• 한국전기전자재료학회논문지
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• 제27권9호
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• pp.547-550
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• 2014

In this study, the electrical characteristics of the nickel (Ni)/carbon nanotube (CNT)/$SiO_2$ structures were investigated in order to analyze the mechanism of CNT in MOS device structures. We fabricated 4H-SiC MOS capacitors with or without CNTs. CNT was dispersed by isopropyl alcohol. The capacitance-voltage (C-V) and current-voltage (I-V) are characterized. Both devices were measured by Keithley 4200 SCS. The experimental flatband voltage ($V_{FB}$) shift was positive. Near-interface trap charge density ($N_{it}$) and negative oxide trap charge density ($N_{ox}$) value of CNT embedded MOS capacitors was less than that values of reference samples. Also, the leakage current of CNT embedded MOS capacitors is higher than reference samples. It has been found that its oxide quality is related to charge carriers and/or defect states in the interface of MOS capacitors.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.112-112
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• 2009

Temperature dependence of the ferroelectric properties of poly(vinylidefluoride-trifluoroethylene) copolymer thin films are studied with various insulators such as $SrTa_2O_6$ and $La_2O_3$. Thin films of poly(vinylidene fluoridetrifluoroethylene) 75/25 copolymer were prepared by chemical solution deposition on p-Si substrate. Capacitance-voltage (C-V) and current density (J-V) behavior of the Au/P(VDF-TrFE)/Insulator/p-Si structures were studied at ($150-200\;^{\circ}C$) and dielectric constant of the each insulators were measured to be about 15 at $850\;^{\circ}C$ for 10 minutes. Memory window width at 5 V bias the MFIS(metal-ferroelectric-insulator-semiconductor) structure with as deposited films was about 0.5 V at high temperature ($200\;^{\circ}C$). And the memory window width increased as voltage increased from 1 V to 5 V.

• 대한전기학회논문지
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• 제43권3호
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• pp.420-431
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• 1994

The HgCdTe material, which is II-VI compound semiconductor, is important materials for the fabrication of the infrared detectros. To suggest the model of accurate MIS C-V calculation for narrow band gap semiconductors such as HgCdTe, non-parabolicity from k.p theory and degeneracy effect are considered. And partially ionized effect and compensation effect which are material's properties are also considerd. Especially, degenerated material C-V characteristics from Fermi-Dirac statistics and exact charge theory are presented to get more accurate analysis of the experimental results. Also the comparison with calculation results between the general MIS theory from Boltzmann appoximation method and this model which is considered the narrow band gap semiconductor properties, show that this model is more useful theory to determination of accurate low and high frequency C-V characteristics.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제54권2호
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• pp.69-75
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• 2005

In order to improve the reliability of high voltage rotating machines and mold transformers, it is necessary to understand the breakdown mechanism and life assessment of the high voltage winding parts. Especially the on-line PD test provides the ability to monitor effects, such as slot discharge, internal discharge, and end-winding discharge without interrupting the electrical machines, this method has been proven the major testing technology. Capacitive couplers have been the most widely used sensors for the on-line partial discharge detection in rotating machines nowadays. This paper deals with the electrical characteristics and long-term reliability of a ceramic coupler(CC), which can be easily mounted into high voltage input terminal part, has been developed and tested to continuously measure PD activity during operating condition. This paper presents electrical characteristics (dielectric loss angle, capacitance, PD inception level, breakdown voltage, and frequency response bandwidth) and long-term life test result of the developed 6.6 kV class on-line ceramic coupling sensor. It was found that this sensor had good electrical characteristics to detect PD activity during the operating condition with its detection frequency band is between several and several tens MHz. Also, the voltage life of the 6.6kV class ceramic coupler was calculated over 60 years.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2008년도 하계종합학술대회
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• pp.577-578
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• 2008

This paper proposes new analog ZQ calibration scheme. Proposed analog ZQ calibration scheme is for minimizing the reflection which degrade the signal integrity. And this scheme is for minimizing CIO capacitance. It is simulated under 1.5v supply voltage and samsung 0.18um process. Power consumption of proposed analog ZQ calibration circuit was improved by 32%. Under all skew, temperature from $30^{\circ}C$ to $90^{\circ}C$ and Monte carlo simulation, quantization error of RZQ(=$240{\Omega}$) is less han 1.07%.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권1호
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• pp.51-56
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• 1999

This paper presents a new transient overvoltage blocking device (TOBD) for info-communication facilities with low power and high frequency bandwidth. Conventional protection devices have some problems such as low frequency bandwidth, low energy capacity and high remnant voltage. In order to improve these limitations, thehybrid type TOBD, which consists of a gas tube, avalanche diodes and junction typefield effect transistors (JFETs), was designed and fabricated. The TOBD differs from the conventional protection devices in configuration, and JFETs were used as an active non-linear element and a high speed switching diode with low capacitance limits high current. Therefore the avalanche dilde with low energy capacity are protected fromthe high current, and the TOBD has a very small input capacitance. From the performance test using combination surge generator, which can produce $1.2/50\mus\;4.2kV_{max}\; 8/20\mus\; 2.1kA_{max}$, it is confirmed that proposed TOBD has an excellent protection performance in tight clamping voltage and limiting current characteristics.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.297-298
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• 2005

We have fabricated twisted nematic (TN) liquid crystal cells doped by carbon nanotubes (CNTs) with different CNT wt. %. With a minute amount doping, multi-walled CNTs did not perturb the liquid crystal orientations at the off- and on-state. The hysteresis studies of voltage-dependent capacitance (V-C) under the influence of electric field generated by ac and dc voltage show that the residual do, which is tightly related to image sticking problem in liquid crystal displays, is greatly reduced due to ion trapping by CNTs. Also, the V-C hysteresis shows dependency of capacitance on concentration of multi-walled CNTs.

• 한국전기전자재료학회논문지
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• 제13권5호
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• pp.365-370
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• 2000

Schottky contacts on n-In$\_$0.53//Ga$\_$0.47//As have been made by metal deposition on substrates cooled to a temperature of 77K. The current-voltage and capacitance-voltage characteristics showed that the Schottky diodes formed at low temperature had a much improved barrier height compared to those formed at room temperature. The Schottky barrier height ø$\_$B/ was found to be increased from 0.2eV to 0.6eV with Ag metal. The saturation current density of the low temperature diode was about 4 orders smaller than for the room temperature diode. A current transport mechanism dominated by thermionic emission over the barrier for the low temperature diode was found from current-voltage-temperature measurement. Deep level transient spectroscopy studies exhibited a bulk electron trap at E$\_$c/-0.23eV. The low temperature process appears to reduce metal induced surface damage and may form an MIS (metal-insulator-semiconductor)-like structure at the interface.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.299-299
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• 2016

SiC는 넓은 에너지갭 (Eg=~3.4 eV)을 갖는 반도체로써, 고전압, 고온에서 동작이 가능하여 기존의 Si기반의 파워디바이스를 대체하기 위한 물질로 많은 연구가 이루어지고 있다. 파워 디바이스의 성능 향상을 위해서는 기판과 절연체 사이의 계면에 생성되는 계면 결함을 감소시켜야 한다. 따라서 본 연구에서는 SiC 기판에 high-k 물질인 HfO2를 증착하여 HfO2/SiC 계면에 유도된 결함을 분석하고 이를 감소시킬 수 있는 방법에 대한 연구를 수행하였다. HfO2 박막은 atomic-layer-deposition (ALD) 방법을 이용하여 SiC 기판 위에 $200^{\circ}C$에서 증착하였다. HfO2 박막 증착 후 NH3 분위기에서 rapid thermal annealing 방법을 이용하여 $600^{\circ}C$에서 1분 동안 열처리 진행하였다. Current-voltage (I-V) 측정을 통해 열처리 전 HfO2/SiC의 절연파괴 전압이 약 8.3 V 임을 확인하였다. NH3 열처리 후 HfO2/SiC의 절연파괴 전압이 10 V로 증가하였으며 누설 전류가 크게 감소하는 것을 확인하였다. 또한 capacitance-voltage (C-V) 측정을 통해 열처리 후 flat band voltage가 negative 방향에서 positive 방향으로 이동함을 확인하였고, 이를 통해 NH3 열처리 방법이 HfO2/SiC 계면에 존재하는 결함을 감소시킬 수 있음을 확인하였다. 전자 구조상의 conduction band edge에 존재하는 결함 준위를 분석하기 위해 x-ray absorption spectroscopy (XAS) 분석을 실시하였고, 열처리 전 HfO2/SiC 계면에 많은 결함 준위가 존재함을 확인하였으며, x-ray photoelectron spectroscopy (XPS) 분석을 통해 이 결함 준위가 oxygen deficiency state과 관련됨을 알 수 있었다. NH3 열처리 후 결과와 비교해보면, oxygen deficiency state가 감소함을 확인하였으며 이로 인해 conduction band edge에 존재하는 결함 준위가 감소함을 알 수 있었다. 따라서, NH3 열처리 방법을 이용하여 HfO2/SiC 계면에 존재하는 결함을 감소시킬 수 있으며, HfO2/SiC의 물리적, 전기적 특성을 향상시킬 수 있다는 결과를 도출하였다.

• KIEE International Transaction on Electrical Machinery and Energy Conversion Systems
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• 제11B권4호
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• pp.180-184
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• 2001

The high operation frequency mainly reduces transformer volume in the power supply. A high frequency and high voltage pulse transformer is designed, fabricated, and tested. Switching frequency of the transformer is 100 kHz. Input and output voltages of the transformer are 250 V and 4 kV, respectively. Normal operation power of the transformer is 3 kW. Maximum volume of the transformer is 400 $cm^3$. The power density is thus 7.5 W/$cm^3$. The transformer will be installed in a metal box that has nominal operation temperature of 85 degree centigrade. The transformer and other high voltage components in the box will be molded with Silicon RTV(Room Temperature Vulcaniza) that has a very low thermal conductivity. Procedure of design and test results are discussed. Analytical as well as experimental results of varous paramters such as transformer loss, leakage inductance, distributed capacitance are also discussed. In addition, thermal analysis results from ANSYS code for three different operation conditions are discussed.