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http://dx.doi.org/10.4191/KCERS.2007.44.1.585

Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering  

Choi, Kyoon (KICET Icheon Branch Institute)
Choi, Eui-Seok (KICET Icheon Branch Institute)
Hwang, Jin-Ha (Hong-Ik University)
Lee, Soo-Hong (Sejong University)
Publication Information
Journal of the Korean Ceramic Society / v.44, no.10, 2007 , pp. 585-588 More about this Journal
Abstract
Silicon nitride films for an anti-reflection coating were deposited on silicon via RF magnetron sputtering using a $Si_3N4$ target. The best result was obtained at the sputtering condition of 340 W RF power, 5 mtorr Ar atmosphere, $100^{\circ}C$ substrate temperature. The films showed 7.9% reflectance minimum with 2.35 refractive index. 0.21 absorption coefficient at 66.6 nm thickness. The surface morphology showed a smooth and dense film with good adhesion to silicon surface.
Keywords
AR coating(anti-reflection coating); Silicon nitride; Solar cell; RF magnetron sputtering;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
Times Cited By SCOPUS : 1
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1 S.G. Kwon, K. Choi, B.-I. Kim, and J.-H. Hwang, 'Crystallization Behavior of Amorphous Silicon with Al and Ni(in Korean),' J. Kor. Ceram. Soc., 43 [4] 230-34 (2006)   과학기술학회마을   DOI   ScienceOn
2 A.G. Aberle, 'Overview on SiN Surface Passivation of Crystalline Silicon Solar Cells,' Solar Ener. Mater. & Solar Cells, 65 239-48 (2001)   DOI   ScienceOn
3 T. Lauinger, J. Schmidt, A.G. Aberle, and R. Hezel, 'Record Low Surface Recombination Velocities on 1$\Omega$ cm P-silicon Using Remote Plasma Silicon Nitride Passivation,' Appl. Phys. Lett., 68 [9] 1232-34 (1996)   DOI
4 N. Shibata, 'Improvement of Solar Cell Performance Using Plasma-Deposited Silicon Nitride Films with Variable Refractive Indices,' J. Jap. Appl. Phys., 27 [4] 480-84 (1988)   DOI
5 B. Kumar, T.B. Pandian, E. Sreekiran, and S. Narayanan, 'Benefit of Dual Layer Silicon Nitride Anti-reflection Coating,' pp.1-4, Proc. 31st IEEE PVSC, Orlando, USA 2005
6 S.H. Lee, I. Lee, and J. Yi, 'Silicon Nitride Films Prepared by High-density Plasma Chemical Vapor Deposition for Solar Cell Applications,' Surf. Coat. Tech., 153 67-71 (2002)   DOI   ScienceOn
7 D. Borchert, M. Rinio, R. Töllee, L. JanBen, W.A. Nositschka, and H. Kurz, 'Silicon Nitride for Backside Passivation of Multicrystalline Solar Cells,' pp.1-4, Proc. 20th EuPVSEC, Barcelona, Spain, 2005
8 M. Vetter and M. Rojahn, 'Properties of Amorphous Si-rich Silicon Nitride Prepared by Rf-magnetron Sputtering,' Mater. Sci. Eng. B71 321-26 (2000)   DOI   ScienceOn
9 Please visit an web site, http://www.ee.byu.edu/photonics/ ARcoatings.phtml, calculate the reflectance and thickness for the film of n= 2.35 on silicon substrate at 635 nm ($\lambda$)
10 G. Xu, P. Jin, M. Tazawa, and K. Yoshimura, 'Optical Investigation of Silicon Nitride thin Films Deposited by R.F. Magnetron Sputtering,' Thin Solid Films, 425 196-202 (2003)   DOI   ScienceOn