• Title/Summary/Keyword: c-si solar cell

Search Result 289, Processing Time 0.032 seconds

Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering (RF 마그네트론 스퍼터링을 이용한 태양전지용 질화 실리콘 반사방지막)

  • Choi, Kyoon;Choi, Eui-Seok;Hwang, Jin-Ha;Lee, Soo-Hong
    • Journal of the Korean Ceramic Society
    • /
    • v.44 no.10
    • /
    • pp.585-588
    • /
    • 2007
  • Silicon nitride films for an anti-reflection coating were deposited on silicon via RF magnetron sputtering using a $Si_3N4$ target. The best result was obtained at the sputtering condition of 340 W RF power, 5 mtorr Ar atmosphere, $100^{\circ}C$ substrate temperature. The films showed 7.9% reflectance minimum with 2.35 refractive index. 0.21 absorption coefficient at 66.6 nm thickness. The surface morphology showed a smooth and dense film with good adhesion to silicon surface.

Study on Fiber Laser Annealing of p-a-Si:H Deposition Layer for the Fabrication of Interdigitated Back Contact Solar Cells (IBC형 태양전지 제작을 위한 p-a-Si:H 증착층의 파이버 레이저 가공에 관한 연구)

  • Kim, Sung-Chul;Lee, Young-Seok;Han, Kyu-Min;Moon, In-Yong;Kwon, Tae-Young;Kyung, Do-Hyun;Kim, Young-Kuk;Heo, Jong-Kyu;Yoon, Ki-Chan;Yi, Jun-Sin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.11a
    • /
    • pp.430-430
    • /
    • 2008
  • Using multi plasma enhanced chemical vapor deposition system (Multi-PECVD), p-a-Si:H deposition layer as a $p^+$ region which was annealed by laser (Q-switched fiber laser, $\lambda$ = 1064 nm) on an n-type single crystalline Si (100) plane circle wafer was prepared as new doping method for single crystalline interdigitated back contact (IBC) solar cells. As lots of earlier studies implemented, most cases dealt with the excimer (excited dimer) laserannealing or crystallization of boron with the ultraviolet wavelength range and $10^{-9}$ sec pulse duration. In this study, the Q-switched fiber laser which has higher power, longer wavelength of infrared range ($\lambda$ = 1064 nm) and longer pulse duration of $10^{-8}$ sec than excimer laser was introduced for uniformly deposited p-a-Si:H layer to be annealed and to make sheet resistance expectable as an important process for IBC solar cell $p^+$ layer on a polished n-type Si circle wafer. A $525{\mu}m$ thick n-type Si semiconductor circle wafer of (100) plane which was dipped in a buffered hydrofluoric acid solution for 30 seconds was mounted on the Multi-PECVD system for p-a-Si:H deposition layer with the ratio of $SiH_4:H_2:B_2H_6$ = 30:120:30, at $200^{\circ}C$, 50 W power, 0.2 Torr pressure for 20 minutes. 15 mm $\times$ 15 mm size laser cut samples were annealed by fiber laser with different sets of power levels and frequencies. By comparing the results of lifetime measurement and sheet resistance relation, the laser condition set of 50 mm/s of mark speed, 160 kHz of period, 21 % of power level with continuous wave mode of scanner lens showed the features of small difference of lifetime and lowering sheet resistance than before the fiber laser treatment with not much surface damages. Diode level device was made to confirm these experimental results by measuring C-V, I-V characteristics. Uniform and expectable boron doped layer can play an important role to predict the efficiency during the fabricating process of IBC solar cells.

  • PDF

Low temperature growth of silicon thin film on sapphire substrate by liquid phase epitaxy for solar cell application (사파이어 기판을 사용한 태양전지용 실리콘 박막의 저온액상 에피탁시에 관한 연구)

  • Soo Hong Lee;Martin A. Green
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.4 no.2
    • /
    • pp.131-133
    • /
    • 1994
  • Deposition of silicon on pretreated sapphire substrates has been investigated by the liquid phase epitaxy method at low temperatures. An average 14 $\mu\textrm{m}$ thickness of silicon was grown over a large area on sapphire substrate originally coated with a much thinner silicon layer $[0.5 \mu\textrm{m} (100) Si/(1102) sapphire]$ at low temperatures from $(380^{\circ}C to 460^{\circ}C)$.

  • PDF

Development of Copper and Copper Oxide Removal Technology Using Supercritical CO2 and Hexane for Silicon Solar Cell Recycling (실리콘 태양전지 재자원화를 위한 초임계 CO2 및 헥산을 이용한 구리 및 산화구리 제거기술 개발)

  • Lee, Hyo Seok;Cho, Jae Yu;Heo, Jaeyeong
    • Current Photovoltaic Research
    • /
    • v.7 no.1
    • /
    • pp.21-27
    • /
    • 2019
  • Lifetime of Si photovoltaics modules are about 25 years and a large amount of waste modules are expected to be discharged in the near future. Therefore, the extraction and collection of valuable metals out of discharged Si modules will be one of the important technologies. In this study, we demonstrated that supercritical $CO_2$ extraction method can be effectively used to remove Cu, one of the abundant elements in the module, as well as its oxide form, $Cu_2O$. Especially, we proved that the addition of hexane as co-solvent is effective for the removal of both materials. The optimal ratio of $CO_2$ and hexane was 4:1 at a fixed temperature and pressure of $250^{\circ}C$ and 250 bar, respectively. In addition, it was proven that the removal of $Cu_2O$ was preceded via reduction of $Cu_2O$ to Cu.

Passivation Properties of Phosphorus doped Amorphous Silicon Layers for Tunnel Oxide Carrier Selective Contact Solar Cell (터널 산화막 전하선택형 태양전지를 위한 인 도핑된 비정질 실리콘 박막의 패시베이션 특성 연구)

  • Lee, Changhyun;Park, Hyunjung;Song, Hoyoung;Lee, Hyunju;Ohshita, Yoshio;Kang, Yoonmook;Lee, Hae-Seok;Kim, Donghwan
    • Current Photovoltaic Research
    • /
    • v.7 no.4
    • /
    • pp.125-129
    • /
    • 2019
  • Recently, carrier-selective contact solar cells have attracted much interests because of its high efficiency with low recombination current density. In this study, we investigated the effect of phosphorus doped amorphous silicon layer's characteristics on the passivation properties of tunnel oxide passivated carrier-selective contact solar cells. We fabricated symmetric structure sample with poly-Si/SiOx/c-Si by deposition of phosphorus doped amorphous silicon layer on the silicon oxide with subsequent annealing and hydrogenation process. We varied deposition temperature, deposition thickness, and annealing conditions, and blistering, lifetime and passivation quality was evaluated. The result showed that blistering can be controlled by deposition temperature, and passivation quality can be improved by controlling annealing conditions. Finally, we achieved blistering-free electron carrier-selective contact with 730mV of i-Voc, and cell-like structure consisted of front boron emitter and rear passivated contact showed 682mV i-Voc.

이종접합 태양전지용 p a-Si:H 에미터 층 최적화 및 태양전지 특성 거동 연구

  • Kim, Kyung Min;Jeong, Dae Young;Song, Jun Yong;Park, Joo Hyung;Oh, Byung Sung;Song, Jinsoo;Lee, Jeong Chul
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 2011.05a
    • /
    • pp.129.2-129.2
    • /
    • 2011
  • 본 연구에서는 a-Si:H/c-si 구조의 이종접합 태양전지의 p a-Si:H 에미터 층의 박막 조건에 따라 태양전지 특성을 연구하였다. p, n-layer는 PECVD (Plasma-enhanced chemical vapor deposition) i-layer는 HWCVD(Hot wire chemical vapor deposition), ITO는 RF 마그네트론 스퍼터링법으로 제작하였다. p-layer의 도핑 농도, 기판 증착 온도, 증착 높낮이에 따라 특성을 비교 분석 하였다. QSSPC로 minority carrier life time, 자외 가시선 분광분석 장치로 투과 반사도를, Ellipsometer로 흡수 계수, 두께, FTIR로 막의 구성요소 등의 변화를 조사하여 개선된 p a-Si:H의 특성이 이종접합 태양전지에서 효율향상에 영향을 주는지 Photo IV와 EQE를 통하여 조사하였다.

  • PDF

Hydrothermally deposited Hydrogen doped Zinc Oxide nano-flowers structures for amorphous silicon thin film solar cells

  • Kim, Yongjun;Kang, Junyoung;Jeon, Minhan;Kang, Jiyoon;Hussain, Shahzada Qamar;Khan, Shahbaz;Kim, Sunbo;Yi, Junsin
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2015.08a
    • /
    • pp.236.1-236.1
    • /
    • 2015
  • The surface morphology of front transparent conductive oxide (TCO) films is very important to achieve high current density in amorphous silicon (a-Si) thin film solar cells since it can scatter the light in a better way. In this study, we present the low cost hydrothermal deposited uniform zinc oxide (ZnO) nano-flower structure with various aspect ratios for a-Si thin film solar cells. The ZnO nano-flower structures with various aspect ratios were grown on the RF magnetron sputtered AZO films. The diameters and length of the ZnO nano-flowers was controlled by varying the annealing time. The length of ZnO nano-flowers were varied from 400 nm to $2{\mu}m$ while diameter was kept higher than 200 nm to obtain different aspect ratios. The ZnO nano-flowers with higher surface area as compared to conventional ZnO nano structure are preferred for the better light scattering. The conductivity and crystallinity of ZnO nano-flowers can be enhanced by annealing in hydrogen atmosphere at 350 oC. The vertical aligned ZnO nano-flowers showed higher haze ratio as compared to the commercially available FTO films. We also observed that the scattering in the longer wavelength region was favored for the high aspect ratio of ZnO nano-flowers. Therefore, we proposed low cost and vertically aligned ZnO nano-flowers for the high performance of thin film solar cells.

  • PDF

Removal of Iron and Phosphorus from Metallurgical Grade Silicon by Melting with Ca and Aqua Regia Leaching (칼슘 첨가(添加)-용융(溶融) 금속급(金屬級) 실리콘의 왕수(王水) 침출(浸出)에 의한 철(鐵)과 인(憐)의 제거(除去))

  • SaKong, Seong-Dae;Sohn, Ho-Sang
    • Resources Recycling
    • /
    • v.20 no.5
    • /
    • pp.34-39
    • /
    • 2011
  • Metallurgical grade silicon(MG-Si) was melted with Ca at 1500$^{\circ}C$ under Ar atmosphere. The sample was cooled at 10 $^{\circ}C$/min to room temperature and leached in aqua regia. In the present study, the effect of Ca addition and conditions of acid leaching on removal of Fe and P in MG-Si were investigated. CaSi$_2$ phase was formed at the grain boundary of MG-Si melting with Ca. Also FeSi$_2$ phase was precipitated in CaSi$_2$ phase. By the formation of CaSi$_2$ phase, 97% of Fe and 66 % of P were removed from Ca added MG-Si with the particle size of 600~850${\mu}m$ by aqua regia(more than 30%) leaching.

Effect of SiO2 Layer of Si Substrate on the Growth of Multiwall-Carbon Nanotubes (실리콘 기판의 산화층이 다중벽 탄소나노튜브 성장에 미치는 영향)

  • Kim, Geum-Chae;Lee, Soo-Kyoung;Kim, Sang-Hyo;Hwang, Sook-Hyun;Choi, Hyon-Kwang;Jeon, Min-Hyon
    • Korean Journal of Materials Research
    • /
    • v.19 no.1
    • /
    • pp.50-53
    • /
    • 2009
  • Multi-walled carbon nanotubes (MWNTs) were synthesized on different substrates (bare Si and $SiO_2$/Si substrate) to investigate dye-sensitized solar cell (DSSC) applications as counter electrode materials. The synthesis of MWNTs samples used identical conditions of a Fe catalyst created by thermal chemical vapor deposition at $900^{\circ}C$. It was found that the diameter of the MWNTs on the Si substrate sample is approximately $5{\sim}10nm$ larger than that of a $SiO_2$/Si substrate sample. Moreover, MWNTs on a Si substrate sample were well-crystallized in terms of their Raman spectrum. In addition, the MWNTs on Si substrate sample show an enhanced redox reaction, as observed through a smaller interface resistance and faster reaction rates in the EIS spectrum. The results show that DSSCs with a MWNT counter electrode on a bare Si substrate sample demonstrate energy conversion efficiency in excess of 1.4 %.

Improving Efficiency of Low Cost EFG Ribbon Silicon Solar Cells by Using a SOD Method (SOD방법을 이용한 저가 EFG 리본 실리콘 태양전지의 효율 향상에 관한 연구)

  • Kim, Byeong-Guk;Lim, Jong-Youb;Chu, Hao;Oh, Byoung-Jin;Park, Jae-Hwan;Lee, Jin-Seok;Jang, Bo-Yun;An, Young-Soo;Lim, Dong-Gun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.24 no.3
    • /
    • pp.240-244
    • /
    • 2011
  • The high cost of crystalline silicon solar cells has been considered as one of the major obstacles to their terrestrial applications. Spin on doping (SOD) is presented as a useful process for the manufacturing of low cost solar cells. Phosphorus (P509) was used as an n-type emitters of solar cells. N-type emitters were formed on p-type EFG ribbon Si wafers by using a SOD at different spin speed (1,000~4,000 rpm), diffusion temperatures ($800^{\circ}C{\sim}950^{\circ}C$), and diffusion time (5~30 min) in $N_2+O_2$ atmosphere. With optimum condition, we were able to achieve cell efficiency of 14.1%.