermal plasma reactor effectively. In addition, the effect of ozone decomposition catalyst of manganese dioxide and its quantity was investigated. First, hydrogen concentration increased until an initial concentration of about 40,000[ppm] of methanol and thereafter it was saturated. Henceforth, hydrogen concentration decreased with increasing the oxygen percent on the carrier gas of nitrogen about both substances. Related with the effect of catalyst, it increased upto 60[g], but it was not changed largely after that. Consequently, it is confirmed that the hybrid process using plasma process and catalytic surface chemical reaction is a very promising way to increase the efficiency of hydrogen generation as investigated in this work.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
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• pp.26-29
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• 2001

ZnO thin film had been deposited on the glass by Evaporation Ramped method. and electrical and resistivity were investigated. Evaporation gas($O_{2}$,) pressure was 10mTorr~100mTorr, chamber pressure was $2{\times}10^{-5}$, and then ZnO film were deposited. AI-doped ZnO thin film had the lowest resistivity ($1{\times}10^{4}\;{\Omega}{\cdot}cm$), and then carrier concentration and Hall mobility were$6.27{\times}10^{20}\;cm^{3}$ and $22.04 cm^{2}/V{\cdot}s$, respectively. When ZnO film had been deposited by Ramp6ed method compared with normal method and investigated resistivity.

• Journal of Welding and Joining
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• 제15권1호
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• pp.116-124
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• 1997

A scope of this study is to establish the optimum plasma spray conditions for fine ($5\mu\textrm{m}$) $Al_2O_3$ powder. However, the flowability of the $Al_2O_3$ powder is not so good because of irregular particle shape and fine particle size. Therefore, powder feeding system was modified by 1) change of powder feeding line material from polymer to copper 2) shorten the powder feeding tube length 3) heating the powder feeding system to $80^{\circ}C$4) vibrating the powder feeding line continuously, in order to feed the fine powder homogeneously. The homogeneous powder feeding conditions were obtained with the modified powder feeding system by controlling the powder carrier gas flow and the powder flow rate indicator. The best plasma spraying conditions for the fine $Al_2O_3$ powder were found out as 40kw gun power, 80 g/min. powder feed rate and 50 mm working distance after characterizing the microstructure, hardness and wear loss of the $Al_2O_3$ coating layer.

• 한국입자에어로졸학회지
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• 제9권3호
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• pp.127-132
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• 2013

Recently, Aerosol Deposition method has attracted considerable attention because of its advantages to produce ceramic coatings on various substrates at room temperature. This method is strongly dependent on the raw powder, which should have high mobility with carrier gas and moderate mechanical strength to be crushed onto the substrate. In this report, the effects of the ceramic granules' compressive strength on the ceramic coating formation are discussed. The ceramic granules were prepared by spray-drying method and heat treated at various temperatures. It was found that at the moderate mechanical strength of ceramic granules gave more effective film formation behavior during Aerosol Deposition method.

• 항공우주기술
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• 제8권1호
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• pp.98-107
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• 2009

5MW급 발전용 가스터빈을 개발하기 위해 주요 구성품 중의 하나인 압축기의 성능을 시험 평가하고자 하며, 이를 위한 사전 작업으로 압축기 시험 리그의 진동 특성을 분석하여 압축기 운전시 구동 방법에 대한 정보를 확보하였다. 압축기 시험 설비는 입 출구 배관과 시험부 및 구동부로 구성되어 있고, 특히 구동부와 시험부에서 가속도계를 이용하여 진동 특성을 계측하였다. 압축기 주 하우징과 콜렉터, 베어링캐리어, 토크미터, 기어박스, 전동 모터 등에 가속도계를 장착하여 진동 속도 및 주파수 분석을 수행하였다.

• 한국세라믹학회지
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• 제23권2호
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• pp.21-30
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• 1986

Pure submicron $SrTiO_3$ powders had been synthesized with chemical wet process that $5N-NH_4OH$ solution was sprayed into the mixed solution of $SrTiO_3$, $TiCl_4$ and $H_2O_2$ with $N_2$ carrier gas. The characteristic properties of powders obtained from this experiment were as follows. The optimum synthesis condition in reaction bath was above PH 8.5 and under $25^{\circ}C$ The particle size of precipitated SrTiO(OH) powders dried at 6$0^{\circ}C$ was under 0.01${\mu}{\textrm}{m}$ and uniform. Amorphous precipitated complex powders emitted adsorbed water at 15$0^{\circ}C$ less that and crystalline $SrTiO_3$powders was produced from calcining the complex at 30$0^{\circ}C$. Sintered body of SrTiO3 fired at 133$0^{\circ}C$ showed that relative dielectric constant was 228 at 1MHZ and bulk density was 4.73g/$cm^3$.

• 한국전기전자재료학회논문지
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• 제15권11호
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• pp.953-957
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• 2002

Single crystal 3C-SiC (cubic silicon carbide) thin-films were deposited on Si(100) wafer up to the thickness of 4.3 ${\mu}{\textrm}{m}$ by APCVD (atmospheric pressure chemical vapor deposition) method using HMDS (hexamethyildisilane; ｛CH$_{3}$｝$_{6}$ Si$_{2}$) at 135$0^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC film was 4.3 ${\mu}{\textrm}{m}$/hr. The 3C-SiC epitaxial film grown on Si(100) wafer was characterized by XRD (X-ray diffraction), AFM (atomic force microscopy), RHEED (reflection high energy electron diffraction), XPS (X-ray photoelecron spectroscopy), and Raman scattering, respectively. Two distinct phonon modes of TO (transverse optical) near 796 $cm^{-1}$ / and LO (longitudinal optical) near 974$\pm$1 $cm^{-1}$ / of 3C-SiC were observed by Raman scattering measurement. The heteroepitaxially grown film was identified as the single crystal 3C-SiC phase by XRD spectra (2$\theta$=41.5。).).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.354-357
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• 2002

Thermally grown gate oxide on 4H-SiC wafer was investigated. The oxide layers were grown at l150$^{\circ}C$ varying the carrier gas and post activation annealing conditions. Capacitance-Voltage(C-V) characteristic curves were obtained and compared using various gate electrode such as Al, Ni and poly-Si. The interface trap density can be reduced by using post oxidation annealing process in Ar atmosphere. All of the samples which were not performed a post oxidation annealing process show negative oxide effective charge. The negative oxide effective charges may come from oxygen radical. After the post oxidation annealing, the oxygen radicals fixed and the effective oxide charge become positive. The effective oxide charge is negative even in the annealed sample when we use poly silicon gate. Poly silicon layer was dope by POCl$_3$ process. The oxide layer may be affected by P ions in poly silicon layer due to the high temperature of the POCl$_3$ doping process.